共查询到20条相似文献,搜索用时 10 毫秒
1.
Mutoh N. Morimoto M. Nishimura M. Teranishi N. Oda E. 《Electron Devices, IEEE Transactions on》1991,38(5):1048-1051
A new low-noise charge-coupled-device (CCD) output amplifier, the RJG detector, has been developed. The RJG detector incorporates a JFET which has an electrically floating ring-junction gate (RJG). The operating principle of the amplifier is that signal charges, transferred from the CCD into the RJG, directly modulate the drain current in the detection JFET. The performance of the detector was evaluated by operating test devices under a 37-MHz clock frequency, which is the same frequency as that for the horizontal CCD operation in the recently developed 2-million-pixel high-definition CCD image sensor. It was found that 1/f noise was reduced by introducing the JFET and that reset noise was completely eliminated by achieving complete charge transfer through the reset operation. As a result, input referred noise equivalent electrons within the 18.5-MHz baseband were reduced to 17 (electrons) 相似文献
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线阵CCD图像传感器驱动电路的设计 总被引:5,自引:0,他引:5
随着CCD性能的不断提高,CCD技术在军、民用领域都得到了广泛的应用.介绍了TCD1501C线阵CCD的驱动电路设计,详细介绍了用VHDL完成的CCD图像传感器驱动时序设计和视频输出差分信号驱动电路的设计. 相似文献
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高帧速CCD摄像器件的设计 总被引:3,自引:3,他引:0
设计了光敏元尺寸18μm×18μm512(H)×512(V)光纤面板耦合CCD高帧速摄像器件,帧速为500帧/s。详细讨论器件多相加压(MPP)和常规工作模式的设计,给出了器件设计性能参数。该器件采用2μm,双层多晶硅和双层金属工艺制作。 相似文献
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《现代电子技术》2019,(20)
以红外增强型图像传感器TH7888A所得的微弱电压信号为输入,对图像传感器的模拟前端处理电路进行设计。采用巴特沃斯低通滤波器和全差分双相关采样的方法,提高整体电路的信噪比为67 dB,从而减少了后续电路的输入噪声。使用Proteus对所设计的低噪声、高增益放大电路的功能和噪声分析等特性进行全面的实验。实验结果表明,该设计能有效放大微弱电压信号,并可以对放大的电压信号进行准确的相关双采样去除KTC噪声、复位噪声。最后,在实际应用中,使用FPGA为硬件设计载体,以vivado作为软件开发环境,使用Verilog语言对时序发生器进行了硬件描述。FPGA生成的模拟信号分别作为读出电路的输入和采样的触发信号,并验证了其正确性和可行性。 相似文献
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Konuma K. Asano Y. Masubuchi K. Utsumi H. Tohyama S. Endo T. Azuma H. Teranishi N. 《Electron Devices, IEEE Transactions on》1996,43(2):282-286
An infrared-bi-color image sensor was developed with a barrier height controlled Schottky-barrier photo diode array for precise temperature images. Low and high barrier height diode pixels are arranged vertically next to one another using a selective area ion implantation technique. Conventional monochrome infrared image sensors frequently give wrong temperature images due to an unreasonable emissivity assumption. The infrared-bi-color image sensor can obtain the temperature image precisely with regard to the emissivity of the object 相似文献
9.
《Electron Devices, IEEE Transactions on》1978,25(2):140-144
A new type of 1024-element linear image sensor has been developed using a CCD with a meander channel (MCCD). Its simple electrode pattern with no contact windows for clocking promises high yield in the production. 相似文献
10.
《Solid-State Circuits, IEEE Journal of》1974,9(2):41-49
A detailed investigation of CCD's for application in the optacon reading aid for the blind has been completed. The results of the investigation include an analysis of the performance of the transparent electrode structure and the CCD scanning circuitry used to realize the new type of image sensor. 相似文献
11.
