Bulk and interface properties of molybdenum trioxide-doped hole transporting layer in organic light-emitting diodes

Effects of doping molybdenum trioxide (MoO₃) in N,N′-diphenyl-N,N′-bis(1,1′-biphenyl)-4,4′-diamine (NPB) are studied at various thicknesses of doped layer (25–500 Å) by measuring the current–voltage characteristics, the capacitance–voltage characteristics and the operating lifetime. We formed charge transfer complex of NPB and MoO₃ by co-evaporation of both materials to achieve higher charge density, lower operating voltage, and better reliability of devices. These improved performances may be attributed to both bulk and interface properties of the doped layer. The authors demonstrated that the interface effects play more important role in lowering the operating voltage and increasing the lifetime.     

Role of hole injection layer in intermediate connector of tandem organic light-emitting devices

In this work, we demonstrate three kinds of intermediate connectors (ICs) having a general configuration of “LiNH₂-doped 4,7-diphenyl-1,10-phenanthroline (BPhen)/hole injection layer (HIL)/N,N′-diphenyl-N,N′-bis(1-naphthyl)-1,1′-biphenyl-4,4′-diamine (NPB)”, in which the HIL is 1,4,5,8,9,11-hexaazatriphenylene hexacarbonitrile (HAT-CN), MoO₃ or MoO₃-doped NPB, respectively. Tandem organic light-emitting devices (OLEDs), vertically stacking two electroluminescence units, are fabricated using these intermediate connectors in between. The results show that, higher power efficiency is achievable in the cases of utilizing HAT-CN and MoO₃-doped NPB as HILs in the intermediate connectors versus MoO₃, whereas higher current efficiency can be obtained in the cases of using MoO₃ and MoO₃-doped NPB versus HAT-CN. We use the current density–voltage and low frequency differential capacitance–voltage measurements and find that the HILs primarily influence the voltage drop and the charge generation capability of intermediate connectors. The correlation between the effectiveness of intermediate connectors and the performances of tandem OLEDs is established, which can shed light on choosing suitable component materials to optimize the intermediate connectors.     

The role of molybdenum oxide as anode interfacial modification in the improvement of efficiency and stability in organic light-emitting diodes

It has been experimentally found that molybdenum oxide (MoO₃) as the interfacial modification layer on indium-tin-oxide (ITO) in organic light-emitting diodes (OLEDs) significantly improves the efficiency and lifetime. In this paper, the role of MoO₃ and MoO₃ doped N,N′-di(naphthalene-1-yl)–N,N′-diphenyl-benzidine (NPB) as the interface modification layer on ITO in improvement of the efficiency and stability of OLEDs is investigated in detail by atomic force microscopy (AFM), polarized optical microscopy, transmission spectra, ultraviolet photoemission spectroscopy (UPS) and X-ray photoemission spectroscopy (XPS). The studies on the energy level and the morphology of the films treated at different temperatures clearly show that the MoO₃ and MoO₃:NPB on ITO can reduce the hole injection barrier, improve the interfacial stability and suppress the crystallization of hole-transporting NPB, leading to a higher efficiency and longer lifetime of OLEDs.     

Hybrid intermediate connector for tandem OLEDs with the combination of MoO3-based interlayer and p-type doping

We report on a high-quality hybrid intermediate connector (IC) used in tandem organic light-emitting diodes (OLEDs), which is composed of an ultrathin MoO₃ interlayer sandwiched between a n-type Cs₂CO₃-doped 4,7-diphenyl-1,10-phenanthroline (BPhen) layer and a p-type MoO₃-doped N,N′-diphenyl-N,N′-bis(1-naphthyl)-(1,1′-biphenyl)-4,4′-diamine (NPB) layer. The charge generation characteristics for light emission in tandem OLEDs have been identified by studying the interfaces and the corresponding devices. The hybrid IC structure exhibits superior charge generation capability, and its interfacial electronic structures are beneficial to the generation and injection of electrons and holes into bottom and top emission units, respectively. Compared to the organic-TMO bilayer and doped p–n junction structures, the hybrid IC structure combining MoO₃-based interlayer and p-type doping can effectively decrease the driving voltage and improve the current efficiency of tandem devices due to the increased bulk heterojunction-like charge generation interfaces. Our results indicate that the TMO-based hybrid IC structure can be a good structure in the fabrication of high-efficiency tandem OLEDs.     

