A 32-Mb chain FeRAM with segment/stitch array architecture

This paper demonstrates the 32-Mb chain ferroelectric RAM (chain FeRAM) with 0.2-/spl mu/m three-metal CMOS technology. A small die size of 96 mm/sup 2/ and a high cell/chip area efficiency of 65.6% are realized not only by the small cell size using capacitor-on-plug technology but also by two key techniques that utilize the three-metal process: 1) a compact memory cell block structure that eliminates plateline area and reduces block selector area and 2) the segment/stitch array architecture which reduces the area of row decoders and plate drivers. As a result, the average cell size shrinks to 1.875 /spl mu/m/sup 2/, which is smaller than a 0.13-/spl mu/m SRAM cell, and the chip size is reduced to 70% of the chain FeRAM of conventional configuration with two-metal process. Moreover, a power-on/off sequence suitable to the chain FeRAM is introduced to protect the memory cell data from the startup noise. Compatibility with low-power SRAM is a key issue for mobile applications. The low-standby-current bias generator is introduced and the standby current of the chip is suppressed to 3 /spl mu/A. The modified address access mode is also adopted to eliminate the need of intentional address transition after the startup of the chip. The chip enable access time was 50 ns and cycle time was 75 ns at 3.0-V V/sub dd/.     

A CMOS mixed-signal clock and data recovery circuit for OIF CEI-6G+ backplane transceiver

A CMOS low-power mixed-signal clock and data recovery circuit is presented in this paper. It is designed for OIF CEI-6G+ LR backplane transceiver, and consists of a phase detector, loop filter, phase control logic, and phase interpolator. A unique subsampled architecture makes it possible for a low-power mixed-signal clock recovery loop running at a rate of 6 Gb/s. The proposed architecture has data pattern independent loop bandwidth. Fabricated in a 0.13-/spl mu/m CMOS technology in an area of 280/spl times/100 /spl mu/m/sup 2/, the clock and data recovery loop exhibits a frequency tracking range up to 2000 ppm. The bit error rate is less than 10/sup -12/ with a pseudorandom bit sequence of length 2/sup 31/-1. The power dissipation is 24 mW for clock and data recovery circuits from a single 1.2-V supply.     

An embedded DRAM with a 143-MHz SRAM interface using a sense-synchronized read/write

This paper describes a 4-Mb embedded DRAM macro using novel fast random cycle architecture with sense-synchronized read/write (SSR/SSW). The test chip has been fabricated with a 0.15-/spl mu/m logic-based embedded DRAM process and the 1.5-V 143-MHz no-wait row random access operation has been confirmed. Data retention power is suppressed to 92 /spl mu/W owing to the hierarchical power supply and SSR. The macro size is 4.59 mm/sup 2/. The cell occupation ratio of the macro is 46%, which is the same as that of a conventional embedded DRAM macro. The macro size and the data retention power are 30% and 4.6%, respectively, of a 4-Mb embedded SRAM macro fabricated by an identical process.     

Electrical characteristics of 8-/spl Aring/ EOT HfO/sub 2//TaN low thermal-budget n-channel FETs with solid-phase epitaxially regrown junctions

The authors demonstrate high-performing n-channel transistors with a HfO/sub 2//TaN gate stack and a low thermal-budget process using solid-phase epitaxial regrowth of the source and drain junctions. The thinnest devices have an equivalent oxide thickness (EOT) of 8 /spl Aring/, a leakage current of 1.5 A/cm/sup 2/ at V/sub G/=1 V, a peak mobility of 190 cm/sup 2//V/spl middot/s, and a drive-current of 815 /spl mu/A//spl mu/m at an off-state current of 0.1 /spl mu/A//spl mu/m for V/sub DD/=1.2 V. Identical gate stacks processed with a 1000-/spl deg/C spike anneal have a higher peak mobility at 275 cm/sup 2//V/spl middot/s, but a 5-/spl Aring/ higher EOT and a reduced drive current at 610 /spl mu/A//spl mu/m. The observed performance improvement for the low thermal-budget devices is shown to be mostly related to the lower EOT. The time-to-breakdown measurements indicate a maximum operating voltage of 1.6 V (1.2 V at 125 /spl deg/C) for a ten-year lifetime, whereas positive-bias temperature-instability measurements indicate a sufficient lifetime for operating voltages below 0.75 V.     

