Cutting characteristics of PVD-coated tools deposited by filtered arc deposition (FAD) method

The cutting characteristics of novel physical vapor deposition (PVD)-coated tools deposited using filtered arc deposition (FAD) method are investigated. The TiCN-coated films are extremely smooth without any droplets. They exhibit superior hardness and adherence and a favorable cutting performance for the high-speed milling of a prehardened stainless steel. The availability of a newly proposed VN film is also examined. Owing to the good lubrication and tribological properties of the VN coating film, the lower cutting force, flank wear with, and cutting temperature than those of the TiN-coated tool are obtained in milling of the prehardened steel.     

CrAlYCN/CrCN nanoscale multilayer PVD coatings deposited by the combined High Power Impulse Magnetron Sputtering/Unbalanced Magnetron Sputtering (HIPIMS/UBM) technology

CrAlYCN/CrCN coating combining high hardness (H_p = 36 GPa) and low friction coefficient (µ = 0.42 against Al₂O₃) has been developed for machining of Si containing Al-alloys. The coating was deposited by the combined High Power Impulse Magnetron Sputtering/Unbalanced Magnetron sputtering, (HIPIMS/UBM) technology. Macroparticle free Cr⁺ ion flux was generated by HIPIMS discharge to sputter clean the substrates prior to the coating deposition. The use of HIPIMS for surface pre treatment resulted in excellent adhesion, scratch test adhesion critical load value of Lc = 55 N on HSS and Lc = 68 N due to the local epitaxial growth and extremely smooth coating surface, Ra = 0.012 μm due to the elimination of growth defects.The coating crystallised in fcc structure with a preferred {220} orientation. XTEM analysis revealed a nanoscale multilayer structure of the coating with carbon segregated at the column boundaries but also vertically to form a lateral phase at the interfaces between the individual nanolayers.Addition of C to CrAlYN/CrN increased the chemical inertness between cutting tool and workpiece material without deteriorating the oxidation resistance of the coating. Thermo gravimetric analysis showed that the temperature for the onset of rapid oxidation was as high as 940 °C.In dry milling of AlSi9Cu1 alloy, CrAlYCN/CrCN coated 8 mm diameter cemented carbide end mills outperformed non coated end mills by factor of 2.5 with effective hindered built up edge formation mechanism.     

Characterization of ZrO_2 Films Deposited by Reactive Unbalanced Magnetron Sputtering

ZIRCONIUM OXIDE FILMS are widely used asoptical coatings due to their excellent properties such ashigh refractive index,broad region of low absorptionfrom the near-UV(above240nm)to the mid-IR(below8u,m)and high pulse laser damage threshold.Theirpotential applications include laser mirrors,edge orbroadband filters,etc ni.Many techniques such as electron beam evaporation,ion-assisted deposition[31,molecular beam epitaxy[41,pulse laser deposition[5]and sputtering havebeen employed to depo…     

非平衡磁控溅射CrTiAlN涂层的耐腐蚀性能

采用非平衡磁控溅射技术,在304不锈钢表面沉积CrTiAlN硬质涂层,测定和研究涂层组织结构和耐腐蚀性能,探索提高奥氏体不锈钢表面性能和耐腐蚀性能的可能性.基于奥氏体不锈钢在含氯离子酸和非氧化性酸中缺乏足够抵抗力的特点,腐蚀介质选用了0.5 Mol/L的NaCl水溶液.结果表明CrTiAlN涂层试样表现了优异的表面性能和耐腐蚀性能,特别是对于提高304不锈钢耐点蚀的能力有很大作用.     

