磁场对氮化物抛物量子阱中束缚极化子的影响

采用改进的Lee-Low-Pines中间耦合方法研究了在外磁场作用下纤锌矿氮化物抛物量子阱中极化子能级,给出不同磁场下极化子基态能量、结合能随阱宽L的变化关系以及能量随磁场强度B变化的函数关系。在计算抛物量子阱材料中考虑了纤锌矿GaN和Al0.3Ga0.7N构成的抛物量子阱中材料中准LO和准TO声子模的各向异性以及外磁场对极化子能量的影响。结果表明:纤锌矿氮化物抛物量子阱材料中电子-声子相互作用和外磁场对极化子能级有明显的影响。极化子基态能量、结合能随阱宽的增加而减小,随磁场的增加而增大,电子-声子相互作用使极化子能量降低,并且GaN/Al0.3Ga0.7N抛物量子阱对极化子的束缚程度比GaAs/Al0.3Ga0.7As抛物量子阱强,因此,在GaN/Al0.3Ga0.7N抛物量子阱中束缚于杂质中心处的电子比在GaAs/Al0.3Ga0.7As抛物量子阱中束缚于杂质中心处的电子稳定。     

在磁场作用下氮化物抛物量子阱中杂质态能量

采用变分法研究了在外磁场作用下GaN／AlxGa1-xN无限抛物量子阱（PQW）中类氢杂质态能级,给出不同磁场下杂质态基态能、结合能随阱宽的变化关系以及能量随磁场强度变化的函数关系。数值结果表明：外磁场对类氢杂质能量和结合能均有明显的影响,杂质态能量随磁场的增强而显著增大,并且随阱宽的增大而增大;GaN／Al0.3Ga0.7 N PQW对杂质态的束缚程度比GaAs／Al0.3Ga0.7As PQW强。     

在外电场作用下有限抛物量子阱中类氢杂质态结合能

采用变分方法研究GaAs/AlxGa1-xAs有限抛物量子阱中类氢杂质态能量和结合能随外电场和阱宽的变化关系.在计算中考虑了电子有效带质量和介电常数随空间坐标(或合金组分)的变化因素.结果表明,外电场对类氢杂质态能量和结合能均有明显的影响,并且这些影响随着阱宽的增大而增大.电子有效带质量和介电常数随空间坐标的变化效应使得类氢杂质态基态能量减小,结合能增大,此效应随着阱宽的增大明显变小.     

在外电场作用下有限抛物量子阱中类氢杂质态结合能

采用变分方法研究GaAs/AlxGa1-xAs有限抛物量子阱中类氢杂质态能量和结合能随外电场和阱宽的变化关系.在计算中考虑了电子有效带质量和介电常数随空间坐标(或合金组分)的变化因素.结果表明,外电场对类氢杂质态能量和结合能均有明显的影响,并且这些影响随着阱宽的增大而增大.电子有效带质量和介电常数随空间坐标的变化效应使得类氢杂质态基态能量减小,结合能增大,此效应随着阱宽的增大明显变小.     

Cd1-xMnxTe/CdTe抛物量子阱内激子结合能的研究

在有效质量近似下采用变分法计算了Cd1-xMnxTe/CdTe抛物量子阱内不同Mn组分下激子的结合能,给出了结合能在不同Mn组分下随阱宽、垒宽、外加电场的变化情况。 结果表明:激子结合能是阱宽的一个非单调函数，随阱宽的变化呈现先增加后减小的趋势，而且随着Mn组分增大, 激子结合能达到最大值的阱宽相应变小, 这与材料的带隙改变有关;激子结合能随垒宽逐渐增大然后趋于稳定值，这与波函数向垒中的渗透有关；在一定范围内电场对激子结合能的影响很小,而且Mn组分越大对激子结合能影响越小，但电场强度较大时会破坏激子效应。计算结果可以对基于半导体抛物形量子阱发光器件设计制作提供一些理论依据。     

外场对InPBi量子阱中激子结合能的影响

在有效质量近似下运用变分法计算了InAlAs/InPBi/InAlAs量子阱中的激子结合能随阱宽、Al组分、Bi组分的变化情况,分析了外加电场和磁场对激子结合能的影响。结果表明：激子结合能随阱宽增大呈现先增大后减小的趋势;随Al、Bi组分的增大,激子结合能也逐渐增大;外加电场较小时对激子结合能的影响很小,外加电场较大时破坏了激子效应;激子结合能随外加磁场增大呈现单调增大的趋势。计算结果对InAlAs/InPBi/InAlAs量子阱在光电子器件方面的应用有一定指导意义。     

