Characterization of GaN epitaxial layers on SiC substrates with AlxGa1−xN buffer layers

High quality GaN epitaxial layers were obtained with Al_xGa_1−xN buffer layers on 6H–SiC substrates. The low-pressure metalorganic chemical vapor deposition (LP-MOCVD) method was used. The 500 Å thick buffer layers of Al_xGa_1−xN (0≤x≤1) were deposited on SiC substrates at 1025°C. The FWHM of GaN (0004) X-ray curves are 2–3 arcmin, which vary with the Al content in Al_xGa_1−xN buffer layers. An optimum Al content is found to be 0.18. The best GaN epitaxial film has the mobility and carrier concentration about 564 cm² V⁻¹ s⁻¹ and 1.6×10¹⁷ cm⁻³ at 300 K. The splitting diffraction angle between GaN and Al_xGa_1−xN were also analyzed from X-ray diffraction curves.     

Investigation of MBE grown GaAs/AlGaAs/InGaAs heterostructures

This paper reports on the influence of the In mole fraction variation (0.1≤x≤0.25) of MBE grown pseudomorphic GaAs/Al_yGa_1−yAs/In_xGa_1−xAs heterostructures on the material quality and the performance of the fabricated devices. For x=0.1–0.15, the carrier mobility in the samples was 4500 cm² V⁻¹ s (at 300 K) and 37 000 cm²V⁻¹ s (at 77 K) and decreased significantly at low temperatures as x was increasing up to 0.25. Transistors with gate length of 0.8 m and In_0.1Ga_0.9As channels exhibited transconductances of 200–220 mSm mm⁻¹ and output conductances of 0.15–0.20 mSm mm⁻¹, while gate-source breakdown voltages were 27–28 V. Delay times of the designed and fabricated ICs frequency dividers by 2 were 130–140 ps.     

Temperature dependence of optical transitions in AlxGa1–xAs/GaAs quantum well structures grown by molecular beam epitaxy

Quantum well (QW) structures of Al_xGa_1–xAs/GaAs were characterized by photoluminescence technique as a function of the temperature between 10 and 300 K. The structures were grown on a 500 nm thick GaAs buffer layer with Molecular Beam Epitaxy technique. We have studied the properties of in-situ Cl₂-etched GaAs surfaces and overgrown QW structures as a function of the etching temperature (70 and 200 °C). Several models were used to fit the experimental points. Best fit to experimental points was obtained with the Pässler model.     

Hardness, internal stress and fracture toughness of epitaxial AlxGa1−xAs films

Vickers microhardness indentations of 10 μm (001) oriented epilayers of Al_xGa_1−xAs on GaAs substrates have been utilized to evaluate the hardness H_v, the internal stress, and the fracture toughness K_Ic of the layers as a function of their composition parameter x. The hardness H_v varies linearly according to: (6.9-2.2x) GPa and K_Ic increases linearly with x according to: K_1c = (0.44+1.30x) MPa m^1/2. The influence of the substrate on these measurements was found to be negligible for the layer thickness (10 μm) and the indentation load (0.25 N) used, disregarding internal stresses.

Internal film stresses were evaluated by the bimorph buckling method, and were found to depend on the composition parameter according to σ = 0.13x GPa. These stresses did not notably affect the H_v measurements, but for K_Ic corrections as large as 25% had to be made.

The radial cracks observed were of the shallow Palmqvist type. In contradiction to previous reports on this type of cracking, it was found to initiate during unloading, not during loading, and a physical explanation for this deviation is given. No deep radial/median cracks were observed. It was found important to use expressions based on the correct crack geometry in the K_Ic evaluation. Also, a simple theory for the influence of internal stresses on the K_Ic results has been developed.     

