Optimized light emission from layered porous silicon structures

We discuss in detail the physics of light emission from porous silicon microcavities formed by periodically modulating the porosity to produce multilayered structures. Changing the porosity alters not only the refractive index and absorption but also the luminescence, resulting in a complex interplay of effects that has not yet been addressed in the literature as far as we know. A transfer matrix model is developed that accounts for the dispersion of the refractive index, absorption, and photoluminescence. A multilayer porous silicon mirror is found to emit light almost as well as a conventional distributed feedback microcavity system with a mid-stop-band resonant state.     

Determination of the refractive index of n- and p-type porous Si samples

Photochemical etching of porous Si layers has been shown to be able to create micrometer or submicrometer-scale lateral gratings very promising for photonic applications. However, the reduced size of this lateral periodicity hinders standard measurements of refractive index variations. Therefore accurate characterizations of such gratings are usually difficult. In this paper we address this problem by reproducing on a larger scale (millimeter) the micrometer scale light-induced refractive index variations associated to the lateral periodicity. Using this procedure we perform standard X-ray and optical reflectivity measurements on our samples. One can then proceed to the determination of light-induced variations of porosity and refractive index. We present results for p-type samples, where the photo-dissolution can only be realized after the formation of the porous layer, as well as for n⁺-type samples, where light action can only be effective during the formation of the porous layer.     

Porous silica xerogel films as antireflective coatings – Fabrication and characterization

The paper presents a simple fabrication method of porous silica xerogel films. By adding a surface active agent Triton X-100™ to the starting solution, we can considerably reduce the surface tension, which, in turn, allows to fabricate silica films of high porosity. The paper presents the influence of surfactant content and the influence of heating temperature on the refractive index and thickness of the fabricated films. We fabricated silica films of the minimum refractive index below 1.3 and corresponding porosity ∼50%. Due to low refractive index, the elaborated porous silica xerogel films can be applied to reduce the light reflection coefficient in optical systems. In this work the spectral characteristics of the refractive index, extinction coefficients, the reflection and transmission coefficients and also depolarization factor are presented. The paper also provides results of surface morphology of produced layers, obtained using an atomic force microscope.     

Smart optical sensors for chemical substances based on porous silicon technology

A simple geometry optical sensor based on porous silicon technology is theoretically and experimentally studied. We expose some porous silicon optical microcavities with different porous structures to several substances of environmental interest: Very large red shifts in the single transmission peak in the reflectivity spectrum due to changes in the average refractive index are observed. The phenomenon can be ascribed to capillary condensation of vapor phases in the silicon pores. We numerically compute the peak shifts as a function of the liquid volume fraction condensed into the stack by using the Bruggeman theory. The results presented are promising for vapor and liquid detection and identification.     

Characterization of high refractive index semiconductor films by surface plasmon resonance

Si-based surface plasmon resonance (SPR) in the Kretschmann-Raether geometry is considered as a platform for the optical measurement of high refractive index films. The implementation of the SPR effect becomes possible due to the relatively high index of refraction of Si compared to most materials. As examples we study the SPR responses for some important semiconductor-based films, including laser-ablated porous silicon and thin germanium films. Using SPR data, we determine the refractive indices of these films for different parameters (thickness and porosity) and ambiences. We also discuss novel SPR biosensor architectures with the use of these solid films.     

High-performance antireflective coatings with a porous nanoparticle layer for visible wavelengths

Ghosts and flares are well-known problems that are caused by reflections from lens surfaces when we take photographs. It is more difficult to prevent such stray light in a digital camera than in a film camera because of high reflectance from the low-pass filter and diffraction from the image sensor. To prevent such stray light, we introduce an ultralow refractive index layer into the antireflective (AR) coatings. We used the solgel method to form porous fluoride layers with ultralow refractive indices, and we succeeded in developing a unique process to form AR coatings with superior performance.     