Subharmonically pumped CMOS frequency conversion (up and down) circuits for 2-GHz WCDMA direct-conversion transceiver

Subharmonically pumped frequency down- and upconversion circuits are implemented in 0.18-/spl mu/m mixed-mode CMOS technology for 2-GHz direct-conversion WCDMA transceiver applications. These circuits operate in quadrature double-balanced mode and a required octet-phases (0/spl deg/, 45/spl deg/, 90/spl deg/, 135/spl deg/, 180/spl deg/, 225/spl deg/, 270/spl deg/, and 315/spl deg/) local oscillator (LO) signal comes from an active multiphases LO generator composed of a polyphase filter and active 45/spl deg/ phase shifting circuits. For linearity improvement, predistortion compensation and negative feedback schemes are used in the frequency down- and upconversion circuits, respectively. The downconverter achieves a conversion voltage gain of 20 dB (to 1-M/spl Omega/ load), 4-dBm IIP3 (18-dBm OIP3 to 50-/spl Omega/ load), 41-dBm IIP2 and 8.5-dB DSB NF at 1-MHz IF frequency, consuming 13.4 mA from 1.8-V supply, in the WCDMA Rx band (2110-2170 MHz). The upconverter, operating as two switched gain modes in the WCDMA Tx band (1920-1980 MHz), consumes 19.4 mA from 1.8-V supply and shows 14.5-dB conversion power gain, 15 -dBm OIP3 (0.5-dBm IIP3) and -11 dBm P/sub 1dB/ at maximum gain mode. At minimum gain mode, it realizes -0.3-dB conversion loss, 10.7-dBm OIP3 (11-dBm IIP3) and 0-dBm P/sub 1dB/, respectively. 3GPP WCDMA modulation tests are performed for both up- and downconversion circuits and the results are discussed in this paper.     

Design and anaylsis of a 2.5-Gbps optical receiver analog front-end in a 0.35-/spl mu/m digital CMOS technology

This paper presents the design of an optical receiver analog front-end circuit capable of operating at 2.5 Gbit/s. Fabricated in a low-cost 0.35-/spl mu/m digital CMOS process, this integrated circuit integrates both transimpedance amplifier and post limiting amplifier on a single chip. In order to facilitate high-speed operations in a low-cost CMOS technology, the receiver front-end has been designed utilizing several enhanced bandwidth techniques, including inductive peaking and current injection. Moreover, a power optimization methodology for a multistage wide band amplifier has been proposed. The measured input-referred noise of the optical receiver is about 0.8 /spl mu/A/sub rms/. The input sensitivity of the receiver front-end is 16 /spl mu/A for 2.5-Gbps operation with bit-error rate less than 10/sup -12/, and the output swing is about 250 mV (single-ended). The front-end circuit drains a total current of 33 mA from a 3-V supply. Chip size is 1650 /spl mu/m/spl times/1500 /spl mu/m.     

A 90-nm low-power 32-kB embedded SRAM with gate leakage suppression circuit for mobile applications

In sub-100-nm generation, gate-tunneling leakage current increases and dominates the total standby leakage current of LSIs based on decreasing gate-oxide thickness. Showing that the gate leakage current is effectively reduced by lowering the gate voltage, we propose a local dc level control (LDLC) for SRAM cell arrays and an automatic gate leakage suppression driver (AGLSD) for peripheral circuits. We designed and fabricated a 32-kB 1-port SRAM using 90-nm CMOS technology. The six-transistor SRAM cell size is 1.25 /spl mu/m/sup 2/. Evaluation shows that the standby current of 32-kB SRAM is 1.2 /spl mu/A at 1.2 V and room temperature. It is reduced to 7.5% of conventional SRAM.     

