InGaAs-InP DHBTs for increased digital IC bandwidth having a 391-GHz f/sub /spl tau// and 505-GHz f/sub max/

InP-In/sub 0.53/Ga/sub 0.47/As-InP double heterojunction bipolar transistors (DHBT) have been designed for use in high bandwidth digital and analog circuits, and fabricated using a conventional mesa structure. These devices exhibit a maximum 391-GHz f/sub /spl tau// and 505-GHz f/sub max/, which is the highest f/sub /spl tau// reported for an InP DHBT-as well as the highest simultaneous f/sub /spl tau// and f/sub max/ for any mesa HBT. The devices have been aggressively scaled laterally for reduced base-collector capacitance C/sub cb/. In addition, the base sheet resistance /spl rho//sub s/ along with the base and emitter contact resistivities /spl rho//sub c/ have been lowered. The dc current gain /spl beta/ is /spl ap/36 and V/sub BR,CEO/=5.1 V. The devices reported here employ a 30-nm highly doped InGaAs base, and a 150-nm collector containing an InGaAs-InAlAs superlattice grade at the base-collector junction. From this device design we also report a 142-GHz static frequency divider (a digital figure of merit for a device technology) fabricated on the same wafer. The divider operation is fully static, operating from f/sub clk/=3 to 142.0 GHz while dissipating /spl ap/800 mW of power in the circuit core. The circuit employs single-buffered emitter coupled logic (ECL) and inductive peaking. A microstrip wiring environment is employed for high interconnect density, and to minimize loss and impedance mismatch at frequencies >100 GHz.     

A 1.6-Gb/s/pin double data rate SDRAM with wave-pipelined CAS latency control

An 8 M /spl times/ 32 GDDR (graphic DDR) SDRAM operating up to 800-MHz clock (CLK) frequency is described. The GDDR SDRAM demands an effective control of CAS latency due to the large and wide number of CAS latencies at the CLK frequency. A wave-pipelined CAS latency control circuit is proposed to provide stable operation for the large and wide number of CAS latencies. The increase of CAS latency also causes a degradation of data bus efficiency at high-speed operation due to the large gap between input data (DINs) and output data (DOUTs) at the operation of write followed by read. A gapless write to read scheme improves the data bus efficiency by separating write data-path from read data-path for different banks accesses. Partial array activation commands can reduce the peak current, preventing the reduction of the data retention time of DRAM cells at high-speed operation. The GDDR SDRAM operates successfully at the CLK frequency of 800 MHz at 2.1 V and 700 MHz at 1.8 V, respectively. The power consumption is measured to be /spl sim/2 W at 1.9 V.     

A 1.3-GHz fifth-generation SPARC64 microprocessor

A fifth-generation SPARC64 processor is fabricated in 130-nm partially depleted silicon-on-insulator CMOS with eight layers of Cu metallization. At V/sub dd/ = 1.2 V and T/sub a/ = 25/spl deg/C, it runs at 1.3 GHz and dissipates 34.7 W. The chip contains 191 M transistors with 19 M logic circuits in an area of 18.14 mm /spl times/ 15.99 mm and is covered with 5858 bumps, of which 269 are for I/O signals. It is mounted in a 1360-pin land-grid-array package. The 16-byte-wide system bus operates with a 260-MHz clock in single-data-rate or double-data-rate modes. This processor implements an error-detection mechanism for execution units and data path logic circuits in addition to on-chip arrays to detect data corruption. Intermittent errors detected in execution units and data paths are recovered via instruction retry. A soft barrier clocking scheme allows amortization of the clock skew and jitter over multiple cycles and helps to achieve high clock frequency. Tunability of the clock timing makes timing closure easier. A relatively small amount of custom circuit design and the use of mostly static circuits contributes to achieve short development time.     

