Bottom-contact small-molecule n-type organic field effect transistors achieved via simultaneous modification of electrode and dielectric surfaces

Low-voltage, n-type organic field effect transistors (OFETs) with simultaneously modified bottom-contact (BC) electrodes and dielectric were compared to their top-contact (TC) counterparts. The devices modified with 6-phenoxyhexylphosphonic acid (Ph6PA) self-assembled monolayer (SAM) showed similar performance, morphology, and contact resistance. Electron mobility of C₆₀ devices were 0.212 and 0.320 cm² V⁻¹ s⁻¹ and [6,6]-phenyl-C₆₁-butyric acid methyl ester (PCBM) devices were 0.04 and 0.06 cm² V⁻¹ s⁻¹ for TC and BC devices, respectively. Low contact resistance between 11 and 45 kΩ cm was found regardless of device architecture or n-type semiconductor used. This work shows it is possible to fabricate solution processable low-voltage bottom-contact devices with performance that is similar or better than their top-contact counterparts without the addition of complex and time-consuming processing steps.     

Influence of Dielectric Surface Chemistry on the Microstructure and Carrier Mobility of an n‐Type Organic Semiconductor

This paper examines the microstructure evolution of 3,4,9,10‐perylene‐tetracarboxylic bis‐benzimidazole (PTCBI) thin films resulting from conditions imposed during film deposition. Modification of the silicon dioxide interface with a hydrophobic monolayer (octadecyltrichlorosilane (OTS‐18)) alters the PTCBI growth habit by changing the unit cell contact plane. PTCBI films deposited on oxide surface have an orientation of (011), while films atop OTS‐treated oxide surface have a preferred orientation of (001). The quality of the self assembled monolayer does not appear to influence the PTCBI growth preference significantly yet it enhances the carrier mobility, suggesting that charge traps are adequately passivated due to uniform monolayer coverage. High‐quality monolayers result in n‐type carrier mobility values of 0.05 cm²V^–1s^–1 Increasing the substrate temperature during PTCBI film deposition correlates with an increase in mobility that is most significant for films deposited on OTS‐treated surface.     

基于有机薄膜晶体管电特性曲线获取迁移率方法的研究

场效应迁移率是描述有机薄膜晶体管(OTFT)性能的 重要参数之一,目前OTFT场效应迁移率主要根据实验测得OTFT电特性曲线通过拟合计算方法 获得。本文针对这种方法进行深入研究发现,OTFT的场效应迁 移率与其工作状态有关。在线性工作状态下,OTFT的线性区场效应迁移率随 着 栅电压的增加而增大;在饱和工作状态下,当漏电压VD>1.5VGmax时,饱和区场效应迁移率 为一定值,表明采用此值表征OTFT的电性能更加客观和精确。     

C8 BTBT薄膜结晶形貌及OTFT器件性能研究

以p型共轭有机小分子2,7二辛基[1]苯并噻吩并[3,2‐b]苯并噻吩(C8‐BTBT)作为底栅顶接触有机薄膜晶体管(OTFT)的有源层,采用浸渍提拉法、喷墨打印法和真空蒸镀法三种制备工艺,探究半导体薄膜载流子迁移率与结晶形貌的关系,发现不同工艺下有机小分子呈现出不同的生长行为和结晶情况,在很大程度上决定了OTFT器件性能的优劣;此外,通过XRD分析研究了退火处理对C8‐BTBT结晶的影响。结果表明,真空蒸镀制备的薄膜具有更高的结晶度、衬底覆盖率高,并且呈现出SK(Stranski‐Krastanov)模式的结晶生长特征,相应器件中陷阱密度最低,迁移率高达5.44 cm^2·V^-1·s^-1,开关比超过106;且退火处理会严重破坏C8‐BTBT薄膜的结晶。因此,控制半导体层的生长行为,提升半导体层的覆盖率和结晶度是制备高性能共轭小分子OTFT器件的有效途径。     

