Mechanical and environmental properties of Ge1−xCx thin film

Ge_1−xC_x thin film was prepared by plasma-enhanced chemical vapor deposition (PECVD) using GeH₄ and CH₄ as precursors and its mechanical and environmental properties were investigated. The samples were measured by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), Raman spectrum, FT-IR spectrometer, WS-92 testing apparatus of adhesion and FY-03E testing apparatus of salt and fog. The results show that the infrared refractive index of Ge_1−xC_x thin film varies from 2 to 4 with different x values. The adhesion increases with increasing gas flow ratio of GeH₄/CH₄ and decreases with increasing film thickness. The nanoindentation hardness number decreases with increasing germanium content. Three series films exhibit the best anti-corrosion property when the RF power is about 80 W, or substrate temperature is about 150 °C, or DC bias is about −100 V. Furthermore, increasing the gas flow ratio of GeH₄/CH₄ improves the anti-corrosion property of these films.     

Effects of methane flow rate on the optical properties and chemical bonding of germanium carbon films deposited by reactive sputtering

Amorphous hydrogenated germanium carbon (a-Ge_1−xC_x:H) films were prepared by radio frequency (RF) reactive magnetron sputtering of a pure Ge (111) target in a CH₄ + H₂+Ar mixture and their composition, optical properties, chemical bonding were investigated as a function of gas flow rate ratio of CH₄/(Ar + H₂). The results showed that the deposition rate first increased and then decreased as gas flow rate ratio of CH₄/(Ar + H₂) was increased from 0.125 to 0.625. And the optical gap of the a-Ge_1−xC_x:H films increased from 1.1 to 1.58 eV accompanied with the increase in the carbon content and the decrease in the relative content of Ge–C bonds of the films as the CH₄ flow rate ratio was increased, while refractive index of the films decreased and the absorption edge shifted to high energy. Through the analysis of X-ray photoelectron spectroscopy (XPS), Fourier transform infrared spectroscopy (FTIR) and Raman spectroscopy, it was found that the formation of Ge–C bonds in the films was promoted by low CH₄ flow rate which is connected with relatively high H₂ concentration and Ge content. Especially in low CH₄ concentration, the formation of sp²-hybridised C–C bonds was suppressed considerably both due to the etching effect on weak bonds of H and the fact that chemical bonding for germanium can be only sp³ hybridization.     

The influence of ambient conditions on properties of MgxZn1−xO films by sputtering

The Mg_xZn_1−xO films were prepared in different Ar-O₂ mixture ambience by magnetron sputtering. According to the X-ray diffraction (XRD) patterns and the energy dispersive X-ray spectroscopy (EDS) results, it was found that the Mg contents in the films varied with the different ratios of O₂/O₂+Ar, and the crystal quality of the films improved with the increasing of Mg contents. Meanwhile, the ultraviolet and visible (UV-vis) absorption spectroscopy indicated that the band gap of the films also increased. Moreover, it could be seen that the photoluminescence (PL) spectrum was different from that of undoped Zinc oxide (ZnO) films or the results in other reports on the Mg_xZn_1−xO films: there was no blueshift effect happening for the near-band-edge (NBE) emission in Mg_xZn_1−xO films with different Mg contents.     

Regulate the content of magnesium in MgxZn1−xO films by vacuum anneal

Mg_xZn_1−xO thin films were grown on c-sapphire substrates by metal-organic chemical vapor deposition (MOCVD), followed by annealing in vacuum at different temperatures for 1 h. The UV emission peak was blue shifted in the photoluminescence (PL) spectra and a dramatic shift of (0 0 2) diffraction peak to higher angle was observed in X-ray diffraction (XRD) pattern with increasing anneal temperature. This suggested the band gap and the lattice parameter of Mg_xZn_1−xO had been affected by annealing in vacuum. Furthermore, the structure of the film became sparser due to annealing in vacuum. From the X-ray photoelectron spectroscopy (XPS) and ICP of the Mg_xZn_1−xO film, we can find that the anneal temperature have an effect on the content of each element in Mg_xZn_1−xO quantitatively. In addition, the value of x in Mg_xZn_1−xO varied slightly as the annealing temperature increased. The above phenomena indicated that annealing in vacuum could slightly adjust the percentage of Mg indirectly in Mg_xZn_1−xO film and offer a good idea in Mg_xZn_1−xO devices facture.     