非平衡磁控溅射CrTiAlN涂层的制备及空蚀性能研究

目的 为缓解动力系统金属表面发生的空泡失效问题,提高水下装备推进系统在复杂多变环境中的综合服役性能,将涂层技术用于金属材料的表面防护。方法 基于正交实验设计,采用非平衡磁控溅射技术在AISI 316不锈钢基体上制备CrTiAlN涂层。采用XRD、SEM、EDS和AFM等测试手段对涂层的物相、形貌、成分和表面粗糙度进行表征;采用维氏硬度计、划痕仪和洛氏硬度计对涂层的显微硬度和膜基结合力进行测试与评估;通过球–盘磨损实验、电化学测试和空蚀实验,分别评价涂层的耐干摩擦磨损、耐腐蚀和抗空蚀性能。结果 实验结果表明,利用正交试验设计调控Cr、Ti和Al靶电流,基于涂层硬度得到最佳靶电流分别为4、8、8 A,此时涂层显微硬度达到1 242HV0.01,纳米硬度为(17.00±0.99) GPa,远高于316不锈钢;涂层的摩擦因数和磨损率远低于316不锈钢;在质量分数为3.5%的NaCl溶液中,涂层的腐蚀电位较高,腐蚀电流较小,具有较好的耐腐蚀性能,采用涂层保护后316不锈钢的寿命得到显著提高;在空蚀实验后,316不锈钢的粗糙度从4.5 nm增至112.0 nm,并出现空蚀坑,而CrTiAlN涂层只出现了褶皱,其粗糙度从4.8 nm增至10.0 nm,仅在涂层缺陷处发生了零星剥落现象。可见,CrTiAlN涂层有效缓解了空蚀的冲击作用,提高了316不锈钢的抗空蚀性能。结论 可将CrTiAlN涂层作为防护涂层,并应用于水利工程装备关键部件。     

Cutting performance of PVD-coated carbide and CBN tools in hardmilling

In this study, cutting performance of CBN tools and PVD-coated carbide tools in end-milling of hardened steel was investigated. In high-speed dry hardmilling, two types of CBN tools were applied: the CBN-rich type and an ordinary one. In the case of relatively low-speed milling, on the other hand, a few coated carbide tools were selected where four kinds of coating films, TiN, TiCN, TiAlN and multi-layered TiAlN/AlCrN, were deposited on the K10 and P30 grade carbide. The cutting performance was mainly evaluated by tool wear, cutting temperature, cutting force and surface roughness. In dry cutting of hardened carbon steel with the ordinary CBN tool, the cutting tool temperature rose rapidly with increase in cutting speed; and tool temperature reached approximately 850 °C at the cutting speed of 600 m/min. In the case of the CBN-rich tool, the cutting temperature decreased by 50 °C or more because of its high thermal conductivity. It is remarkable that tool wear or damage on a cutting tool was not observed even when the cutting length was 156 m in both CBN tools. In the case of coated carbide tools, the temperatures of TiN-, TiCN- and TiAlN-coated carbide tools rose as cutting proceeded because of the progress of tool wear, but that of TiAlN/AlCrN-coated carbide tool hardly rose due to little tool wear. When the base material was K10 grade carbide, tool temperature was lower than that of P30 with any coating. The tool flank wear depends considerably on hardness and oxidizing temperature of the coating film.     

非平衡磁控溅射沉积Ti-N薄膜色彩和性能调控研究

目的研究Ti-N薄膜颜色和硬度及其结合强度的影响因素。方法利用封闭磁场非平衡磁控溅射离子镀膜技术,该变溅射偏压、氮气流量等参数,分别在304不锈钢基体和载玻片基体上沉积多彩Ti-N薄膜。用努氏硬度、划痕法和球坑法分别评价Ti-N薄膜的显微硬度和结合强度等性能。结果当偏压和溅射电流分别为-60 V和2 A时,将反应气体氮气流量从3sccm逐渐增加到20sccm,Ti-N薄膜颜色依次发生从"淡黄-金黄-红黄-紫红-金黄"的循环变化趋势。薄膜的硬度随氮气流量的增加在601~700HK之间呈逐步上升的趋势。膜基结合普遍较好。当氮气流量和溅射电流分别为10sccm和2 A时,将负偏压从-50 V逐渐增加到-120 V,薄膜颜色从淡黄色变成金黄色,膜基结合强度较好。硬度随偏压的增加变化不明显。结论影响Ti-N薄膜颜色的主要因素为氮气流量,偏压也可以轻微地改变薄膜颜色,但对薄膜性能影响并不明显。     

非平衡磁控溅射沉积类石墨碳膜结构及其摩擦学性能

利用非平衡磁控溅射技术在单晶硅基底上沉积了类石墨非晶碳膜。利用X射线光电子光谱、Ram an光谱、高分辨透射电子显微镜及原子力显微镜对沉积薄膜的微观结构进行了详细表征;利用纳米压痕仪和球盘摩擦试验机分别对其力学性能和摩擦学性能进行了测试。结果表明,当前制备的非晶碳膜中sp2杂化碳占主导呈现出类石墨特征,但薄膜硬度可达14.2 GPa。大气环境中的摩擦性能测试表明,所制备的类石墨非晶薄膜具有优异的摩擦学性能:其承载能力高达2.8 GPa,同时具有较低摩擦因数(~0.05)和磨损率(~10-11cm3/Nm)。类石墨碳膜优异的摩擦学性能主要归因于其独特的结构、较低的内应力及良好的热稳定性。     