A 1.6-GS/s 12-bit return-to-zero GaAs RF DAC for multiple Nyquist operation

A 12-bit 1.6-GS/s digital-to-analog converter (DAC) implemented with 4-/spl mu/m/sup 2/ GaAs HBT process is presented. Return-to-zero (RZ) current switches are added to current steering DAC for high-frequency wideband applications to achieve 800-MHz bandwidth at first and second Nyquist band without the need for a reverse sinc equalization filter in wideband transmitter application. The RZ circuit also improves spectral purity by screening the switching noise from the analog output during data transition. Measured performance shows two-tone third-order harmonic distortion of -70 dB at 1.5-GHz output frequency, clocked at 1.6 GHz. Reliable interface with CMOS logic IC is guaranteed with the inclusion of a four-clock-deep FIFO circuit. The DAC dissipates 1.2 W at -5 V when sampled with 1.6-GHz clock, with typical output voltage swing of 1.2 V/sub PP/.     

A 1-MHz-bandwidth second-order continuous-time quadrature bandpass sigma-delta modulator for low-IF radio receivers

This paper presents a quadrature bandpass /spl Sigma//spl Delta/ modulator with continuous-time architecture. Due to the continuous-time architecture and the inherent anti-aliasing filter, the proposed /spl Sigma//spl Delta/ modulator needs no additional anti-aliasing filter in front of the modulator in contrast to quadrature bandpass /spl Sigma//spl Delta/ modulators with switched-capacitor architectures. The second-order /spl Sigma//spl Delta/ modulator digitizes complex analog I/Q input signals at 1-MHz intermediate frequency and operates within a clock frequency range of 25-100 MHz. The modulator chip achieves a peak signal-to-noise-distortion ratio (SNDR) of 56.7 dB and a dynamic range of 63.8 dB within a 1-MHz signal bandwidth and at a clock frequency of 100 MHz. Furthermore, it provides an image rejection of at least 40 dB. The 0.65-/spl mu/m BiCMOS chip consumes 21.8 mW at 2.7-V supply voltage.     

Switched-current circuits in digital CMOS technology with low charge-injection errors

In this paper, digital CMOS switched-current (SI) circuits with low charge-injection errors are presented. These circuits are based on the operation of the switches at virtual-ground nodes to result in signal-independent charge injection. Based on this scheme, different topologies for the memory cell are discussed. To verify the theoretical concepts developed, a third-order elliptic low-pass SI filter is implemented in a 0.25-/spl mu/m digital CMOS process. The filter nominally operates with a clock frequency of 10 MHz, cutoff frequency of 1 MHz, and a power supply of 2.3 V, while consuming 29 mW of power and processing input signals as large as 600-/spl mu/A peak differential. The low-charge injection nature of the circuit is reflected in its low total harmonic distortion of -59 dB for a 0.3-MHz signal with a modulation index of 0.5.     

A sub-mW MPEG-4 motion estimation processor core for mobile video application

This paper describes a sub-mW motion estimation processor core for MPEG-4 video encoding. It features a gradient descent search (GDS) algorithm that reduces required computational complexity to 15 MOPS. The GDS algorithm combined with a sub-block search method upgrades picture quality. The quality is almost equal to that of a full search method. An SIMD datapath architecture optimized for the algorithm decreases a clock frequency and supply voltage. A dedicated three-port SRAM macro for image data caches of the processor is newly designed to reduce power consumption. It has been fabricated with 0.18-/spl mu/m five-layer metal CMOS technology. The VLSI processing QCIF 15-f/s video consumes 0.4-mW power at 0.85-MHz clock frequency with 1.0-V supply voltage. It is applicable to mobile video applications.     

