Effects of main particle diameter on improving particle flowability for compressed packing fraction in a smaller particle admixing system

Particle flowability can be improved by admixing particles smaller than the original particles (main particles). However, the mechanisms by which this technique improves flowability are not yet fully understood. In this study, we examined compressed packing in a particle bed, which is affected by particle flowability. To estimate the mechanism of improvement, we investigated the effects of the main particle diameter on the improvement of compressed packing fractions experimentally.The main particles were 397 and 1460 nm in diameter and the admixed particles were 8, 21, 62, and 104 nm in diameter. The main and admixed particles were mixed in various mass ratios, and the compressed packing fractions of the mixtures were measured. SEM images were used to analyze the coverage diameter and the surface coverage ratio of the admixed particles on the main particles. The main particle packing fraction was improved as the diameter ratio (=main particles/admixed particles) increased. This was explained by a linked rigid-3-bodies model with leverage. Furthermore, the actual surface coverage ratio at which the most improved packing fraction was obtained decreased with increasing main particle diameter. This was explained by the difference in the curvature of the main particle surface.     

Effects of surface roughness of substrates on the c-axis preferred orientation of ZnO films deposited by r.f. magnetron sputtering

The c-axis preferred orientation of ZnO film is the most important factor for its successful application in piezoelectric devices. The effects of surface roughness of the substrate on the c-axis preferred orientation of ZnO thin films, deposited by radio frequency magnetron sputtering, were investigated. During sputtering, the oxygen content in the argon environment used was varied from 0 to 70% at a total sputtering pressure of 10 mTorr. Very smooth Si, smooth evaporated Au/Si, smooth evaporated-Al/Si, and rough sputtered-Al/Si were used as substrates. Their r.m.s. roughnesses, as measured by atomic force microscopy, were 1.27, 17.1, 21.1 and 65-118 Å, respectively. The crystalline structure and the angular spread of the (0 0* 2) plane normal to the ZnO films were determined using X-ray diffraction and X-ray rocking curves, respectively. The crystallinity and the preferred c-axis orientation of the ZnO films were strongly dependent on the surface roughness of the substrates rather than on the oxygen content of the working environment or on the chemical nature of the substrate.     

Influence of the surface roughness on the properties of Au films measured by surface plasmon resonance and X-ray reflectometry

Thickness and refractive index of Au films thermally evaporated onto glass substrates and with an underlayer of Cr are determined from surface plasmon resonance. The results for the thickness are found to agree very well with those from X-ray reflectivity when a simple model of layers with flat interfaces is used. Plasmon propagation along thin films is influenced by radiative damping due to scattering from surface roughness. To study this influence the surface roughness of the glass substrate, Cr an Au layers are measured by X-ray reflectometry and the results used to introduce three intermediate layers with effective refractive indices and thicknesses corresponding to the roughness. Then Fresnel's equations are used to fit the reflectivity and to deduce the layer properties. It is found that the roughness affects to a great extent the optical parameters of the Au films even when it is smaller than 1 nm. In particular, the absolute value of real part of the dielectric constant decreases while its imaginary part increases when those effects are not taken into account.     

Influence of thickness on the crystallography and surface topography of TiN nano-films deposited by reactive DC and pulsed magnetron sputtering

TiN films of 50 nm and 500 nm thickness were deposited on M2 tool steel substrates by reactive closed field unbalanced magnetron sputtering operating in direct current (DC) and pulsed magnetron sputtering (PMS) modes. Parameters of the crystallographic structure and surface roughness and their evolution during the films growth were analyzed via X-ray diffraction and atomic force microscopy. The obtained results show that all the analyzed films have polycrystalline and mono-phase (TiN) structures. In the 50 nm films, the in plane crystallographic texture that formed was 100% {111}. During film growth a weakening of the preferred crystallographic orientation and a decrease of the concentration of lattice imperfections occurred. Both processes are more pronounced in the film deposited by PMS compared to that deposited by DC sputtering. Film growth is accompanied by increasing of surface smoothness. Pulsing the target power led to a decrease of the mean surface roughness of both the 50 nm and 500 nm films.     

DEM study on the mixed feeding process of coal and cylindroid biomass particles in a screw feeder

The complex mixed feeding process for the binary mixture of coal and cylindroid biomass particles in a screw feeder was numerically studied by the discrete element method (DEM). The effects of biomass feeding ratio, feeding rate, and screw rotational speed on the feeding performance were investigated with the continuity, uniformity, and stability of the mixed feeding process being emphatically discussed. The results reveal that the stability of real-time mass flow rate and biomass blending ratio performs better at higher biomass feeding ratios. A larger variability of real-time biomass blending ratio is found at low feeding rate, while increasing the feeding rate reduces the stability of real-time mass flow rate and the too high feeding rate would cause some cylindroid biomass particles being hindered by the front wall surface of the hopper. Moreover, increasing the screw rotational speed significantly increases the stability of the mixed feeding process.