Multi-level wordline driver for robust SRAM design in nano-scale CMOS technology

In this paper, a multi-level wordline driver scheme is presented to improve 6T-SRAM read and write stability. The proposed wordline driver generates a shaped pulse during the read mode and a boosted wordline during the write mode. During read, the shaped pulse is tuned at nominal voltage for a short period of time, whereas for the remaining access time, the wordline voltage is reduced to save the power consumption of the cell. This shaped wordline pulse results in improved read noise margin without any degradation in access time for small wordline load. The improvement is explained by examining the dynamic and nonlinear behavior of the SRAM cell. Furthermore, during the hold mode, for a short time (depending on the size of boosting capacitance), wordline voltage becomes negative and charges up to zero after a specific time that results in a lower leakage current compared to conventional SRAM. The proposed technique results in at least 2× improvement in read noise margin while it improves write margin by 3× for lower supply voltages than 0.7 V. The leakage power for the proposed SRAM is reduced by 2% while the total power is improved by 3% in the worst case scenario for an SRAM array. The main advantage of the proposed wordline driver is the improvement of dynamic noise margin with less than 2.5% penalty in area. TSMC 65 nm technology models are used for simulations.     

A 45 nm 2-port 8T-SRAM Using Hierarchical Replica Bitline Technique With Immunity From Simultaneous R/W Access Issues

We propose a new 2-port SRAM with a single read bit line (SRBL) eight transistors (8 T) memory cell for a 45 nm system-on-a-chip (SoC). Access time tends to be slower as a fabrication is scaled down because of threshold voltage (V_t) random variations. A divided read bit line scheme with shared local amplifier (DBSA) realizes fast access time without increasing area penalty. We also show an additional important issue of a simultaneous read and write (R/W) access at the same row by using DBSA with the SRBL-8T cell. A rise of the storage node causes misreading. A read end detecting replica circuit (RER) and a local read bit line dummy capacitance (LDC) are introduced to solve this issue. A 128 bit lines - 512 word lines 64 kb 2-port SRAM macro using these schemes was fabricated by a 45 nm bulk CMOS low-standby-power (LSTP) CMOS process technology [1]. The memory cell size is 0.597 mum². This 2-port SRAM macro achieves 7 times faster access time without misreading.     

A reduced voltage swing circuit using a single supply to enable lower voltage operation for SRAM-based memory

This paper presents a new read and write assist technique to enable lower voltage operation for Static Random Access Memory (SRAM). The ability to scale the operating voltage with frequency of the chip has big impact on power consumption (Pαv²). The lower end of the operating voltage (V_ddmin) for most chips is determined by the stability of the SRAM cell. The new technique uses a contention-free circuit to generate a Reduced Voltage Swing (RVS) on the wordline (VWL) and selectively reduce the supply to the bitcell (V_ddmem) during write. The required VWL and bitcell voltages are programmable and controllable to adapt to performance and yield requirements. An 8 KB memory test-chip was designed to demonstrate this technique in a low-leakage 45 nm process technology. Results show a 7 to 19% improvement in V_ddmin depending on the process corner, which translates into 14–40% reduction on active power. The proposed technique has 4% area overhead and minimal impact to speed.     

Implementation of low-voltage static RAM with enhanced data stability and circuit speed

This paper presents a novel SRAM circuit technique for simultaneously enhancing the cell operating margin and improving the circuit speed in low-voltage operation. During each access, the wordline and cell power node of selected SRAM cells are internally boosted into two different voltage levels. This technique with optimized boosting levels expands the read margin and the write margin to a sufficient amount without an increase of cell size. It also improves the SRAM circuit speed owing to an increase of the cell read-out current. A 256 Kbit SRAM test chip with the proposed technique has been fabricated in a 0.18 μm CMOS logic process. For 0.8 V supply voltage, the design scheme increases the cell read margin by 76%, the cell write margin by 54% and the cell read-out current by three times at the expense of 14.6% additional active power. Silicon measurement eventually confirms that the proposed SRAM achieves nearly 1.2 orders of magnitude reduction in a die bit-error count while operating with 26% faster speed compared with those of conventional SRAM.     