Process and temperature compensation in a 7-MHz CMOS clock oscillator

This paper reports on the design and characterization of a process, temperature and supply compensation technique for a 7-MHz clock oscillator in a 0.25-/spl mu/m, two-poly five-metal (2P5M) CMOS process. Measurements made across a temperature range of -40/spl deg/C to 125/spl deg/C and 94 samples collected over four fabrication runs indicate a worst case combined variation of /spl plusmn/2.6% (with process, temperature and supply). No trimming was performed on any of these samples. The oscillation frequencies of 95% of the samples were found to fall within /spl plusmn/0.5% of the mean frequency and the standard deviation was 9.3 kHz. The variation of frequency with power supply was /spl plusmn/0.31% for a supply voltage range of 2.4-2.75 V. The clock generator is based on a three-stage differential ring oscillator. The variation of the frequency of the oscillator with temperature and process has been discussed and an adaptive biasing scheme incorporating a unique combination of a process corner sensing scheme and a temperature compensating network is developed. The biasing circuit changes the control voltage of the differential ring oscillator to maintain a constant frequency. A comparator included at the output stage ensures rail-to-rail swing. The oscillator is intended to serve as a start-up clock for micro-controller applications.     

1.5-V single work-function W/WN/n/sup +/-poly gate CMOS device design with 110-nm buried-channel PMOS for 90-nm vertical-cell DRAM

This letter reports on 1.5-V single work-function W/WN/n/sup +/-poly gate CMOS transistors for high-performance stand-alone dynamic random access memory (DRAM) and low-cost low-leakage embedded DRAM applications. At V/sub dd/ Of 1.5-V and 25/spl deg/C, drive currents of 634 /spl mu/A//spl mu/m for 90-nm L/sub gate/ NMOS and 208 /spl mu/A-/spl mu/m for 110-nm L/sub gate/ buried-channel PMOS are achieved at 25 pA//spl mu/m off-state leakage. Device performance of this single work function technology is comparable to published low leakage 1.5-V dual work-function technologies and 25% better than previously reported 1.8-V single work-function technology. Data illustrating hot-carrier immunity of these devices under high electric fields is also presented. Scalability of single work-function CMOS device design for the 90-nm DRAM generation is demonstrated.     

Memory characteristics of MOSFETs with densely stacked silicon nanocrystal Layers in the gate oxide synthesized by low-energy ion beam

Densely stacked silicon nanocrystal layers embedded in the gate oxide of MOSFETs are synthesized with Si ion implantation into an SiO/sub 2/ layer at an implantation energy of 2 keV. In this letter, the memory characteristics of MOSFETs with 7-nm tunnel oxide and 20-nm control oxide at various temperatures have been investigated. A threshold voltage window of /spl sim/ 0.5 V is achieved under write/erase (W/E) voltages of +12 V/-12 V for 1 ms. The devices exhibit good endurance up to 10/sup 5/ W/E cycles even at a high operation temperature of 150/spl deg/C. They also have good retention characteristics with an extrapolated ten-year memory window of /spl sim/ 0.3 V at 100/spl deg/C.     

A 600-MHz single-chip multiprocessor with 4.8-GB/s internal shared pipelined bus and 512-kB internal memory

A 600-MHz single-chip multiprocessor, which includes two M32R 32-bit CPU cores , a 512-kB shared SRAM and an internal shared pipelined bus, was fabricated using a 0.15-/spl mu/m CMOS process for embedded systems. This multiprocessor is based on symmetric multiprocessing (SMP), and supports modified-exclusive-shared-invalid (MESI) cache coherency protocol. The multiprocessor inherits the advantages of previously reported single-chip multiprocessors, while its multiprocessor architecture is optimized for use as an embedded processor. The internal shared pipelined bus has a low latency and large bandwidth (4.8 GB/s). These features enhance the performance of the multiprocessor. In addition, the multiprocessor employs various low-power techniques. The multiprocessor dissipates 800 mW in a 1.5-V 600-MHz multiprocessor mode. Standby power dissipation is less than 1.5 mW at 1.5 V. Hence, the multiprocessor achieves higher performance and lower power consumption. This paper presents a single-chip multiprocessor architecture optimized for use as an embedded processor and its various low-power techniques.     

