Design und Herstellung selektiver Dünnschichtabsorber auf Silberinselbasis. Design and fabrication of selective multilayer absorber based on silver island films

The combination of a metal island film with a dielectric multilayer represents a novel approach for preparation of spectrally selective absorbers. Metal island films show exceptional optical properties caused by the optical excitation of surface plasmon modes. The plasmon resonance frequency depends on the size and shape of the islands and is influenced by the deposition parameters. The first type of samples represents a silver island film in an ultra thin Al₂O₃ film. We analyzed these samples by means of spectrophotometry. The recorded spectra allow the calculation of the optical constants of the silver island films. These show a maximum absorptance up to 40 %. Finally, we incorporated ultrathin metal‐dielectric‐composite films on a silver/alumina basis into multilayer stacks to design tailored spectrally selective absorber coatings. The stack absorptance comes close to 100 %.     

Gradient silver nanoparticle layers in absorbing coatings--experimental study

Metal island films show a characteristic absorption peak related to the surface plasmon resonance of free electrons. This kind of film can be used in absorbing coatings, together with dielectric layers. Such absorbing multilayer coatings, with and without the gradient of the silver mass thickness in metal island films throughout the coating, have been deposited by electron beam evaporation. It is shown experimentally that coatings with a gradient in the mass thickness of silver nanoparticles have higher absorption than equivalent nongradient coatings with the same total mass thickness of silver nanoparticles.     

Electrodeposition of template free hierarchical ZnO nanorod arrays via a chloride medium

We have successfully grown template and buffer free ZnO nanorod films via chloride medium by controlling bath temperature in a simple and cost effective electrochemical deposition method. Thin films of ZnO nano-rods were obtained by applying a potential of ?0.75 V by employing Ag/AgCl reference electrode for 4 h of deposition time. The CV measurements were carried out to determine potential required to deposit ZnO nanorod films whereas chronoamperometry studies were carried out to investigate current and time required to deposit ZnO nanorod films. The formation of ZnO nanorod has been confirmed by scanning electron microscopy (SEM) and Raman spectroscopy. Low angle XRD analysis confirms that ZnO nanorod films have preferred orientation along (101) direction with hexagonal wurtzite crystal structure. The SEM micrographs show nice surface morphology with uniform, dense and highly crystalline hexagonal ZnO nanorods formation. Bath temperature has a little influence on the orientation of nanorods but has a great impact on their aspect ratio. Increase in bath temperature show improvement in crystallinity, increase in diameter and uniform distribution of nanorods. Compositional analysis shows that the amount of oxygen is ~49.35 % and that of Zn is ~50.65 %. The optical band gap values were found to be 3.19 and 3.26 eV for ZnO nanorods prepared at bath temperature 70 and 80 °C respectively. These results indicate that by controlling the bath temperature band gap of ZnO nanorods can be tailored. The obtained results suggest that it is possible to synthesize ZnO nanorod films by a simple, cost effective electrodeposition process which can be useful for opto-electronic devices fabrication.     

Optical properties of gold island films—a spectroscopic ellipsometry study

Metal island films of noble metals are obtained by deposition on glass substrates during the first stage of evaporation process when supported metal nanoparticles are formed. These films show unique optical properties, owing to the localized surface plasmon resonance of free electrons in metal nanoparticles. In the present work we study the optical properties of gold metal island films deposited on glass substrates with different mass thicknesses at different substrate temperatures. The optical characterization is performed by spectroscopic ellipsometry at different angles of incidence and transmittance measurements at normal incidence in the same point of the sample. Fitting of the ellipsometric data allows determining the effective optical constants and thickness of the island film. A multiple oscillator approach was used to successfully represent the dispersion of the effective optical constants of the films.     

Phosphonate-anchored thin films on titanium and niobium oxide surfaces: Fabrication and characterization

Phosphonate-anchored thin films form on various metal oxide substrates. This paper compares structural details of these covalently anchored films on the oxidized surfaces of titanium, niobium and a Ti45Nb alloy. This is made possible by a sample configuration wherein the alkylphosphonates are coated onto a thin film of metal which is sputtered onto a double-side-polished silicon wafer and then oxidized. Samples are flat and reflective and are suitable for ellipsometry, wetting measurements, X-ray Photoelectron Spectroscopy, Atomic Force Microscopy, and Fourier Transform Infrared-Attenuated Total Reflectance Spectroscopy. Deposition from heated tetrahydrofuran produces ordered films with measurable differences among deposition protocols and among metal oxide substrates. These substrates enable identification of the mildest deposition procedures that still provide uniform, robust surface coatings.     