Variation resilient subthreshold SRAM cell design technique

This article presents a circuit technique for designing a variability resilient subthreshold static random access memory (SRAM) cell. The architecture of the proposed cell is similar to the conventional 10T SRAM cell with the exception that dynamic threshold MOS is used for the read/write access FETs and cell content body bias scheme is used for bitline droppers (FETs used to drop bitlines). Moreover, the proposed bitcell utilises single differential port unlike conventional 10T bitcell which utilises dual differential ports. The proposed design offers 2.1× improvement in T _RA (read access time) and 3.2× improvement in T _WA (write access time) compared to CON10T at iso-device-area and 200?mV. It exhibits three roots in its read voltage transfer characteristic (VTC) even at 150?mV showing its ability to function as a bistable circuit. The combination of write and read VTCs for write static noise margin of the proposed design also shows single root signifying its write-ability even at 150?mV. It proves its robustness against process variations by featuring narrower spread in T _RA distribution (by 1.3×) and in T _WA distribution (by 1.2×) at 200?mV.     

Sub-1V embedded SRAM with bit-error immune dual-boosted cell technique

A sub-1 V operating SRAM based on the dual-boosted cell technique is described. For each read/write cycle, the wordline and cell power node of selected SRAM cells are boosted into two different voltage levels. This technique enhances the read static noise margin (SNM) to a sufficient amount without an increase of cell size. It also improves the SRAM circuit speed owing to an increase of the cell readout current. A 0.18 mum 256 kbit SRAM macro has been fabricated with the proposed technique, which demonstrated: 0.8 V operation with 50 MHz while consuming a power of 65 muW/MHz; 400 mV read SNM at 0.8 V power supply; and a reduction by 87% in bit-error rate compared with that of a conventional SRAM     

Low standby leakage 12T SRAM cell characterisation

In this work, a low power and variability-aware static random access memory (SRAM) architecture based on a twelve-transistor (12T) cell is proposed. This cell obtains low static power dissipation due to a parallel global latch (G-latch) and storage latch (S-latch), along with a global wordline (GWL), which offer a high cell ratio and pull-up ratio for reliable read and write operations and a low cell ratio and pull-up ratio during idle mode to reduce the standby power dissipation. In the idle state, only the S-latch stores bits, while the G-latch is isolated from the S-latch and the GWL is deactivated. The leakage power consumption of the proposed SRAM cell is thereby reduced by 38.7% compared to that of the conventional six-transistor (6T) SRAM cell. This paper evaluates the impact of the chip supply voltage and surrounding temperature variations on the standby leakage power and observes considerable improvement in the power dissipation. The read/write access delay, read static noise margin (SNM) and write SNM were evaluated, and the results were compared with those of the standard 6T SRAM cell. The proposed cell, when compared with the existing cell using the Monte Carlo method, shows an appreciable improvement in the standby power dissipation and layout area.     

High Performance Process Variations Aware Technique for Sub-threshold 8T-SRAM Cell

The demand of low power high density integrated circuits is increasing in modern battery operated portable systems. Sub-threshold region of MOS transistors is the most desirable region for energy efficient circuit design. The operating ultra-low power supply voltage is the key design constraint with accurate output performance in sub-threshold region. Degrading of the performance metrics in Static random access memory (SRAM) cell with process variation effects are of major concern in sub-threshold region. In this paper, a bootstrapped driver circuit and a bootstrapped driver dynamic body biasing technique is proposed to assist write operation which improves the write-ability of sub-threshold 8T-SRAM cell under process variations. The bootstrapped driver circuit minimizes the write delay of SRAM cell. The bootstrapped driver dynamic body bias increases the output voltage levels by boosting factor therefore increasing in switching threshold voltage of MOS devices during hold and read operation of SRAM latch. The increment in threshold voltage improves the static noise margin and minimizing the process variation effects. Monte-Carlo simulation results with 3 \(\sigma \) Gaussian distributions show the improvements in write delay by 11.25 %, read SNM by 12.20 % and write SNM by 12.57 % in 8T-SRAM cell under process variations at 32 nm bulk CMOS process technology node.     

