A thyristor-only input ESD protection scheme for CMOS RF ICs

We propose an input protection scheme composed of thyristor devices only avoiding usage of a clamp NMOS device to minimize the area consumed by an input pad structure in CMOS RF ICs. For this purpose, we suggest low-voltage triggering thyristor protection device structures assuming usage of standard CMOS processes, and attempt an in-depth comparison study with a conventional thyristor protection scheme incorporating a clamp NMOS device in the input pad. The comparison study mainly focuses on robustness against the human body model electrostatic discharge (HBM ESD) in terms of peak voltages applied to gate oxides in an input buffer and lattice heating inside protection devices based on DC and mixed-mode transient analyses utilizing a 2-dimensional device simulator. We constructed an equivalent circuit for the input HBM test environment of the CMOS chip equipped with the input ESD protection devices, and by executing mixed-mode simulations including up to four protection devices and analyzing the results for five different test modes, we attempt a detailed analysis on the problems which can occur in real HBM tests. We figure out strength of the proposed thyristor-only protection scheme, and suggest guidelines relating the design of the protection devices and circuits.     

Ladder-shaped network for ESD protection of millimetre-wave CMOS ICs

A compact ladder-shaped electrostatic discharge (ESD) protection circuit is presented for millimetre-wave integrated circuits (ICs) in CMOS technology. Multiple shorted shunt stubs form a ladder network together with series stubs as ESD protection that discharges current/voltage pulses caused by an ESD event, while at the same time the network is embedded as part of the matching circuit for a normal operation. A 60 GHz low-noise amplifier using a 90 nm CMOS process is demonstrated with the proposed ESD protection methodology that introduces less than 1 dB insertion loss. Owing to the ESD current distribution through multiple shorted stubs, the proposed methodology is useful to millimetre-wave ICs with advanced CMOS technology that suffers from higher sheet resistance of the metal layers.     

Complementary-LVTSCR ESD protection circuit for submicron CMOS VLSI/ULSI

There is one LVTSCR device merged with short-channel NMOS and another LVTSCR device merged with short-channel PMOS in a complementary style to offer effective and direct ESD discharging paths from the input or output pads to VSS and VDD power lines. The trigger voltages of LVTSCR devices are lowered to the snapback-breakdown voltages of short-channel NMOS and PMOS devices. This complementary-LVTSCR ESD protection circuit offers four different discharging paths to one-by-one bypass the four modes of ESD stresses at the pad, so it can effectively avoid unexpected ESD damage on internal circuits. Experimental results show that it provides excellent ESD protection capability in a smaller layout area as compared to the conventional CMOS ESD protection circuit. The device characteristics under a high-temperature environment of up to 150/spl deg/C are also experimentally investigated to guarantee the safety of this proposed ESD protection circuit.     

CMOS集成电路中电源和地之间的ESD保护电路设计

讨论了3种常用的CMOS集成电路电源和地之间的ESD保护电路,分别介绍了它们的电路结构以及设计考虑,并用Hspice对其中利用晶体管延时的电源和地的保护电路在ESD脉冲和正常工作两种情况下的工作进行了模拟验证。结论证明：在ESD脉冲下,该保护电路的导通时间为380ns;在正常工作时。该保护电路不会导通．因此这种利用晶体管延时的保护电路完全可以作为CMOS集成电路电源和地之间的ESD保护电路。     

Capacitor-couple ESD protection circuit for deep-submicronlow-voltage CMOS ASIC

Capacitor-couple technique used to lower snapback-trigger voltage and to ensure uniform ESD current distribution in deep-submicron CMOS on-chip ESD protection circuit is proposed. The coupling capacitor is realized by a poly layer right under the wire-bonding metal pad without increasing extra layout area to the pad. A timing-original design model has been derived to calculate the capacitor-couple efficiency of this proposed ESD protection circuit. Using this capacitor-couple ESD protection circuit, the thinner gate oxide of CMOS devices in deep-submicron low-voltage CMOS ASIC can be effectively protected     

RC-SCR: very-low-voltage ESD protection circuit in plain CMOS

A simple, novel RC-coupled very-low-voltage silicon controlled rectifier, electrostatic discharge protection circuit is reported, implemented in 0.35 μm CMOS, which is confirmed by transient electrostatic discharge simulation and measurement, and results in a very low triggering of 7 V, a 60% reduction over traditional silicon controlled rectifiers     

一种CMOS新型ESD保护电路设计

金属氧化物半导体(MOS)器件的缩放技术使集成电路芯片面临着严重的静电放电(ESD)威胁,而目前采用的ESD保护电路由于电流集边效应等原因,普遍存在着抗静电能力有限、占用较大芯片面积等问题。根据全芯片ESD防护机理,基于SMIC 0.18μm工艺设计并实现了一种新型ESD保护电路,其具有结构简单、占用芯片面积小、抗ESD能力强等特点。对电路的测试结果表明,相对于相同尺寸栅极接地结构ESD保护电路,新型ESD保护电路在降低35%芯片面积的同时,抗ESD击穿电压提升了32%,能够有效保护芯片内部电路免受ESD造成的损伤和降低ESD保护电路的成本。     

