Differential current-sensing for on-chip interconnects

This paper presents a differential current-sensing technique as an alternative to existing circuit techniques for on-chip interconnects. Using a novel receiver circuit, it is shown that, delay-optimal current-sensing is a faster (20% on an average) option as compared to the delay-optimal repeater insertion technique for single-cycle wires. Delay benefit for current-sensing increases with an increase in wire width. Unlike repeaters, current-sensing does not require placement of buffers along the wire, and hence, eliminates any placement constraints. Inductive effects are negligible in differential current-sensing. Current-sensing also provides a tighter bound on delay with respect to process variations. However, current-sensing has some drawbacks. It is power inefficient due to the presence of static-power dissipation. Current-sensing is essentially a low-swing signaling technique, and hence, it is sensitive to full swing aggressor noise.     

A design-oriented methodology for accurate modeling of on-chip interconnects

An accurate modeling methodology for typical on-chip interconnects used in the design of high frequency digital, analog, and mixed signal systems is presented. The methodology includes the parameter extraction procedure, the equivalent circuit model selection, and mainly the determination of the minimum number of sections required in the equivalent circuit for accurate representing interconnects of certain lengths within specific frequency ranges while considering the frequency-dependent nature of the associated parameters. The modeling procedure is applied to interconnection lines up to 35 GHz obtaining good simulation-experiment correlations. In order to verify the accuracy of the obtained models in the design of integrated circuits (IC), several ring oscillators using interconnection lines with different lengths are designed and fabricated in Austriamicrosystems 0.35 μm CMOS process. The average error between the experimental and simulated operating frequency of the ring oscillators is reduced up to 2% when the interconnections are represented by the equivalent circuit model obtained by applying the proposed methodology.     

Inductance model and analysis methodology for high-speed on-chip interconnect

With operating frequencies entering the multi-gigahertz range, inductance has become an important consideration in the design and analysis of on-chip interconnects. In this paper, we present an accurate and efficient inductance modeling and analysis methodology for high-performance interconnect. We determine the critical elements for a PEEC based model by analyzing the current flow in the power grid and signal interconnect. The proposed model includes distributed interconnect resistance, inductance and capacitance, device decoupling capacitances, quiescent switching currents in the grid, pad connections, and pad/package inductance. We propose an efficient methodology for extracting these elements, using statistical models for on-chip decoupling capacitance and switching currents. Simulation results show the importance of various elements for accurate inductance analysis. We also demonstrate the accuracy of the proposed model compared to the traditional loop-based inductance approach. Since the proposed model can consist of hundreds of thousands of RLC elements, and a fully dense mutual inductance matrix, we propose a number of acceleration techniques that enable efficient analysis of large interconnect structures.     

Electromigration challenges for advanced on-chip Cu interconnects

As technology scales down, the gap between what circuit design needs and what technology allows is rapidly widening for maximum allowed current density in interconnects. This is the so-called EM crisis. This paper reviews the precautions and measures taken by the interconnect process development, circuit design and chip integration to overcome this challenge. While innovative process integration schemes, especially direct and indirect Cu/cap interface engineering, have proven effective to suppress Cu diffusion and enhance the EM performance, the strategies for circuit/chip designs to take advantage of specific layout and EM failure characteristics are equally important to ensure overall EM reliability and optimized performance. To enable future technology scaling, a co-optimization approach is essential including interconnect process development, circuit design and chip integration.     

High-speed completion detection for current sensing on-chip interconnects

A novel completion detection technique for delay insensitive current sensing on-chip interconnects is presented. The scheme is based on sensing currents on the data wires and comparing the sum of these currents to an appropriately set reference. The goal is to solve the performance bottleneck caused by conventional voltage-mode detection methods. With the channel width of 64 bits, the proposed method is 4.65 times faster and takes 36% less area than the voltage-mode scheme. Furthermore, its speed does not degrade when increasing the channel bit width. It is implemented in a 65 nm CMOS technology.     

Designing fast on-chip interconnects for deep submicrometer technologies

This paper proposes a solution to the problem of improving the speed of on-chip interconnects, or wire delay, for deep submicron technologies where coupling capacitance dominates the total line capacitance. Simultaneous redundant switching is proposed to reduce interconnect delays. It is shown to reduce delay more than 25% for a 10-mm long interconnect in a 0.12-/spl mu/m CMOS process compared to using shielding and increased spacing. The paper also proposes possible design approaches to reduce the delay in local interconnects.     

