ZAO透明导电薄膜的制备及性质

ZAO（ZnO：Al）透明导电薄膜是一种具有高的载离子浓度和宽禁带的半导体氧化物，电学和光学性能优异。极具应用前景。本文介绍了ZAO薄膜的制备现状、特性、磁控溅射参数对其电学和光学性质的影响以及今后研究的方向。     

掺铝氧化锌粉末的制备及其性能研究

采用溶胶凝胶燃烧合成法制备了ZAO(掺铝氧化锌)粉末,借助于DSC-TG、XRD、SEM、反射率测试、红外辐射率测试对制得的ZAO粉末的形貌、微观结构、激光吸收性能和红外辐射性能进行表征.研究结果表明,制备的ZAO粉末属于六方晶系纤锌矿结构.XRD分析表明煅烧温度提高到700℃后,ZA0的晶相形成的更好.SEM图中可以看出,随着Al离子的掺杂量增加,ZAO粉末的粒径越来越小,形状越来越不规则.反射率图谱表明,在900～1200nm波长范围,存在较强的激光吸收.红外辐射率测试表明ZAO粉末具有中等红外辐射率.     

氧分压对掺钼氧化铟透明导电薄膜光电性能的影响

采用射频磁控反应溅射法在k9玻璃衬底上制备了In2O3∶Mo(IMO)透明导电薄膜,分析了不同氧分压条件下IMO薄膜的晶体结构、化学成分及光电性能.结果表明:不同氧分压下制备的IMO薄膜具有不同晶粒的取向性;随着氧分压的增加,薄膜的载流子浓度、载流子迁移率先增加后减小;薄膜的电阻率呈现先增加再减少然后再增加的趋势.在可...     

湿化学工艺SrNbxTi1-xO3导电薄膜的制备及性能

采用湿化学工艺在硅衬底上成功地制备了结构致密、均匀且无龟裂的SrNbxTi1-xO3薄膜.金属盐的冰醋酸溶液经回流再加入乙酸酐除去无机阴离子和结晶水,形成的金属醋酸盐与适当的络合剂形成的多配体络合物经部分水解生成的羟基化合物M(OH)n-x(L)x(L=C4H6O6或AcAc,M=Sr或Ti或Nb)经羟基聚合形成SrNbxTi1-xO3簇状溶胶.丙三醇抑制了羟基金属过度聚合,甲基纤维素(MCL)使SrNbxTi1-xO溶胶具有网状结构.SrNb0.1Ti0.9O3(SNTO)凝胶薄膜经过650～750℃/30min退火形成假立方钙钛矿结构.应用XRD、SEM和TEM对薄膜结构和形貌进行表征.室温下SNTO薄膜的电阻率为54μΩ·cm,而在160K到室温之间薄膜电阻率随温度的变化遵从p=p0 AT2.分析结果表明:Nb5 离子的施主掺杂改变了禁带宽度,实现了SrTiO3的n-型半导体化.SNTO(100)/Pt/Ti/SiO2/Si衬底上的Pb(Zr0.52Ti0.48)O3(PZT)薄膜的择优取向明显,较之于Pt/Ti/SiO2/Si衬底上的PZT薄膜有良好的铁电性,其剩余极化强度也比PZT/Pt(111)/Ti/SiO2/Si的大.     

有机-无机透明导电薄膜的研究进展

透明导电膜是一种重要的光电材料,应用广泛.以传统的无机氧化物和导电高分子材料制备的导电薄膜虽然电学性能优良,但综合性能不甚理想.通过有机-无机杂化的透明导电薄膜能够借助各组成材料特性的互补作用使复合材料具有出色的综合性能.介绍了透明导电薄膜的种类、用途和特性,综述了有机-无机杂化导电材料在块体材料和透明导电薄膜方面的应用,并展望了其发展前景.     

Al掺杂ZnO薄膜的制备及其电学性能研究

采用溶胶-凝胶法在玻璃基底上制备掺杂铝的氧化锌薄膜.研究了不同的铝掺杂浓度、薄膜厚度以及退火温度对电阻率的影响,结果表明掺杂铝摩尔分数为2%、退火温度在550℃时电阻率最低,电阻率随着薄膜厚度的增加而减小.通过XRD和SEM对薄膜的组织结构和形貌进行了表征,结果表明样品表面相对平整、致密,AZO薄膜保持着ZnO六角纤锌矿结构,说明了Al原子对Zn原子的有效替位.     

