超声波技术在溅射镀膜材料检测中的应用

超声波技术在溅射镀膜用材料方面的检测采用了先进的非接触式无伤检测的方式,且通过声波的回收处理后可对靶材粘结材料内部结合情况作出明确判定。介绍超声波检测的原理,实际检测的图例,解决此类材料极高的外观表面要求,内部结合质量要求。     

溅射镀膜进展

磁控溅射是在玻璃上沉积薄膜的一种真空镀膜技术。自20世纪60年代末发明以来，溅射电极经历了一系列演变。最重要的技术进步是旋转筒式磁控管及先进旋转筒式溅射靶的使用。这两项并行进展使镀膜效率大为提高，同时使成本显著降低，与此同时镀膜质量获得保证，厚度均匀性得到改善。     

溅射镀膜系统的压力控制的一种新设想

通过对一般溅射镀膜装置特点以及镀膜过程中存在问题的分析，指出：由于溅射镀膜时的工作压力处于扩散泵的恒定排气量区（第一级喷口过载区）．扩故泵在这种环境下工作，返流严重，并且由于喷流不稳定现象导致压力难于控制。提出了一种由扩散泵机组作为溅射镀膜油气系统的改进型设计方案。理论分析表明：使用该方案，扩散泵进气口压力维持在恒定抽速区．返流减小，镀膜室工作压力也易于稳定。     

溅射设备真空系统故障与诊断

本文介绍了应用真空溅射方法形成膜层，设备真空系统常见故障诊断及排除。     

溅射镀膜铌靶材表面纹路原因分析

从晶粒组织分布、织构组份分布、杂质含量分布三个方面对工业生产中溅射镀膜铌靶材表面纹路产生原因进行分析。结果表明,原材料的化学成分分布不均和杂质富集,经过后期的轧制加工,形成铌靶材表面规律性纹路;消除原材料成分分布不均和杂质富集,可避免铌靶材表面规律性纹路的形成。     

第十九讲 真空溅射镀膜

正用高能粒子(通常是由电场加速的正离子)轰击固体表面,固体表面的原子、分子与入射的高能粒子交换动能后从固体表面飞溅出来的现象称为溅射。溅射出来的原子(或原子团)具有—定的能量,它们可以重新沉积凝聚在固体基片表面上形成薄膜,称为溅射镀膜。通常是利用气体放电产生气体电离,其正离子在电场作用下高速轰击阴极靶材,击出阴极靶材的原子或分子,飞向被镀基片表面沉积成薄膜。     

溅射靶的开发与应用

本文就溅射的分类，选用靶材的原则及常用几种靶的制备等问题进行了探讨。     

磁控溅射镀膜技术在建材及民用工业中的应用

本文扼要阐述了磁控溅射镀膜技术在建材及民用工业中的应用前景及特点，所需设备类型及镀膜过程中应注意的若干问题，并对若干种镀膜玻璃的膜系及镀膜玻璃的性能要求与测试等问题进行了介绍。     

溅射镀膜用铌靶材晶粒尺寸控制工艺研究

铌靶材主要应用于表面工程材料,如船舶、化工、液晶显示器(LCD)以及耐热、耐腐蚀等镀膜行业。作为被溅射的基材,为了获得均匀一致的薄膜淀积速率,对溅射铌靶材的主要要求是均匀的组分、合适的颗粒尺寸以及具体的结晶学取向。本文主要研究在实际生产中,锻造工艺、轧制工艺以及热处理工艺对溅射镀膜用铌靶材晶粒尺寸的影响。通过多次试验,得到合理的锻造工艺、轧制工艺以及热处理工艺,从而对铸锭晶粒进行彻底的破碎和再结晶,最终得到晶粒尺寸小于100μm,且均匀一致的等轴晶组织,满足了溅射镀膜用铌靶材要求的晶粒尺寸和均匀等轴晶组织。     

卷绕式海绵材料真空磁控溅射镀膜设备的研制

本文介绍了海绵卷绕真空磁控溅射镀膜设备的结构及其特点，采用独特的传动机构，靶极结构及控制方式实现了海绵连续卷绕真空磁控溅射镀膜。     

三柱靶磁控溅射镀膜机在工艺品装饰镀中的应用

将三柱靶磁控溅射镀膜机应用于工艺品装饰镀生产中,开发多种镀膜工艺并进行了批量生产,实践证明:三柱靶磁控溅射镀膜技术结合特制的衬底漆和保护面漆涂装工艺,能够在工艺品上获得合格的装饰层.拓展该技术在工艺品行业的应用,可有效减轻传统电镀对环境的污染.     

Surface coating of microparticles with tungsten carbide by using the barrel sputtering system

We studied the coating of microparticles with tungsten carbide using a sputtering system with barrel-type powder sample holder (the barrel sputtering system). In order to find suitable sputtering conditions using the system, tungsten carbide was coated on a glass plate under various desired methane fractions, total pressures and RF powers. According to the XRD analysis on the fabricated films, the desired parameter is attained at a methane fraction of 5%, a total pressure of 1.5 Pa, and an RF power of 100 W. Surface coating of polymer microparticles with a WC layer was performed under this condition. Scanning electron microscope and energy-dispersion X-ray spectrum measurement show that the surface of the microparticle is uniformly coated with a thin WC layer.     

Optimization of coating uniformity in an ion beam sputtering system using a modified planetary rotation method

A modified planetary rotation system has been developed to obtain high uniformity optical coatings on large substrates in an ion beam sputter coater. The system allows the normally fixed sun gear to rotate, thus allowing an extra degree of freedom and permitting more complex motions to be used. By moving the substrate platen between two fixed positions around the sun axis, averaging of the distributions at these two positions takes place and improved uniformity can be achieved. A peak-to-valley radial uniformity of ～0.15% (～0.07%?rms) on a single layer film on a 400?mm diameter substrate has been achieved without the aid of masking.     

Application of high-density plasma to sputtering and reactive sputtering processes

An investigation of thin-film preparation processes by sputtering technique has been carried out utilizing the high-density plasma induced by the microwave power coupled in the surface wave mode. The high sputtering rate arising from the high ion current to the target is expected to be advantageous for processes of nitride surface and compounds. An independent control of the external bias potential to the target and of the gas mixture ratio is demonstrated to be possible by the mode-locking mechanism. Ferromagnetic films of FeNi alloy were deposited on glass substrates. Films of TiN and of AlN were produced on plastic substrates and on glasses.     

A robotic spectrophotometric analysis system

A low cost robotic assay system is described which is highly flexible and can handle a wide range of spectrophotometric procedures either completely automatically or incorporating manual chemistry steps. No user intervention is required between different procedures. Information on several different assays can be stored and the assays performed in sequences with no further user attention.     

JPD-1200型矩形双平面磁控溅射阴极镀膜设备的研制

介绍了设备的结构、组成及工作过程,对新型矩形双平面磁控溅射阴极及有关的各阴极进行了分析、比较.     

海绵卷绕真空磁控溅射镀膜过程中的传动控制

根据磁控溅射中海绵的传动特性，建立了传动控制的数学模型，采用带有矢量的变频调速器实现了海绵卷绕真空镀膜过程中的张力控制，满足了磁控溅射中海绵卷绕的传动要求。