A perspective on the optimisation of hard carbon and related coatings for engineering applications

Hard carbon coatings hold the key to improved performance for many types of products. However the achievement of these improvements requires the selection of the appropriate type of carbon coating and therefore the correct process and appropriate deposition parameters. The huge range of properties achievable in carbon coatings is mainly due to the ability of carbon to form different types of interatomic bonds, to take up different sites, and to adopt different structures. In addition to intrinsic material properties, other factors must also be considered for each application, such as the adhesion level achievable and coating cost. This complex situation explains why the number of applications for hard carbon films is still more limited than originally expected. Despite the considerable progress achieved during the last decade in hard coating technologies, practical results often appear conflicting, with differences in properties occurring even within the same types of coatings. Furthermore, the many different deposition systems and processes which have been developed introduce further complications in regard to (for example) achievable coating uniformity and deposition rates. Thus, there is often confusion in the use of certain fundamental principles, especially regarding the growth mechanisms and the effects which produce more dense homogeneous and stable coating materials. This is especially true for the improved properties of tetrahedral amorphous carbon films, which are different from previously reported diamond-like carbon materials, and can be created by adapting and improving existing industrial processes, to offer advantages compared to earlier coatings, and hence possibilities for important new applications. This paper discusses issues relating to intrinsic material properties, and practical aspects such as adhesion, to provide a framework for the development, selection and use of hard carbon coatings in practical situations.     

Resistance changes in discontinuous gold films

The change in the electrical resistance of vacuum-deposited island films of gold after deposition has been investigated. This change is found to be well explained by the morphological change of the island particles due to surface self-diffusion, provided that the electron transport between the island particles obeys the relationship derived by Neugebauer and Webb and that the temperature rise induced by the deposition decays exponentially with time.     

Glancing angle deposition of crystalline zinc oxide nanorods

Zinc oxide nanorod films produced by glancing angle deposition were fabricated within the parameter space defined by the process variables pitch (nanorod growth per substrate rotation), deposition rate, and throw distance to investigate the effect these parameters have on morphology and crystallinity. Statistical analysis was used to identify important relationships. Final film morphology depends on both pitch and deposition rate, where two growth regimes distinguished by deposition rate are observed and interpreted as arising from competition between geometric shadowing and crystalline growth kinetics. Optimal growth conditions for nanostructured films of isolated zinc oxide nanorods occurred for pitch values of approximately 1 nm to 10 nm. Pole-figure measurements confirm that the films consist of oriented single-crystal nanorods. Films deposited at all pitch values between 0.001 nm to 6.5 μm are crystalline and textured, and greater texturing is achieved for conditions of decreased surface diffusion.     

直流反应溅射沉积Al2O3薄膜及其在SS-AlN金属陶瓷太阳吸收涂层的应用

在沉积不锈钢-氮化铝(SS-AlN)金属陶瓷太阳吸收集热管的磁控溅射三靶镀膜机上,安装了UPS03反应溅射闭环控制单元,实现反应溅射Al2O3稳定反馈控制。采用国产直流电源在Al靶表面处于过渡态下,成功制备了吸收几乎为零的Al2O3薄膜。溅射功率在14kW时,反应溅射沉积Al2O3的靶电压波动可长时间稳定控制在±3 V范围内,沉积速率为5.4 nm/(min·kW),约为Al靶在无反应气体溅射下沉积Al薄膜速率的74%。采用Al2O3代替AlN作为减反射层,应用到SS-AlN太阳选择性吸收涂层中,进一步提高了复合膜的太阳光学性能,太阳吸收比由AlN作为减反射层的0.956提高到0.965,红外发射比不变,仍为0.044。     

TiO(2) fibers enhance film integrity and photovoltaic performance for electrophoretically deposited dye solar cell photoanodes

Nanoparticulated TiO(2) fibers as one-dimensional long structures were introduced into TiO(2) P25 nanoparticle films using coelectrophoretic deposition. This prevented the usual crack formation occurring in wet coatings, and resulted in less porosity and higher roughness factor of the films that provided more favorable conditions for electron transport. The films used as the photoanode of a dye solar cell (DSC) produced 65% higher photovoltaic efficiency. TiO(2) fibers can be excellent binders in single-step, organic-free electrophoretic deposition of TiO(2) for DSC photoanode.     