A new on-chip ESD protection circuit with dual parasitic SCRstructures for CMOS VLSI

A new CMOS on-chip electrostatic discharge (ESD) protection circuit which consists of dual parasitic SCR structures is proposed and investigated. Experimental results show that with a small layout area of 8800 μ², the protection circuit can successfully perform negative and positive ESD protection with failure thresholds greater than ±1 and ±10 kV in machine-mode (MM) and human-body-mode (HBM) testing, respectively. The low ESD trigger voltages in both SCRs can be readily achieved through proper circuit design and without involving device or junction breakdown. The input capacitance of the proposed protection circuit is very low and no diffusion resistor between I/O pad and internal circuits is required, so it is suitable for high-speed applications. Moreover, this ESD protection circuit is fully process compatible with CMOS technologies     

Overview on ESD protection design for mixed-voltage I/O interfaces with high-voltage-tolerant power-rail ESD clamp circuits in low-voltage thin-oxide CMOS technology

Electrostatic discharge (ESD) protection design for mixed-voltage I/O interfaces has been one of the key challenges of system-on-a-chip (SOC) implementation in nanoscale CMOS processes. The on-chip ESD protection circuit for mixed-voltage I/O interfaces should meet the gate-oxide reliability constraints and prevent the undesired leakage current paths. This paper presents an overview on the design concept and circuit implementations of ESD protection designs for mixed-voltage I/O interfaces with only low-voltage thin-oxide CMOS transistors. Especially, the ESD protection designs for mixed-voltage I/O interfaces with ESD bus and high-voltage-tolerant power-rail ESD clamp circuits are presented and discussed.     

A new ESD protection structure for high-speed GaAs RF ICs

We demonstrate a new electrostatic discharge (ESD) protection structure for high-speed GaAs RF ICs. The structure is composed of small diodes and large transistors using an InGaP heterojunction bipolar transistor (HBT) technology. Its loading effect and its robustness are evaluated experimentally. The impedance of the new structure at OFF state, represented with an equivalent shunt capacitance and an equivalent shunt resistance, are 0.22 pF and 500 /spl Omega/ at 10 GHz. The structure can withstand +2700-V and -2900-V human body model ESD pulses. It can clamp voltage more effectively than the conventional diode-based ESD structure. The new structure can be used to protect 10 Gb/s input/output pins of high-speed RF ICs against ESD.     

A mixed-mode ESD protection circuit simulation-design methodology

On-chip electrostatic discharge (ESD) protection design becomes a major design challenge as IC technologies continue to migrate into very-deep-submicron (VDSM) regime. However, trial-and-error approaches still dominate in ESD protection circuit design. This paper discusses a new mixed-mode ESD protection simulation-design methodology, aiming to design prediction, which involves multiple-level coupling in ESD protection simulation by solving complex electrothermal equations self-consistently at process, device, and circuit levels in a coupled fashion to investigate ESD protection circuit details without any pre-assumption. Practical ESD protection design examples, implemented in commercial 0.18/0.35-/spl mu/m CMOS and BiCMOS processes, are presented.     

Lateral SCR devices with low-voltage high-current triggeringcharacteristics for output ESD protection in submicron CMOS technology

A high-current PMOS-trigger lateral SCR (HIPTSCR) device and a high-current NMOS-trigger lateral SCR (HINTSCR) device with a lower trigger voltage but a higher trigger current are proposed to improve ESD robustness of CMOS output buffer in submicron CMOS technology. The lower trigger voltage is achieved by inserting short-channel thin-oxide PMOS or NMOS devices into the lateral SCR structures. The higher trigger current is achieved by inserting the bypass diodes into the structures of the HIPTSCR and HINTSCR devices. These HIPTSCR and HINTSCR devices have a lower trigger voltage to effectively protect the output transistors in the ESD-stress conditions, but they also have a higher trigger current to avoid the unexpected triggering due to the electrical noise on the output pad when the CMOS ICs are in the normal operating conditions. Experimental results have verified that the trigger current of the proposed HIPTSCR (HINTSCR) is increased up to 225.5 mA (218.5 mA). But, the trigger voltage of the HIPTSCR (HINTSCR) remains at a lower value of 13.4 V (11.6 V). The noise margin against the overshooting (undershooting) voltage pulse on the output pad, without accidentally triggering on the HINTSCR (HIPTSCR), can be greater than VDD+12 V (VSS -12 V). These HIPTSCR and HINTSCR devices have been practically used to protect CMOS output buffers with a 4000-V (700-V) HEM (MM) ESD robustness but only within a small layout area of 37.6×60 μm² in a standard 0.6-μm CMOS technology without extra process modification     