量子阱中强耦合极化子的性质

采用改进的线性组合算符和变分相结合的方法，导出了量子阱中强耦合极化子的振动频率和有效质量；讨论了阱宽和电子-声子耦合强度对强耦合极化子的有效质量的影响以及极化子的速度对振动频率、基态能量、基态结合能和有效质量的影响。通过数值计算结果表明；强耦合极化子的有效质量随阱宽的增加而减少，随电子声子耦合强度的增加而增大；极化子的振动频率、有效质量和基态结合能随极化子速度的增大而增加，极化于的基态能量随速度的增大而减小。     

应变纤锌矿GaN/AlxGa1-xN柱形量子点中的束缚极化子

本文采用有效质量近似,考虑类LO声子,类TO声子以及内建电场的影响,利用变分法研究了应变GaN/AlxGa1-xN柱形量子点中的极化子效应。数值计算表明,极化子效应显著降低了杂质态的结合能。而且,类LO声子对结合能的贡献起主要作用,各向异性的角度和Al组分对结合能的影响则很小。     

GaN/GaAlN宽量子阱的二类激子特征

考虑了内建电场的影响,用变分法计算了GaN/GaAlN量子阱(QW)的电子子带和激子结合能.结果表明,对于阱宽较大情形,电子和空穴高度局域在QW边沿附近.内建电场造成的电子空穴空间的较大分离使QW激子表现出二类阱特征.重空穴基态结合能对Al浓度变化不敏感.     

电场中束缚极化子

采用线性组合算符及幺正变换方法研究了电场对量子阱弱耦合束缚极化子的性质的影响.推导出量子阱中束缚极化子的基态能量和库仑束缚势、电场和阱宽的变化关系.数值计算结果表明,基态能量因电场和库仑束缚势的不同而不同,随电场和库仑束缚势的增大而增大,随阱宽的增大而迅速减小.     

Characterization of AlxInyGa1−x−yN quaternary alloys grown on sapphire substrates by molecular-beam epitaxy

High-resolution X-ray diffraction (HR-XRD) with rocking curve, atomic force microscopy (AFM) and photoluminescence (PL) spectroscopy have been performed on high-quality quaternary Al_xIn_yGa_1−x−yN thin films at room temperature. The Al_xIn_yGa_1−x−yN films were grown on c-plane (0 0 0 1) sapphire substrates with AlN as buffer layers using a molecular beam epitaxy (MBE) technique with aluminum (Al) mole fractions x ranging from 0.0 to 0.2 and constant indium (In) mole fraction y=0.1. HR-XRD measurements confirmed the high crystalline quality of these alloys without any phase separation. The X-ray rocking curve of Al_xIn_yGa_1−x−yN films typically shows full widths at half maximum (FWHM) intensity between 14.4 and 28.8 arcmin. AFM measurements revealed a two-dimensional (2D) growth mode with a smooth surface morphology of quaternary epilayers. PL spectra exhibited both an enhancement of the integrated intensity and an increasing blueshift with increased Al content with reference to the ternary sample In_0.1Ga_0.90N. Both effects arise from Al-enhanced exciton localization. PL was used to determine the behavior of the energy band gap of the quaternary films, which was found to increase with increasing Al composition from 0.05 to 0.2. This trend is expected since the incorporation of Al increases the energy band gap of ternary In_0.1Ga_0.90N (3.004 eV). We have also investigated the bowing parameter for the variation of energy band gaps and found it to be very sensitive on the Al composition. A value of b=10.4 has been obtained for our quaternary Al_xIn_yGa_1−x−yN alloys.     

Binding energies of shallow impurities in asymmetric strained wurtzite AlxGa1-xN/ GaN/Aly Ga1-yN quantum wells

The ground state binding energies of hydrogenic impurities in strained wurtzite AlxGa1-xN/GaN/AlyGa1-y>N quantum wells are calculated numerically by a variational method. The de-pendence of the binding energy on well width, impurity location and Al concentrations of the left and right barriers is discussed, including the effect of the built-in electric field induced by spontaneous and piezoelectric polarizations. The results show that the change in binding energy with well width is more sensitive to the impurity position and barrier heights than the barrier widths, especially in asymmetric well structures where the barrier widths and/or barrier heights differ. The binding energy as a function of the impurity position in symmetric and asymmetric structures behaves like a map of the spatial distribution of the ground state wave function of the electron. It is also found that the influence on the binding energy from the Al concentration of the left barrier is more obvious than that of the right barrier.     

