Photoluminescence and photoluminescence excitation spectra of In0.2Ga0.8N-GaN quantum wells: comparison betweenexperimental and theoretical studies

InGaN-GaN represents an important heterostructure with applications in electronics and optoelectronics. It also offers a system where we can study the effects of interface roughness, alloy clustering, and the piezoelectric effect. In the paper, we examine how these factors influence the photoluminescence and excitation photoluminescence in InGaN-GaN quantum wells. We examine the Stokes shift as a function of the excitation level and doping and relate the values to the piezoelectric effect and disorder in the system. Detailed comparisons are made with experimental results     

正照射延伸波长In0.8Ga0.2As红外焦平面探测器

为了研究延伸波长In0.8Ga0.2As PIN短波红外探测器的温度响应光电特性,采用闭管扩散的平面型器件工艺,在金属有机化学气相外延（MOCVD）外延生长的NIN型InAs0.6P0.4/In0.8Ga0.2As/InAs0.6P0.4 buf./InP材料上制备了正照射延伸波长2561线列InGaAs红外焦平面探测器,研究了探测器在不同温度下的I-V特性、光谱响应特性和探测率。结果表明,随着温度的降低,在小偏压下,器件的正向暗电流由产生复合电流为主逐渐变为以扩散电流为主。在260~300 K温度范围内,反向电流主要由扩散电流和产生复合电流组成,当温度低于180 K时,器件的反向电流主要为隧穿电流。室温下器件响应截止波长和峰值波长分别为2.57 m和2.09 m,峰值探测率为7.25108 cmHz1/2/W,峰值响应率为0.95 A/W,量子效率为56.9%。焦平面的峰值探测率在153 K达到峰值,约为1.111011 cmHz1/2/W,响应非均匀性为5.28%。     

Design and characterization of In0.2Ga0.8AsMQW vertical-cavity surface-emitting lasers

The device design, material characterization, and performance of optimized vertical-cavity surface-emitting lasers (VCSELs) are presented. The basic design goal was to increase the output power of the lasers without greatly increasing the low threshold current reported in earlier devices. The material characterization was performed by measuring in-plane lasers and broad-area VCSELs made from the same material as the small VCSELs. For 10-μm-square devices, outputs over 3 mW, device operation over 100°C, 6% wall-plug efficiency, threshold voltages under 3 V, and threshold currents under mA are reported     

A Novel Dilute Antimony Channel In0.2Ga0.8AsSb/GaAs HEMT

This letter reports, for the first time, a high-electron mobility transistor (HEMT) using a dilute antimony In_0.2Ga_0.8 AsSb channel, which is grown by a molecular-beam epitaxy system. The interfacial quality within the InGaAsSb/GaAs quantum well of the HEMT device was effectively improved by introducing the surfactantlike Sb atoms during the growth of the InGaAs layer. The improved heterostructural quality and electron transport properties have also been verified by various surface characterization techniques. In comparison, the proposed HEMT with (without) the incorporation of Sb atoms has demonstrated the maximum extrinsic transconductance g_m,max of 227 (180) mS/mm, a drain saturation current density I_DSS of 218 (170) mA/mm, a gate-voltage swing of 1.215 (1.15) V, a cutoff frequency f_T of 25 (20.6) GHz, and the maximum oscillation frequency f_max of 28.3 (25.6) GHz at 300 K with gate dimensions of 1.2times200 mum²     

Device linearity improvement byAl0.3Ga0.7As/In0.2Ga0.8Asheterostructure doped-channel FETs

The linearities of pseudomorphic heterostructure Al_0.3Ga_0.7As/In_0.2Ga_0.8As doped-channel FETs (DCFETs) and HEMTs were evaluated by DC and RF testings. Due to the absence of parallel conduction in the doped-channel approach, as compared to the modulation-doped structure, a wide and flat device performance together with a high current density was achieved. This improvement of device linearity suggests that doped-channel designs are suitable for high frequency power device application     