Versatile hole injection of VO2: Energy level alignment at N,N′-di(1-naphthyl)-N,N′-diphenyl-(1,1′-biphenyl)-4,4′-diamine/VO2/fluorine-doped tin oxide

Energy level alignments at the interface of N,N′-di(1-naphthyl)-N,N′-diphenyl-(1,1′-biphenyl)-4,4′-diamine (NPB)/VO₂/fluorine-doped tin oxide (FTO) were studied by photoemission spectroscopy. The overall hole injection barrier between FTO and NPB was reduced from 1.38 to 0.59 eV with the insertion of a VO₂ hole injection layer. This could allow direct hole injection from FTO to NPB through a shallow valence band of VO₂. Surprisingly, VO₂ can also act as a charge generation layer due to its small band gap of 0.80 eV. That is, its conduction band is quite close to the Fermi level, and thus electrons can be extracted from the highest occupied molecular orbital (HOMO) of NPB, which is equivalent to hole injection into the NPB HOMO.     

P-type doping of organic wide band gap materials by transition metal oxides: A case-study on Molybdenum trioxide

A study on p-doping of organic wide band gap materials with Molybdenum trioxide using current transport measurements, ultraviolet photoelectron spectroscopy and inverse photoelectron spectroscopy is presented. When MoO₃ is co-evaporated with 4,4′-Bis(N-carbazolyl)-1,1′-biphenyl (CBP), a significant increase in conductivity is observed, compared to intrinsic CBP thin films. This increase in conductivity is due to electron transfer from the highest occupied molecular orbital of the host molecules to very low lying unfilled states of embedded Mo₃O₉ clusters. The energy levels of these clusters are estimated by the energy levels of a neat MoO₃ thin film with a work function of 6.86 eV, an electron affinity of 6.7 eV and an ionization energy of 9.68 eV. The Fermi level of MoO₃-doped CBP and N,N′-bis(1-naphtyl)-N,N′-diphenyl-1,1′-biphenyl-4,4′-diamine (α-NPD) thin films rapidly shifts with increasing doping concentration towards the occupied states. Pinning of the Fermi level several 100 meV above the HOMO edge is observed for doping concentrations higher than 2 mol% and is explained in terms of a Gaussian density of HOMO states. We determine a relatively low dopant activation of ～0.5%, which is due to Coulomb-trapping of hole carriers at the ionized dopant sites.     

Effect of annealing-induced oxidation of molybdenum oxide on organic photovoltaic device performance

Molybdenum oxide (MoO_x) has been widely used as a hole transport layer in organic photovoltaic cells (OPVs), whose performance can be improved by inserting a MoO_x layer between an organic active layer and a transparent anode because of efficient carrier dissociation. In this study, the influence of thermally annealed MoO_x on the photovoltaic performance of OPVs was first investigated using low-bandgap polymer and [6,6]-phenyl C₇₁-butyric acid methyl ester (PC₇₁BM) blend films as the active layer. We used three low-bandgap polymers: poly[2,6-(4,4-bis-(2-ethylhexyl)-4H-cyclopenta[2,1-b;3,4-b′]dithiophene)-alt-4,7(2,1,3-benzothiadiazole)] (PCPDTBT), poly(4,8-bis[(2-ethylhexyl)oxy]benzo[1,2-b:4,5-b′]dithiophene-2,6-diyl3-fluoro-2-[(2-ethylhexyl)carbonyl]thieno[3,4-b]thiophenediyl) (PTB7), and poly([2,6′-4,8-di(5-ethylhexylthienyl)benzo[1,2-b,3,3-b]dithiophene]3-fluoro-2[(2-ethylhexyl)carbonyl]thieno[3,4-b]thiophenediyl) (PTB7-Th). Power conversion efficiencies were drastically increased for all investigated polymers when the as-deposited MoO_x layer was annealed at 160 °C for 5 min. In particular, a high efficiency of 6.57% was achieved when PTB7 was used; for comparison, the efficiency of a reference device with an as-deposited MoO_x layer (not subjected to annealing) was 1.40%. Specifically, the short-circuit current density and fill factor were remarkably improved after annealing, which means that efficient carrier dissociation was achieved in the active layer. We evaluated optical absorption and surface morphology to elucidate reasons behind the improved photovoltaic performance, and these parameters only slightly changed after annealing. In contrast, angle-dependent X-ray photoelectron spectroscopy revealed that the MoO_x layer was oxidized after annealing. In general, the oxygen vacancies of MoO_x act as carrier traps; a reduction in the number of carrier traps causes high hole mobility in the organic layer, which, in turn, results in an improved photovoltaic performance. Therefore, our results indicate that the annealing-induced oxidation of MoO_x is useful for achieving high photovoltaic performance.     

