Preface to Special Issue on Towards High Performance Ga2O3 Electronics:Power Devices and DUV Optoelectronic Devices(Ⅱ)

<正>Gallium oxide(Ga₂O₃) has garnered world-wide attention as an ultrawide-bandgap semiconductor material from the area of power electronics and DUV optical devices benefiting from its outstanding electronic and optoelectronic properties. For one thing, since Ga₂O₃ features high critical breakdown field of 8 MV/cm and Baliga’s figure of merit(BFOM) of 3444, it is a promising candidate for advanced high-power applications. For another thing,     

Recent advances in NiO/Ga2O3 heterojunctions for power electronics

Beta gallium oxide(β-Ga₂O₃) has attracted significant attention for applications in power electronics due to its ultrawide bandgap of ～ 4.8 eV and the large critical electric field of 8 MV/cm. These properties yield a high Baliga’s figures of merit(BFOM) of more than 3000. Though β-Ga₂O₃ possesses superior material properties, the lack of p-type doping is the main obstacle that hinders the development of β-Ga₂O₃-based power device...     

Heterogeneous integration technology for the thermal management of Ga2O3 power devices

<正>The more severe phonon-phonon scattering in gallium oxide(Ga₂O₃) crystals leads to lower thermal conductivity compared to most other semiconductor materials. To address this issue and enhance the heat dissipation in Ga₂O₃ devices, one practical solution is to integrate Ga₂O₃ with a highly thermally conductive substrate, such as SiC and Si. Currently,there are three methods employed for the heterogeneous integration of Ga<...     

Improvement of Ga2O3 vertical Schottky barrier diode by constructing NiO/Ga2O3 heterojunction

The high critical electric field strength of Ga₂O₃ enables higher operating voltages and reduced switching losses in power electronic devices. Suitable Schottky metals and epitaxial films are essential for further enhancing device performance.In this work, the fabrication of vertical Ga₂O₃ barrier diodes with three different barrier metals was carried out on an n–-Ga₂O₃homogeneous epitaxial film deposited on an n+-β-Ga₂...     

Vertical β-Ga2O3 power electronics

<正>β-Ga₂O₃ possesses a highly promising critical electric field of 8 MV/cm, allowing devices with improved performance compared with other wide bandgap materials^{[1, 2]}. The 4-inch wafers grown from a melt and over 10 μm of the epitaxial layers grown by Halide vapor phase epitaxy(HVPE) with highly controllable doping concentration, are commercially available, paving the way of vertical power devices.     

A comprehensive review of recent progress on enhancement-mode β-Ga2O3 FETs: Growth,devices and properties

Power electronic devices are of great importance in modern society. After decades of development, Si power devices have approached their material limits with only incremental improvements and large conversion losses. As the demand for electronic components with high efficiency dramatically increasing, new materials are needed for power device fabrication. Betaphase gallium oxide, an ultra-wide bandgap semiconductor, has been considered as a promising candidate, and various β-Ga₂O_...     

Plasma-Enhanced Atomic Layer Deposition of Amorphous Ga2O3 for Solar-Blind Photodetection

Wide-bandgap gallium oxide(Ga₂O₃) is one of the most promising semiconductor materials for solar-blind(200 nm to 280 nm) photodetection. In its amorphous form, amorphous gallium oxide(a-Ga₂O₃) maintains its intrinsic optoelectronic properties while can be prepared at a low growth temperature, thus it is compatible with Si integrated circuits(ICs) technology. Herein, the a-Ga₂O₃ film is directly deposited on pre-fabricated Au inter...     

亚稳相Ga2O3异质外延的研究进展

作为一种新兴的超宽禁带半导体材料,氧化镓(Ga₂O₃)被认为是下一代高功率电力电子器件领域的战略性先进电子材料。相较于热稳定的β-Ga₂O₃,亚稳相Ga₂O₃表现出更为新颖的物理性质,逐渐受到关注。通过异质外延生长高质量的亚稳相Ga₂O₃单晶薄膜是实现亚稳相Ga₂O₃基功率电子、微波射频和深紫外光电信息感知器件的重要前提。重点阐述了亚稳相Ga₂O₃的晶体结构、电子能带结构以及相关物理性质,总结了近年来亚稳相Ga₂O₃异质外延和能带工程的研究进展,并对未来亚稳相Ga₂O₃材料和器件的发展趋势进行了展望。     