A CMOS analog front-end IC for portable EEG/ECG monitoring applications

A new digital programmable CMOS analog front-end (AFE) IC for measuring electroencephalograph or electrocardiogram signals in a portable instrumentation design approach is presented. This includes a new high-performance rail-to-rail instrumentation amplifier (IA) dedicated to the low-power AFE IC. The measurement results have shown that the proposed biomedical AFE IC, with a die size of 4.81 mm/sup 2/, achieves a maximum stable ac gain of 10 000 V/V, input-referred noise of 0.86 /spl mu/ V/sub rms/ (0.3 Hz-150 Hz), common-mode rejection ratio of at least 115 dB (0-1 kHz), input-referred dc offset of less than 60 /spl mu/V, input common mode range from -1.5 V to 1.3 V, and current drain of 485 /spl mu/A (excluding the power dissipation of external clock oscillator) at a /spl plusmn/1.5-V supply using a standard 0.5-/spl mu/m CMOS process technology.     

A subharmonically injected LC delay line oscillator for 17-GHz quadrature LO generation

An injection-locked delay line oscillator multiplies a 5-6-GHz input by 3 to generate I/Q LO signals for 17-GHz wireless networking applications. I/Q errors caused by asymmetric injection are minimized by symmetric injection via a passive polyphase prefilter. Passive delay lines set the measured free-running frequency of the LC ring oscillator to 16.24 GHz. The measured locking range for a 0 dBm (50 /spl Omega/) input is 14.6-17.86 GHz. Input-to-output phase noise degradation is negligible, and I/Q amplitude and phase errors are <0.17 dB and <2/spl deg/, respectively. Power consumption of the 1.2/spl times/1.4 mm/sup 2/ 0.2 /spl mu/m SiGe BiCMOS testchip (excluding buffers) is 22 mW at 2.2 V.     

1-Mbit virtually static RAM

The 1-Mb RAM utilizes a one-transistor, one-capacitor dynamic memory cell. Since all the refresh-related operations are done on chip, the RAM acts as a virtually static RAM (VSRAM). The refresh operations are merged into the normal operation, called a background refresh, the main feature of the VSRAM. Since the fast operation of the core part of the RAM is crucial to minimize the access-time overhead by the background refresh, 16 divided bit lines and parallel processing techniques are utilized. Novel hot-carrier resistant circuits are applied selectively to bootstrapped nodes for high hot-carrier reliability. N-channel memory cells are embedded in a p-well, which gives a low soft error rate of less than 10 FIT. 1-/spl mu/m NMOSFETs with moderately lightly doped drain structures offer fast 5-V operation with sufficient reliability. An advanced double-level poly-Si and double-level Al twin-well CMOS technology is developed for fast circuit speed and high packing density. The memory cell size is 3.5/spl times/8.4 /spl mu/m/SUP 2/, and the chip size is 5.99/spl times/13.8 mm./SUP 2/. Address access time is typically 62 ns, with 21-mA operating current and 30-/spl mu/A standby current at room temperature.     

1.5-V single work-function W/WN/n/sup +/-poly gate CMOS device design with 110-nm buried-channel PMOS for 90-nm vertical-cell DRAM

This letter reports on 1.5-V single work-function W/WN/n/sup +/-poly gate CMOS transistors for high-performance stand-alone dynamic random access memory (DRAM) and low-cost low-leakage embedded DRAM applications. At V/sub dd/ Of 1.5-V and 25/spl deg/C, drive currents of 634 /spl mu/A//spl mu/m for 90-nm L/sub gate/ NMOS and 208 /spl mu/A-/spl mu/m for 110-nm L/sub gate/ buried-channel PMOS are achieved at 25 pA//spl mu/m off-state leakage. Device performance of this single work function technology is comparable to published low leakage 1.5-V dual work-function technologies and 25% better than previously reported 1.8-V single work-function technology. Data illustrating hot-carrier immunity of these devices under high electric fields is also presented. Scalability of single work-function CMOS device design for the 90-nm DRAM generation is demonstrated.     