Effect of thermal treatments on the structure of MoNxOy thin films

MoN_xO_y films were deposited on steel substrates by dc reactive magnetron sputtering. The depositions were carried out from a pure molybdenum target, varying the flow rate of reactive gases. X-ray diffraction (XRD) results revealed the occurrence of cubic MoN_x and hexagonal (δ-MoN) phases for the films with high nitrogen flow rates. The increase of oxygen content induces the decrease of the grain size of the molybdenum nitride crystallites. The thermal stability of a set of samples was studied in vacuum, for an annealing time of 1 h, for temperatures ranging from 500 to 800 °C in 100 °C steps. The results showed that pure molybdenum nitride films changed their structure from a meta-stable cubic MoN to hexagonal δ-MoN and cubic γ-Mo₂N-type structures with increasing annealing temperatures. The samples with molybdenum nitride films evidenced a good thermal stability, but those with molybdenum oxynitride coatings showed a tendency to detach with the increase of the annealing temperature.     

The deposition and optical properties of Ge1−xCx thin film and infrared multilayer antireflection coatings

The effects of deposition parameters on the deposition rate, microstructure, and composition of Ge_1−xC_x thin films prepared by plasma enhanced chemical vapor deposition were studied and the films' infrared optical properties were investigated. The results show that the carbon content of these films increases as the precursor gas flow ratio of CH₄:GeH₄ increases, while the infrared refractive index of these films decreases from 4 to 2. The deposition rate increases with the radio-frequency power and reaches a constant value when the power goes above 60 W. Ge_1−xC_x/diamond-like carbon infrared antireflection coatings were prepared, and the transmittance of the coatings in the band of 8 to 14 μm was 88%, which is superior to that of Zinc Sulfide substrate by 14%.     

Bonding structure and optical properties of a-CNx:H films deposited in CH4-NH3 system

Hydrogenated amorphous carbon nitride (a-CN_x:H) films were deposited by plasma enhanced chemical vapor deposition (PECVD) in CH₄-NH₃ system. The chemical composition and bonding configuration were investigated by XPS and FTIR. The results indicated that both sp²CN and sp³CN bonds generally increased with the increase of the nitrogen concentration, and the N atoms bonded to C atoms through CN, CN and CN bonds. Remarkably, for FTIR spectra, two peaks (2125 and 2200 cm⁻¹) were obviously observed, corresponding to CN bond which was found to predominantly exist in the isonitrile structure. As more nitrogen atoms were incorporated, the optical band gap was found to vary from 1.8 to 2.5 eV. Finally, the conduction mechanisms were discussed at low and high temperature, respectively.     

Magnetron sputtering of TiOxNy films

This article reports on the characterization and preparation of N-doped titanium dioxide (TiO₂) films by reactive magnetron sputtering from Ti(99.5) targets in a mixture of Ar/O₂/N₂ atmosphere on unheated glass substrates. A dual magnetron system supplied by a dc bipolar pulsed power source was used to sputter the TiO_xN_y films. The amount of N in the TiO_xN_y film ranges from 5 to 40 at%. Its structure was measured using X-ray diffraction (XRD), the optical band gap was calculated from Tauc plots and the decrease of the water contact angle α_ir after the film activation by UV irradiation was investigated as a function of at% of N in the TiO_xN_y film. The yellow-coloured TiO_xN_y films with high (≈8 at%) amount of N exhibited a strong decrease of the band gap E_g down to 2.7 eV. A significant decrease of the water contact angle α_ir after UV irradiation has been observed for 2 μm thick transparent nanocrystalline (anatase+rutile) N-doped TiO₂ films containing less than 6 at% of N.     

Effects of TeOx films on temperature coefficients of delay of Love-type wave devices based on TeOx/36°YX-LiTaO3 structures

Tellurium oxide (TeO_x) thin films are prepared on 36°YX-LiTaO₃ substrates by RF magnetron sputtering technique under different deposition conditions. The structures and compositions of the TeO_x films are analyzed by X-ray diffraction, Fourier transform infrared spectroscopy and X-ray photoelectron spectroscopy, which show that the TeO_x films are amorphous and with different ratios of Te to O prepared in different conditions. Then the Love-type wave devices based on TeO_x/36°YX-LiTaO₃ structures are fabricated, and the temperature coefficient of delay (TCD) of the Love-type wave devices are investigated. The results show that, when TeO_x films deposited at suitable deposition conditions, the TCD of the Love-type wave devices are less than that of the shear-horizontal (SH) wave devices fabricated on the bare 36°YX-LiTaO₃ substrates, which demonstrates that the TCD of the TeO_x films is negative. Moreover, the TCD of the devices are strongly dependent upon the preparation conditions and the thicknesses of the TeO_x films. Therefore, the TCD of the Love-type wave devices can be optimized by suitably selecting the preparation conditions and the thickness of TeO_x films.     

