氮化ZnO/Ga2O3薄膜合成GaN纳米管

利用射频磁控溅射法在Si(111)衬底上先溅射ZnO中间层,接着溅射Ga2O3 薄膜,然后ZnO/Ga2O3薄膜在管式炉中常压下通氨气进行氮化,高温下ZnO层在氨气的气氛中挥发,而Ga2O3薄膜和氨气反应合成出GaN纳米管.X射线衍射(XRD)测量结果表明利用该方法制备的GaN具有沿c轴方向择优生长的六角纤锌矿结构.利用傅里叶红外光谱(FTIR)研究了所制备样品的光学性质.利用透射电子显微镜(TEM)和选区电子衍射(SAED)观测了样品的形貌和晶格结构.     

Piezo‐Phototronic Matrix via a Nanowire Array

Piezoelectric semiconductors, such as ZnO and GaN, demonstrate multiproperty coupling effects toward various aspects of mechanical, electrical, and optical excitation. In particular, the three‐way coupling among semiconducting, photoexcitation, and piezoelectric characteristics in wurtzite‐structured semiconductors is established as a new field, which was first coined as piezo‐phototronics by Wang in 2010. The piezo‐phototronic effect can controllably modulate the charge‐carrier generation, separation, transport, and/or recombination in optical‐electronic processes by modifying the band structure at the metal–semiconductor or semiconductor–semiconductor heterojunction/interface. Here, the progress made in using the piezo‐phototronic effect for enhancing photodetectors, pressure sensors, light‐emitting diodes, and solar cells is reviewed. In comparison with previous works on a single piezoelectric semiconducting nanowire, piezo‐phototronic nanodevices built using nanowire arrays provide a promising platform for fabricating integrated optoelectronics with the realization of high‐spatial‐resolution imaging and fast responsivity.     

Fabrication and structure properties of GaN nanowires by ammoniating Ga2O3 films

The GaN nanowires were successfully synthesized on Si(111) substrates by ammoniating the Ga₂O₃/ZnO films at 900 °C. The structure and morphology of the as-prepared GaN nanowires were studied by X-ray diffraction (XRD), Fourier transform infrared spectrum (FTIR), scanning electron microscopy (SEM) and field-emission transmission electron microscopy (FETEM). The results show that the single-crystal GaN nanowires have a hexagonal wurtzite structure with lengths of about several micrometers and diameters ranging from 30 nm to 120 nm, which are conducive to the application of nanodevices. Finally, the growth mechanism is also briefly discussed.     

Effect of ammoniating temperature on morphologic and optical properties of GaN nanostructured materials

GaN nanostructured materials have been obtained on Si(111) substrates by ammoniating the Ga₂O₃/ZnO films at different temperature in a quartz tube. X-ray diffraction (XRD), Scanning electron microscope (SEM), and photoluminescence (PL) are used to analyze the structure, morphology and optical properties of GaN nanostructured films. The results show that their properties are investigated particularly as a function of ammoniating temperature. The optimally ammoniating temperature of Ga₂O₃ layer is 950 °C for the growth of GaN nanorods. These nanorods are pure hexagonal GaN wurtzite structure with lengths of about several micrometers and diameters of about 200 nm, which is conducive to the application of nanodevices. Finally, the growth mechanism is also briefly discussed.     

Advances in ion beam modification of semiconductors

This review provides an overview of the current status of ion-implantation research in silicon, germanium and the compound semiconductors SiC, GaN and ZnO. The discussion of silicon includes recent developments in metrology and device simulation, as well as a brief discussion of emerging applications in photovoltaics and quantum electronics. That of Ge includes a more detailed overview of doping, radiation damage and annealing processes due to the renewed research interest in this material. Finally, the discussion of compound semiconductors focuses on the newer wide bandgap materials where there are remaining implantation issues to be solved and potentially new implantation applications emerging.     

Zinc oxide micro- and nanoparticles: Synthesis, structure and optical properties

Zinc oxide (ZnO) spherical nanoparticles (SNPs) and bitter-melon-like (BML) microparticles were synthesized by a hydrothermal route using a zinc (Zn) plate as a source and substrate at various synthesis conditions. The structural analysis confirmed the formation of ZnO with hexagonal wurtzite phase on the hexagonal Zn substrate with growth of the ZnO microparticles along the [1 0 1] direction. The UV-vis absorption spectra of the ZnO microparticles indicated absorption peaks in the UV region which can be attributed to the band gap of ZnO. The room temperature photoluminescence (PL) of the ZnO microparticles exhibited a broad emission band, which is fitted with four Gaussian peaks and were assigned to transitions involving free excitons and various defect centers. The growth model for the formation of ZnO micro- and nanoparticles is presented.     