有源层厚度对CuPc-OTFT器件性能的影响

研究了不同厚度有源层的顶电极CuPc-OTFT器件的电学特性。发现器件的性能与有源层厚度有依赖关系，其中，有源层厚度为20nm的器件性能最好。在有源层厚度大于20nm时，有源层厚度的增大不但分去一部分栅电压而且还增大了源、漏电极的接触电阻，从而不利于器件性能的提高。但当有源层厚度小于20nm以后器件的性能开始降低。我们认为当有源层厚度降低到一定程度时，有源层上表面的表面态会使有机材料的隙态浓度增加从而对沟道载流子迁移率产生不良影响以及使器件的阈值电压增大。     

一种基于聚合物绝缘层的TIPS-pentacene晶体管性质研究

采用顶接触结构研究制备了以TIPS-pentacene为有源层、聚甲基丙烯酸甲酯(PMMA)为绝缘层的有机场效应晶体管(OFET),其中绝缘层采用溶液旋涂法制备,电极采用Au电极。通过原子力显微镜(AFM)和X射线衍射(XRD)技术对TIPS-pentacene在PMMA上的生长特性进行了详细分析,结果表明,器件获得了良好的电学特性,其场效应迁移率、阈值电压以及开关电流比分别为0.137 cm2/Vs、-19 V和9.74×104。对器件的稳定性也做了详细研究。     

抗反膜设计改善半导体光放大器偏振不灵敏性的理论研究

通过理论分析和计算表明,适当地增加反射率,在同样的工作电流下,半导体光放大器(SOA)的增益将有所增大。合理地调节抗反膜的折射率和厚度,可以使TM模的反射率R_(TM)在一段波长范围内大于TE模的反射率R_(TE)。这样的反射率分布可以相对提高TM模的增益,在一定程度上改善SOA的偏振不灵敏性。通过抗反膜的设计来辅助解决偏振不灵敏的问题,可以使SOA在有源区和波导设计中获得更大的灵活性,更好地兼顾其他的性能要求。     

有机薄膜晶体管阈值电压漂移现象的研究

研究了有机薄膜晶体管(Oganic thin film transistor，OTFT)的阈值电压漂移与栅偏置电压和偏置时间的关系、不同栅绝缘膜对OTFT阈值电压漂移的影响以及不同栅绝缘膜MIS结构的C-V特性。结果发现．栅偏置电压引起了OTFT转移特性曲线的平移而场效应迁移率(μFE)和亚阈值陡度(△S)不变；阈值电压漂移的量与偏置时间的对数呈线性关系。还发现阈值电压漂移量与栅绝缘膜绝缘性能有关，绝缘性能好的绝缘膜(如SiO2)器件阈值电压漂移量小．绝缘性能差的绝缘膜(如TaOx)器件阈值电压漂移量大。认为有机晶体管阈值电压漂移是由沟道载流子以直接隧穿方式进入栅绝缘膜内的陷阱造成的。     

Light Effects on the Bias Stability of Transparent ZnO Thin Film Transistors

We report on the bias stability characteristics of transparent ZnO thin film transistors (TFTs) under visible light illumination. The transfer curve shows virtually no change under positive gate bias stress with light illumination, while it shows dramatic negative shifts under negative gate bias stress. The major mechanism of the bias stability under visible illumination of our ZnO TFTs is thought to be the charge trapping of photo‐generated holes at the gate insulator and/or insulator/channel interface.     

Surface modification of printed silver electrodes for efficient carrier injection in organic thin-film transistors

The modification of printed silver electrode surfaces for use as the bottom-contact electrodes of organic thin-film transistors (OTFTs) is reported. Printed silver electrodes fabricated using the surface photoreactive nanometal printing (SuPR-NaP) technique are inevitably covered with an inert surface layer of alkylamines that is originally used for encapsulation of the silver nanoparticles (AgNPs). However, it may act as a built-in protective layer against carrier injections. We demonstrate that a simple vapor exposure method is sufficient for converting the protective layer into a layer that assists carrier injection. As modifiers, we used various types of fluorinated benzenethiols that exhibit a stronger coordination with the silver surfaces than the alkylamimes. We detected the chemical conversion from alkylamine encapsulation to thiol coordination by surface enhanced Raman spectroscopy (SERS) and evaluated the improvement in the carrier injection using a transfer length method (TLM) for the OTFTs. Among the modifiers, the pentafluorobenzenethiol (PFBT) treatment significantly improves the device performance and stability of the OTFTs.     