Characterization of N-doped TiO2 films prepared by reactive sputtering using air/Ar mixtures

Nitrogen-doped titanium dioxide (TiO_2 − xN_x) thin films desirable for visible light photocatalysts were prepared by reactive sputtering using air/Ar mixtures. Using air as the reactive gas allows the process to conduct at high base pressures (low vacuum), which reduces substantially the processing time. The obtained films transformed from mixed phases to anatase phase as the air/Ar flow ratio increased. Substitutional doping of nitrogen verified by X-ray photoelectron spectroscopy accounts for the red-shift of absorption edge in the absorption spectra. Anatase TiO_2 − xN_x films could incorporate up to about 7.5 at.% substitutional nitrogen and a maximum of 23 at.% nitrogen was determined in the films with mixed phases. The optical band gaps of the TiO_2 − xN_x films calculated from Tauc plots varied from 3.05 to 3.11 eV and those of the mixed phase ranged from 2.77 to 3.00 eV, which are all lower than that for pure anatase TiO₂ and fall into the visible light regime.     

Cd1−xMnxTe thin films deposited by close-spaced sublimation for application in solar cells

High-quality Cd_1−xMn_xTe polycrystalline films with (1 1 1) preferred orientation were deposited by close-spaced sublimation (CSS) method. The XRD and optical absorption analysis indicated that the band gap of the film was about 1.6 eV. The as-grown Cd_1−xMn_xTe films exhibit quite low photovoltaic performance when used to make cells with CdS as the hetero-junction partner. The effect of various post-deposition treatments with vapors of chlorine-containing materials (CdCl₂ and/or MnCl₂), in Ar or H₂/Ar ambient, on the properties of Cd_1−xMn_xTe cells was studied.     

TixSiyN nanocomposites by cathodic arc plasma deposition

We have deposited Ti_xSi_yN nanocomposites by means of a custom-made cathodic arc evaporation system, using a TiSi 80/20 at% compound target in a reactive Ar-N₂ atmosphere. We have studied the influence of different process parameters, like the amount of nitrogen in the gas, the total pressure, the arc current or the deposition temperature, on the properties of the material. We have analysed the films by X-ray diffraction (XRD), which has allowed us to determine the optimum conditions to obtain TiN nanocrystals with a good degree of texture. We have found that a moderate increase in the deposition temperature leads to an improvement in the crystalline quality of the films; however, the results as to their hardness are not as good as we expected. We have not been able to confirm the existence of Si₃N₄ by Fourier-transform infrared (FT-IR) spectrometry measurements. Additionally, glow-discharge optical emission spectroscopy (GD-OES) analyses show a high amount of oxygen incorporated to the films (around 5.5 at%).     

Effect of the oxygen fraction on the structure and optical properties of HfOxNy thin films

The main purpose of this work was to prepare hafnium oxynitride (HfO_xN_y) thin films. HfO_xN_y thin films were deposited by radio frequency reactive magnetron sputtering from a pure Hf target onto Quartz and ZnS substrates at room temperature. The depositions were carried out under an oxygen-nitrogen-argon atmosphere by varying the flow rate of the reactive gases (oxygen/nitrogen ratio). The variation of the flow rate of the reactive gases changed the structure and properties of the films. Glancing incidence X-ray diffraction (GIXRD) was used to study the structural changes of as-deposited films; a new crystalline hafnium oxynitride phase was formed in a region of oxygen/nitrogen ratio. Cross-section of the films observed by SEM revealed that the films grew with a columnar-type structure, and surface observation with AFM showed values of surface roughness changed with the flow rate of the reactive gases, higher oxygen fraction had lower surface roughness than lower oxygen fraction. Visible spectra, infrared spectra, refractive index, absorption coefficient also changed with the variation of the oxygen fraction.     

