Preparation and Thermoelectric Properties of Ag<Subscript>0.5</Subscript>In<Subscript>0.5−<Emphasis Type="Italic">x</Emphasis></Subscript>Pb<Subscript>5</Subscript>Sn<Subscript>4</Subscript>Te<Subscript>10</Subscript>

A series of compounds with composition Ag_0.5In_0.5−x Pb₅Sn₄Te₁₀ (x = 0.05 to 0.20) were prepared by slowly cooling the melts of the corresponding elements, and the effect of In content on the thermoelectric transport properties of these compounds has been investigated. Results indicate that the compounds’ electronic structure is sensitive to In content, and that the carrier concentration of these compounds at room temperature increases from 4.86 × 10¹⁸ cm⁻³ to 3.85 × 10²¹ cm⁻³ as x increases from 0.05 to 0.20. For these compounds, electrical conductivity decreases and Seebeck coefficient increases with increasing In content. Ag_0.05In_0.03Pb_0.5Sn_0.4Te₁₀ shows very low lattice thermal conductivity, and has a maximum dimensionless figure of merit ZT of 1.2 at 800 K.     

Performance analysis of 20 nm gate-length In0.2Al0.8N/GaN HEMT with Cu-gate having a remarkable high ION/IOFF ratio

Abstract： We propose a new structure of InxAll-xN/GaN high electron mobility transistor （HEMT） with gate length of 20 nm. The threshold voltage of this HEMT is achieved as -0.472 V. In this device the InA1N barrier layer is intentionally n-doped to boost the ION/IOFF ratio. The InAlN layer acts as donor barrier layer for this HEMT which exhibits an ION = 10-4.3 A and a very low IOFF = 10-14.4 A resulting in an ION/IoFF ratio of 1010.1. We compared our obtained results with the conventional InAlN/GaN HEMT device having undoped barrier and found that the proposed device has almost l0s times better ION/IOFF ratio. Further, the mobility analysis in GaN channel of this proposed HEMT structure along with DC analysis, C-V and conductance characteristics by using small-signal analysis are also presented in this paper. Moreover, the shifts in threshold voltage by DIBL effect and gate leakage current in the proposed HEMT are also discussed. InAlN was chosen as the most preferred barrier layer as a replacement of AlGaN for its excellent thermal conductivity and very good scalability.     

Hybrid functional calculations on the band gap bowing parameters of InxGa1-xN

The electronic band structures and band gap bowing parameters of In_xGa_1-xN are studied by the firstprinciples method based on the density functional theory. Calculations by employing both the Heyd-ScuseriaErnzerh of hybrid functional（HSE06） and the Perdew-Burke-Ernzerhof（PBE） one are performed. We found that the theoretical band gap bowing parameter is dependent significantly on the calculation method, especially on the exchange-correlation functional employed in the DFT calculations. The band gap of In_xGa_1-xN alloy decreases considerably when the In constituent x increases. It is the interactions of s–s and p–p orbitals between anions and cations that play significant roles in formatting the band gaps bowing. In general, the HSE06 hybrid functional could provide a good alternative to the PBE functional in calculating the band gap bowing parameters.     

高K栅介质/金属栅极金属氧化物半导体晶体管平带电压roll-off现象物理起源研究

本文从能带平衡的角度来研究带有高K栅介质/金属栅极的金属氧化物半导体晶体管平带电压roll-off现象,认为随着高K介质与Si衬底之间中间层厚度的减小,高K介质与Si之间直接的电子交换会从无到有,越来越强,而这可能是roll-off现象的起源之一。此外给出了在不同条件下基于此模型得到的理论模拟结果。     

An Adaptive Biased Single-Stage CMOS Operational Amplifier with a Novel Rail-to-Rail Constant-<Emphasis Type="Italic">g</Emphasis><Subscript><Emphasis Type="Italic">m</Emphasis></Subscript> Input Stage

Using rail-to-rail (R-R) swing analog circuits has become almost mandatory in the design of low supply voltage circuits. In this paper, a new architecture for constant-g_m rail-to-rail input stages is presented. The design features a less than 5% deviation in g_m over the entire range of the input common-mode voltage. Furthermore, a new structure for folded cascode amplifier based on the use of a floating current source is presented. By employing these techniques, a low-power operational amplifier (op-amp) with 100 MHz unity-gain bandwidth, 106 dB gain, 60^∘ phase margin, 2.65 V swing, and 6.4 nV/✓Hz input-referred noise with rail-to-rail input common-mode range is realized in a 0.8 μ m CMOS technology. This amplifier dissipates 10 mW from a 3 V power supply.     