Determination of the E1 and E1+Δ1 energy bands by photoreflectance in AlxGa1−xAs in the region 0<x<0.55

The E₁ and E₁+Δ₁ energy bands of metal–organic chemical vapor deposition grown Al_xGa_1−xAs, with x in the range 0–0.55, have been determined using photoreflectance technique. The aluminum composition for each sample was determined using the energy of the room-temperature photoluminescence compensated peak value and a suitable fundamental band gap formula. The positions of the E₁ and E₁+Δ₁ peaks were determined from curve-fitting an appropriate theoretical model to our experimental data by a modified downhill simplex method. Using the results, we propose new E₁ and E₁+Δ₁ cubic expressions as functions of the aluminum composition, x, and compare them with the available reported expressions.     

Optical transitions near the band edge in bulk CuInxGa1−xSe2 from ellipsometric measurements

From the analysis of the variation of optical absorption coefficient with incident photon energy between 0.8 and 2.6 eV, obtained from ellipsometric data, the energy E_G of the fundamental absorption edge and E_G′ of the forbidden direct transition for CuIn_xGa_1−xSe₂ alloys are estimated. The change in E_G and the spin-orbit splitting Δ_SO=E_G′−E_G with the composition x can be represented by parabolic expression of the form E_G(x)=E_G(0)+ax+bx² and Δ_SO(x)=Δ_SO(0)+a′x+b′x², respectively. b and b′ are called “bowing parameters”. Theoretical fit gives a=0.875 eV, b=0.198 eV, a′=0.341 eV and b′=−0.431 eV. The positive sign of b and negative sign of b′ are in agreement with the theoretical prediction of Wei and Zunger [Phys. Rev. B 39 (1989) 6279].     

Applications of variable angle spectroscopic ellipsometry to strained SiGe alloy heterostructures

Variable angle spectroscopic ellipsometry (VASE) has been used to characterize several Si_xGe_1−x/Ge heterostructures. First, Si_xGe_1−x/Ge superlattice (SL) structures were characterized in terms of the layer thicknesses, composition, x, of the Si_xGe_{1− x} layer, and oxide thickness. High-resolution X-ray diffraction results are also presented for the Si_xGe_1−x/Ge SL structures and are shown to be in close agreement with the VASE results once strain effects are taken into account. VASE has also been used to study thick, Ge-rich Si_xGe_1−x/Ge heterostructures that have been grown on Si substrates. A stepped buffer has been deposited first in order to minimize the strain in the Si_xGe_1−x/Ge layers. VASE can be used to give a qualitative determination of the residual strain along with the thickness of all layers within the optical penetration depth from the surface.     

Molecular beam epitaxy synthesis of Si1−yCy and Si1−x−yGexCy alloys and Ge islands using an electron cyclotron resonance argon/methane plasma

We report the growth of Si_1−yC_y and Si_1−x−yGe_xC_y alloys on Si(001) by electron cyclotron resonance plasma-assisted Si molecular beam epitaxy using an argon/methane gas mixture. Various Si/Si_1−yC_y and Si/Si_1−x−yGe_xC_y multilayers have been grown and characterized principally by X-ray diffraction and Raman spectroscopy. The influence of growth parameters and electron cyclotron resonance plasma source operating conditions on the C substitutional incorporation was studied. Under optimum growth conditions the structures show good structural properties and sharp interfaces with carbon being essentially substitutionally incorporated up to concentrations of 1%. No significant carbon incorporation was measured in films grown under a high methane partial pressure without plasma excitation. Si_1−x−yGe_xC_y layers grown with this technique exhibit the strain compensation and enhanced thermal stability expected for these ternary alloys. Carbon pre-deposition of Si through surface exposure to the argon/methane plasma is shown to act as an antisurfactant on the growth of Ge islands by suppressing the formation of a Ge wetting layer on the surface.     