非平衡磁控溅射沉积不同成分 Ti-Ni 合金薄膜的伪弹性研究

应用非平衡磁控溅射离子镀方法沉积制备了五种不同成分的Ti-Ni合金薄膜,并在保护气体条件下于600℃进行了晶化退火处理。分析了薄膜的相结构,测定了薄膜的硬度和弹性模量,并利用纳米压入加载-卸载曲线分析研究了薄膜的伪弹性回复率,讨论了薄膜成分对硬度、弹性模量和伪弹性的影响规律。结果表明:富Ni薄膜的硬度、弹性模量和伪弹性均较高,但含Ni量达到一定值后,这些性能指标呈下降趋势。     

磁控溅射类石墨镀层的微观组织观察与分析

利用非平衡磁控溅射系统制备了含微量Cr的类石墨镀层,使用四点探针法测量所制备镀层的电阻率,测试结果表明所制备镀层工作层为类石墨层。使用SEM观察了镀层形貌,使用TEM及HRTEM观察了镀层的微观组织并利用选区电子衍射分析了镀层相结构,观察和分析结果表明:镀层表面质量良好,镀层的纯Cr金属底层为柱状晶结构,过渡层的晶体结构为非晶相中嵌有Cr纳米晶结构;工作层为非晶结构。测定了镀层的硬度、结合力,以及在不同载荷下的摩擦因数和比磨损率,测试结果表明:所制备镀层具有高硬度、高结合力、低摩擦因数和低比磨损率,且高载下比低载下有更低的摩擦因数。分析和讨论的结果还表明:工作层的非晶结构,是使所研究镀层具有高硬度、高结合力、低摩擦因数、低磨损率低的主要原因。     

钛合金表面非平衡磁控溅射制备TiN薄膜的冲击磨损性能

文中利用非平衡磁控溅射技术在Ti6Al4V合金表面沉积TiN薄膜.固定冲击频率、改变冲击载荷,在小载荷冲击磨损试验机上进行了系列周次的冲击磨损试验,用台阶仪、扫描电子显微镜、X射线衍射仪分析磨痕深度、形貌及相结构,并探讨了TiN薄膜的磨损机理.试验表明:TiN薄膜的冲击磨损机理主要为塑性变形和疲劳剥落,与基体材料作比较,TiN薄膜破坏的临界冲击周次比基体材料Ti6Al4V合金明显提高.     

电弧离子镀与中频磁控溅射复合制备TiAlN薄膜

采用Ti靶电弧离子镀与Al靶中频磁控溅射相结合的复合工艺,分别在单晶硅抛光面和高速钢抛光面两种基体上成功地制备了TiAlN薄膜样品.电子扫描电镜(SEM)、能谱和X射线衍射(XRD)分析结果表明:此复合工艺下制备的TiAlN薄膜比TiN薄膜表面液滴尺寸更小,针状孔洞基本消除,组织更为致密均匀.TiAlN薄膜的含Al量为0.86 %(原子百分比)左右,Ti与N的含量比(原子百分比)大致为1:1,Al原子的加入使TiN结晶结构发生畸变,晶格常数变小.TiAlN薄膜的硬度比TiN薄膜的硬度,提高30 %左右.     

氦气流量对中频非平衡反应磁控溅射制备CrAlN薄膜性能的影响

采用中频非平衡反应磁控溅射技术制备CrAlN薄膜,研究了氮气分压对CrAlN薄膜的沉积速率、薄膜成分、微观结构、机械性能和耐腐蚀性能的影响,并与CrN薄膜的性能进行了比较.研究表明,相比较CrN薄膜而言,CrAlN薄膜的硬度高,结构致密,耐腐蚀性好.随着氮气流量的升高,CrAlN薄膜沉积速率降低,Cr/Al比率升高;薄膜中CrN(200)衍射峰强度逐渐增强,六方结构的AlN相逐渐消失;薄膜的粗糙度由39 nm降低至10 nm,并且腐蚀电位升高,耐腐性增强.当氮气流量为53 mL/min时,CrAlN薄膜具有最佳的硬度和优良的耐腐蚀性能.     