Growth and characterization of Tl3InSe4 single crystals

Tl₃InSe₄ single crystal has been successfully prepared by the Bridgman crystal growth technique. The crystal that is reported for the first time is found to be of tetragonal structure with lattice parameters of a=0.8035 and c=0.6883 nm. The electrical resistivity and Hall effect measurements on the crystal revealed a conductivity type conversion from p- to n-type at a critical temperature of 283 K. The electron to hole mobility ratio is found to be 1.10. The analysis of the temperature-dependent electrical resistivity, Hall coefficient and carrier concentration data reveals the extrinsic type of conduction with donor impurity levels that behave as acceptor levels when are empty. The data analysis allowed the calculation of the hole and the electron effective masses as 0.654m₀ and 0.119m₀, respectively. In addition, the temperature-dependent Hall mobility in the n-region is found to be limited by the electron–phonon short-range interactions scattering with an electron–phonon coupling constant of 0.21.     

Structure and High-Temperature Thermoelectric Properties of the n-Type Layered Oxide Ca2?xBix?δMnO4?γ

We have investigated the effects of Bi doping on the crystal structure and high-temperature thermoelectric properties of the n-type layered oxide Ca₂MnO_4−γ . The electrical conductivity σ and the absolute value of the Seebeck coefficient S were, respectively, found to increase and decrease with Bi doping. The thermal conductivity κ of doped Ca₂MnO_4−γ is relatively low, 0.5 W/m K to 1.8 W/m K (27°C to 827°C). Consequently, the ZT value, ZT = σS ² T/κ, increases with Bi doping. The maximum ZT is 0.023 for Ca_1.6Bi_0.18MnO_4−γ at 877°C, which is ten times higher than that of the end member, Ca₂MnO_4−γ . The increase of ZT mainly results from the considerable increase of σ, which can be explained in terms of structural change. The␣Mn-O(1) and the Mn-O(2) distances in the c-direction and ab-plane, respectively, increase with increasing Bi concentration, indicating that the valence state of Mn ions decreases with the increase of electron carriers in the CaMnO₃ layers. In addition, the Mn-O(2)-Mn bond angle increases linearly with Bi doping, leading to an improvement of the electron carrier mobility.     

溅射压力对制备a-GaAs1-xNx 薄膜光学常数的影响

采用反应磁控溅射法在室温条件下制备了a-GaAs_1-xN_x 薄膜。实验测定了薄膜厚度、氮含量、载流子浓度和光学透过率及并研究了其随溅射压的变化。系统研究了溅射压对所制备薄膜的光学带隙、折射率和色散参数的影响。所制备的薄膜为直接带隙材料,利用Cauchy和Wemple模型能够很好地拟合所制备薄膜的折射率色散曲线。     

Dynamic characterization of Built-In Current Sensors based on PN junctions: Analysis and experiments

The goal of this work is to analyze the performance of PN junction-based Built-in Current Sensors (BICS) for I _DDQ testing. Two types of BIC Sensors are analyzed: one based on a simple PN junction as the sensing element (DBICS), and the other based on a lateral BJT (PBICS). The sensitivity, speed and performance of the BICS are studied by showing their dependence on circuit parameters. Design constraints of such sensors in order to achieve performance criteria on CUT and BICS are analyzed. The dynamic analysis of the BICS is compared with experimental results when the PN junction BICS are used on a CMOS circuit.     

Microstructure of reactively sputtered oxide diffusion barriers

Molybdenum oxide (Mo_1-x O _x ) and ruthenium oxide (RuO₂) films were prepared by rf reactive sputtering of Mo or Ru targets in an O₂/Ar plasma. Both films exhibit metallic conductivities. The influence of the deposition parameters on the phase that forms and on the microstructure of Mo_1-x O _x and RuO₂ films is reported. A phase transformation is observed in Mo_1-x O _x films subjected to heat treatment. The diffusion barrier performance of Mo_1-x O _x and RuO₂ layers interposed between Al and Si is compared.     

Optical characterization of as-prepared and rapid thermal oxidized partially strain compensated Si1−x−y GexCy films

The optical properties of as-prepared and rapid thermal oxidized (RTO) heteroepitaxial Si_1−x−yGe_xC_y alloys grown on Si substrate have been characterized using spectroscopic ellipsometry. The critical points E₁, E₀′, E₂ band gaps were determined by line shape fitting in the second derivative spectra of the pseudo-dielectric functions. For as-prepared films, the E₁ gap increases with C concentration and a linear dependence on C content was observed. However, the E₂ gap decreases as the C concentration increases. For the RTO samples, the amplitude of E₂ transition reduces rapidly and the E₁ transition shifts to a lower energy. The reduction in the amplitude of E₂ transitions is due to the presence of oxide layer. A high Ge content layer and the low C content in the RTO films account for the E₁ shift to lower energy and the increase of the refractive indices.     

