Pt/CdS Schottky紫外探测器的光电性能研究

制备了Pt/CdS Schottky紫外探测器,对Pt/CdS Schottky紫外芯片对中波红外（3～5μm）的透过率进行了研究,并对器件光电性能进行了测试分析。通过优化 Pt 电极制备条件及对 SiO2增透膜的研究,使Pt/CdS Schottky紫外芯片对中波红外波段的透过率达到85%。室温300 K下,所制备Pt/CdS Schottky紫外探测器在零偏压处的背景光电流为-0.063 nA,在＋6 V时的暗电流密度为7.6×10-7 A/cm2,R0A达到7.2×104?·cm2,其50%截止波长为510 nm。     

InSb红外焦平面探测器背减薄技术

文中着重介绍了InSb红外焦平面探测器薄技术工艺以及精抛对器件性能的影响。目前已较好的掌握了减薄至20μm的磨抛技术。     

基于Pt/CdS与InSb光伏型紫外—红外焦平面探测器的双色探测机理（英文）

基于新型的时域有限差分光子学分析方法联合有限元电学分析方法研究了Pt/CdS紫外与InSb红外双色焦平面阵列探测器的双色探测机理.研究发现超薄Pt金属膜与CdS形成肖特基结可以获得较大的紫外光响应并能更好耦合红外光.采用像元间距为50μm的Pt/CdS与InSb键合结构,可以很好地抑制像元间的串音.结果证明了紫外-红外双色探测的可行性,该方法将为紫外—红外双色探测器的设计提供基础指导.     

InAs/GaSb二类超晶格中/短波双色红外焦平面探测器

InAs/GaSb超晶格材料已经成为了第三代红外焦平面探测器的优选材料。开展了InAs/GaSb二类超晶格中/短波双色焦平面探测器器件结构设计、材料外延、芯片制备,对钝化方法进行了研究,制备出性能优良的320256双色焦平面探测器。首先以双色叠层背靠背二极管电压选择结构作为基本结构,设计了中/短波双色芯片结构,然后采用分子束外延技术生长出结构完整、表面平整、低缺陷密度的PNP结构超晶格材料。采用硫化与SiO2复合钝化方法,最终制备的器件在77 K下中波二极管的RA值达到13.6 kcm2,短波达到538 kcm2。光谱响应特性表明短波响应波段为1.7~3 m,中波为3~5 m。双色峰值探测率达到中波3.71011 cmHz1/2W-1以上,短波2.21011 cmHz1/2W-1以上。响应非均匀性中波为9.9%,短波为9.7%。中波有效像元率为98.46%,短波为98.06%。     

双色焦平面红外探测器相对光谱串音研究

提出了一种评价双色探测器的相对光谱串音的模型及测试方法。为验证模型及测试方法的可行性,采用分子束外延锗基叠层异质结构碲镉汞薄膜材料,研制了微台面结构短波/中波双色红外焦平面探测器原理器件,进行了相对光谱串音测试,归纳出3种主要的相对光谱串音模式,并结合材料、器件结构和工艺特点,分析了相对光谱串音的成因。     

紫外-红外双色集成探测器的发展与现状

随着军事和民用对高集成度、多色化光电探测的不断需求,在近几十年内,紫外-红外(UV-IR)双色集成探测器从无到有,从彼此独立的紫外和红外探测器的简单集成发展到如今量子阱结构、键合结构等新型集成技术,但不同的光敏材料或系统带来较大的品格失配问题仍然限制了其发展与应用.本文阐述了紫外-红外双色集成探测技术在发展过程中的主要问题,并以时间和紫外探测技术为线索简述了紫外-红外双色集成探测器的发展历史及研究现状.     