A highly threshold Voltage-controllable 4T FinFET with an 8.5-nm-thick Si-fin channel

Highly threshold voltage (V/sub th/)-controllable four-terminal (4T) FinFETs with an aggressively thinned Si-fin thickness down to 8.5-nm have successfully been fabricated by using an orientation-dependent wet-etching technique, and the V/sub th/ controllability by gate biasing has systematically been confirmed. The V/sub th/ shift rate (/spl gamma/=-/spl delta/V/sub th///spl delta/V/sub g2/) dramatically increases with reducing Si-fin thickness (T/sub Si/), and the extremely high /spl gamma/=0.79 V/V is obtained at the static control gate bias mode for the 8.5-nm-thick Si-fin channel device with the 1.7-nm-thick gate oxide. By the synchronized control gate driving mode, /spl gamma/=0.46 V/V and almost ideal S-slope are achieved for the same device. These experimental results indicate that the optimum V/sub th/ tuning for the high performance and low-power consumption very large-scale integrations can be realized by a small gate bias voltage in the ultrathin Si-fin channel device and the orientation-dependent wet etching is the promising fabrication technique for the 4T FinFETs.     

Low-voltage high-speed switched-capacitor circuits without voltage bootstrapper

Low-voltage high-speed switched-capacitor (SC) circuit design without using voltage bootstrapper is presented. The basic building block used for low-voltage SC circuit design is the auto-zeroed integrator (AZI), which can work at both low voltage and high sampling frequency. With this method, two low-voltage SC systems were successfully designed and implemented in 1.2-/spl mu/m CMOS technology. The first one is a fully differential SC bandpass biquad working at 1.5 V and 5.0-MHz clock frequency. The measured Q value is 8.0 at the center frequency of 833 kHz. The second one is a fully differential fourth-order bandpass /spl Delta//spl Sigma/ modulator that also works at 1.5 V and 5.0 MHz. Its measured third-order intermodulation is less than -78 dBc due to the low distortion characteristic of AZI. The measured signal-to-noise ratio of the modulator is 61 dB within the narrow band of 25 kHz centered at 1.25 MHz.     

A 4160-bit C4D serial memory

A 4160-bit serial memory chip has been designed, fabricated, and tested using as the basic memory cell the conductively connected charge-coupled device (CCD) or C4D. The chip includes an inverting regenerator every 65 bits and a reading tap every 130 bits. Also on-chip is a recirculating amplifier which senses the charge packet as it reaches the end of the register and feeds it back to the input. This means that once data has been written onto the chip, it will be retained as long as the regenerator supply and the two clocks are on. The chip has two multiplexed halves to obtain a data rate of twice the clock frequency. The active area of the chip is 12 mm/SUP 2/ or 2900 /spl mu/m/SUP 2/ per bit. Operation was obtained for arbitrary data streams at clock rates of 1 kHz to 1.6 MHz (3.2 MHz data rate). Power dissipation varies linearly with frequency and is 16 /spl mu/W per bit at the highest frequency. Maximum read latency is 80 /spl mu/s at this frequency. This performance demonstrates the feasibility of the C4D as a component for a medium speed large-scale memory.     

A 256K dynamic random access memory

A 5 V 256K/spl times/1 bit NMOS dynamic RAM employing redundancy is described. Using 2.3 /spl mu/m design rules, the cell is laid out in a folded bit line configuration having a row pitch of 6.5 /spl mu/m and a sense-amplifier pitch of 18 /spl mu/m. Tantalum silicide/polysilicon is used as the second polysilicon level to reduce the row line time constant. A storage capacitance of 60 fF and the Hi-C cell structure provides this memory with high alpha-particle insensitivity. The die measures 4.66/spl times/11.65 mm, and fits into a standard 0.3 in wide 16-pin DIP. The memory operates with 256 refresh cycles with a 4 ms refresh time. Typical RE/CE access times are 105/45 ns with an active power dissipation of 250 MW. Typical standby power is less than 20 mW. The part is compatible with the present Western Electric 5 V 64K part.     