Replacing I DDQ Testing: With Variance Reduction

This work is part of our effort to find an alternative to I _DDQ testing. Specifically, this paper presents our variance reduction post-processing approach in order to replace I _DDQ. It describes our test procedure based on Delta I _DDQ histograms. It shows how this test procedure can help to reduce variance, optimize test resources and reduce the impact of process drifting and resolution loss caused by the expected I _DDQ growth. Another practical aspect is discussed, namely the use of the proposed test procedure in a production test. We propose a new distribution model and revisit some experimental data, which provides a better understanding of the relationship between defect and fault. The results obtained so far confirm the pertinence of our test approach and the necessity of keeping current testing alive.     

New op-amp-RC to G m -C transformation method

A new transformation method is proposed and used to transform op-amp-RC circuits to G _m -C ones with only grounded capacitors. The proposed method enables the generation of high-performance G _m -C filters that benefit from the advantages of good and well-known op-amp-RC structures and at the same time feature electronic tunability, high frequency capability and monolithic integration ability. An attractive feature of the proposed method is that it results in G _m -C structures with only grounded capacitors in spite of the presence of floating capacitors in the original op-amp-RC circuits. Ahmed M. Soliman was born in Cairo Egypt, on November 22, 1943. He received the B.Sc. degree with honors from Cairo University, Cairo, Egypt, in 1964, the M.S. and Ph.D. degrees from the University of Pittsburgh, Pittsburgh, PA, U.S.A., in 1967 and 1970, respectively, all in Electrical Engineering. He is currently Professor Electronics and Communications Engineering Department, Cairo University, Egypt. From September 1997–September 2003, Dr. Soliman served as Professor and Chairman Electronics and Communications Engineering Department, Cairo University, Egypt. From 1985–1987, Dr. Soliman served as Professor and Chairman of the Electrical Engineering Department, United Arab Emirates University, and from 1987–1991 he was the Associate Dean of Engineering at the same University. He has held visiting academic appointments at San Francisco State University, Florida Atlantic University and the American University in Cairo. He was a visiting scholar at Bochum University, Germany (Summer 1985) and with the Technical University of Wien, Austria (Summer 1987). In November 2005, Dr. Soliman gave a lecture at Nanyang Technological University, Singapore. Dr. Soliman was also invited to visit Taiwan and gave lectures at Chung Yuan Christian University and at National Central University of Taiwan. In 1977, Dr. Soliman was decorated with the First Class Science Medal, from the President of Egypt, for his services to the field of Engineering and Engineering Education. Dr. Soliman is a Member of the Editorial Board of the IEE Proceedings Circuits, Devices and Systems. Dr. Soliman is a Member of the Editorial Board of Analog Integrated Circuits and Signal Processing. Dr. Soliman served as Associate Editor of the IEEE Transactions on Circuits and Systems I (Analog Circuits and Filters) from December 2001 to December 2003 and is Associate Editor of the Journal of Circuits, Systems and Signal Processing from January 2004–Now.     

On Faster I DDQ Measurements

The purpose of this paper is to introduce a new I _DDQ measurement technique based on active successive approximations, called ASA-I _DDQ. This technique has unique features facilitating a speed-up in I _DDQ measurement. Experimental results suggest that a significant speed-up factor (up to 4) can be obtained over the QuiC-Mon technique. Such a speed-up is a key element in the replacement of single-threshold I _DDQ testing since it amplifies the effectiveness of post-processing techniques.     

A high-linear wide-tunable CMOS transconductor for video frequency applications

In this paper a new CMOS transconductor structure based on a g_m-boosted degenerated differential pair is presented for applications in the video frequency range. The proposed circuit combines two techniques, a switchable array of source degenerating MOS resistors and a programmable output current mirror, in order to widen the G_m tuning range while maintaining linearity. Degeneration MOS resistors are made common-mode voltage independent thanks to a simple control circuit. Post-layout simulation results from a 0.35 μm design supplied at 3.3 V show a wide tuning range (10–100 MHz), good linearity (−58.4 dB for an output signal voltage of 1.1 V_p–p) and low excess phase (<0.5° over the whole tuning range).     