纳米氧化锌掺铝薄膜的微观结构研究

采用溶胶-凝胶(sol-gel)法在玻璃衬底上制备了纳米ZnO掺铝薄膜,利用X射线衍射仪(XRD)和透射电镜(TEM)对薄膜的微观结构进行了系统的研究。结果表明,所有在玻璃衬底上生长的ZnO薄膜均具有c轴择优取向。掺杂量为2%(原子分数)时,Al在ZnO薄膜中达到最高水平。过量Al掺杂明显减弱薄膜的c轴择优取向。随着Al掺杂量的增加,ZnO晶粒进一步细化。其原因是未进入ZnO晶格的Al以非晶Al2O3的形式在ZnO晶界上形成了对晶界运动的钉扎,从而阻碍了ZnO晶粒进一步长大。     

ZAO薄膜的溶胶-凝胶法制备及性能研究

以普通玻璃载玻片为衬底,采用溶胶-凝胶工艺成功地制备出沿(002)晶面择优取向生长的ZAO薄膜.用XRD、SEM、紫外-可见光分光光度计和四探针电阻测试仪进行了结构和性能分析,研究了掺Al3+浓度、镀膜层数和退火温度对ZAO薄膜的晶体结构、形貌及光电性能的影响.当掺杂浓度为1%(原子分数)、镀膜层数为12层、在氩气气氛下经过600℃退火时,得到电阻率为1.37×10-2Ω·cm、可见光范围内平均透射率超过90%的ZAO薄膜.     

溶胶-凝胶法制备ITO透明导电薄膜的研究进展

ITO透明导电薄膜以其优良的透明导电性能在平面液晶显示(LCD)、电致发光(EC)等多个领域得到了广泛的应用.制备ITO薄膜的方法很多,其中采用溶胶-凝胶法制备ITO透明导电薄膜具有成本低,设备简单,工艺可控,有利于大面积成膜等优点,因而受到了广泛的关注.较详尽地介绍了ITO薄膜的透明导电机理、溶胶-凝胶法的工艺特征,并初步论述了溶胶-凝胶法制备ITO透明导电薄膜的应用和发展前景.     

透明导电氧化锌薄膜的制备

简单回顾了透明导电氧化锌薄膜的发展历程，着重介绍了各种氧化锌薄膜的制备方法和各自的优缺点，以及改进方案和在实际生产中的应用，分析了透明导电氧化锌薄膜存在的问题和解决问题的思路，最后对于氧化锌这种极具替力的材料进行了展望。     

Development of thickness measurement program for transparent conducting oxide thin films

The gallium doped zinc oxide has been one of the candidates for the transparent conducting oxide thin film electrode. It is not suitable to use a conventional light interference method to measure the thickness of the gallium doped zinc oxide thin film because the refractive index and extinction coefficient of the thin film is unknown during the optimization of the deposition conditions. In this paper, we report on the details of the film thickness program which uses the measured optical and electric properties and relationship between the plasma frequency and the optical constant of the film. The obtained film thickness of the prepared gallium doped zinc oxide thin film using the program was comparable with thicknesses measured by a cross-sectional analysis of the atomic force microscopy and the surface profiler. Moreover, the optical constant of refractive index and extinction coefficient of the film could also be estimated.     

Factorial design preparation of transparent conducting oxide thin films

Transparent and conducting properties of Cd₂SnO₄ films deposited onto glass substrates by the dip coating technique have been obtained using a 2⁴ factorial design. All films were well adhered onto their substrates, presented porous morphology and inverse spinel structure. Statistical factorial design analysis showed that only substrate withdrawal rate and precursor solution concentration had significant effects on average transmission of the films. Cumulative probability graphs of factorial design model coefficients showed that none of the factor levels have significant effects on resistivity. However the films presented significantly higher resistivities using low withdrawal rates and low concentration levels. This indicates resistivity is a more complex function of the factor variables than transmission. From the factorial design experiments and statistical analysis of their results a highest average transmission of 88% and lowest resistivity of 2.43 × 10^− 4 Ω m were found.     

Electrical and optical properties of Zn-In-Sn-O transparent conducting thin films

Indium tin oxide (ITO) is one of the widely used transparent conductive oxides (TCO) for application as transparent electrode in thin film silicon solar cells or thin film transistors owing to its low resistivity and high transparency. Nevertheless, indium is a scarce and expensive element and ITO films require high deposition temperature to achieve good electrical and optical properties. On the other hand, although not competing as ITO, doped Zinc Oxide (ZnO) is a promising and cheaper alternative. Therefore, our strategy has been to deposit ITO and ZnO multicomponent thin films at room temperature by radiofrequency (RF) magnetron co-sputtering in order to achieve TCOs with reduced indium content. Thin films of the quaternary system Zn-In-Sn-O (ZITO) with improved electrical and optical properties have been achieved.The samples were deposited by applying different RF powers to ZnO target while keeping a constant RF power to ITO target. This led to ZITO films with zinc content ratio varying between 0 and 67%. The optical, electrical and morphological properties have been thoroughly studied. The film composition was analysed by X-ray Photoelectron Spectroscopy. The films with 17% zinc content ratio showed the lowest resistivity (6.6 × 10^− 4 Ω cm) and the highest transmittance (above 80% in the visible range). Though X-ray Diffraction studies showed amorphous nature for the films, using High Resolution Transmission Electron Microscopy we found that the microstructure of the films consisted of nanometric crystals embedded in a compact amorphous matrix. The effect of post deposition annealing on the films in both reducing and oxidizing atmospheres were studied. The changes were found to strongly depend on the zinc content ratio in the films.     