A new single-chip C/SUP 2/MOS A/D converter for microprocessor systems-Penta-Phase Integrating C/SUP 2/MOS A/D converter

A new unique conversion technique named the `Penta-Phase Integration' method, applied to a single-chip C/SUP 2/MOS 12-bit analog-to-digital converter designed for microprocessor system, is introduced and described. The newly developed device, fabricated with a standard metal gate CMOS process including an 8-channel multiplexer and TTL compatibility, has several features: unipolar- and ratiometric-conversion can be performed; conversion accuracy within /spl plusmn/0.05 percent of full scale over the -35/spl deg/C-+85/spl deg/C temperature range can be obtained; conversion time is 1.1 ms at a 20 MHz clock frequency, and the device can be operated with a single 5 V power supply and 6 mW power consumption at a 4 MHz clock frequency. The new technique essentially incorporated several methods which divide one conversion cycle into five-phases, accomplish minimization of the error caused by comparator response delay, provide several narrow flat phases to eliminate switching errors due to parasitic capacitance, and enable high clock frequency operation in digital circuits by utilizing C/SUP 2/MOS circuit technology and a synchronized configuration for counters.     

The design and performance of CMOS 256K bit DRAM devices

The design and performance of CMOS 256K bit dynamic random access memory devices with 256K/spl times/1 and 64K/spl times/4 output configurations are presented. An advanced CMOS technology, with device scaling to the HMOS-III level, is used to provide effective solutions to critical device and circuit problems in DRAM design and to offer features not previously implemented in NMOS designs. The cell and die area are 70 /spl mu/m/SUP 2/ and 253 mil /spl square/ (6.3 mm /spl square/), respectively. The typical row access time is less than 100 ns. The p-channel memory array used in this design improves the memory refresh characteristics and reduces the soft error rates. The use of static and clocked CMOS circuits provides lower active power, wide operating margins, microwatt standby power, and high column data bandwidth. The 256K bit devices are designed with two output modes, namely, ripplemode and static column mode, selected by a metal mask option.     

Vertical scaling of 0.25-/spl mu/m emitter InP/InGaAs single heterojunction bipolar transistors with f/sub T/ of 452 GHz

Vertical scaling of the epitaxial structure has allowed submicron InP/InGaAs-based single heterojunction bipolar transistors (SHBTs) to achieve record high-frequency performance. The 0.25/spl times/16 /spl mu/m/sup 2/ transistors, featuring a 25-nm base and a 100-nm collector, display current gain cut-off frequencies f/sub T/ of 452 GHz. The devices operate at current densities above 1000 kA/cm/sup 2/ and have BV/sub CEO/ breakdowns of 2.1 V. A detailed analysis of device radio frequency (RF) parameters, and delay components with respect to scaling of the collector thickness is presented.     

A 16 384-bit dynamic RAM

A 16-kbit dynamic RAM is described which is TTL compatible on all pins, and fits a standard 16-pin package. A single-transistor storage cell is used which occupies 455 /spl mu/m/SUP 2/. The device is fabricated in n-channel two-layer polysilicon gate technology using conventional design rules. The chip size is 145 by 234 mils. A low-power sense amplifier is used for each 64 memory cells. A special refresh mode is possible in which all 256 sense amplifiers are active, and the entire memory can be refreshed in 64 address cycles.     

High-frequency performance of subthreshold SOI MESFETs

Results from silicon-on-insulator (SOI) MESFETs designed for subthreshold operation are presented. The transistors have subthreshold slopes as low as 78 mV/dec and off-state drain currents approaching 1 pA//spl mu/m. Drain current saturation can be achieved with drain voltages of less than 0.5 V and with output impedance>100 M/spl Omega//spl middot//spl mu/m. The cutoff frequency of a 500-nm gate length device exceeds 1 GHz at currents significantly less than 1 /spl mu/A//spl mu/m. These results suggest that subthreshold SOI MESFETs might have useful applications in mixed-signal, micropower circuit design.