High performance top-emitting organic light-emitting diodes with copper iodide-doped hole injection layer

Efficient top-emitting organic light-emitting diodes were fabricated using copper iodide (CuI) doped 1,4-bis[N-(1-naphthyl)-N′-phenylamino]-4,4′-diamine (NPB) as a hole injection layer and Ir(ppy)₃ doped CBP as the emitting layer. CuI doped NPB layer functions as an efficient p-doped hole injection layer and significantly improves hole injection from a silver bottom electrode. The top-emitting device shows high current efficiency of 69 cd/A with Lambertian emission pattern. The enhanced hole injection is originated from the formation of the charge transfer complex between CuI and NPB.     

Fabrication of high-speed InP/InGaAs/InP DHBT with a new self-aligned metallization technique for reduced base resistance

A new self-aligned emitter–base metallization (SAEBM) technique with wet etch is developed for high-speed heterojunction bipolar transistors (HBTs) by reducing extrinsic base resistance. After mesa etch of the base layer using a photo-resist mask, the base and emitter metals are evaporated simultaneously to reduce the emitter–base gap (S_EB) and base gap resistance (R_GAP). The InP/InGaAs/InP double heterojunction bipolar transistor (DHBT) fabricated using the technique has a reduced R_GAP, from 16.48 Ω to 4.62 Ω comparing with the DHBT fabricated by conventional self-aligned base metallization (SABM) process. Furthermore, we adopt a novel collector undercut technique using selective etching nature of InP and InGaAs to reduce collector–base capacitance (C_CB). Due to the reduced R_GAP, the maximum oscillation frequency (f_max) for a 0.5 μm-emitter HBT is improved from 205 GHz to 295 GHz, while the cutoff frequency (f_T) is maintained at around 300 GHz.     

Notch-δ-doped InP Gunn diodes for low-THz band applications

The viability of the indium phosphide (InP) Gunn diode as a source for low-THz band applications is analyzed based on a notch-δ-doped structure using the Monte Carlo modeling. The presence of the δ-doped layer could enhance the current harmonic amplitude (A₀) and the fundamental operating frequency (f₀) of the InP Gunn diode beyond 300 ​GHz as compared with the conventional notch-doped structure for a 600-nm length device. With its superior electron transport properties, the notch-δ-doped InP Gunn diodes outperform the corresponding gallium arsenide (GaAs) diodes with up to 1.35 times higher in f₀ and 2.4 times larger in A₀ under DC biases. An optimized InP notch-δ-doped structure is estimated to be capable of generating 0.32-W radio-frequency (RF) power at 361 ​GHz. The Monte Carlo simulations predict a reduction of 44% in RF power, when the device temperature is increased from 300 ​K to 500 ​K; however, its operating frequency lies at 280 ​GHz which is within the low-THz band. This shows that the notch-δ-doped InP Gunn diode is a highly promising signal source for low-THz sensors, which are in a high demand in the autonomous vehicle industry.     

Effect of lithium and silver diffusion in single-stack and tandem OLED devices

A study of metal (Li, Ag) diffusion has been carried out in an archetypal OLED device based on N,N′-di(1-naphthyl)-N,N′-diphenyl-(1,1′-biphenyl)-4,4′-diamine|tris(8-hydroxyquinolinato) aluminum|4,7-diphenyl-1,10-phenanthroline (NPB|Alq₃|Bphen). Using single-stack and two-stack tandem OLED structures with variations of layer thicknesses and metal layer placements, we have found that Ag vapor-deposited on Alq₃ layer can diffuse or penetrate deep into Alq₃, up to ∼2,000 Å, causing luminescence quenching. This diffusion can be substantially prevented by a thin layer of Li or Bphen deposited on Alq₃ prior to the deposition of Ag. In contrast, Li diffusion in either Alq₃ or Bphen is limited to about 50–100 Å. Li appears to be able to diffuse into Bphen irrespective of the order of Li and Bphen depositions.     

Thermal Stability Study of Cu(MoN<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript>) Seed Layer on Barrierless Si

This study reports the good thermal stability of a sputtered Cu(MoN _x ) seed layer on a barrierless Si substrate. A Cu film with a small amount of MoN _x was deposited by reactive co-sputtering of Cu and Mo in an Ar/N₂ gas mixture. After annealing at 560°C for 1 h, no copper silicide formation was observed at the interface of Cu and Si. Leakage current and resistivity evaluations reveal the good thermal reliability of Cu with a dilute amount of MoN _x at temperatures up to 560°C, suggesting its potential application in advanced barrierless metallization. The thermal performance of Cu(MoN _x ) as a seed layer was evaluated when pure Cu is deposited on top. X-ray diffraction, focused ion beam microscopy, and transmission electron microscopy results confirm the presence of an ∼10-nm-thick reaction layer formed at the seed layer/Si interface after annealing at 630°C for 1 h. Although the exact composition and structure of this reaction layer could not be unambiguously identified due to trace amounts of Mo and N, this reaction layer protects Cu from a detrimental reaction with Si. The Cu(MoN _x ) seed layer is thus considered to act as a diffusion buffer with stability up to 630°C for the barrierless Si scheme. An electrical resistivity of 2.5 μΩ cm was obtained for the Cu/Cu(MoN _x ) scheme after annealing at 630°C.     