Structural characterization of ion-beam-induced epitaxially crystallized thin layers of III–V and IV–IV semiconductors

Structural properties of ion-beam-induced epitaxial crystallization (IBIEC) for amorphous layers of GaAs on GaAs(100), BP on BP(100) and Si_1−xGe_x and Si_1−x−yGe_xC_y on Si(100) have been investigated. Crystallization was induced by ion bombardment with 400 keV Ne, Ar or Kr at 150 °C for GaAs and at 350 °C for BP. Epitaxial crystallization up to the surface was observed both in GaAs and BP at temperatures much below those required for the solid phase epitaxial growth (SPEG). The growth rate per nuclear energy deposition density has shown a larger dependence on ion dose rate in cases of heavier ion bombardments both for GaAs and BP. Crystallization of a-GaAs with ions whose projected ranges are within the amorphous layer thickness was also observed at 150 °C. Epitaxial crystallization of Si_1−xGe_x and Si_1−x−yGe_xC_y layers (x = 0.13 and y = 0.014 at peak concentration) on Si(100) formed by high-dose implantation of 80 keV Ge and 17 keV C ions has been observed in the IBIEC process with 400 keV Ar ion bombardments at 300–400 °C. Crystalline growth by IBIEC has shown a larger growth rate in Si_1−x−yGe_xC_y/Si} than in Si_1−xGe_x/Si} with the same Ge concentration for all bombardments under investigation. X-ray rocking-curve measurements have shown a strain-compensated growth in Si_1−x−yGe_xC_y/Si}, whereas Si_1−xGe_x/Si} samples have shown a growth with strain accommodation.     

New material for photoemission electron source: semiconductor alloy InGaAsP grown on GaAs substrate

Wide-bandgap epitaxial In_xGa_1−xAs_yP_1−y layers grown on GaAs substrates were investigated as a material for photoemission electron sources for the first time. By variation of x and y, both thick (of about one μm) lattice-matched unstrained layers and thin (of about 0.2 μm) lattice-mismatched strained layers with direct energy gap from 1.78 to 1.92 eV were grown. The layers were chemically treated in a glove-box, loaded into UHV via a loading chamber without exposure to air, heat cleaned, and activated to the state of negative electron affinity (NEA). For InGaAsP it was possible to reach the NEA-state by an activation with cesium only, without oxygen. The estimated e-folding lifetime of InGaAsP photocathodes operating at DC current of 400 μA was above one thousand hours in the regime with automatical additional cesiations and above one hundred hours without additional cesiations. Lifetime limitation factors are discussed. Strain-induced splitting of the valence band up to 32 meV was observed in the lattice-mismatched films; this observation gives prospects for an increase of spin polarization beyond the 50% limit.     

Correlation between high pressure effect and alloying in GaAs and Ga1-xAlx As

The empirical pseudopotential method coupled with the virtual crystal approximation has been used to compute the electronic band gaps and pseudocharge densities for the compound semiconductor GaAs and the alloy Ga_1−xAl_xAs. The variation of the compositional fraction of AlAs in GaAs has been correlated to the high pressure effect on GaAs.     

Bulk Si1−xGex single- and poly-crystals: a new prospective material for electronics

Si_1−xGe_x is a prospective material for electronics. This is mostly because Si_1−xGe_x-based technology is close to silicon-based technology, which is advanced, widely applicable, and cheap. The majority of work on this material is devoted to Si_1−xGe_x-based heteroepitaxy, and in particular to the Si_1−xGe_x/Si system; few publications are devoted to bulk single-crystal. Here we focus on some interesting properties of bulk Si_1−xGe_x solid solutions. First, under heat treatment and alpha- and beta-irradiation the efficiency of defect introduction decreases with the increase of Ge composition of the Si_1−xGe_x single-crystal. This is because Ge atoms in a crystal lattice are annihilation centers for primary defects. Hence, this material is more resistant to temperature and radiation than silicon. Second, it is known that, since Z(Ge)Z(Si), the sensitivity of the material to irradiation should increase with the concentration of Ge. We show that Si_1−xGe_x nuclear detectors have efficiency three times higher than silicon detectors. Finally, we note that one of the major problems in materials based on solid solutions is the composition uniformity. Our investigations on the influence of composition fluctuations on material properties have shown that the material has a sufficient uniformity at x<0.1. Such an alloy is a prospective material for electronics.     