Spontaneous Phase Separation of Poly(3‐hexylthiophene)s with Different Regioregularity for a Stretchable Semiconducting Film

Highly regioregular (RR) poly(3‐hexylthiophene)s PHTs are known to exhibit excellent electrical properties in comparison to chemically identical but regiorandom (rr) PHTs. In this study, distinct RR (97% and 55%)‐graded PHTs are subjected to solution blending to spontaneously separate the high‐RR PHT chains from the low‐RR PHT media and develop highly conjugated nanodomains in both solution and film. In the spun‐cast blend films, the rr PHT matrix imparts sufficient deformability of the channel layer required for stretchable organic thin‐film transistors (OTFTs), compared to neat RR PHTs and blends with a deformable polymer. OTFTs including RR PHT/rr PHT blend films show excellent hole mobility (µ) values up to 0.13 cm² V^?1 s^?1, surpassing that of the best RR PHT films (0.026 cm² V^?1 s^?1) fabricated by ultrasound solution pretreatment. Furthermore, a 50% stretched RR PHT/rr PHT film maintains ≈55% of its µ value at no strain, while RR PHT films show a sudden decrease in µ even at 10% stretch. The simple blending approach imparts deformability to π‐conjugated polymer films for application in stretchable OTFTs.     

In+Cd共掺杂ZnO薄膜的光电性能研究

通过脉冲激光沉积(PLD)在石英玻璃基底上沉积了 四元Zn0.86Cd0.11In0.03O(ZCIO)合金半导体薄膜 。其中,Cd的掺杂是 用以改变ZnO的光学禁带宽度,In是用以提高载流子浓度。X射线衍射(XRD)分析证实,ZCIO 具有六方纤锌 矿结构而没有其它相(如CdO和In₂O₃相)出现。场发射扫描电子显微镜(FE-SEM)观察到Z CIO薄膜的晶粒尺 寸要比未掺杂ZnO的小。所有薄膜在可见光范围内都有很高的透过率(≈85%)。最重要 的是,在保持了Zn1－xCdxO 薄膜的光学特性外,ZCIO薄膜的电学性能得到了改善 ,低的电阻率(4.42×10－3 Ω·cm)和高的载流子浓度(5.50×10¹⁹ cm－ 3),使得它比Zn1－xCdxO 薄膜更具应用价值。     

用于OLED的a-Si TFT有源驱动阵列保护电路的分析

在模拟与仿真的基础上．根据MOS器件的源漏击穿特性．分析了用于a-Si TFT有源驱动阵列的外围保护电路的工作原理;同时根据所采用的有源OLED单元像素驱动电路的特点,确定了电源线、数据线、信号线上的相应保护电路形式。该保护电路可应用于OLED的有源驱动TFT阵列。     

NPB层嵌入MgF_2超薄层对OLED性能的影响

将MgF2超薄层嵌入有机电致发光器件(OLED)的空穴传输层NPB中,制备了结构为ITO/NPB(10nm)/MgF2(xnm)/NPB(20nm)/Alq3(30nm)/Al(30nm)的一系列OLED。测试结果表明,合适厚度的MgF2可有效降低器件启亮电压,提高器件的发光效率。MgF2厚度为0.5nm的器件启亮电压只有2.3V,较未嵌入MgF2器件降低2V;MgF2厚度为1.0nm的器件最大电流效率达到3.93cd/A,最大光功率效率达到1.58lm/W,较未嵌入MgF2器件分别提高95%和110%。