Device linearity comparisons between doped-channel andmodulation-doped designs in pseudomorphic Al0.3Ga0.7As/In0.2Ga0.8As heterostructures

The linearities of pseudomorphic Al_0.3Ga_0.7As/In_0.2Ga_0.8As doped-channel FET's were characterized by comparing the characteristics of modulation-doped field-effect transistors (FET's) based on dc and microwave evaluations. By using an undoped high-bandgap layer beneath the gate, the so-called parasitic MESFET-type conduction, which is common in HEMT's, can therefore be eliminated in doped-channel designs. Therefore, a wide and flat device performance together with a high current driving capability can be achieved in DCFET's. This linearity improvement in device performance suggests that doped-channel designs are more suitable for application in microwave power devices     

Effects of growth temperature on high-quality In0.2Ga0.8N layers by plasma-assisted molecular beam epitaxy

High-quality In_0.2Ga_0.8N epilayers were grown on a GaN template at temperatures of 520 and 580℃ via plasma-assisted molecular beam epitaxy. The X-ray rocking curve full widths at half maximum (FWHM) of (10.2) reflections is 936 arcsec for the 50-nm-thick InGaN layers at the lower temperature. When the growth temperature increases to 580℃, the FWHM of (00.2) reflections for these samples is very narrow and keeps similar, while significant improvement of (10.2) reflections with an FWHM value of 612 arcsec has been observed. This improved quality in InGaN layers grown at 580℃ is also reflected by the much larger size of the crystalline column from the AFM results, stronger emission intensity as well as a decreased FWHM of room temperature PL from 136 to 93.9 meV.     

Optical properties of Si0.8Ge0.2/Si multiple quantum wells

The optical property was studied on the Si_0.8Ge_0.2/Si strained multiple quantum well (MQW) structure grown using ultra-high vacuum chemical vapor deposition (UHV-CVD). Three peaks are observed in Raman spectrum, which are located at about 510, 410, and 300 cm⁻¹, corresponding to the vibration of Si–Si, Si–Ge, and Ge–Ge phonons, respectively. The photoluminescence (PL) spectrum originates from the radiative recombinations both from the Si substrate and the Si_0.8Ge_0.2/Si MQW. For Si_0.8Ge_0.2/Si strained MQW, the transition peaks related to the MQW region observed in the photocurrent (PC) spectrum were preliminarily assigned to electron–heavy hole (e–hh) and electron–light hole (e–lh) fundamental excitonic transitions.     

Tunneling between two quantum wells: In0.53Ga0.47As/InP versus GaAs/Al0.35Ga0.65As

The electron transfer from a narrow to a wide quantum well through a thin barrier is studied in the non-resonant case by time-resolved photoluminescence. The two systems In_0.53Ga_0.47As/InP and GaAs/Al_0.35Ga_0.65As are compared. Space charge effects are investigated and discussed. Contributions of holes to the tunneling process are determined.     

Avalanche multiplication characteristics ofAl0.8Ga0.2As diodes

The avalanche multiplication characteristics of Al_0.8Ga _0.2As have been investigated in a series of p-i-n and n-i-p diodes with i-region widths, w, varying from 1 μm to 0.025 μm. The electron ionization coefficient, α, is found to be consistently higher than the hole ionization coefficient, β, over the entire range of electric fields investigated. By contrast with Al_xGa _1-xAs (x⩽0.6) a significant difference between the electron and hole initiated multiplication characteristics of very thin Al_0.8Ga_0.2As diodes (w=0.025 μm) was observed. Dead space effects in the diodes with w⩽0.1 μm were found to reduce the multiplication at low bias below the values predicted from bulk ionization coefficients. Effective α and β that are independent of w have been deduced from measurements and are able to reproduce accurately the multiplication characteristics of diodes with w⩾0.1 μm and breakdown voltages of all diodes with good accuracy. By performing a simple correction for the dead space, the multiplication characteristics of even thinner diodes were also predicted with reasonable accuracy     