Effect of high-temperature annealing on lanthanum aluminate thin films grown by ALD on Si(1 0 0)

Amorphous lanthanum aluminate thin films were deposited by atomic layer deposition on Si(1 0 0) using La(ⁱPrCp)₃, Al(CH₃)₃ and O₃ species. The effects of post-deposition rapid thermal annealing on the physical and electrical properties of the films were investigated. High-temperature annealing at 900 °C in N₂ atmosphere leads to the formation of amorphous La-aluminosilicate due to Si diffusion from the substrate. The annealed oxide exhibits a uniform composition through the film thickness, a large band gap of 7.0 ± 0.1 eV, and relatively high dielectric constant (κ) of 18 ± 1.     

Efficient red phosphorescent organic light emitting diodes based on solution processed all-inorganic cesium lead halide perovskite as hole transporting layer

An efficient red phosphorescent organic light emitting diode (PhOLED) has been realized by utilizing a composite hole transporting layer comprised of all-inorganic cesium lead halide perovskite CsPbBr₃ via spin-coating and 1,3-bis(9-carbazolyl) benzene (mCP) by vacuum depositing, in which CsPbBr₃ film is used as a hole transporting layer and mCP plays a dominant role in electron and exciton blocking. And this PhOLED shows a saturated red emission coordinated at CIE (0.65, 0.33) driven at 7.5 V, a maximum brightness of 20,750 cd/m², and a maximum current efficiency of 10.64 cd/A, which is as 1.87 times as that 5.68 cd/A of the reference PhOLEDs based on traditional small organic molecular hole transporting material N,N′-bis(naphthalen-1-yl)-N,N′-bis(phenyl)-benzi (NPB). The electroluminescent (EL) spectra and the energy level alignment of different PhOLEDs are investigated. The enhanced EL performances are ascribed to improved hole injecting and transporting behaviors, and better electron and exciton confinements by introducing the composite hole transporting layer CsPbBr₃/mCP.     

Using metal/organic junction engineering to prepare an efficient organic base-modulation triode and its inverter

In this study, we investigated the influence of a buffer layer of molybdic oxide (MoO₃) at the metal/organic junction on the behavior of organic base-modulation triodes. The performance of devices featuring MoO₃/Al as the emitter electrode was enhanced relative to that of corresponding devices with Au and Ag, presumably because of the reduced in the contact barrier and the prevention of metal diffusion into the organic layer. The device exhibited an output current of ?16.1 μA at V_B = ?5 V and a current ON/OFF ratio of 10³. Using this architecture, we constructed resistance–load inverters that exhibited a calculated gain of 6.     

Aqueous solution-processed MoO3 as an effective interfacial layer in polymer/fullerene based organic solar cells

The authors demonstrate an effective anode interfacial layer based on aqueous solution-processed MoO₃ (sMoO₃) in poly (3-hexylthiophene) (P3HT) and indene-C60 bisadduct (ICBA) based bulk-heterojunction organic solar cells (PSCs). Various sMoO₃ concentration (0.03–0.25 wt%) was obtained by dissolving MoO₃ powder into deionized water directly with weak solubility. The characteristics of sMoO₃ films evaluated by atomic force microscope (AFM) and scanning electron microscope (SEM) suggest that the sMoO₃ films continuously cover the entire indium tin oxide (ITO) surface. The sMoO₃ based PSCs exhibit comparable power conversion efficiency with poly (3,4-ethylenedioxythiophene)–polystyrenesulfonic acid (PEDOT:PSS) based devices. However, even more importantly, the stability of sMoO₃ based devices have been greatly improved in air under continual light-illumination at 52 mW/cm². Further evaluations on Mo valence states and work function of sMoO₃ films by X-ray photoelectron spectroscopy (XPS) and ultraviolet photoelectron spectroscopy (UPS) demonstrate that the aqueous solution-processed MoO₃ could act as an better anode interfacial layer than the conventional PEDOT:PSS.     