Nanostructures and sensing properties of ZnO prepared using normal and oblique angle deposition techniques

Nanostructured zinc oxide (ZnO) for gas sensing application has been prepared by using normal and oblique angle sputtering deposition techniques under different substrate temperatures. Oblique angle plasma beam deposition is demonstrated effectively growing large-area uniformly aligned and inclined ZnO nanorod arrays on catalyst-free silicon substrate due to a self-shadowing mechanism, whereas normal radio frequency sputtering deposition yields nanoparticles as island growth mode. Furthermore, the density of the nanorod arrays is dependent on the incident angle of ZnO plasma beam. With an increase of the incident flux angle, large inter spacing was induced, resulting in sparser nanorod arrays. The nanorod arrays grown with an incident angle of 70° have an average diameter of ∼ 150-300 nm and length of ∼ 700-750 nm. The experimental data from characterization of the samples indicates that the obtained samples at different substrate temperatures and incident angles have wurtzite structure with a c-axis orientation.Sensing characterization reveals that the nanorod-based sensor shows higher sensitivity, faster response and recovery time, as well as better reproducibility than that of nanoparticle-based gas sensor to 100 ppm hydrogen and methane at low operating temperature below 150 °C due to the porosity and large grain boundaries of the nanorod arrays. It demonstrates that oblique angle of sputtering deposition is a simple, inexpensive synthesis process to get high-porosity nanostructures and as a result, improves the sensing properties of fabricated ZnO sensors, which permits us to obtain sensors with high sensitivity, low operating temperature and stability.     

Development of CVD Ti-containing films

Ti-containing films have attracted many interests in last decades due to their specific properties, and can be used in many applications. Chemical vapor deposition (CVD) is an advanced manufacture technique for surface coating currently and has been widely used to prepare various surface coatings and thin films. Therefore, researchers have carried out in depth investigations on CVD Ti-containing films in the last decades. This article reviews the development of CVD Ti-containing films in the last years. Ti-containing films can be classified into pure Ti films, binary films, ternary films and quaternary films by components, and are described with extend discussion about their preparaiton, structures, properties and applications. Otherwise, the techniques based on CVD method and the Ti-precursors for Ti-containing films will be presented in the article.     

Nano structured physical vapor deposited coatings by means of picosecond laser radiation

Molding of nano structures by injection molding leads to special requirements for the tools e.g., wear resistance and as low as possible release forces of the molded components. On the other hand it is not allowed to affect the replication precision. Physical vapor deposition is one of the promising technologies for applying coatings with adapted properties like high hardness, low roughness, low Young's modulus and less adhesion to the plastics melt. Although physical vapor deposition technology allows the deposition of films on micro structures without changing the structure significantly, film deposition on nano structures and small micro structures leads to a relevant change in surface topography. For this reason direct structuring of physical vapor deposition coatings might be beneficial. In this paper structuring was done using a picoseconds ultraviolet laser, Lumera Laser "Rapid," with a master oscillator power amplifier system at 355 nm. Two different coatings were deposited by magnetron sputter ion plating physical vapor deposition technology for laser structuring tests ((Cr, Al)N, (Cr, Al,Si)N). After deposition, the coatings were analyzed by common techniques regarding hardness, Young's modulus and morphology. The structures were analyzed by scanning electron microscopy. The results show a high potential for laser structuring of coatings deposited via physical vapor deposition. Linear structures with sizes between 400 nm and 10microm were realized.     

Carbonaceous alumina films deposited by MOCVD from aluminium acetylacetonate: a spectroscopic ellipsometry study

Spectroscopic ellipsometry was used to characterize carbonaceous, crystalline aluminium oxide films grown on Si(100) by low-pressure metal organic chemical vapour deposition, using aluminium acetylacetonate as the precursor. The presence of carbon in the films, attributed to the use of a metalorganic precursor for the deposition of films, was identified and analysed by secondary ion mass spectroscopy and X-ray photoelectron spectroscopy, for the elemental distribution and the chemical nature of the carbon in the films, respectively. Ellipsometry measurements over the photon energy range 1.5–5 eV were used to derive the pseudo-dielectric function of the aluminium oxide-containing films. Multi-layer modelling using linear regression techniques and the effective medium approximation were carried out to extract the structural details of the specimens. The excellent fit between the simulated and experimental optical data validates the empirical model for alumina-containing coatings grown by MOCVD.     

Influence of bilayer period on the characteristics of nanometre-scale ZrN/TiAIN multilayers

In the last decade, considerable research effort was directed to the deposition of multilayer films with layer thicknesses in the nanometer range (superlattice coatings), in order to increase the performance of various cutting tools and machine parts. The goal of the present work was to investigate the main microstructural, mechanical and wear resistance characteristics of a superlattice coating, consisting of alternate multilayer ZrN/TiAIN films, with various bilayer periods (5 / 20 nm). The coatings were deposited by the cathodic arc method on Si, plain carbon steel and high speed steel substrates to be used as wear resistance surfaces. The multilayer structures were prepared by using shutters placed in front of each cathode (Zr and Ti+Al). The characteristics of multilayer structures (elemental and phase composition, texture, Vickers microhardness, thickness, adhesion, and wear resistance) were determined by using various techniques (AES, XPS, XRD, microhardness measurements, scratch, and tribological tests). A comparison with the properties of ZrN and TiAIN single-layer coatings was carried out.     