Variational results for electron mobility in modulation-doped In0.53Ga0.47As/InP single symmetric quantum wells

In this paper, the low-field carrier mobility is investigated for quasi-2D electrons in a n-doped In_0.53Ga_0.47As/InP single symmetric quantum well. An accurate variational scheme is developed in view to determine the subband structure in this lattice-matched heterostructure. In this scheme, the Schrödinger-Poisson coupled equations are solved observing adequate matching conditions at the heterointerfaces, as well as exchange-correlation corrections to the Hartree potential. The results allowed us to compute the main scattering rates. Some interchanges in these scattering rates were found with respect to the limitation of electron mobility by varying the well and the spacer widths.     

Single- and double-heterojunction pseudomorphic In0.5(Al0.3Ga0.7)0.5P/In0.2Ga0.8As high electron mobility transistors grown by gas sourcemolecular beam epitaxy

In_0.5(Al_0.3Ga_0.7)_0.5 P/In_0.2Ga_0.8As single- and double-heterojunction pseudomorphic high electron mobility transistors (SH-PHEMTs and DH-PHEMTs) on GaAs grown by gas-source molecular beam epitaxy (GSMBE) were demonstrated for the first time. SH-PHEMTs with a 1-μm gate-length showed a peak extrinsic transconductance g_m of 293 mS/mm and a full channel current density I_max of 350 mA/mm. The corresponding values of g_m and I_max were 320 mS/mm and 550 mA/mm, respectively, for the DH-PHEMTs. A short-circuit current gain (H₂₁) cutoff frequency f_T of 21 GHz and a maximum oscillation frequency f_max of 64 GHz were obtained from a 1 μm DH device. The improved device performance is attributed to the large ΔE_c provided by the In_0.5(Al_0.3Ga_0.7)_0.5P/In _0.2Ga_0.8As heterojunctions. These results demonstrated that In_0.5(Al_0.3Ga_0.7)_0.5P/In _0.2Ga_0.8As PHEMT's are promising candidates for microwave power applications     

The effect of gate recess profile on device performance ofGa0.51In0.49P/In0.2Ga0.8Asdoped-channel FET's

The effect of gate recess profile on device performance of Ga_0.51In_0.49P/In_0.2Ga_0.8As doped-channel FETs was studied. In the experiment, Ga_0.51In _0.49P/In_0.2Ga_0.8As doped-channel FETs (DCFET's) using triple-recessed gate structure were compared with devices using single-recessed and double-recessed gate structures. It is found that triple-recessed gate approach provides higher breakdown voltage (35 V) than single-recessed (16 V) and double-recessed gate (28 V) approaches. This is attributed to the larger aspect ratio in the triple-recessed gate structure. A unified method to calculate the breakdown voltages of MESFETs, HEMTs and DCFETs (or MISFETs) of any given arbitrary recessed gate profile was proposed and used to explain the experimental results     

Enhanced power performance of enhancement-mode Al0.5Ga0.5As/In0.15Ga0.85As pHEMTs using alow-k BCB passivation

Surface passivation technology plays an important role, especially in E-mode pHEMTs applications, and a new passivation technology has been proposed in this study. This novel benzocyclobutene (BCB) passivation layer takes advantage of the low dielectric permittivity (2.7) and a low loss tangent (0.0008). In this letter, we not only suppress the gate-to-drain leakage current but also improve the device power performance under a high input power swing by using a BCB passivation layer. The passivated 1.0 μm-long gate pHEMTs exhibit a better off-state performance than the unpassivated ones. The maximum output power under a 2.4-GHz operation is 118 mW/mm, with a linear power gain of 11.1 dB and a power-added efficiency is 60%     

High-speed Al0.2Ga0.8As/GaAsmulti-quantum-well phototransistors with tunable spectral response