绒面ZAO透明导电膜的制备工艺研究

绒面ZAO(ZnO∶Al,氧化锌铝)透明导电膜在硅基薄膜太阳能电池领域应用前景广阔,本文利用直流磁控溅射方法,采用氧化锌铝陶瓷靶材制备了ZAO透明导电膜,并用自制的腐蚀液对膜层进行腐蚀以便形成太阳能电池所需要的表面凹凸起伏的绒面结构。研究了不同镀膜温度对膜层性能的影响,不同退火条件下膜层热稳定性的变化情况,不同腐蚀时间下膜层电阻、透过率以及表面形貌的变化,结果表明,在相同真空度、溅射功率和节拍的情况下,220℃下制备的ZAO透明导电膜膜层性能最好,腐蚀时间为30 s时获得的绒面效果好。     

超疏水性透明涂层的研究进展

超疏水性固体表面是指表面对水的接触角在150°以上,前进接触角和后退接触角的差＜10°的固体表面.超疏水性透明涂层具有自清洁的表面性能,在许多领域具有潜在的应用价值.本文就超疏水性透明涂层研究的理论发展和该领域近年来取得的一些重要研究成果进行评述,并扼要分析了该领域今后的发展方向.     

Annealing effect on properties of transparent and conducting ZnO thin films

This work presents the effect of postdeposition annealing on the structural, electrical and optical properties of undoped ZnO (zinc oxide) thin films, prepared by radio-frequency sputtering method. Two samples, 0.17 and 0.32 µm-thick, were annealed in vacuum from room temperature to 350 °C while another 0.32 µm-thick sample was annealed in air at 300 °C for 1 h. X-ray diffraction analysis revealed that all the films had a c-axis orientation of the wurtzite structure normal to the substrate. Electrical measurements showed that the resistivity of samples annealed in vacuum decreased gradually with the increase of annealing temperature. For the 0.32 µm-thick sample, the gradual decrease of the resistivity was essentially due to a gradual increase in the mobility. On the other hand, the resistivity of the sample annealed in air increased strongly. The average transmission within the visible wavelength region for all films was higher than 80%. The band gap of samples annealed in vacuum increased whereas the band gap of the one annealed in air decreased. The main changes observed in all samples of this study were explained in terms of the effect of oxygen chemisorption and microstructural properties.     

CZTS thin films on transparent conducting electrodes by electrochemical technique

We have fabricated single phase Cu₂ZnSnS₄ (CZTS) films using a specially designed 3-stage electrochemical system. Sequential electrodepositon of constituent metallic layers was carried out on SnO₂/F coated glass substrates using a platinum counter electrode and a saturated calomel reference electrode. Unique bath compositions were formulated for each of these constituents. Sequentially deposited tri-layer stacks were annealed in sulfur environment to get CZTS phase. Detailed structural, morphological and optical characterization experiments were performed using several techniques including x-ray diffraction, Raman and UV-visible spectroscopy, scanning electron microscopy and atomic force microscopy. All characterization experiments indicated that the films are single phase with a measured direct band gap of 1.5 eV.     

Highly conducting and transparent tin-doped CdO thin films for optoelectronic applications

Highly conducting and transparent thin films of tin-doped cadmium oxide were deposited on quartz substrate using pulsed laser deposition technique. The effect of growth temperature on structural, optical and electrical properties was studied. These films are highly transparent (78-89%) in visible region, and transmittance of the films depends on growth temperature. It is observed that resistivity increases with growth temperature after attaining minimum at 150 °C, while carrier concentration continuously decreases with temperature. The lowest resistivity of 1.96 × 10^− 5 Ω cm and carrier concentration of 5.52 × 10²¹ cm³ is observed for the film grown at 150 °C. These highly conducting and transparent tin-doped CdO thin films grown via pulsed laser deposition could be an excellent candidate for future optoelectronic applications.     

Substitution of transparent conducting oxide thin films for indium tin oxide transparent electrode applications

The present status and prospects for further development of reduced or indium-free transparent conducting oxide (TCO) materials for use in practical thin-film transparent electrode applications such as liquid crystal displays are presented in this paper: reduced-indium TCO materials such as ZnO-In₂O₃, In₂O₃-SnO₂ and Zn-In-Sn-O multicomponent oxides and indium-free materials such as Al- and Ga-doped ZnO (AZO and GZO). In particular, AZO thin films, with source materials that are inexpensive and non-toxic, are the best candidates. The current problems associated with substituting AZO or GZO for ITO, besides their stability in oxidizing environments as well as the non-uniform distribution of resistivity resulting from dc magnetron sputtering deposition, can be resolved. Current developments associated with overcoming the remaining problems are also presented: newly developed AZO thin-film deposition techniques that reduce resistivity as well as improve the resistivity distribution uniformity using high-rate dc magnetron sputtering depositions incorporating radio frequency power. In addition, stability tests of resistivity in TCO thin films evaluated in air at 90% relative humidity and 60 °C have demonstrated that sufficiently moisture-resistant AZO thin films can be produced at a substrate temperature below 200 °C when the film thickness was approximately 200 nm. However, improving the stability of AZO and GZO films with a thickness below 100 nm remains a problem.