用于非易失性相变存储器中Si2Sb2Te5在CF4/Ar等离子体下的反应离子刻蚀

Phase change random access memory（PCRAM） is one of the best candidates for next generation nonvolatile memory,and phase change Si₂Sb₂Te₅ material is expected to be a promising material for PCRAM.In the fabrication of phase change random access memories,the etching process is a critical step.In this paper,the etching characteristics of Si₂Sb₂Te₅ films were studied with a CF₄/Ar gas mixture using a reactive ion etching system.We observed a monotonic decrease in etch rate with decreasing CF4 concentration,meanwhile,Ar concentration went up and smoother etched surfaces were obtained.It proves that CF4 determines the etch rate while Ar plays an important role in defining the smoothness of the etched surface and sidewall edge acuity.Compared with Ge₂Sb₂Te₅, it is found that Si₂Sb₂Te₅ has a greater etch rate.Etching characteristics of Si₂Sb₂Te₅ as a function of power and pressure were also studied.The smoothest surfaces and most vertical sidewalls were achieved using a CF₄/Ar gas mixture ratio of 10/40,a background pressure of 40 mTorr,and power of 200 W.     

Preparation of Sn-doped Ga2O3 thin films and their solar-blind photoelectric detection performance

Sn doping is an effective way to improve the response rate of Ga₂O₃ film based solar-blind detectors. In this paper,Sn-doped Ga₂O₃ films were prepared on a sapphire substrate by radio frequency magnetron sputtering. The films were characterized by X-ray diffraction, scanning electron microscopy, X-ray photoelectron spectroscopy and ultraviolet visible spectroscopy, and the effect of annealing atmosphere on the properties of films was studied. The Ga     

阳极刻蚀提升Ga2O3肖特基势垒二极管击穿特性

提出了一种采用阳极刻蚀提升Ga₂O₃肖特基势垒二极管(SBD)击穿特性的新方法。基于氢化物气相外延(HVPE)法生长的Ga₂O₃材料制备了Ga₂O₃纵向SBD。在完成阳极制备后，对阳极以外的Ga₂O₃漂移区进行了不同深度的刻蚀，刻蚀完成后，在器件表面生长了SiO₂介质层，随后制备了场板结构。测试结果显示，刻蚀后器件的比导通电阻小幅上升，而反向击穿电压均大幅提升。刻蚀深度为300 nm的β-Ga₂O₃ SBD具有最优特性，其比导通电阻(R_{on, sp})为2.5 mΩ·cm²,击穿电压(V_br)为1 410 V,功率品质因子(FOM)为795 MW/cm²。该研究为高性能Ga₂O₃ SBD的制备提供了一种新方法。     

Influence of window layer thickness on double layer antireflection coating for triple junction solar cells

The optimization of a SiO₂/TiO₂,SiO₂/ZnS double layer antireflection coating（ARC）on Ga_0.5In_0.5P/In_0.02Ga_0.98As/Ge solar cells for terrestrial application is discussed.The Al_0.5In_0.5P window layer thickness is also taken into consideration.It is shown that the optimal parameters of double layer ARC vary with the thickness of the window layer.     

具有界面依赖光致发光的双层WS2/Ga2O3异质结的能带工程(英文)

利用垂直WS₂/Ga₂O₃异质结构中异质界面诱导了反常的光致发光(PL)发射。垂直堆栈的WS₂/Ga₂O₃异质界面使其形成了II型能带结构,导致与Ga₂O₃层接触的底层WS₂的PL强度下降。而异质界面的强耦合作用也影响了双层WS₂中的同质层间相互作用,使得上层WS₂出现反常的PL增强。这种堆栈新型二维异质结构为定制目标能带结构并控制其光子和电子行为提供一种新的手段。     

Homoepitaxial growth of (100) Si-doped β-Ga2O3 films via MOCVD

Homoepitaxial growth of Si-doped β-Ga₂O₃ films on semi-insulating(100) β-Ga₂O₃ substrates by metalorganic chemical vapor deposition(MOCVD) is studied in this work. By appropriately optimizing the growth conditions, an increasing diffusion length of Ga adatoms is realized, suppressing 3D island growth patterns prevalent in(100) β-Ga₂O₃ films and optimizing the surface morphology with [010] oriented stripe features. The slightly Si-...     

Elaboration and characterization of a KCl single crystal doped with nanocrystalsof a Sb2O3 semiconductor

Undoped and doped KCl single crystals have been successfully elaborated via the Czochralski（Cz） method.The effects of dopant Sb₂O₃ nanocrystals on structural and optical properties were investigated by a number of techniques,including X-ray diffraction（XRD）,scanning electron microscopy（SEM）,energy dispersive X-ray（EDAX） analysis,UV-visible and photoluminescence（PL） spectrophotometers.An XRD pattern of KCl:Sb₂O₃ reveals that the Sb₂O₃ nanocrystals are in the well-crystalline orthorhombic phase.The broadening of diffraction peaks indicated the presence of a Sb₂O₃ semiconductor in the nanometer size regime.The shift of absorption and PL peaks is observed near 334 nm and 360 nm respectively due to the quantum confinement effect in Sb₂O₃ nanocrystals.Particle sizes calculated from XRD studies agree fairly well with those estimated from optical studies.An SEM image of the surface KCl:Sb₂O₃ single crystal shows large quasi-spherical of Sb₂O₃ crystallites scattered on the surface.The elemental analysis from EDAX demonstrates that the KCl:Sb₂O₃ single crystal is slightly rich in oxygen and a source of excessive quantities of oxygen is discussed.     