Circular under-pad multiple-mode ESD protection structure for ICs

A novel circular pad-oriented low-parasitic all-mode electrostatic discharge (ESD) protection structure is designed in BiCMOS for RF and mixed-signal (MS) ICs, featuring tunable triggering, low voltage clamping (~2 V), low discharge impedance (~Ω) and low leakage current (~pA). It consumes limited silicon and achieves 14 kV ESD protection     

A new low-parasitic polysilicon SCR ESD protection structure for RF ICs

Robust low-parasitic electrostatic discharge (ESD) protection is highly desirable for RF ICs. This letter reports design of a new low-parasitic polysilicon silicon controlled rectifier (SCR) ESD protection structure designed and implemented in a commercial 0.35-/spl mu/m SiGe BiCMOS technology. The concept was verified by simulation and experiment with the results showing that the new structure has much lower parasitic capacitance (C/sub ESD/) and higher F-factor than that of other ESD protection devices. A small polysilicon SCR structure of 750-/spl mu/m/sup 2/ all-inclusive provides a high human body model ESD protection of 3.2 kV while featuring a high F-factor of /spl sim/42 and a low C/sub ESD/ of /spl sim/92.3 fF. The new polysilicon SCR ESD protection structure seems to be an attractive solution to high-GHz RF ICs.     

ESD protection methodology for deep-sub-micron CMOS

Electrostatic discharge is considered to be a serious treat of integrated CMOS circuits since the feature size reached about 1.5-1.0μm. Since then the scaling of CMOS technologies led to an increase of their ESD susceptibility based on geometrical, physical and technological limitations. The paper describes the change in methodology in order to assure a reasonably high target value of ESD protection with newly to be developed deep sub-micron feature size technologies. The backward adaptive conservative methodology is step by step replaced by a methodology considering the ESD issue already during process development and involving more predictive ESD-TCAD into the development cycle. It is concluded that the scaling based limitations might grow to a significant problem in the near future requiring significant effort to assure a reasonable ESD protection level for CMOS technologies, in particular if the high-frequency properties of such technologies should not be affected.     

Analog phase measuring circuit for digital CMOS ICs

A circuit measuring the phase of incoming asynchronous signals relative to the system clock in digital signal processing is described. The system clock can be in the range from 10 to 20 MHz, as is typical for video signal processing applications. As a reference in the asynchronous signal the positive or negative slope is taken. Its phase is measured with a resolution of 1/32 of a system clock cycle (approximately 1.5 to 3 ns). Pure digital CMOS technology without precision components is used, to enable combined integration on processor chips. Timing precision (jitter) is better than 200 ps without any adjustments. One external capacitor is needed     

TLP analysis of 0.125 μm CMOS ESD input protection circuit

In this investigation, TLP ESD analysis shows that if a large input resistor is used in combination with a secondary ggNMOS clamp in the input protection circuitry, then the trigger voltage, V_t1, of the ggNMOS clamp is not a constant. The value is influenced by the size and properties of the input resistor, by current injection problems due to parallel resistive networks formed between the primary and secondary ESD circuits, by reverse bias diode leakage currents effects, and by source elevation effects due to voltage rises along the ESD ground bus.     

Complementary-SCR ESD protection circuit with interdigitatedfinger-type layout for input pads of submicron CMOS IC's

A new ESD protection circuit with complementary SCR structures and junction diodes is proposed. This complementary-SCR ESD protection circuit with interdigitated finger-type layout has been successfully fabricated and verified in a 0.6 μm CMOS SRAM technology with the LDD process. The proposed ESD protection circuit can be free of VDD-to-VSS latchup under 5 V VDD operation by means of a base-emitter shorting method. To compensate for the degradation on latching capability of lateral SCR devices in the ESD protection circuit caused by the base-emitter shorting method, the p-well to p-well spacing of lateral BJT's in the lateral SCR devices is reduced to lower its ESD-trigger voltage and to enhance turn-on speed of positive-feedback regeneration in the lateral SCR devices. This ESD protection circuit can perform at high ESD failure threshold in small layout areas, so it is very suitable for submicron CMOS VLSI/ULSI's in high-pin-count or high-density applications     

A plug-and-play wideband RF circuit ESD protection methodology: T-diodes

A novel “plug-and-play” ESD protection methodology for wideband RF applications is demonstrated. This methodology, referred to as T-diodes, utilizes an integrated transformer together with classical ESD protection diodes. The T-diodes act as an artificial transmission line that, when placed as a “plug-and-play” ESD protection component in front of an unprotected wideband LNA, preserves the input matching of that LNA. As a demonstrator, a wideband RF LNA in 0.18 μm CMOS is protected above 4.5 kV HBM ESD robustness without degrading its bandwidth.     

Structures for ESD protection in CMOS processes

This paper reviews the basic building blocks that are used for CMOS ESD protection structures, circuit and layout effects are considered. The performance of several structures is characterized in order to demonstrate the different effects. Guide-lines and recommendations for proper protection structure implementation are given.