High-performance 1-Gb-NAND flash memory with 0.12-/spl mu/m technology

A 1.8-V, 1-Gb NAND flash memory is fabricated with 0.12-/spl mu/m CMOS STI process technology. For higher integration, a 32-cell NAND structure, which enables row decoder layout in one block pitch, is applied for the first time. Resulting cell and die sizes are 0.076 /spl mu/m/sup 2/ and 129.6 mm/sup 2/, respectively. A pseudo-4-phase charge pump circuit can generate up to 20 V even under the supply voltage of 1.6 V. A newly applied cache program function and expanded page size of (2 k + 64) byte lead to program throughput of 7 MB/s. The page copy-back function is provided for on-chip garbage collection. The read throughput of 27 MB/s is achieved by simply expanding I/O width and page size. A measured disturbance free-window of 3.5 V at 1.5 V-V/sub DD/ is obtained.     

A 667-Mb/s operating digital DLL architecture for 512-Mb DDR SDRAM

This paper describes an all-digital delay-locked loop (DLL) architecture for over 667 Mb/s operating double-data-rate (DDR) type SDRAMs, which suppresses skews and jitters. Two novel replica adjusting techniques are introduced, in which timing skews caused by the clock input and data output circuits are reduced by a hierarchical phase comparing architecture and a replica check method with slow tester. Further, an improved phase interpolating method suppresses jitters caused by a boundary of the fine and coarse delays. A 512-Mb test device is fabricated using a 0.13-/spl mu/m DRAM process technology, in which skew and jitter suppressed 667-Mb/s (333-MHz) DDR operation has been verified.     

A 10-Gb/s receiver with series equalizer and on-chip ISI monitor in 0.11-/spl mu/m CMOS

A 10-Gb/s receiver is presented that consists of an equalizer, an intersymbol interference (ISI) monitor, and a clock and data recovery (CDR) unit. The equalizer uses the Cherry-Hooper topology to achieve high-bandwidth with small area and low power consumption, without using on-chip inductors. The ISI monitor measures the channel response including the wire and the equalizer on the fly by calculating the correlation between the error in the input signal and the past decision data. A switched capacitor correlator enables a compact and low power implementation of the ISI monitor. The receiver test chip was fabricated by using a standard 0.11-/spl mu/m CMOS technology. The receiver active area is 0.8 mm/sup 2/ and it consumes 133 mW with a 1.2-V power supply. The equalizer compensates for high-frequency losses ranging from 0 dB to 20 dB with a bit error rate of less than 10/sup -12/. The areas and power consumptions are 47 /spl mu/m /spl times/ 85 /spl mu/m and 13.2 mW for the equalizer, and 145 /spl mu/m /spl times/ 80 /spl mu/m and 10 mW for the ISI monitor.     

A 10-Gb/s CMOS clock and data recovery circuit with a half-rate binary phase/frequency detector

A 10-Gb/s phase-locked clock and data recovery circuit incorporates a multiphase LC oscillator and a half-rate phase/frequency detector with automatic data retiming. Fabricated in 0.18-/spl mu/m CMOS technology in an area of 1.75/spl times/1.55 mm/sup 2/, the circuit exhibits a capture range of 1.43 GHz, an rms jitter of 0.8 ps, a peak-to-peak jitter of 9.9 ps, and a bit error rate of 10/sup -9/ with a pseudorandom bit sequence of 2/sup 23/-1. The power dissipation excluding the output buffers is 91 mW from a 1.8-V supply.     

A 1.8-V 700-mb/s/pin 512-mb DDR-II SDRAM with on-die termination and off-chip driver calibration

A 512-Mb DDR-II SDRAM has achieved 700-Mb/s/pin operation at 1.8-V supply voltage with 0.12-/spl mu/m DRAM process. The low supply voltage presents challenges in high data rate and signal integrity. Circuit techniques such as hierarchical I/O lines, local sense amplifier, and fully shielded data lines without area penalty have provided improved data access time and, thus, high data rate can be achieved. Off-chip driver with calibrated strength and on-die termination are utilized to give sufficient signal integrity for over 533-Mb/s/pin operation.     