The authors have measured the high-frequency characteristics and temporal response of a GaAs/AlGaAs heterojunction phototransistor with a GaAs/Al_0.2Ga_0.8 multi-quantum-well collector. The quantum wells offer tunability of the photoresponse (10 nm for a bias change of 4 V) and a negative differential resistance in the photocurrent-voltage characteristics. Measured values of f_T and f_max are 20 and 6 GHz, respectively. The temporal response to short-pulse optical excitation is characterized by a linewidth of 46 ps. Such devices are attractive candidates for making optically induced oscillators     

Fabrication of In0.25Ga0.75As/InGaAsPstrained SQW lasers on In0.05Ga0.95As ternarysubstrate

A uniform In_0.05Ga_0.95As ternary substrate was grown by using liquid encapsulated Czochralski (LEC) technique with a method of supplying GaAs source material at a constant temperature, and InGaAs/InGaAsP strained single quantum well (SQW) lasers were fabricated on the substrate for the first time. The lasers lased at 1.03 μm and exhibited low threshold current density of 222 A/cm² and excellent characteristic temperature of 221 K, showing that the ternary substrate has a sufficient quality for laser fabrication     

Optical transitions in strainedIn0.53Ga0.47As/In1-xGaxAsquantum wells

Experimental and theoretical characterization of a series of strained InGaAs/InGaAs quantum well heterostructures is presented. Measurements of X-ray diffraction on calibrated pairs of samples are in excellent agreement with simulated X-ray spectra and provide precise values for compositions and layer thicknesses. With these parameters, the authors have calculated the light- and heavy-hole to electron transition wavelengths, taking into account quantum confinement effects and the influence of strain on the strained-layer bandgap and on the band offset at the lattice-mismatched heterointerface. These calculated bandgaps are in good agreement with the measured room temperature photoluminescence spectra     

Temporal response characteristics of a In0.53Ga0.47As/InP quantum well phototransistor

An investigation of multiple-quantum-well heterojunction phototransistors with InGaAs/InP quantum wells in the collector and InGaAsP base is discussed. The design of the structure ensures that light is absorbed only in the quantum-well region, thus providing a way to study the correlation between quantum well and phototransistor carrier dynamics. Moreover, since the operation of a n-p-n phototransistor is governed by hole injection into the base, the transient behavior of the device reflects the hole dynamics in the multiple-quantum-well region. The response of the device to picosecond optical pulses shows strong dependence on bias conditions: from device response determined by minority carrier recombination time (~2 ns) at high base-emitter bias, to current time constant dominated response (~50 ps) at low base-emitter bias. The field dependent escape times of carriers from the quantum wells under different bias conditions are obtained (10-100 ps) and are seen to affect the risetime of the transistor to pulsed photoexcitation     

A low-voltage, high-reflectance-change normally off refractiveGaAs/Al0.2Ga0.8As MQW reflection modulator

We present our optimization of a normally off refractive GaAs/Al _xGa_1-xAs multiple-quantum-well (MQW) reflection modulator with respect to the on/off reflectance change, on/off contrast ratio, and operating voltage. We use optical transfer matrices, theoretically calculated refractive indices, and absorption coefficients to simulate the operation of a normal-incident Fabry-Perot MQW modulator. Our calculations suggest that a normally off refractive GaAs/Al_0.2Ga_0.8As MQW reflection modulator with a reflectance change of 42.9% and an on/off contrast ratio of 1539 for an operating voltage of only 2.44 V can be fabricated by molecular-beam epitaxy (MBE)     

Observation of negative differential resistance inAl0.2Ga0.8As/Al0.4Ga0.6As/GaAs double barrier resonant tunnelling structure

Negative differential resistance has been observed in the current/voltage characteristics of a double barrier resonant tunnelling structure with Al_0.2Ga_0.8As emitters, Al_0.4 Ga_0.6As barriers and GaAs quantum well for the first time. The NDR becomes clear at low temperatures below 77 K, and the current/voltage characteristic is asymmetric. Results demonstrate that high-quality abrupt GaAs-Al_xGa_1-xAs-Al_yGa_1-yAs heterojunctions can be of use in resonant tunnelling structures