Doping and electrical characteristics of in-situ heavily B-doped Si1−x−yGexCy films epitaxially grown using ultraclean LPCVD

Doping and electrical characteristics of in-situ heavily B-doped Si_1−x−yGe_xC_y (0.22<x<0.6, 0<y<0.02) films epitaxially grown on Si(100) were investigated. The epitaxial growth was carried out at 550°C in a SiH₄–GeH₄–CH₃SiH₃–B₂H₆–H₂ gas mixture using an ultraclean hot-wall low-pressure chemical vapor deposition (LPCVD) system. It was found that the deposition rate increased with increasing GeH₄ partial pressure, and only at high GeH₄ partial pressure did it decrease with increasing B₂H₆ as well as CH₃SiH₃ partial pressures. With the B₂H₆ addition, the Ge and C fractions scarcely changed and the B concentration (C_B) increased proportionally. The C fraction increased proportionally with increasing CH₃SiH₃ partial pressures. These results can be explained by the modified Langmuir-type adsorption and reaction scheme. In B-doped Si_1−x−yGe_xC_y with y=0.0054 or below, the carrier concentration was nearly equal to C_B up to approximately 2×10²⁰ cm⁻³ and was saturated at approximately 5×10²⁰ cm⁻³, regardless of the Ge fraction. The B-doped Si_1−x−yGe_xC_y with high Ge and C fractions contained some electrically inactive B even at the lower C_B region. Resistivity measurements show that the existence of C in the film enhances alloy scattering. The discrepancy between the observed lattice constant and the calculated value at the higher Ge and C fraction suggests that the B and C atoms exist at the interstitial site more preferentially.     

MOVPE growth and characterization of AlxGa1-xN

AlGaN is an important material in the design of nitride devices. However, little is known concerning its growth with high Al contents. We have studied the growth of Al_xGa_1-xN epilayers on c-face sapphire by low pressure MOVPE (76 Torr), using triethylgallium, trimethylaluminum and ammonia as precursors. The solid versus gas phase composition relationship was determined experimentally and was fitted using a kinetic model. Then the structural properties of the layers (x=0–1) were studied, using X-ray diffraction, scanning electron microscopy and transmission electron microscopy. We demonstrate that at high Al content, the buffer layer defects are replicated into the AlGaN layer.     

Bond-lengths of the atomic nearest-neighbor and next-nearest-neighbor in A1−xBxC1−yDy III–V solid solutions

On the basis of the FDUC model and the hypothesis of the constant covalent radii, the expressions of the atomic nearest-neighbor and the next-nearest-neighbor bond-lengths were derived for A_1−xB_xC_1−yD_y III–V quaternary solid solutions. This set of bond-length expressions predicts the averaged bond-lengths and bond angles at any concentration (x, y) for the III–V pseudobinary and quaternary solid solutions, which are only dependent on the lattice parameters and the concentrations of the pure end compounds. When x=0, 1 or y=0, 1, A_1−xB_xC_1−yD_y III–V quaternary solid solutions degenerate into the relative pseudobinary solid solutions, in which the nearest-neighbor and the next-nearest-neighbor bond-lengths agree well with the experimental results. Further discussion and comparison with other theoretical models are also given in this paper.     

Sintering behavior and microwave dielectric properties of Bi3(Nb1−xTax)O7 solid solutions

Solid solutions of Bi₃(Nb_1−xTa_x)O₇ (x = 0.0, 0.3, 0.7, 1) were synthesized using solid state reaction method and their microwave dielectric properties were first reported. Pure phase of fluorite-type could be obtained after calcined at 700 °C (2 h)⁻¹ between 0 ≤ x ≤ 1 and Bi₃(Nb_1−xTa_x)O₇ ceramics could be well densified below 990 °C. As x increased from 0.0 to 1.0, saturated density of Bi₃(Nb_1−xTa_x)O₇ ceramics increased from 8.2 to 9.1 g cm⁻³, microwave permittivity decreased from 95 to 65 while Q_f values increasing from 230 to 560 GHz. Substitution of Ta for Nb modified temperature coefficient of resonant frequency τ_f from −113 ppm °C⁻¹ of Bi₃NbO₇ to −70 ppm °C⁻¹ of Bi₃TaO₇. Microwave permittivity, Q_f values and τ_f values were found to correlate strongly with the structure parameters of fluorite solid solutions and the correlation between them was discussed in detail. Considering the low densified temperature and good microwave dielectric proprieties, solid solutions of Bi₃(Nb_1−xTa_x)O₇ ceramics could be a good candidate for low temperature co-fired ceramics application.     