Sol-gel synthesis, structure and magnetic properties of Mn-doped ZnO diluted magnetic semiconductors

2.5, 5, 10 and 15% Mn-doped ZnO diluted magnetic semiconductors (DMSs) were prepared via an ethyl acetoacetate-aided sol-gel process. The 5% Mn-doped ZnO consists of 20-50 nm spheroid-like particles and has a wurtzite phase. Existence of nanoscale ZnMnO₃ clusters in this sample is confirmed by HRTEM analysis. Vegard's law calculation reveals that about 2.6% Mn atoms have been incorporated into ZnO lattice. Besides major wurtzite phase, ZnMnO₃ secondary phase is observed in the 10% and 15% Mn-doped samples. The Mn-doped ZnO shows red shift of photoluminescence (PL), which arises from defects caused by Mn incorporation. The magnetic measurements confirm that the 2.5% and 5% Mn-doped ZnO samples display room-temperature ferromagnetism as well as paramagnetism, while the 10% and 15% samples exhibit paramagnetic effects. The as-observed ferromagnetic behaviors likely originate from cooperative effect of intrinsic and extrinsic magnetisms.     

硅基正六边形氮化镓纳米颗粒薄膜的制备,结构和形貌特性

本文通过在ZnO/Si(111)衬底上,利用JCK-500A型射频磁控溅射系统溅射氧化镓靶得到氧化镓薄膜.然后将硅基Ga2O3置于管武石英炉中,在850℃的氨化温度下氨化15min后,成功制备出GaN薄膜,该薄膜由正六边形的晶粒组成.X射线衍射(XRD)表明GaN具有六方纤锌矿结构,晶格常数为a=0.318nm和c=0.518nm.X射线光电子能谱(XPS)的测试确定了样品中Ga-N键的形成,并且Ga和N的化学计量比为1:1.用扫描电镜(SEM)和原子力显微镜(AFM)观察发现,样品表面非常光滑和平整.透射电镜(TEM)表明薄膜由正六边形晶粒组成.选区电子衍射(SAED)进一步验证了GaN薄膜的六方纤锌矿结构.最后,简单地讨论了其生长机制.     

Progress in Piezo‐Phototronic‐Effect‐Enhanced Light‐Emitting Diodes and Pressure Imaging

Wurtzite materials exhibit both semiconductor and piezoelectric properties under strains due to the non‐central symmetric crystal structures. The three‐way coupling of semiconductor properties, piezoelectric polarization and optical excitation in ZnO, GaN, CdS and other piezoelectric semiconductors leads to the emerging field of piezo‐phototronics. This effect can efficiently manipulate the emission intensity of light‐emitting diodes (LEDs) by utilizing the piezo‐polarization charges created at the junction upon straining to modulate the energy band diagrams and the optoelectronic processes, such as generation, separation, recombination and/or transport of charge carriers. Starting from fundamental physics principles, recent progress in piezo‐phototronic‐effect‐enhanced LEDs is reviewed; following their development from single‐nanowire pressure‐sensitive devices to high‐resolution array matrices for pressure‐distribution mapping applications. The piezo‐phototronic effect provides a promising method to enhance the light emission of LEDs based on piezoelectric semiconductors through applying static strains, and may find perspective applications in various optoelectronic devices and integrated systems.     

Selective MOCVD growth of ZnO nanotips

ZnO is a wide bandgap semiconductor with a direct bandgap of 3.32eV at room temperature. It is a candidate material for ultraviolet LED and laser. ZnO has an exciton binding energy of 60 meV, much higher than that of GaN. It is found to be significantly more radiation hard than Si, GaAs, and GaN, which is critical against wearing out during field emission. Furthermore, ZnO can also be made as transparent and highly conductive, or piezoelectric. ZnO nanotips can be grown at relatively low temperatures, giving ZnO a unique advantage over the other nanostructures of wide bandgap semiconductors, such as GaN and SiC. In the present work, we report the selective growth of ZnO nanotips on various substrates using metalorganic chemical vapor deposition. ZnO nanotips grown on various substrates are single crystalline, n-type conductive and show good optical properties. The average size of the base of the nanotips is 40 nm. The room temperature photoluminescence peak is very intense and sharp with a full-width-half-maximum of 120 meV. These nanotips have potential applications in field emission devices, near-field microscopy, and UV photonics.     