Electrochemical evaluation of the reliability of plasma-polymerized methylcyclohexane films

Plasma-polymerized thin films are developed for electronic devices to satisfy the important requirement of a low dielectric constant in the interlayer dielectrics. Three types of methylcyclohexane coatings are deposited on copper as interlayer dielectrics by plasma-enhanced chemical vapor deposition at three different deposition temperatures. The coating performance is evaluated by electrochemical impedance spectroscopy and potentiodynamic polarization testing in a 3.5 wt.% NaCl solution. The coatings are also analyzed by surface analyses, including atomic force microscopy, Fourier transform infrared spectroscopy, and contact angle measurements. The electrochemical behavior of the coatings is improved by increasing the deposition temperature. The methylcyclohexane films on the copper substrate show high protective efficiency, charge transfer resistance and low porosity, which indicate that the coating performance increased with increasing deposition temperature. Atomic force microscopy, Fourier transform infrared spectroscopy and contact angle measurements confirm the enhanced formation of C-H, C-C, and CC stretching configurations, improved surface roughness and wettability with increasing deposition temperature.     

Hybrid plasma CVD of diamond-like carbon (DLC) at low temperatures

Diamond-like carbon coatings have been deposited onto various substrates at 100–150°C using a hybrid plasma assisted chemical vapour deposition technique activated by radio frequency at 13.56 MHz. The coatings have been characterized using a number of techniques including scanning electron microscopy, Raman spectroscopy, thermoanalysis and pin-on-disc wear testing. Results show the films to be diamond like, with the addition of nitrogen (prior to deposition) promoting the formation of crystallites. In addition the condition and type of substrate have been found to have a strong influence on the structural characteristics of the deposited diamond-like films. SEM analysis of diamond-like carbon coatings deposited onto metal matrix composite materials such as Si-Al MMC is reported. The hybrid CVD technology enabled films to be deposited evenly onto the porous MMC structure. Commercially manufactured drills, coated with DLC and titanium nitride (TiN), have been compared to examine their cutting wear resistance characteristics. This revised version was published online in November 2006 with corrections to the Cover Date.     

Noncontacting low-cost instrument for film thickness measurement

A low-cost, noncontacting, nondestructive technique is presented for measuring the thickness of thin liquid or solid films and coatings in real time by utilizing the resonance properties of microstrip structures. A new measurement system in which all the microwave components are internal to the instrument, thereby eliminating the need for microwave test equipment, is described. Only a low-voltage DC source, such as a battery, is required to power the unit; the output is also a DC voltage or current. Using a linear model, sample coefficients of determination, r², greater than 0.98 have been obtained for film thickness measurements of water, enamel paint, and silicon rubber up to 0.8-1.5- and 2-mm thick, respectively. Copper sheet metal up to 0.9-mm thick has been measured with an r² greater than 0.99. The measurement range can be extended or improved even further if nonlinear circuit behavior is accounted for     

Chemical stability of laminated AlN/AlN:H films

Highly adherent and chemically stable coatings of aluminum nitride are produced by ion beam sputter deposition of graded concentration films of AlN:H_x, where x ranges to zero (AlN) at the outer surface of the film. These layered structures exhibit the good adhesion of AlN:H while maintaining the chemical stability of A1N. On the basis of scanning tunneling microscopy and scanning electron microscopy, films deposited on room temperature substrates (metal or mica) form layers that are smooth (structures smaller than 6 nm) and that remain so for periods longer than one month. Fourier transform spectroscopy indicates that they are chemically unchanged by exposure to air for two months.     

Influence of the target composition on reactively sputtered titanium oxide films

Titanium dioxide thin films have many interesting properties and are used in various applications. High refractive index of titania makes it attractive for the glass coating industry, where it is used in low-emissivity and antireflective coatings. Magnetron sputtering is the most common deposition technique for large area coatings and a high deposition rate is therefore of obvious interest. It has been shown previously that high rate can be achieved using substoichiometric targets. This work deals with reactive magnetron sputtering of titanium oxide films from TiO_x targets with different oxygen contents.The deposition rate and hysteresis behaviour are disclosed. Films were prepared at various oxygen flows and all films were deposited onto glass and silicon substrates with no external heating. The elemental compositions and structures of deposited films were evaluated by means of X-ray photoelectron spectroscopy, elastic recoil detection analysis and X-ray diffraction. All deposited films were X-ray amorphous. No significant effect of the target composition on the optical properties of coatings was observed. However, the residual atmosphere is shown to contribute to the oxidation of growing films.