Discrete dipole approximation simulations of scattering by particles with hierarchical structure

We use the discrete dipole approximation (DDA) method to calculate the intensity and the linear polarization degree of light scattered by agglomerated debris particles with hierarchical structure as functions of size parameter (varying from x = 2 to x = 14) and phase angle. Such structures are important, e.g., for cometary and interplanetary dust particles. Calculations for three combinations of refractive index were made, which correspond to regions of water ice, organic matter, and silicates. We examine the photometric and polarization properties of agglomerated particles with prefractal (Whitten-Sander model) and nonfractal porous structures of particle fragments formed by dipoles. We find that the aggregated particles can produce significant negative polarization at small phase angles. Increasing the packing density of dipoles and/or refractive index makes the negative polarization more prominent. The depth of the negative polarization branch depends on the type of internal structure: the negative polarization branch of particles having nonfractal structure is noticeably shallower in comparison with that of those having a prefractal structure. The negative polarization branch depth strongly depends on the imaginary part of the refractive index and increases with decreasing absorption. Polarization phase curves for agglomerated debris particles become smoother as the number of hierarchical levels increases.     

Room-temperature formation of low refractive index silicon oxide films using atmospheric-pressure plasma

This study aims to apply atmospheric-pressure (AP) plasma to the fabrication of single-layer anti-reflection (AR) coatings with porous silicon oxide. 150 MHz very high-frequency (VHF) excitation of AP plasma permits to enhance the chemical reactions both in the gas phase and on the film-growing surface, increasing deposition rate significantly. Silicon oxide films were prepared from silane (SiH4) and carbon dioxide (CO2) dual sources diluted with helium. The microstructure and refractive index of the films were studied using infrared absorption and ellipsometry as a function of VHF power density. It was shown that significant increase in deposition rate at room temperature prevented the formation of a dense SiO2 network, decreasing refractive index of the resulting film effectively. As a result, a porous silicon oxide film, which had the lowest refractive index of 1.24 at 632.8 nm, was obtained with a very high deposition rate of 235 nm/s. The reflectance and transmittance spectra showed that the low refractive index film functioned as a quarter-wave AR coating of a glass plate.     

掺锗石英光纤光致折射率变化的实验研究

对掺锗石英光纤的紫外光敏特性进行了实验研究. 实验结果表明: 未载氢光纤经过紫外光照射后折射率变化在10^-4数量级; 而载过氢光纤的折射率变化在10^-3数量级, 比未载氢的 光纤折射率变化提高了一个数量级. 载氢前后光纤的折射率变化随曝光时间的变化规律是不同的, 这表明载氢前后光纤的光敏性微观机理是不同的. 对载氢前后光纤的光敏性机理进 行了分析与讨论, 分别解释了未载氢光纤和载氢光纤的折射率随紫外光曝光时间的变化过程.     

Development of interference filters based on multilayer porous silicon structures

Porous silicon (PS) has a great potential in optical applications due to its tuneable refractive index. In particular, multilayer structures consisting of alternating PS layers with different refractive indices can be used as interference filters for applications in the field of optoelectronics and sensors. In the present work, the optical properties of PS single layers and multilayer structures were studied. Since the refractive index of PS varies depending on the air content of the porous matrix, the PS structures were modelled as an homogeneous mixture of silicon and air, according to the effective medium theories (EMTs). By adjusting the refractive index and thickness of each individual layer, we can obtain a stack of PS layers with the desired optical properties, resulting in interference filters of predetermined bandwidth.     

High quality ZnO layers with adjustable refractive indices for integrated optics applications

Thin ( 1 μm) crystalline ZnO films with a good optical quality and good (0002) texture are grown under two considerably different process parameter sets using a r.f. planar magnetron sputtering unit. The optical parameters of the two corresponding ZnO layers are distinctly different: high refractive index ( 2.0 at λ = 632.8 nm) ZnO films resembling the single crystal form, and ZnO films with considerably lower (typical difference 0.05) refractive indices. The refractive index of the latter ZnO layers is adjustable ( 1.93–1.96 at λ = 632.8 nm) through the process deposition parameters. It is shown that the difference in refractive index between the two ZnO types most probably results from a difference in package density of the crystal columns. The optical waveguide losses of both ZnO types are typically 1–3 dB/cm at λ = 632.8 nm, however the low refractive index ZnO layers need a post-deposition anneal step to obtain these values. The two ZnO types are used to fabricate optical channel-and slab waveguides with small refractive index differences.     