Charge influence and growth mechanism of ZnO nanorods

We demonstrate the influence of charges near the substrate surface on vertically aligned ZnO nanorod growth. ZnO nanorods were fabricated on n-type GaN with and without H+ treatments by catalyst-free metal-organic chemical vapor deposition. The ZnO nanorods grown on n-GaN films were vertically well-aligned and had a well-ordered wurtzite structure. However, the ZnO did not form into nanorods and the crystal quality was very degraded as they were deposited on the H+ treated n-GaN films. The charge influence was also observed in the ZnO nanorod growth on sapphire substrates. These results implied that the charges near the substrate surface dominantly affected on the crystalization and formation of ZnO nanorods.     

Charge influence and growth mechanism of ZnO nanorods

We demonstrate the influence of charges near the substrate surface on vertically aligned ZnO nanorod growth. ZnO nanorods were fabricated on n-type GaN with and without H+ treatments by catalyst-free metal-organic chemical vapor deposition. The ZnO nanorods grown on n-GaN films were vertically well-aligned and had a well-ordered wurtzite structure. However, the ZnO did not form into nanorods and the crystal quality was very degraded as they were deposited on the H+ treated n-GaN films. The charge influence was also observed in the ZnO nanorod growth on sapphire substrates. These results implied that the charges near the substrate surface dominantly affected on the crystallization and formation of ZnO nanorods.     

Au-N共掺杂ZnO电子结构和光学性质的第一性原理研究

采用基于密度泛函理论的第一性原理平面波超软赝势法,结合广义梯度近似(GGA)研究了Au、N共掺杂纤锌矿ZnO的能带结构、电子态密度,以及复介电函数、光学吸收等光学性质,并与本征ZnO和N掺杂ZnO情况进行了对比.计算结果表明Au、N共掺杂ZnO仍是直接带隙半导体材料,掺杂后ZnO的带隙收缩,价带展宽.在价带顶电子密度分布较N掺杂ZnO情况的局域性减弱,更有利于获得p型ZnO.与未掺杂ZnO相比,介电函数和吸收系数在可见和紫外区域得到显著增强.     

Structural, optical and magnetic properties of Co-doped ZnO nanorods with hidden secondary phases

Co-doped ZnO nanorods (composition: Zn(0.955)Co(0.045)O) were grown by a simple surfactant-assisted hydrothermal technique. The morphological, structural, optical and magnetic properties of the as-prepared nanorods were investigated by means of scanning electron microscopy, high-resolution transmission electron microscopy, x-ray diffraction, x-ray photoelectron spectroscopy, micro-Raman spectroscopy, micro-cathodoluminescence, and vibrating sample magnetometry (VSM). The results showed that the sample had rod-like morphology and that the preferential growth direction was along the c axis. While Co was successfully doped into the ZnO wurtzite lattice structure as revealed by several characterization techniques, hidden secondary phases of Zn(y)Co(3-y)O(4) (0≤y≤1) were also clearly detected by the micro-Raman spectroscopic technique. We propose that the predominant diffusion-limited Ostwald ripening crystal growth mechanism under the hydrothermal coarsening yielded such phase segregation. VSM results showed that the nanorods displayed relatively weak room-temperature ferromagnetism. We suggest that the origin of the ferromagnetism is probably due to the presence of the mixed cation valence of Co via a d-d double-exchange mechanism rather than the real doping effect. It is essential to control the crystal growth mechanism and defect states associated with the ferromagnetism in order to realize the intrinsic diluted magnetic semiconductors.     

Comparison of wurtzite and zinc blende III–V nitrides field effect transistors: a 2D Monte Carlo device simulation

An ensemble Monte Carlo method is used to compare the potentialities of zinc blende and wurtzite GaN for field effect transistor applications. First, bulk material electron transport properties are compared and we find that mobility, steady state velocity and velocity overshoot are at the advantage of zinc blende GaN. Then, zinc blende GaN and wurtzite GaN MESFET with very short gate length (L_g=0.12 μm) are investigated using a 2D Monte Carlo device simulation. A 50% gain in performance is obtained for the zinc blende GaN MESFET as compared with the wurtzite one. A zinc blende AlGaN/GaN HEMT is also simulated and exhibits a current density of 900 mA mm⁻¹, a transconductance of 480 mS mm⁻¹ and a cut-off frequency of 180 GHz.     