Antireflective characteristics of Ge1−xCx films on sub-wavelength structured ZnS surfaces

Antireflective sub-wavelength structures (SWSs) combined a Ge_1−xC_x coating on Zinc sulfide (ZnS) can enhance the long-wave infrared transmission and durability of ZnS, which have the potent for practical applications. We have investigated the antireflective characteristics of Ge_1−xC_x sub-wavelength periodic hole structures on ZnS through the Fourier modal method (FMM) for application with normally incident, randomly polarized, 10.6 μm wavelength. Then according to the results, we have successfully fabricated the sub-wavelength periodic square hole structures with Ge_0.05C_0.95 films on one side of ZnS. A substantial transmittance improvement for bare ZnS in the 8-12 μm spectral region was obtained.     

Influence of electron irradiation on characteristics of Si1−xGex p-n-structures

Electrically active defects induced by irradiation with 4 MeV electrons and their influence on dynamic and static parameters of p-n-structures with bases on boron doped Si_1−xGe_x alloys (0<x?0.06) have been investigated. It has been found that after irradiation with the electron fluence Φ=2×10¹⁴ cm⁻² lifetime of minority charge carriers decreases more than 12 times and forward voltage increases twice. Deep level transient spectroscopy (DLTS) studies have shown that interstitial carbon atoms are dominant electrically active defects induced by the irradiation. These defects are transformed into the complexes “interstitial carbon—interstitial oxygen” upon annealing of irradiated samples in the temperature range 50-100 °C.     

Annealing effect on crystallization behavior of cubic MgxZn1−xO films on A-plane and M-plane sapphire

Cubic Mg_xZn_1−xO thin films with Mg composition around 70% were deposited on A-plane and M-plane sapphire substrates by rf-reactive magnetron sputtering. Measured structural and optical properties of these thin films indicated an optimal annealing temperature of 700 °C which produced high quality cubic MgZnO thin films on both substrates. Moreover, when the annealing temperature exceeded 750 °C, a much rougher surface resulted, and several large mosaic particles on the surface of the annealed films appeared. From EDX results, the Mg composition was lower than that found in other sections of the annealed films. We attributed this to thermally induced reconstruction of the crystallites. This phenomenon was more obvious for annealed MgZnO films on A-plane sapphire than that on M-plane sapphire. Thermal expansion mismatch with the substrate is the principal reason.     

SiOx-doped DLC films: Charge transport, dielectric properties and structure

In the present study, SiO_x-doped diamond-like carbon (DLC) films were synthesized by ion beam deposition on different substrates. Electrical properties, morphology and structure of the DLC films were investigated. Poole-Frenkel emission was the main carrier transport mechanism in all investigated metal-SiO_x-doped DLC-metal samples. Dielectric properties of the samples were dependent on both the bottom and top electrode metal. The trans-polyacetylene chain vibrations detected from the Raman spectra have been observed for all the SiO_x-doped DLC films. Different dielectric properties of the film deposited onto the different metal interlayers were explained both by different roughness of the metal films and by different structure of the ion beam-synthesized SiO_x-doped DLC films.     

Deposition of amorphous carbon nitride films using Ar/N2 supermagnetron sputter

Amorphous carbon nitride (a-CN_x) films were formed by supermagnetron sputter deposition using N₂ and/or Ar gases. Supplying rf power with a substrate-holding electrode (bias sputter) and lowering the gas pressure were found to be effective at decreasing the optical band gap and increasing the hardness. Nitrogen concentrations of bias sputtered films were about 32-35 mass% (30-100 mTorr). The a-CN_x films deposited for electron field emission showed a low-threshold electric field (E_TH). With the decrease of gas pressure, admixture of Ar to N₂ or the use of pure Ar, and the use of bias sputter, the E_TH of a-CN_x films largely decreased to 11 V/μm (30 mTorr Ar/N₂ bias sputter).     

Passive Q-switching performance of intracavity frequency-doubled red laser with mixed Nd:GdxY1−xVO4 crystals

Passive Q-switching laser operation of Nd:Gd_xY_1−xVO₄ mixed crystals at 671 nm has been compared in the same V-shape folded cavity. Based on our comparative analysis, the best laser characteristics - the highest pulse energy and peak power and the shortest pulse width - were demonstrated by Nd:Gd_0.63Y_0.37VO₄ crystal. At the same time, this crystal possesses the lowest thermal conductivity in comparison with the other Nd:Gd_xY_1−xVO₄ crystals, which could result in decreasing the average laser output power. To verify this assumption we also measured the focal lengths of thermal lens induced in the crystals during the laser operation.