High-frequency characterization of on-chip digital interconnects

On-chip inductance is becoming increasingly important as technology continues to scale. This paper describes a way to characterize inductive effects in interconnects. It uses realistic test structures that study the effect of mutual couplings to local interconnects, to random lines connected to on-chip drivers, and to typical power and ground grids. The use of S parameters to characterize the inductance allows a large number of lines to be extracted while requiring only a small overhead measurement of dummy open pads to remove measurement parasitics. It also enables direct extraction of the frequency-dependent R, L, G, C parameters. The results are summarized with curve-fitted formulas of inductance and resistance over a wide range of line spacings and line widths. The significance of the frequency dependence is illustrated with transient analysis of a typical repeater circuit in a 0.25-μm technology. A model that captures the frequency dependency of the extracted parameters accurately predicts the performance of a new inductance-sensitive ring oscillator     

Simulation of high-speed interconnects

With the rapid developments in very large-scale integration (VLSI) technology, design and computer-aided design (CAD) techniques, at both the chip and package level, the operating frequencies are fast reaching the vicinity of gigahertz and switching times are getting to the subnanosecond levels. The ever increasing quest for high-speed applications is placing higher demands on interconnect performance and highlighted the previously negligible effects of interconnects such as ringing, signal delay, distortion, reflections, and crosstalk. In this review paper various high-speed interconnect effects are briefly discussed. In addition, recent advances in transmission line macromodeling techniques are presented. Also, simulation of high-speed interconnects using model-reduction-based algorithms is discussed in detail     

Loop-based inductance extraction and modeling for multiconductor on-chip interconnects

An efficient extraction and modeling methodology for self and mutual inductances within multiconductors for on-chip interconnects is investigated. The method is based on physical layout considerations and current distribution on multiple return paths, leading to loop inductance and resistance. It provides a lumped circuit model suitable for timing analysis in any circuit simulator, which can represent frequency-dependent characteristics. This novel modeling methodology accurately provides the mutual inductance and resistance as well as self terms within a wide frequency range without using any fitting algorithm. Measurement results for single and coupled wires within a multiconductor system, fabricated using 0.13 and 0.18 /spl mu/m CMOS technologies, confirm the validity of the proposed method. Our methodology can be applicable to high-speed global interconnects for post-layout as well as prelayout extraction and modeling.     

Silicon oxynitride integrated waveguide for on-chip optical interconnects applications

This work explores the microfabrication technology for realizing miniature waveguide structure for on-chip optical interconnects applications. Thick oxynitride films were prepared by plasma enhanced chemical vapor deposition (PECVD) with N₂O, NH₃ and SiH₄ precursors. The composition and the bonding structure of the oxynitride films were investigated with Fourier transform infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS), and secondary ion mass spectroscopy. Results showed that the silicon oxynitride deposited with gas flow rates of NH₃/N₂O/SiH₄ = 10/400/10 (sccm) has favorable properties for integrated waveguide applications. The refractive index of this layer is about 1.5 and the layer has comparative low densities of O–H and N–H bonds. The hydrogen bonds can be further eliminated with high temperature annealing of the as-deposited film in nitrogen ambient and the propagation loss can be reduced significantly with thermal annealing. An integrated miniature waveguide with cross-section of 2 μm × 3 μm was realized with the proposed technology. The waveguide is able to transmit signal in either TE or TM mode with propagation loss <0.6 dB/cm (at 1550 nm) and bending radius of about 6 μm.     

Synthesis of generalised characteristic model for high-speed interconnects using current sources approach

The derivation of an efficient Norton equivalent companion GCM for coupled interconnects in high-speed circuits is presented. The proposed model contains fewer nodes compared to its The/spl acute/venin counterpart and hence accelerates the SPICE solution process. An application example with coupled microstrip lines driven by a bipolar ECL OR gate is given to demonstrate the efficiency. Comparison with the FDTD-SPICE simulation results substantiates the validity of this approach.     

A novel systematic approach for equivalent model extraction of embedded high-speed interconnects in time domain

Based on time-domain scattered data, an efficient systematic approach in the time domain has been proposed to extract the SPICE-compatible models of embedded high-speed interconnects. The approach combines the layer-peeling technique and the generalized pencil-of-matrix method to obtain a pole-residue representation of the step response of the interconnects. An order-reduction procedure is implemented based on the bandwidth criterion to find the optimum pole-residue representation of the interconnects with minimum pole numbers. The SPICE-compatible lumped circuits are then systematically extracted from the pole-residue rational functions. The discontinuous microstrip lines and bonding wire structure are used to demonstrate the validity of the proposed approach. Good agreement is seen between the modeled and measured transient response. The advantages of this approach are the de-embedding ability for arbitrary nonuniform interconnects, systematically obtaining lower order and more accurate SPICE-compatible circuits, and broad-band performance of the extracted circuits.     