Interfacial modifying layer-driven high-performance organic thin-film transistors and their nitrogen dioxide gas sensors

Organic thin-film transistors (OTFTs) based on bottom-gate bottom-contact configuration were fabricated by inserting two kinds of modifying layers at the interface of source/drain electrode and organic semiconductor, while nitrogen dioxide (NO₂) sensing capability was also evaluated based on the obtained OTFTs. Compared to OTFT without interfacial layer, the field-effect mobility (μ) was enhanced from 0.018 cm²/Vs to 0.15 cm²/Vs by incorporating with MoO_x interfacial layer. Moreover, when exposed to 30 ppm NO₂, the saturation current and μ of OTFT with MoO_x interfacial layer increase 22.7% and 26.7%, respectively, while in original OTFT, the values are only 3.0% and 3.7%, respectively. The mechanism of performance improvement of OTFT sensor was systematically studied by focusing on the interface of source/drain electrode and organic semiconductor. The reduced contact resistance leads to higher μ, meanwhile, pentacene morphology modulation on MoO_x contributes to better diffusion of NO₂ molecules. As a result, higher μ and more diffused gas molecules enhance the gas sensing property of the transistor.     

MoO3/Au/MoO3–PEDOT:PSS multilayer electrodes for ITO-free organic solar cells

The effect of the MoO₃–PEDOT:PSS composite layer in the MoO₃/Au/MoO₃–PEDOT:PSS multilayer electrode on the power conversion efficiency of ITO-free organic solar cells (OSCs) was evaluated. The MoO₃ (30 nm)/Au(12 nm)/MoO₃–PEDOT:PSS (30 nm)/PEDOT:PSS structure showed ~7% more optical transmittance than the MoO₃ (30 nm)/Au (12 nm)/MoO₃(30 nm)/PEDOT:PSS structure at 550 nm wavelength. The OSCs using MoO₃/Au/MoO₃–PEDOT:PSS multilayer electrodes as anodes showed a considerable improvement in power conversion efficiency (PCE), from 1.84% to 2.81%, comparable to ITO based OSCs with PCE of 2.89%. This improvement is attributed to the suppression of MoO₃ dissolution by the acidic hole transport layer (HTL) PEDOT:PSS on the MoO₃/Au/MoO₃–PEDOT:PSS multilayer electrode, resulting in high J_sc, V_oc and FF of the OSCs. This composite based multilayer electrode was shown to be a promising replacement in ITO-free flexible optoelectronic devices.     

Orange phosphorescent organic light-emitting diodes with high operational stability

In this article we report on the performances of phosphorescent orange organic light-emitting diodes (OLEDs) having a high operational stability. The fabricated devices all consist of a “hybrid” structure, where the hole-injection layer was processed from solution, while the rest of the organic materials were deposited by vacuum thermal evaporation. A device stack having an emissive layer comprising a carbazole-based host TCzMe doped with the orange phosphor tris(2-phenylquinoline)iridium(III) [Ir(2-phq)₃] shows improved efficiencies compared to a the same device with the standard N,N′-bis(naphthalen-1-yl)-N,N′-bis(phenyl)-benzidine (NPB) as host material. External quantum efficiency (EQE) up to 7.4% and a power efficiency of 16 lm/W were demonstrated using TCzMe. Most importantly, the operational stability of the device was largely improved, resulting in extrapolated values reaching lifetimes well above 100,000 h at initial luminance of 1000 Cd/m².     

Origin of Enhanced Hole Injection in Inverted Organic Devices with Electron Accepting Interlayer

Conventional organic light emitting devices have a bottom buffer interlayer placed underneath the hole transporting layer (HTL) to improve hole injection from the indium tin oxide (ITO) electrode. In this work, a substantial enhancement in hole injection efficiency is demonstrated when an electron accepting interlayer is evaporated on top of the HTL in an inverted device along with a top hole injection anode compared with the conventional device with a bottom hole injection anode. Current–voltage and space‐charge‐limited dark injection (DI‐SCLC) measurements were used to characterize the conventional and inverted N,N′‐diphenyl‐N,N′‐bis(1‐naphthyl)(1,1′biphenyl)‐4,4′diamine (NPB) hole‐only devices with either molybdenum trioxide (MoO₃) or 1,4,5,8,9,11‐hexaazatriphenylene hexacarbonitrile (HAT‐CN) as the interlayer. Both normal and inverted devices with HAT‐CN showed significantly higher injection efficiencies compared to similar devices with MoO₃, with the inverted device with HAT‐CN as the interlayer showing a hole injection efficiency close to 100%. The results from doping NPB with MoO₃ or HAT‐CN confirmed that the injection efficiency enhancements in the inverted devices were due to the enhanced charge transfer at the electron acceptor/NPB interface.