A 312-MHz 16-Mb random-cycle embedded DRAM macro with a power-down data retention mode for mobile applications

An embedded DRAM macro with a self-adjustable timing control (STC) scheme, a negative edge transmission scheme (NET), and a power-down data retention (PDDR) mode is developed. A 13.98-mm/sup 2/ 16-Mb embedded DRAM macro is fabricated in 0.13 /spl mu/m logic-based embedded DRAM process. Co-salicide word lines and MIM capacitors are used for high-speed array operation. The delay timing variation of 36 % for an RC delay can be reduced to 3.8% by using the STC scheme. The NET scheme transfers array control signals to local array blocks with high accuracy. Thereby, the test chip achieves 1.2-V 312-MHz random cycle operation even in the low-power process. 73-/spl mu/W data retention power is realized by using the PDDR mode, which is 5% of conventional schemes.     

SRAM design on 65-nm CMOS technology with dynamic sleep transistor for leakage reduction

A 70-Mb SRAM is designed and fabricated on a 65-nm CMOS technology. It features a 0.57-/spl mu/m/sup 2/ 6T SRAM cell with large noise margin down to 0.7 V for low-voltage operation. The fully synchronized subarray contains an integrated leakage reduction scheme with dynamically controlled sleep transistor. SRAM virtual ground in standby is controlled by programmable bias transistors to achieve good voltage control with fine granularity under process skew. It also has a built-in programmable defect "screen" circuit for high volume manufacturing. The measurements showed that the SRAM leakage can be reduced by 3-5/spl times/ while maintaining the integrity of stored data.     

A fourth-order /spl Sigma//spl Delta/ interface for micromachined inertial sensors

This paper presents the design and implementation of a high-order /spl Sigma//spl Delta/ interface for micromachined inertial sensors, which employs an electronic filter in series with the mechanical sensor element to reject the excessive in-band quantization noise inherently present in state-of-the-art second-order solutions. A fourth-order prototype was fabricated in a standard 0.5-/spl mu/m CMOS process. The active circuit area measures 0.9 mm/sup 2/, and the interface consumes 13 mW from a 5-V supply and achieves resolution of 1/spl deg//s//spl radic/Hz with a gyroscope and 150/spl mu/g//spl radic/Hz with an accelerometer. Comparison between the measured and simulated behavior of the system shows that the contribution of the quantization error to the total noise is negligible.     

Low-threshold continuous-wave 1.5-/spl mu/m GaInNAsSb lasers grown on GaAs

We present the first continuous-wave (CW) edge-emitting lasers at 1.5 /spl mu/m grown on GaAs by molecular beam epitaxy (MBE). These single quantum well (QW) devices show dramatic improvement in all areas of device performance as compared to previous reports. CW output powers as high as 140 mW (both facets) were obtained from 20 /spl mu/m /spl times/ 2450 /spl mu/m ridge-waveguide lasers possessing a threshold current density of 1.06 kA/cm/sup 2/, external quantum efficiency of 31%, and characteristic temperature T/sub 0/ of 139 K from 10/spl deg/C-60/spl deg/C. The lasing wavelength shifted 0.58 nm/K, resulting in CW laser action at 1.52 /spl mu/m at 70/spl deg/C. This is the first report of CW GaAs-based laser operation beyond 1.5 /spl mu/m. Evidence of Auger recombination and intervalence band absorption was found over the range of operation and prevented CW operation above 70/spl deg/C. Maximum CW output power was limited by insufficient thermal heatsinking; however, devices with a highly reflective (HR) coating applied to one facet produced 707 mW of pulsed output power limited by the laser driver. Similar CW output powers are expected with more sophisticated packaging and further optimization of the gain region. It is expected that such lasers will find application in next-generation optical networks as pump lasers for Raman amplifiers or doped fiber amplifiers, and could displace InP-based lasers for applications from 1.2 to 1.6 /spl mu/m.