Structural and interfacial properties of high-k HfOxNy gate dielectric films

The thermal stability and interfacial characteristics for hafnium oxynitride (HfO_xN_y) gate dielectrics formed on Si (1 0 0) by plasma oxidation of sputtered HfN films have been investigated. X-ray diffraction results show that the crystallization temperature of nitrogen-incorporated HfO₂ films increases compared to HfO₂ films. Analyses by X-ray photoelectron spectroscopy confirm the nitrogen incorporation in the as-deposited sample and nitrogen substitution by oxygen in the annealed species. Results of FTIR characterization indicate that the growth of the interfacial SiO₂ layer is suppressed in HfO_xN_y films compared to HfO₂ films annealed in N₂ ambient. The growth mechanism of the interfacial layer is discussed in detail.     

Characterization of Zn1?xMgxO Films Prepared by the Sol–Gel Process and Their Application for Thin-Film Transistors

Transparent semiconductor thin films of Zn_1−x Mg _x O (0 ≤ x ≤ 0.36) were prepared using a sol–gel process; the crystallinity levels, microstructures, and optical properties affected by Mg content were studied. The experimental results showed that addition of Mg species in ZnO films markedly decreased the surface roughness and improved transparency in the visible range. A Zn_1−x Mg _x O film with an x-value of 0.2 exhibited the best average transmittance, namely 93.7%, and a root-mean-square (RMS) roughness of 1.63 nm. Therefore, thin-film transistors (TFTs) with a Zn_0.8Mg_0.2O active channel layer were fabricated and found to have n-type enhancement mode. The Zn_0.8Mg_0.2O TFT had a field-effect mobility of 0.1 cm²/V s, threshold voltage of 6.0 V, and drain current on/off ratio of more than 10⁷.     

Large signal and noise properties of heterojunction AlxGa1-xAs/GaAs DDRIMPATTs

Simulation studies are carried out on the large signal and noise properties of heterojunction (HT) Al_xGa_1-xAs/GaAs double drift region (DDR) IMPATT devices at V-band (60 GHz). The dependence of Al mole fraction on the aforementioned properties of the device has been investigated. A full simulation software package has been indigenously developed for this purpose. The large signal simulation is based on a non-sinusoidal voltage excitation model. Three mole fractions of Al and two complementary HT DDR structures for each mole fraction i.e., six DDR structures are considered in this study. The purpose is to discover the most suitable structure and corresponding mole fraction at which high power, high efficiency and low noise are obtained from the device. The noise spectral density and noise measure of all six HT DDR structures are obtained from a noise model and simulation method. Similar studies are carried out on homojunction (HM) DDR GaAs IMPATTs at 60 GHz to compare their RF properties with those of HT DDR devices. The results show that the HT DDR device based on N-Al_xGa_1-xAs/p-GaAs with 30% mole fraction of Al is the best one so far as large signal power output, DC to RF conversion efficiency and noise level are concerned.     

Effects of Ball-Milling Atmosphere on the Thermoelectric Properties of TAGS-85 Compounds

Inspired by the high ZT value lately attained in Ar-protected ball-milled nanocrystalline p-BiSbTe bulk alloy, we report herein an investigation of the effects of ball-milling atmosphere on the thermoelectric (TE) properties of the traditional TE material (GeTe)₈₅(AgSbTe₂)₁₅ (TAGS-85). TAGS-85 samples were prepared via a melting–quenching–annealing process, and then ball-milled in different atmospheres and subsequently densified using a spark plasma sintering technique. The Seebeck coefficient, electrical conductivity, thermal conductivity, and Hall coefficient were measured as a function of temperature from 10 K to 310 K. It was found that different ball-milling atmospheres, i.e., air, liquid N₂ (LN₂), and Ar, profoundly affected the TE properties. A state-of-the-art figure of merit ZT ≈ 0.30 was attained at 310 K in the Ar-ball milled sample. The results are discussed in terms of the carrier concentration, mobility, crystallinity, and the grain boundary scattering.     

Low-frequency low-noise circuits design using an E n-In model

In view of the limitations of a R _n-G_n model in the low frequency range and the defects of an E _n-I_n model in common use now, this paper builds a complete E _n-I_n model according to the theory of random harmonic. The parameters for the low-noise design such as the equivalent input noisy voltage E _ns, the optimum source impedance Z _sopt and the minimum noise figure F _min can be calculated accurately by using this E _n-I_n model because it considers the coherence between the noise sources fully. Moreover, this paper points out that it will cause the maximum 30% miscalculation when neglecting the effects of the correlation coefficient γ. Using the series-series circuits as an example, this paper discusses the methods for the E _n-I_n noise analysis of electronic circuits preliminarily and demonstrates its correctness through the comparison between the simulated and measured results of the minimum noise figure F _min of a single current series negative feedback circuit.