Optical properties of GaN epilayers grown on Si (111) and Si (001) substrates

We report the observation of bright photoluminescence (PL) emission from two types of GaN epilayers grown by molecular beam epitaxy (MBE). Wurtzite phase GaN/Si (111) epilayers are grown by gas source MBE process, whereas cubic phase GaN epilayers are grown on (001) Si covered by thin SiC film in the process of Si annealing in propane prior to the GaN growth. PL emissions are identified based on the results of detailed PL and time-resolved PL investigations. For the wurtzite phase GaN we observe an efficient up in the energy transfer from bound to free excitons. This process is explained by a large difference in the PL decay times for two types (free and bound (donor, acceptor)) of excitonic PL emissions. For cubic phase GaN we confirm recent suggestion that acceptors have smaller thermal ionization energies than those in the wurtzite phase GaN.     

Catalytic synthesis of large-scale GaN nanorods

A novel rare earth metal seed was employed as the catalyst for the growth of GaN nanorods. Large-scale GaN nanorods were synthesized successfully through ammoniating Ga₂O₃/Tb films sputtered on Si(1 1 1) substrates. Scanning electron microscopy, X-ray diffraction, transmission electron microscopy, high-resolution transmission electron microscopy, and X-ray photoelectron spectroscopy were used to characterize the structure, morphology, and composition of the samples. The results demonstrate that the nanorods are high-quality single-crystal GaN with hexagonal wurtzite structure. The growth mechanism of GaN nanorods is also discussed.     

Self-assembled GaN nanowires on diamond

We demonstrate the nucleation of self-assembled, epitaxial GaN nanowires (NWs) on (111) single-crystalline diamond without using a catalyst or buffer layer. The NWs show an excellent crystalline quality of the wurtzite crystal structure with m-plane faceting, a low defect density, and axial growth along the c-axis with N-face polarity, as shown by aberration corrected annular bright-field scanning transmission electron microscopy. X-ray diffraction confirms single domain growth with an in-plane epitaxial relationship of (10 ?10)(GaN) [parallel] (01 ?1)(Diamond) as well as some biaxial tensile strain induced by thermal expansion mismatch. In photoluminescence, a strong and sharp excitonic emission reveals excellent optical properties superior to state-of-the-art GaN NWs on silicon substrates. In combination with the high-quality diamond/NW interface, confirmed by high-resolution transmission electron microscopy measurements, these results underline the potential of p-type diamond/n-type nitride heterojunctions for efficient UV optoelectronic devices.     

Chemical vapor synthesis of size-selected zinc oxide nanoparticles

ZnO can be regarded as one of the most important metal oxide semiconductors for future applications. Similar to silicon in microelectronics, it is not only important to obtain nanoscale building blocks of ZnO, but also extraordinary purity has to be ensured. A new gas-phase approach to obtain size-selected, nanocrystalline ZnO particles is presented. The tetrameric alkyl-alkoxy zinc compound [CH(3)ZnOCH(CH(3))(2)](4) is chemically transformed into ZnO, and the mechanism of gas-phase transformation is studied in detail. Furthermore, the morphological genesis of particles via gas-phase sintering is investigated, and for the first time a detailed model of the gas-phase sintering processes of ZnO is presented. Various analytical techniques (powder XRD, TEM/energy-dispersive X-ray spectroscopy, magic-angle spinning NMR spectroscopy, FTIR spectroscopy, etc.) are used to investigate the structure and purity of the samples. In particular, the defect structure of the ZnO was studied by photoluminescence spectroscopy.     

Synthesis and characterization of heteroepitaxial GaN films on Si(111)

We report crack-free and single-crystalline wurtzite GaN heteroepitaxy layers have been grown on Si (111) substrate by metal-organic chemical vapor deposition(MOCVD). Synthesized GaN epilayer was characterized by X-ray diffraction(XRD), atomic force microscope (AFM) and Raman spectrum. The test results show that the GaN crystal reveals a wurtzite structure with the <0001> crystal orientation and XRD ω-scans showed a full width at half maximum (FWHM) of around 583 arcsec for GaN grown on Si substrate with an HT-AlN buffer layer. In addition, the Raman peaks of E₂^high and A₁(LO) phonon mode in GaN films have an obvious redshit comparing to bulk GaN eigen-frequency, which most likely due to tensile strain in GaN layers. But the AO phonon mode of Si has a blueshit which shows that the Si substrate suffered a compressive strain. And we report that the AlN buffer layer plays a role for releasing the residual stress in GaN films.