InAs/InAsSb超晶格红外中/中波双色焦平面探测器研制

超晶格材料已经成为了第三代红外焦平面探测器的优选材料。双波段红外探测器能够通过对比两个波段内的光谱信息差异,对复杂的背景进行抑制,提高探测效果,在需求中尤为重要。本文开展了InAs/InAsSb超晶格中/中双色焦平面探测器设计及制备技术研究,从器件设计、材料外延、芯片加工等方面展开研究,制备了中心距30 μm的320×256 InAs/InAsSb二类超晶格中/中波双色焦平面探测器。器件短中波峰值探测率达到7.2×10¹¹ cm·Hz^1/2W^-1,中波峰值探测率为6.7×10¹¹ cm·Hz^1/2W^-1,短中波有效像元率为99.51%,中波为99.13%,获得了高质量的成像效果,实现中中双色探测。     

InSb红外焦平面探测器现状与进展

红外焦平面探测器技术是一种通过摄取景物热辐射分布图像,并将其转换为人眼可见图像的技术。近年来红外探测器技术发展迅速,在军事、工业、农业、医学等各领域显示出越来越重要的应用。本文对锑化铟红外焦平面探测器的应用及发展情况进行了分析,并对其发展前景进行了展望。     

Pt/CdS Schottky势垒紫外探测器的研制

介绍了Pt/CdS金属半导体接触Schottky势垒形成及In/CdS的欧姆接触工艺研究,由此制成了紫外探测器.测试了探测器的Ⅰ-Ⅴ特性,零偏下的光谱响应和器件的频率响应.观察了器件的反偏响应情况.获得的探测器在λ=440am处加两伏反偏时的响应率为0.17A/W,内量子效率最大可达64%.     

CdS紫外探测器芯片的制备研究

针对紫外探测器在紫外-红外双色探测器中的工程化应用需求,开展了Pt/CdS肖特基紫外探测器研究,通过对CdS晶片表面处理工艺、Pt电极制备及紫外芯片退火等关键技术进行优化研究,并对Pt/CdS肖特基紫外探测器性能进行测试分析.测试结果表明:Pt/CdS肖特基紫外探测器在0.3～0.5μm下响应率大于0.2 A/W,对3...     

Extremely reproducible zinc diffusion into InSb and its application to infrared detector array

A systematic investigation has been performed on diffusion of Zn in n-type InSb using elemental Zn and Sb in closed ampoules at temperature range 355–455 °C. The diffusion behavior could be well understood by arranging the data as a function of the mole ratio of Sb to Zn in the source, N_sb/N_zn. The diffusion depth was constant, independing on the total amount of Zn or/and Sb source loaded into ampoule when N_sb/N_zn≤0.5 or N_sb/N_zn ≥5, if Zn source was enough. When N_sb/N_zn ≥5, a highly planar diffusion front and a high quality p-type layer were reproducibly obtained. However, when N_sb/N_zn ≤ 0.5, a very ragged diffusion front and much damage were observed. 3–5 μm InSb photovoltaic detector arrays with 8 elements were prepared using above results.     

异质结构InSb-APD中波红外探测器的设计与表征

制冷要求仍然是制约中红外探测器应用的主要因素.设计了一种异质pin结构的InSb雪崩光电二极管.采用宽禁带、低复合率的材料GaSb和InP形成异质结,并将I区设计成吸收、倍增层分离的雪崩区域.该异质结构有效地抑制了扩散电流,在300 K时,JAuger被显著抑制在大小为1×10-7 A/cm2的水平.器件的主要限制是S...     

Molecular-beam epitaxial growth of HgCdTe infrared focal-plane arrays on silicon substrates for midwave infrared applications

Molecular beam epitaxy has been employed to deposit HgCdTe infrared detector structures on Si(112) substrates with performance at 125K that is equivalent to detectors grown on conventional CdZnTe substrates. The detector structures are grown on Si via CdTe(112)B buffer layers, whose structural properties include x-ray rocking curve full width at half maximum of 63 arc-sec and near-surface etch pit density of 3–5 × 10⁵ cm⁻² for 9 μm thick CdTe films. HgCdTe p⁺-on-n device structures were grown by molecular beam epitaxy (MBE) on both bulk CdZnTe and Si with 125K cutoff wavelengths ranging from 3.5 to 5 μm. External quantum efficiencies of 70%, limited only by reflection loss at the uncoated Si-vacuum interface, were achieved for detectors on Si. The current-voltage (I-V) characteristics of MBE-grown detectors on CdZnTe and Si were found to be equivalent, with reverse breakdown voltages well in excess of 700 mV. The temperature dependences of the I-V characteristics of MBE-grown diodes on CdZnTe and Si were found to be essentially identical and in agreement with a diffusion-limited current model for temperatures down to 110K. The performance of MBE-grown diodes on Si is also equivalent to that of typical liquid phase epitaxy-grown devices on CdZnTe with R₀A products in the 10⁶–10⁷ Θ-cm² range for 3.6 μm cutoff at 125K and R₀A products in the 10⁴–10⁵ Θ-cm² range for 4.7 μm cutoff at 125K.     