A Voltage Scalable 0.26 V, 64 kb 8T SRAM With V$_{min}$ Lowering Techniques and Deep Sleep Mode

A voltage scalable 0.26 V, 64 kb 8T SRAM with 512 cells per bitline is implemented in a 130 nm CMOS process. Utilization of the reverse short channel effect in a SRAM cell design improves cell write margin and read performance without the aid of peripheral circuits. A marginal bitline leakage compensation (MBLC) scheme compensates for the bitline leakage current which becomes comparable to a read current at subthreshold supply voltages. The MBLC allows us to lower ${rm V}_{min}$ to 0.26 V and also eliminates the need for precharged read bitlines. A floating read bitline and write bitline scheme reduces the leakage power consumption. A deep sleep mode minimizes the standby leakage power consumption without compromising the hold mode cell stability. Finally, an automatic wordline pulse width control circuit tracks PVT variations and shuts off the bitline leakage current upon completion of a read operation.      

An Experimental 0.8 V 256‐kbit SRAM Macro with Boosted Cell Array Scheme

This work presents a low‐voltage static random access memory (SRAM) technique based on a dual‐boosted cell array. For each read/write cycle, the wordline and cell power node of selected SRAM cells are boosted into two different voltage levels. This technique enhances the read static noise margin to a sufficient level without an increase in cell size. It also improves the SRAM circuit speed due to an increase in the cell read‐out current. A 0.18 µm CMOS 256‐kbit SRAM macro is fabricated with the proposed technique, which demonstrates 0.8 V operation with 50 MHz while consuming 65 µW/MHz. It also demonstrates an 87% bit error rate reduction while operating with a 43% higher clock frequency compared with that of conventional SRAM.     

一种基于位交错结构的亚阈值10管SRAM单元

提出了一种基于位交错结构的亚阈值10管SRAM单元,实现了电路在超低电压下能稳定地工作,并降低了电路功耗。采用内在读辅助技术消除了读干扰问题,有效提高了低压下的读稳定性。采用削弱单元反馈环路的写辅助技术,极大提高了写能力。该10管SRAM单元可消除半选干扰问题,提高位交错结构的抗软错误能力。在40 nm CMOS工艺下对电路进行了仿真。结果表明,该10管SRAM单元在低压下具有较高的读稳定性和优异的写能力。在0.4 V工作电压下,该10管SRAM单元的写裕度为传统6管单元的14.55倍。     

Variability-aware 7T SRAM circuit with low leakage high data stability SLEEP mode

The design of nanoscale static random access memory (SRAM) circuits becomes increasingly challenging due to the degraded data stability, weaker write ability, increased leakage power consumption, and exacerbated process parameter variations in each new CMOS technology generation. A new asymmetrically ground-gated seven-transistor (7T) SRAM circuit is proposed for providing a low leakage high data stability SLEEP mode in this paper. With the proposed asymmetrical 7T SRAM cell, the data stability is enhanced by up to 7.03x and 2.32x during read operations and idle status, respectively, as compared to the conventional six-transistor (6T) SRAM cells in a 65 nm CMOS technology. A specialized write assist circuitry is proposed to facilitate the data transfer into the new 7T SRAM cells. The overall electrical quality of a 128-bit×64-bit memory array is enhanced by up to 74.44x and 13.72% with the proposed asymmetrical 7T SRAM cells as compared to conventional 6T and 8T SRAM cells, respectively. Furthermore, the new 7T SRAM cell displays higher data stability as compared to the conventional 6T SRAM cells and wider write voltage margin as compared to the conventional 8T SRAM cells under the influence of both die-to-die and within-die process parameter fluctuations.     