Ferroelectric/superconductor heterostructures

This review covers the fabrication and characterization of ferroelectric/superconductor heterostructures such as Pb(Zr_xTi_1−x)O₃/YBa₂Cu₃O_7−δ (YBCO), BaTiO₃/YBCO and Ba_xSr_1−xTiO₃/YBCO etc. on various single crystal substrates. Pulsed laser deposition, laser molecular beam epitaxy, and magnetron-sputtering methods are compared. This report shows that pulsed laser deposition equipped with in situ reflection high-energy electron diffraction is a good method to control the growth mode of YBCO thin films. Furthermore, laser molecular beam epitaxy is a superb method for research of complex oxide films and their superlattices. Atomic force microscopy and transmission electron microscopy showed the ferroelectric films grown on the rough surface of the YBCO films produced high-density planar defects in the film and is detrimental to the ferroelectric/dielectric properties of the heterostructures. Therefore, for device usage, it is more advantageous to use SrRuO₃ than YBCO as the bottom electrode material. For growing atomically smooth surface films step-flow mode is highly recommended. Prospects of microwave device application of the ferroelectric/superconductor heterostructures are discussed, and proposed the BSTO films as the best candidate for passive microwave components.     

Progress in the room-temperature optical functions of semiconductors

Optical functions of a specific semiconductor in a particular wavelength region are often needed in optics and optoelectronics research. Basic optical properties of some materials are available in handbooks, but recent advances in the experimental techniques for growth, sample preparation and determination of optical functions, as well as theoretical advances in modeling the optical functions, prompted demand for a review of the state of the art of the optical functions of some important semiconductor materials. This paper gives an overview of the experimental methods for the determination of optical functions in the 1–6 eV spectral range and the available models for calculating the optical functions. Also, the paper summarizes the progress in the study of optical functions of several important semiconductors such as GaP, InP, InAs, GaSb, InSb, AlSb, Al_xGa_1−xAs, Hg_xCd_1−xTe, Si_xGe_1−x, GaN, InN, AlN, 6H–SiC, and ZnO. Besides discussing the available data and expected positions of optical transitions, the paper focuses on the model of the dielectric function which allows reproducing accurately the experimental dielectric function values for all the materials considered here.     

Optical and electrical properties of p-type AgInSnxS2−x (x = 0–0.04) thin films prepared by spray pyrolysis

AgInSn_xS_2−x (x = 0–0.2) polycrystalline thin films were prepared by the spray pyrolysis technique. The samples were deposited on glass substrates at temperatures of 375 and 400 °C from alcoholic solutions comprising silver acetate, indium chloride, thiourea and tin chloride. All deposited films crystallized in the chalcopyrite structure of AgInS₂. A p-type conductivity was detected in the Sn-doped samples deposited at 375 °C, otherwise they are n-type. The optical properties of AgInSn_xS_2−x (x < 0.2) resemble those of chalcopyrite AgInS₂. Low-temperature PL measurements revealed that Sn occupying an S-site could be the responsible defect for the p-type conductivity observed in AgInSn_xS_2−x (x < 2) thin films.     

Photoluminescence study of the nitrogen content effect on GaAs/GaAs1 − xNx/GaAs/AlGaAs: (Si) quantum well

We study the effect of nitrogen content in modulation-doped GaAs/GaAs_1 − xN_x/GaAs/GaAlAs:(Si) quantum well using low-temperature photoluminescence spectroscopy. The samples were grown on GaAs (001) substrates by molecular-beam epitaxy with different nitrogen compositions. The variation of the nitrogen composition from 0.04% to 0.32% associated to the bi-dimensional electron gas gives a new interaction mode between the nitrogen localized states and the GaAs_1 − xN_x/GaAs energies levels. The red-shift observed in photoluminescence spectra as function of nitrogen content has been interpreted in the frame of the band anticrossing model.