氮气流量对中频非平衡反应磁控溅射制备CrAlN薄膜性能的影响

采用中频非平衡反应磁控溅射技术制备CrAlN薄膜,研究了氮气分压对CrAlN薄膜的沉积速率、薄膜成分、微观结构、机械性能和耐腐蚀性能的影响,并与CrN薄膜的性能进行了比较。研究表明,相比较CrN薄膜而言,CrAlN薄膜的硬度高,结构致密,耐腐蚀性好。随着氮气流量的升高,CrAlN薄膜沉积速率降低,Cr/Al比率升高;薄膜中CrN(200)衍射峰强度逐渐增强,六方结构的AlN相逐渐消失;薄膜的粗糙度由39 nm降低至10 nm,并且腐蚀电位升高,耐腐性增强。当氮气流量为53 mL/min时,CrAlN薄膜具有最佳的硬度和优良的耐腐蚀性能。     

非平衡磁控溅射结合电弧离子镀制备掺杂DLC硬质膜性能研究

将非平衡磁控溅射和电弧离子镀工艺相结合，并使用霍尔离子源辅助，制备了过渡层为Cr、掺杂Ti和N的DLC薄膜。对DLC薄膜的表面形貌、内部结构、力学性能以及电学性能进行了分析测试，结果表明：膜层中含有sp^2键和sp^3键结构，硬度达到HV（20g）2600以上，摩擦因数接近0．1，电阻高于2MΩ。     

靶电流对非平衡磁控溅射制备无氢碳膜结构与性能的影响

利用非平衡磁控溅射(UBMS)技术在硅基片上制备了无氢碳膜,并采用Raman光谱、X射线衍射、傅立叶变换光谱等手段对不同靶电流下沉积的薄膜的微观结构、沉积速率、粗糙度、表面接触角及红外透过率进行了研究.试验结果表明:随着靶电流的增大,薄膜的沉积速率增大,薄膜中sp3键含量增加,薄膜表面接触角增大,红外透过率增大;而薄膜的粗糙度随靶电流增加而减小.靶电流是影响非平衡磁控溅射制备无氢碳膜结构与性能的1个主要因素.     

非平衡磁控溅射制备氮化铬膜及其摩擦学性能研究

为了克服传统TiN膜系镀层的性能不足，采用新型非平衡磁控溅射技术制备了一系列氮化铬膜，采用原子力显微镜(AFM)和SEM对所制备不同厚度的薄膜形貌进行了分析，测定了薄膜的厚度、硬度和膜基结合强度，并对薄膜的摩擦学性能进行了研究。结果表明，使用铬过渡层可以提高膜基结合强度，实现薄膜性能的优化。采用新型非平衡磁控溅射方法制备的氮化铬膜显示出高硬度、低摩擦系数和良好的抗磨性。并考察了镀层厚度对镀层摩擦学性能的影响以及其它影响镀层摩擦学性能的因素。     

非平衡磁控溅射离子镀TiN、TiAIN涂层抗高温氧化行为的研究

采用非平衡磁控溅射离子镀在W6M05Cr4V(M2)高速钢表面分别进行TiN、TiAIN涂覆,对TiN涂层和TiAIN涂层的抗高温氧化性能做对比性分析.通过观察不同温度下氧化后涂层的宏观形貌和色泽,涂层表面光学显微形貌以及涂层表面显微硬度的变化,判定TiN、TiAIN涂层的抗高温氧化性能.结果表明,TiN涂层丌始氧化温度为600℃,TiAIN涂层开始氧化温度为750℃.     

非平衡磁控溅射La-Ti/WS2 自润滑薄膜的摩擦磨损行为

要满足航天器机械转动部件在恶劣工况下的工作,需研制高硬度、低摩擦系数的固体润滑薄膜。采用非平衡磁控溅射法分别制备了纯WS₂薄膜、Ti掺杂WS₂复合薄膜和La-Ti掺杂WS₂复合薄膜。分析了薄膜的微观形貌、成分、硬度和摩擦学性能。结果表明,与纯WS₂薄膜和Ti/WS₂复合薄膜相比,La-Ti/WS₂复合薄膜的微观结构更加致密。La-Ti/WS₂复合薄膜的硬度H和弹性模量E也显著提高。此外,La-Ti/WS₂复合薄膜的摩擦系数减小,并且H/E比值增大,La-Ti/WS₂复合薄膜的磨损率降低。结果表明,La的掺杂有助于在摩擦接触表面形成稳定的转移膜,提高La-Ti/WS₂复合薄膜的耐磨性和承载能力。