AlxGa1-xAs量子线中的浅杂质态的研究

利用变分方法研究柱型量子线中浅杂质态的极化效应。给出AlxGa1-xAs柱型量子线中浅杂质态的结合能随组份x,杂质位置的变化关系。结果表明电子-声子相互作用明显降低了杂质态的结合能,且结合能随组份x的增加而增加。     

MOCVD AlxGa1-xN/GaN超晶格结构的X射线反射谱与原子力显微研究

采用掠入射X射线反射谱技术与原子力显微技术对属有机化合物化学气相淀积生长的AlxGa1-xN/GaN超晶格结构的表面和界面进行了精确表征。结合高分辨率X射线衍射谱与反射谱数据分析获得外延层各层厚度与AlGaN层的Al摩尔组分。掠入射x射线反射谱的显著强度振荡与原子力显微镜所观察到的台阶流动形貌表明了平整的界面和表面的存在。研究发现,低Al组分（x=0.25）且阱宽小的样品界面与表面粗糙度最小,通过原子力显微技术得到的表面粗糙度均方根偏差为0.45nm。     

Rectification in AlxGa1-xAs-GaAs N-n heterojunction devices

The previously unsolved problem of rectification at Al_xGa_1-xAs-GaAs N-n heterojunction is found to originate from a vague concept regarding the maximum junction grading width which can sustain rectification. The theoretical current density vs voltage characteristics of this heterojunction system are derived from thermionic emission theory. It is found that, unless the impurity concentration of the AlGaAs layer (prepared by LPE techniques) is less than 10¹⁶ cm^?3, typical 90–200 Å metallurgical grading widths at the N-n heterojunction interface produce either ohmic or poorly rectifying characteristics. These results explain (1) the lack of rectification in most N-n Al_xGa_1-xAs-GaAs heterojunctions reported in the literature and (2) the recent observation of significant rectification in high purity (N)Al_0.3Ga_0.7As-(n)GaAs heterojunctions reported by Chandra and Eastman.     

Large signal and noise properties of heterojunction AlxGa1-xAs/GaAs DDRIMPATTs

Simulation studies are carried out on the large signal and noise properties of heterojunction (HT) Al_xGa_1-xAs/GaAs double drift region (DDR) IMPATT devices at V-band (60 GHz). The dependence of Al mole fraction on the aforementioned properties of the device has been investigated. A full simulation software package has been indigenously developed for this purpose. The large signal simulation is based on a non-sinusoidal voltage excitation model. Three mole fractions of Al and two complementary HT DDR structures for each mole fraction i.e., six DDR structures are considered in this study. The purpose is to discover the most suitable structure and corresponding mole fraction at which high power, high efficiency and low noise are obtained from the device. The noise spectral density and noise measure of all six HT DDR structures are obtained from a noise model and simulation method. Similar studies are carried out on homojunction (HM) DDR GaAs IMPATTs at 60 GHz to compare their RF properties with those of HT DDR devices. The results show that the HT DDR device based on N-Al_xGa_1-xAs/p-GaAs with 30% mole fraction of Al is the best one so far as large signal power output, DC to RF conversion efficiency and noise level are concerned.     

Hybrid functional calculations on the band gap bowing parameters of InxGa1-xN

The electronic band structures and band gap bowing parameters of In_xGa_1-xN are studied by the firstprinciples method based on the density functional theory. Calculations by employing both the Heyd-ScuseriaErnzerh of hybrid functional（HSE06） and the Perdew-Burke-Ernzerhof（PBE） one are performed. We found that the theoretical band gap bowing parameter is dependent significantly on the calculation method, especially on the exchange-correlation functional employed in the DFT calculations. The band gap of In_xGa_1-xN alloy decreases considerably when the In constituent x increases. It is the interactions of s–s and p–p orbitals between anions and cations that play significant roles in formatting the band gaps bowing. In general, the HSE06 hybrid functional could provide a good alternative to the PBE functional in calculating the band gap bowing parameters.     

Valence band structures and optical transitions of Ga1−xInxNyAs1−y/GaAs compressively strained quantum wells

The electronic structures of the Ga_1−xIn_xN_yAs_1−y/GaAs compressively strained quantum wells (QW) are investigated using 6×6 k·p Hamiltonian including the heavy hole, light hole and spin–orbit splitting band. The curves of dependence of transition energy on well width and N mole fraction are obtained. The valence subband energy dispersion curves, density of state and TE and TM squared optical transition matrix elements of three possible QW structures for emitting 1.3 μm wavelength are given.     

InxAl1-xN/AlN/GaN高电子迁移率晶体管的电学特性

通过自洽求解薛定谔和泊松方程研究了In_xAl_1-xN/AlN/GaN结构的电学特性。通过研究In_xAl_1-xN内部极化效应随铟组分的变化发现,当铟组分为0.41时,总的极化效应为零。通过计算发现,二维电子气密度随着铟组分的增加而减小。对于AlN的厚度存在一个临界值：当AlN的厚度小于临界值时,二维电子气密度随着In_xAl_1-xN厚度的增加而增加;然而,当AlN的厚度大于临界值时,二维电子气密度随着In_xAl_1-xN厚度的增加而减少。对于晶格匹配的In_0.18Al_0.82N/AlN/GaN结构,AlN的厚度临界值为2.8nm。通过计算还发现,AlN厚度临界值随着铟组分的增加而减少。