A 0.2 V, 480 kb Subthreshold SRAM With 1 k Cells Per Bitline for Ultra-Low-Voltage Computing

A 2 muW, 100 kHz, 480 kb subthreshold SRAM operating at 0.2 V is demonstrated in a 130 nm CMOS process. A 10-T SRAM cell allows 1 k cells per bitline by eliminating the data-dependent bitline leakage. A virtual ground replica scheme is proposed for logic "0" level tracking and optimal sensing margin in read buffers. Utilizing the strong reverse short channel effect in the subthreshold region improves cell writability and row decoder performance due to the increased current drivability at a longer channel length. The sizing method leads to an equivalent write wordline voltage boost of 70 mV and a delay improvement of 28% in the row decoder compared to the conventional sizing scheme at 0.2 V. A bitline writeback scheme was used to eliminate the pseudo-write problem in unselected columns.     

MRAM Cell Technology for Over 500-MHz SoC

This paper describes newly developed magnetic random access memory (MRAM) cell technology suitable for high-speed memory macros embedded in next-generation system LSIs: a two-transistor one-magnetic tunneling junction (2T1MTJ) cell structure, a write-line-inserted MTJ, and a 5T2MTJ cell structure. The 2T1MTJ cell structure makes it possible to significantly improve the write margin and accelerate the operating speed to 200 MHz. Its high compatibility with SRAM specifications and its wide write margin were confirmed by measuring 2T1MTJ MRAM test chips. Although the cell structure requires a small-writing-current MTJ, the current can be reduced to 1mA using the newly developed write-line-inserted MTJ. Further development to reduce the current down to 0.5 mA is required to obtain a cell area of 1.9 mum², which is smaller than the SRAM cell area, in the 0.13-mum CMOS process. The 5T2MTJ cell structure also enables random-access operation over 500 MHz because the sensing signal is amplified in each cell. Random access time of less than 2 ns can be achieved with SPICE simulation when the magnetic resistance is 5 kOmega and the magnetoresistive (MR) ratio is more than 70%     

A 220 mV robust read-decoupled partial feedback cutting based low-leakage 9T SRAM for Internet of Things (IoT) applications

In this work, a 9T subthreshold SRAM cell is proposed with the reduced leakage power and improved stability against the PVT variations. The proposed cell employs the read decoupling to improve the read stability, and the partial feedback cutting approach to control the leakage power with improved read/write ability. The incorporated stacking effect further improves the leakage power. The simulated leakage power for the proposed cell is 0.61×, 0.49×, 0.80× and 0.55×, while the read static noise margin (RSNM) is 2.5×, 1×, 1.05× and 0.96×, write static noise margin (WSNM) 0 is 1.5×, 1.8×, 1.68× and 1.9× and WSNM 1 is 0.95×, 1.2×, 1.05×, and 1.2× at 0.4 V when compared with the conventional 6T and state of arts (single ended 6T, PPN based 10T and data aware write assist (DAWA) 12T SRAM architectures) respectively. The minimum supply voltage at which this cell can successfully operate is 220 mV. A 4 Kb memory array has also been simulated using proposed cell and it consumes 0.63×, 0.67× and 0.63× less energy than 6T during read, write 1 and write 0 operations respectively for supply voltage of 0.3 V.     

PVT-aware leakage reduction for on-die caches with improved read stability

Effectiveness of previous SRAM leakage reduction techniques vary significantly as the leakage variation gets worse with process and temperature fluctuation. This paper proposes a simple circuit technique that adaptively trades off overhead energy for maximum leakage savings under severe leakage variations. The proposed run-time leakage reduction technique for on-die SRAM caches considers architectural access behavior to determine how often the SRAM blocks should enter a sleep mode. A self-decay circuit generates a periodic sleep pulse with an adaptive pulse period, which puts the SRAM array into a sleep mode more frequently at high leakage conditions (fast process, high temperature) and vice versa. An 0.18-/spl mu/m 1.8-V 16-kbyte SRAM testchip shows 94.2% reduction in SRAM cell leakage at a performance penalty less than 2%. Measurement results also indicate that our proposed memory cell improves SRAM static noise margin by 25%.     