Oxidation of evaporated porous silicon rugate filters

Rugate filters are thin-film optical interference coatings with sinusoidal variation of the refractive index. Several of these filters were fabricated with glancing angle deposition, which exploits atomic competition during growth to create nanoporous materials with controllable effective refractive index. This method enables the fabrication of devices with almost arbitrary refractive index profiles varying between the ambient, 1.0, and the index of the film material, in this case silicon with an index of 4.0 (at 600 nm). As these filters are inherently porous, oxidation of the silicon can occur throughout the device layer, and here we study the intentional oxidation of silicon filters by high-temperature reaction with gaseous oxygen. We find that a significant portion of the silicon filter oxidizes in approximately 10 min when heated to 600 degrees C-650 degrees C in an oxygen environment; oxidation then continues slowly over several hours. The presence of water vapor has little apparent effect on the oxidation reaction, and attempts to oxidize with ozone at room temperature were unsuccessful. As silicon filters oxidize to become silica, spectral blueshifts and increased short-wavelength transmittance are observed. Measured and calculated transmittance spectra generally agree, although the lack of absorption and dispersion in the theoretical model limits detailed comparison.     

Waveguide properties of optical structures fabricated by oxidation of porous silicon

Results of an investigation of the optical properties of channel waveguides fabricated by oxidation of porous silicon are described. The waveguide parameters are estimated and the existence of optical anisotropy is established. The effective refractive index of the dominant quasi-TM waveguide mode is measured. The results suggest that a buffer layer exists between the waveguide and the silicon substrate. It is hypothesized that a second refractive index peak exists within this layer. Pis’ma Zh. Tekh. Fiz. 23, 86–89 (May 26, 1997)     

Some characteristics of porous silicon (Reflection, scattering, refractive index, microhardness)

A porous layer formed on the surface of a silicon single crystal as a result of the electrochemical erosion represents a composite material, in which the energy band structure of silicon is deformed and the refractive index is much smaller compared to that of the single crystal.     

Vacuum evaporated porous silicon photonic interference filters

Porous materials with nanometer-scale structure are important in a wide variety of applications including electronics, photonics, biomedicine, and chemistry. Recent interest focuses on understanding and controlling the properties of these materials. Here we demonstrate porous silicon interference filters, deposited in vacuum with a technique that enables continuous variation of the refractive index between that of bulk silicon and that of the ambient (n approximately 3.5 to 1). Nanometer-scale oscillations in porosity were introduced with glancing angle deposition, a technique that combines oblique deposition onto a flat substrate of glass or silicon in a high vacuum with computer control of substrate tilt and rotation. Complex refractive index profiles were achieved including apodized filters, with Gaussian amplitude modulations of a sinusoidal index variation, as well as filters with index matching antireflection regions. A novel quintic antireflection coating is demonstrated where the refractive index is smoothly decreased to that of the ambient, reducing reflection over a broad range of the infrared spectrum. Optical transmission characterstics of the filters were accurately predicted with effective medium modeling coupled with a calibration performed with spectroscopic ellipsometry.     

Determination of the refractive index of single crystal bulk samples and micro-structures

We present comparative studies for the exact determination of the refractive index of single crystals using spectroscopic ellipsometry and photonic-mode-structure investigations by means of spatially resolved photoluminescence spectroscopy, especially in the near band-gap spectral range. By applying such complementary methods we can overcome the uncertainties in the determination of the bulk refractive index introduced by surface properties. The physical effects used are the electromagnetic field reflection used by spectroscopic ellipsometry at large scale planar single crystals and the whispering-gallery-mode formation by total internal reflection in confined micro-structures. We demonstrate the applicability of such studies using the example of uniaxial ZnO bulk samples and micro-wires. By assuming a surface near region with electronic properties different from the bulk material, the method presented here gives the refractive index dispersion for both types of samples in an energy range from 1 to 3.4 eV.     