In conventional arrays, charges are read out from photodiodes through vertically placed charge-coupled registers. In an array
presented here, reading out is performed through vertical diffusion lines. As shown, such an array is more sensitive, since
the photodiodes occupy a larger space. Also, this array shows a reduced level of cross-coupling, because extra charges leave
the photodiodes, and a reduced level of intrinsic back-ground, because charges generated exterior to the photodiodes are removed. 相似文献
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《Solid-state electronics》2006,50(11-12):1828-1834
A low voltage charge coupled device (CCD) image sensor has been developed by adjusting the electron potential barrier in the electron sensing structure. A charge injection to the gate dielectrics of a MOS transistor was utilized to optimize the electron potential level in the output structure. A DC bias generating circuit was added to the reset structure which sets reference voltage and holds the signal charge to be detected. The generated DC bias is added to the reset pulse to give an optimized voltage margin to the reset operation, and is controlled by adjustment of the threshold voltage of a MOS transistor in the circuit. By the pulse-type stress voltage applied to the gate, the electrons and holes were injected to the gate dielectrics, and the threshold voltage could be adjusted ranging from 0.2 V to 5.5 V, which is suitable for compensating the incomplete reset operation due to the process variation. The charges trapped in the silicon nitride lead to the positive and negative shift of the threshold voltage, and this phenomenon is explained by Poole–Frenkel conduction and Fowler–Nordheim conduction. A CCD image sensor with 492(H) × 510(V) pixels adopting this structure showed complete reset operation with the driving voltage of 3.0 V. The image taken with the image sensor utilizing this structure was not saturated to the illumination of 30 lux, that is, showed no image distortion. 相似文献
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This paper presents a bouwblok family of CCD image sensors, a set of devices of varying size built with a single pixel design from one mask set. It describes the original design goals and how they led to dividing the layout into smaller blocks that could be stitched together to form a complete sensor. The architecture is traditional for large-area scientific devices. The pixel design is optimized for large charge packets, antiblooming and low dark current, the horizontal register for binning, and the output amplifier for fast pixel rates. The paper describes how the design is split and modified to cover all possible configurations and how to minimize the effects of stitching 相似文献
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Interline CCD image sensor with an antiblooming structure 总被引:1,自引:0,他引:1
《Electron Devices, IEEE Transactions on》1984,31(1):83-88
A ⅔-in 384 (H) × 490 (V) element interline CCD image sensor with a new antiblooming structure was developed. Blooming was suppressed without sacrificing photosensitivity and dynamic range by means of a vertical overflow drain positioned under (rather than beside) a photodiode. For 10-percent vertical height illumination the smear signal was reduced to 0.05 percent of the illumination signal. Well-balanced performance, namely, large dynamic range (72 dB), low random noise (65 rms noise electrons per charge packet), high-contrast transfer functions for horizontal and vertical directions, and a spectral response similar to the luminous efficiency curve were obtained under moderate operating conditions. 相似文献
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《Electron Devices, IEEE Transactions on》1987,34(5):1052-1056
An undesirable smear in a vertical-overflow-drain interline CCD image sensor (VOD IL-CCD) has been analyzed. This smear has been reduced by using a new structure. The main cause of the smear was identified, using an experimental linear CCD image sensor, as light leakage, i.e., oblique incident light effect, concave lens effect, diffraction effect, and waveguide effect, To reduce the light-leakage smear, a new structure is proposed, where the oxide thickness under the aluminum photoshield is as small as 0.2 µm. As a result, the photoshielding performance is improved, and the smear-to-signal ratio for 10-percent vertical height illumination in the new structure VOD IL-CCD obtained is 0.016 percent, or 12 times smaller than that in a conventional structure VOD IL-CCD. 相似文献
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A new 128×128 element PtSi Schottky barrier infrared image sensor with ITCCD readout structure and PtSi thin film optical cavity detector structure has been fabricated,which has 50μm×50 μm pixels,a fill factor of 40 percent,the nonuniformity of 5% or less and the dynamic range of over or equal to 50 dB.The noise equivalent temperature difference is 0.2 K with f/1.0 optics at 300 K background. In this paper,the principle of operation,design consideration and fabrication technology for the device are described. 相似文献
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A CCD linear image sensor with buried overflow drain structure has been developed. Since the overflow drain, i.e. a reverse biased n-region buried under photosites arrayed in p-layer, makes an effective sink of excess electrons, imaging characteristics such as uniformity of photosensitivity, spectral response, resolution, and antiblooming, are highly improved. 相似文献
20.
Sangsik Park Author Vitae Hyungsoo Uh Author VitaeAuthor Vitae 《Microelectronics Journal》2006,37(8):778-782
A charge coupled device (CCD) image sensor operating with 3.0 V-reset has been developed using a charge injection to the gate dielectrics of a MOS structure. A DC bias generating circuit was added to the reset structure, which sets reference voltage and holds the signal charge to be detected. The generated Dc bias is added to the reset pulse to give an optimized voltage margin to the reset operation, and is controlled by adjustment of the threshold voltage of a MOS transistor in the circuit. By the pulse-type stress voltage applied to the gate, the electrons and holes were injected to the gate dielectrics, and the threshold voltage could be adjusted ranging from 0.2 to 5.5 V, which is suitable for controlling the incomplete reset operation due to the process variation. The charges trapped in the silicon nitride lead to the positive and negative shift of the threshold voltage, and this phenomenon is explained by Poole-Frenkel conduction and Fowler-Nordheim conduction. A CCD image sensor with 492(H)×510(V) pixels adopting this structure showed complete reset operation with the driving voltage of 3.0 V. The image taken with the image sensor utilizing this structure was not saturated to the illumination of 30 lux, that is, showed no image distortion. 相似文献