一种应用于能量攫取系统的低功耗的工作于亚阈值区域的基准电压源的设计

We propose a bandgap reference, which works in sub-threshold regions to the reduce power consumption in applications such as those in energy harvesting systems that stimulate the development of power management for low power consumption applications.Measurements shows that the supply current of the proposed bandgap reference is only 6.87 μA, including a voltage buffer consuming 3.6 μA of supply current, when the supply voltage is 5 V.The supply voltage can vary from 3 to 11 V and the line regulation of the proposed bandgap reference output voltage is 0.875 mV/V at room temperature.The temperature coefficiency is 88.9 ppm from 10 to 100° C when the supply voltage is 5 V.     

2.83-kV double-layered NiO/β-Ga2O3 vertical p-n heterojunction diode with a power figure-of-merit of 5.98 GW/cm2

This work demonstrates high-performance NiO/β-Ga₂O₃ vertical heterojunction diodes(HJDs) with double-layer junction termination extension(DL-JTE) consisting of two p-typed NiO layers with varied lengths. The bottom 60-nm p-NiO layer fully covers the β-Ga₂O₃ wafer, while the geometry of the upper 60-nm p-NiO layer is 10 μm larger than the square anode electrode. Compared with a single-layer JTE, the electric field concentration is inhibited by double-la...     

Electronic structure and optical properties of F-doped β-Ga2O3 from first principles calculations

The effects of F-doping concentration on geometric structure, electronic structure and optical property of β-Ga₂O₃ were investigated. All F-doped β-Ga₂O₃ with different concentrations are easy to be formed under Ga-rich conditions, the stability and lattice parameters increase with the F-doping concentration. F-doped β-Ga₂O₃ materials display characteristics of the n-type semiconductor, occupied states contributed from Ga 4s, Ga 4p and O 2p states in the conduction band increase with an increase in F-doping concentration. The increase of F concentration leads to the narrowing of the band gap and the broadening of the occupied states. F-doped β-Ga₂O₃ exhibits the sharp band edge absorption and a broad absorption band. Absorption edges are blue-shifted, and the intensity of broad band absorption has been enhanced with respect to the fluorine content. The broad band absorption is ascribed to the intra-band transitions from occupied states to empty states in the conduction band.     

软抛光垫条件下非晶态Ge2Sb2Te5的化学机械抛光

Chemical mechanical planarization（CMP） of amorphous Ge₂Sb₂Te₅（a-GST） is investigated using two typical soft pads（politex REG and AT） in acidic slurry.After CMP,it is found that the removal rate（RR） of a-GST increases with an increase of runs number for both pads.However,it achieves the higher RR and better surface quality of a-GST for an AT pad.The in-situ sheet resistance（R_s） measure shows the higher R_s of a-GST polishing can be gained after CMP using both pads and the high R_s is beneficial to lower the reset current for the PCM cells. In order to find the root cause of the different RR of a-GST polishing with different pads,the surface morphology and characteristics of both new and used pads are analyzed,it shows that the AT pad has smaller porosity size and more pore counts than that of the REG pad,and thus the AT pad can transport more fresh slurry to the reaction interface between the pad and a-GST,which results in the high RR of a-GST due to enhanced chemical reaction.     

磁控溅射工作压强对β-Ga2O3薄膜特性的影响

作为新兴的第三代半导体材料,β-Ga₂O₃高质量薄膜是制备高效Ga₂O₃基器件的基础,β-Ga₂O₃薄膜的制备、表征及光电特性的研究具有深刻的意义。通过分析研究磁控溅射工作压强变化对薄膜性能和形貌的影响,为制备更高质量的薄膜提供了一种新的方法。基于射频磁控溅射方法,在单晶c面蓝宝石(Al₂O₃)衬底上沉积生长Ga₂O₃薄膜,并进行900℃、90min的氮气退火处理,以得到β-Ga₂O₃薄膜。沉积过程不改变其他实验参数,仅改变工作压强,研究工作压强对β-Ga₂O₃薄膜特性的影响。X射线衍射仪(XRD)和原子力显微镜(AFM)表征结果显示,β-Ga₂O₃薄膜具有不同取向的衍射峰,沿着■晶向择优生长,薄膜呈多晶状态。适当增大工作压强可使β-Ga<...