Effect of zeolite nanoparticles on the optical properties of diacetone acrylamide-based photopolymer

The effect of zeolite nanoparticles with BEA type framework structure on the optical properties of a diacetone acrylamide (DA)-based holographic photopolymer has been investigated. Both types of zeolite nanocrystals, as synthesized (BEA) and silver containing (BEA-Ag), are used for doping the DA photopolymer. Doping of the DA photopolymer with BEA zeolites results in an 11% decrease of the average refractive index of the nanocomposite layer, while the inclusion of BEA-Ag nanoparticles decreases the average refractive index by 3% only. This observation is in good agreement with the fact that the contrast in refractive index between the host photopolymer and nanoparticles is expected to be much lower for the BEA nanoparticles containing Ag in their pores. Doping of the DA photopolymer with pure BEA zeolite nanoparticles results in a significant increase in refractive index modulation due to holographic recording, Δn, of up to 91% at a concentration of 2 wt.% compared to un-doped layers. For the BEA-Ag zeolites, a maximum increase in Δn of up to 17% at a concentration of 0.5 wt.% is observed. The increase in Δn is attributed to the difference in n between the host photopolymer and nanoparticles and the redistribution of the nanoparticles during holographic recording. It is demonstrated that the DA photopolymer is compatible as a host material for the porous BEA nanoparticles. This is due to the large size of the DA monomer molecules, which restricts monomer migration into the zeolite pores and thus the pores of the Ag-free BEA nanoparticles remain empty, making them suitable for application in holographic sensors.     

Direct reconstruction of complex refractive index distribution from boundary measurement of intensity and normal derivative of intensity

We present an optical tomographic reconstruction method to recover the complex refractive index distribution from boundary measurements based on intensity, which are the logarithm of intensity and normal derivative of intensity. The method, which is iterative, repeatedly implements the forward propagation equation for light amplitude, the Helmholtz equation, and computes appropriate sensitivity matrices for these measurements. The sensitivity matrices are computed by solving the forward propagation equation for light and its adjoint. The results of numerical experiments show that the data types ln(I) and partial differential I/ partial differential n reconstructed, respectively, the imaginary and the real part of the object refractive index distribution. Moreover, the imaginary part of the refractive index reconstructed from partial differential I/ partial differential n and the real part from ln(I) failed to show the object's inhomogeneity. The value of the propagation constant, k, used in our simulations was 50, and this value resulted in smoothing of the reconstructed inhomogeneities. Thus we have shown that it is possible to reconstruct the complex refractive index distribution directly from the measured intensity without having to first find the light amplitude, as is done in most of the currently available reconstruction algorithms of diffraction tomography.     

Effective medium theories for irregular fluffy structures: aggregation of small particles

The extinction efficiencies as well as the scattering properties of particles of different porosity are studied. Calculations are performed for porous pseudospheres with small size (Rayleigh) inclusions using the discrete dipole approximation. Five refractive indices of materials covering the range from 1.20+0.00i to 1.75+0.58i were selected. They correspond to biological particles, dirty ice, silicate, and amorphous carbon and soot in the visual part of the spectrum. We attempt to describe the optical properties of such particles using Lorenz-Mie theory and a refractive index found from some effective medium theory (EMT) assuming the particle is homogeneous. We refer to this as the effective model. It is found that the deviations are minimal when utilizing the EMT based on the Bruggeman mixing rule. Usually the deviations in the extinction factor do not exceed approximately 5% for particle porosity P = 0 - 0.9 and size parameters x(porous) = 2 pi r(s,porous)/lambda < or approximately = 25. The deviations are larger for scattering and absorption efficiencies and smaller for particle albedo and the asymmetry parameter. Our calculations made for spheroids confirm these conclusions. Preliminary consideration shows that the effective model represents the intensity and polarization of radiation scattered by fluffy aggregates quite well. Thus the effective models of spherical and nonspherical particles can be used to significantly simplify the computations of the optical properties of aggregates containing only Rayleigh inclusions.     

Heat transfer in photonic mirrors

The use of secondary mirrors in solar energy concentration is common. However, high concentrated solar radiation heats these mirrors thereby degrading their physical properties. In particular, aluminum mirrors melt because of high temperature due to storage by high radiative heat transfer. In contradistinction photonic crystals could present “perfect reflection” and they can be fabricated using porous silicon which has a higher melting point than aluminum (porous silicon has a melting point higher than 900 K). Porous silicon is a nanostructured semiconductor material which can be fabricated with different porosities and refractive indices. Multilayers of alternating periodic refractive index conform the structure of these photonic crystals. The light that propagates in these structures interacts with its periodic refractive index that generates wavelength gaps of forbidden transmission and so these multilayers conform a mirror. Even these photonic structures are heated when they are exposed to high concentrated solar radiation. In this work we experimentally analyze this heating process and model it using an effective medium approach to explain the increasing temperature behavior.