Variability aware low leakage reliable SRAM cell design technique

This paper presents a technique for designing a low power SRAM cell. The cell achieves low power dissipation due to its series connected drivers driven by bitlines and read buffers which offer stack effect. The paper investigates the impact of process, voltage, and temperature (PVT) variations on standby leakage and finds appreciable improvement in power dissipation. It also estimates read/write delay, read stability, write-ability, and compares the results with that of standard 6T SRAM cell. The comparative study based on Monte Carlo simulation exhibits appreciable improvement in leakage power dissipation and other design metrics at the expense of 84% area overhead.     

Design of a single-ended energy efficient data-dependent-write-assist dynamic (DDWAD) SRAM cell for improved stability and reliability

A data-dependent write-assist dynamic (DDWAD) SRAM cell is proposed to reduce the power consumption and enhance the relaibility against process, voltage, temperature variation and aging effect under static stress. The cell has distinct read and write circuits with single bit line for respective operations which improve the read stability. In the cell, write operation is performed using separate write signal WS instead of wordline WL. The write signal WS is introduced to reduce the discharging actvity at the write bit line BL to reduce the dynamic power consumption. The latch property of the cell is disabled during write operation to flip the data faster at the storage nodes. The proposed design approach provides high immunity to the data-dependent bit line leakage and results in lower voltage drop on BL, lower leakage current and lower parasitic capacitance. The proposed cell consumes approximately 60.4 % lower write power and 52.8 % read power compared to the other cells. The storage node does not float during read operation and thus cell is not sensitive to any positive noise. The data in the cell can be maintained even if the power supply is reduced to 300 mV.     

A 3.8 GHz 153 Mb SRAM Design With Dynamic Stability Enhancement and Leakage Reduction in 45 nm High-k Metal Gate CMOS Technology

A high-performance low-power 153 Mb SRAM is developed in 45 nm high-k Metal Gate technology. Dynamic SRAM PMOS forward-body-bias (FBB) and Active-Controlled SRAM VCC in Sleep are integrated in the design to lower Active-VCCmin and Standby Leakage, respectively. FBB improves the Active-VCCmin by up to 75 mV, and Active-Controlled SRAM VCC distribution tightened by 100 mV, both of which result in further power reduction. A 0.346 mum² 6T-SRAM bit-cell is used which is optimized for VCCmin, performance, leakage and area. The design operates at high-speed over a wide voltage range, and has a maximum frequency of 3.8 GHz at 1.1 V. The 16 KB Subarray was also used as the building block in on-die 6 MB Cache for Intel Core 2 Duo CPU in 45 nm technology.     

A 1.1 GHz 12 μA/Mb-Leakage SRAM Design in 65 nm Ultra-Low-Power CMOS Technology With Integrated Leakage Reduction for Mobile Applications

A low-power, high-speed SRAM macro is designed in a 65 nm ultra-low-power (ULP) logic technology for mobile applications. The 65 nm strained silicon technology improves transistor performance/leakage tradeoff, which is essential to achieve fast SRAM access speed at substantially low operating voltage and standby leakage. The 1 Mb SRAM macro features a 0.667 mum² low-leakage memory cell and can operate over a wide range of supply voltages from 1.2 V to 0.5 V. It achieves operating frequency of 1.1 GHz and 250 MHz at 1.2 V and 0.7 V, respectively. The SRAM leakage is reduced to 12 muA/Mb at the data retention voltage of 0.5 V. The measured bitcell leakage from the SRAM array is ~2 pA/bit at retention voltage with integrated leakage reduction schemes.