PbSe光电导焦平面阵列探测器

应用半导体非平衡载流子连续性方程模拟了PbSe光电导红外探测器参数对光电响应的影响,实验研制了小规模像元的x-y寻址型PbSe光电导焦平面阵列（FPA）探测器,像元尺寸为500 μm×500 μm,像元间距为500 μm。实验表征了PbSe FPA探测器像元的光电响应性能,有效像元率达到了100%。500 K温度黑体辐射和3.0V偏压下像元的黑体响应率的范围是70~146 mA/W,平均响应率和平均探测率分别达到了110 mA/W和5.5×10⁹。像元的噪声等效温差（NETD）范围是15~81mK,平均噪声等效温差为32 mK。使用中波红外成像装置,初步演示了PbSe FPA探测器对350~450℃热辐射目标的红外成像。为后续研制高密度像元PbSe FPA探测器奠定了基础。     

Design and development of multicolor MWIR/LWIR and LWIR/VLWIR detector arrays

Multicolor infrared (IR) focal planes are required for high-performance sensor applications. These sensors will require multicolor focal plane arrays (FPAs) that will cover various wavelengths of interest in mid wavelength infrared/long wavelength infrared (MWIR/LWIR) and long wavelength infrared/very long wavelength infrared (LWIR/VLWIR) bands. There has been significant progress in HgCdTe detector technology for multicolor MWIR/LWIR and LWIR/VLWIR FPAs.^1–3 Two-color IR FPAs eliminate the complexity of multiple single-color IR FPAs and provide a significant reduction of weight and power in simpler, reliable, and affordable systems. The complexity of a multicolor IR detector MWIR/LWIR makes the device optimization by trial and error not only impractical but also merely impossible. Too many different geometrical and physical variables need to be considered at the same time. Additionally, material characteristics are only relatively controllable and depend on the process repeatability. In this context, the ability of performing “simulation experiments” where only one or a few parameters are carefully controlled is paramount for a quantum improvement of a new generation of multicolor detectors for various applications.     

InAs/GaAsSb带间级联中波红外焦平面研究

针对高工作温度红外探测器的迫切需求,设计并利用分子束外延技术制备了高晶格质量的2级带间级联中波红外探测材料,带间级联单元器件在最高323 K下可以测试到清晰的响应光谱,140 K下暗电流密度达到4×10~(-5)A/cm~(-2).并在此基础上利用干法刻蚀技术实现了320×256规模的台面型带间级联红外焦平面原型器件.焦平面测试结果表明其在80-120K范围内量子效率达到30%,127 K下噪声等效温差为55.1 mK,盲元率为2.3%.采用该焦平面器件在127 K下获得了较为清晰的演示性室温目标红外热成像.     

128x128元InAs/GaSb II类超晶格红外焦平面探测器

报道了128×128元InAs/GaSb Ⅱ类超晶格红外焦平面阵列探测器的研究成果.实验采用分子束外延技术在GaSb衬底上生长超晶格材料.红外吸收区结构为13 ML(InAs)/9 ML(GaSb),器件采用PIN结构,焦平面阵列光敏元大小为40μm×40μm.通过台面形成、侧边钝化和金属电极生长,以及与读出电路互连等工艺,得到了128×128面阵长波焦平面探测器.在77 K时测试,器件的100%截止波长为8μm,峰值探测率6.0×109cmHz1/2W-1.经红外焦平面成像测试,探测器可得到较为清晰的成像.