Near speed-of-light signaling over on-chip electrical interconnects

The propagation limits of electrical signals for systems built with conventional silicon processing are explored. A design which takes advantage of the inductance-dominated high-frequency regime of on-chip interconnect is shown capable of transmitting data at velocities near the speed of light. In a 0.18-/spl mu/m six-level aluminum CMOS technology, an overall delay of 283 ps for a 20-mm-long line, corresponding to a propagation velocity of one half the speed of light in silicon dioxide, has been demonstrated. This approach offers a five times improvement in delay over a conventional repeater-insertion strategy.     

SPICE compatible modelling of on-chip coupled interconnects

On-chip coupled interconnect lines are modelled using measured S-parameters. The physical consistency between single and coupled line model parameters are maintained in the proposed methodology. The SPICE compatible model is validated in both the frequency and the time domain using copper and ultra low-kappa coupled interconnects.     

A high-speed four-phase clock generator for low-power on-chip SerDes applications

In this work we present a low-power, low-area and high-speed fully CMOS quadrature clock generator for on-chip SerDes applications. The device utilizes a couple of differential prescalers for high speed frequency division and four duty cycle adjusters to set the duty cycle of the produced clock signals at 50% of the clock period. The circuit was implemented with the STMicroelectronics 65 nm process technology using only 125 transistors and it occupies an active area of under 2.34 μm². With a power supply of 1.1 V the complete circuit consumes 89.56 μW at room temperature.     

The analytical model for crosstalk noise of current-mode signaling in coupled RLC interconnects of VLSI circuits

With the continuous advancement of semiconductor technology,the interconnects crosstalk has had a great influence on the performances of VLSI circuits.To date,most of the research about the interconnects of VLSI circuits focus on the voltage-mode signaling (VMS) scheme while the current-mode signaling (CMS) scheme is rarely analyzed.First of all,an equivalent circuit model of two-line coupled interconnects is presented in this paper, which is applicable to both the CMS and VMS schemes.The coupling capacitive and mutual inductive are taken into account in the equivalent circuit model.Secondly,the output noise of CMS and VMS schemes are investigated in the paper according to the decoupling technique andABCD parameter matrix approach at local level,intermediate level and global level,respectively.Moreover,the experimental results show that the CMS interconnects have lesser noise peak,noise width and noise amplitude than the VMS interconnects in the same cases,and the CMS scheme is especially suitable for the global interconnects communication of VLSI circuits.It is found that the results obtained by ABCD parameter matrix approach are in good accordance with the simulation results of the advanced design system.     

Experimental validation of crosstalk simulations for on-chip interconnects using S-parameters

Since the design of advanced microprocessors is based on simulation tools, accurate assessments of the amount of crosstalk noise are of paramount importance to avoid logic failures and less-than-optimal designs. With increasing clock frequencies, inductive effects become more important, and the validity of assumptions commonly used in simulation tools and approaches is unclear. We compared accurate experimental S-parameters with results derived from both magneto-quasi-static and full-wave simulation tools for simple crosstalk structures with various capacitive and inductive couplings, in the presence of parallel and orthogonal conductors. Our validation approach made possible the identification of the strengths and weaknesses of both tools as a function of frequency, which provides useful guidance to designers who have to balance the tradeoffs between accuracy and computation expenses for a large variety of cases     

Analysis and optimization of shielded RLC global interconnects for gigascale integration

Compact physical models are presented for on-chip double-sided shielded transmission lines, which are mainly used for long global interconnects where inductance effects should not be ignored. The models are then used to optimize the width and spacing of long global interconnects with repeater insertion. The impacts of increasing line width and spacing on various performance parameters such as delay, data-flux density, power dissipation and total repeater area are analysed. The product of data-flux density and reciprocal delay per unit length are defined as a figure of merit (FOM). By maximizing the FOM, the optimal width and spacing of shielded RLC global interconnects are obtained for various international technology roadmap for semiconductors (ITRS) technology nodes.     

Skin effect of on-chip copper interconnects on electromigration

A simple model is derived to evaluate skin effect of on-chip copper interconnects on electromigration. The result gives the range of frequency in which skin effect on electromigration need to be taken into consideration.