Mechanisms of charge transport in anisotype <Emphasis Type="Italic">n</Emphasis>-TiO<Subscript>2</Subscript>/<Emphasis Type="Italic">p</Emphasis>-CdTe heterojunctions

Surface-barrier anisotype n-TiO₂/p-CdTe heterojunctions are fabricated by depositing thin titanium-dioxide films on a freshly cleaved surface of single-crystalline cadmium-telluride wafers by reactive magnetron sputtering. It is established that the electric current through the heterojunctions under investigation is formed by generation-recombination processes in the space-charge region via a deep energy level and tunneling through the potential barrier. The depth and nature of the impurity centers involved in the charge transport are determined.     

Electrical Characteristics of <Emphasis Type="Italic">n</Emphasis>-ZnO/<Emphasis Type="Italic">p</Emphasis>-Si Heterojunction Diodes Grown by Pulsed Laser Deposition at Different Oxygen Pressures

Heterojunction diodes of n-type ZnO/p-type silicon (100) were fabricated by pulsed laser deposition of ZnO films on p-Si substrates in oxygen ambient at different pressures. These heterojunctions were found to be rectifying with a maximum forward-to-reverse current ratio of about 1,000 in the applied voltage range of −5 V to +5 V. The turn-on voltage of the heterojunctions was found to depend on the ambient oxygen pressure during the growth of the ZnO film. The current density–voltage characteristics and the variation of the series resistance of the n-ZnO/p-Si heterojunctions were found to be in line with the Anderson model and Burstein-Moss (BM) shift.     

Electrical and gas sensing properties of <Emphasis Type="Italic">por</Emphasis>-Si/SnO<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript> nanocomposite layers

The electrical characteristics and chemical reactant sensitivity of layers of heterogeneous nanocomposites based on porous silicon and nonstoichiometric tin oxide por-Si/SnO _x , fabricated by the magnetron sputtering of tin with subsequent oxidation, are studied. It is shown that, in the nanocomposite layers, a system of distributed heterojunctions (Si/SnO _x nanocrystals) forms, which determine the electrical characteristics of such structures. The sensitivity of test sensor structures based on por-Si/SnO _x nanocomposites to NO₂ is determined. A mechanism for the effect of the adsorption of NO₂ molecules on the current-voltage characteristics of the por-Si(p)/SnO _x (n) heterojunctions is suggested.     

Epitaxial growth and properties of Mg<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript>Zn<Subscript>1-<Emphasis Type="Italic">x</Emphasis></Subscript>O films produced by pulsed laser deposition

The Mg _x Zn_1-x O thin films with a Mg content corresponding to x = 0–0.45 are grown by pulsed laser deposition on ablation of ceramic targets. The conditions for epitaxial growth of the films on the single-crystal Al₂O₃ (00.1) substrates are established. The record limit of solubility of Mg in hexagonal ZnO, x = 35 is attained. In this case, the lattice mismatch for the parameter a of the ZnO and Mg_0.35Zn_0.65O films does not exceed 1%, whereas the band gaps of the films differ by 0.78 eV. The surface roughness of the films corresponds to 0.8–1.5 nm in the range of x = 0–0.27.     

Electrodeposition of <Emphasis Type="Italic">p</Emphasis>-Type Sb<Subscript><Emphasis Type="Italic">x</Emphasis></Subscript>Te<Subscript><Emphasis Type="Italic">y</Emphasis></Subscript> Thermoelectric Films

Thermoelectric Sb _x Te _y films were potentiostatically electrodeposited in aqueous nitric acid electrolyte solutions containing different concentrations of TeO₂. Stoichiometric Sb _x Te _y films were obtained by applying a voltage of −0.15 V versus saturated calomel electrode (SCE) using a solution consisting of 2.4 mM TeO₂, 0.8 mM Sb₂O₃, 33 mM tartaric acid, and 1 M HNO₃. The nearly stoichiometric Sb₂Te₃ films had a rhombohedral structure, R[`3]m R\bar{3}m , with a preferred orientation along the (015) direction. The films had hole concentration of 5.8 × 10¹⁸/cm³ and exhibited mobility of 54.8 cm²/Vs. A more negative potential resulted in higher Sb content in the deposited Sb _x Te _y films. Furthermore, it was observed that the hole concentration and mobility decreased with increasingly negative deposition potential, and eventually showed insulating properties, possibly due to increased defect formation. The absolute value of the Seebeck coefficient of the as-deposited Sb₂Te₃ thin film at room temperature was 118 μV/K.     

A DLTS study of 4<Emphasis Type="Italic">H</Emphasis>-SiC-based <Emphasis Type="Italic">p</Emphasis>-<Emphasis Type="Italic">n</Emphasis> junctions fabricated by boron implantation

Deep-level transient spectroscopy (DLTS) has been used to study p-n junctions fabricated by implantation of boron into epitaxial 4H-SiC films with n-type conductivity and the donor concentration (8–9) × 10¹⁴ cm⁻³. A DLTS signal anomalous in sign is observed; this signal is related to recharging of deep compensating boron-involved centers in the n-type region near the metallurgical boundary of the p-n junction.     

Effects of Growth Temperature on Properties of Nonpolar <Emphasis Type="Italic">a</Emphasis>-Plane ZnO Films on GaN Templates by Pulsed Laser Deposition

In this work, a-plane GaN/r-sapphire templates have been used to grow nonpolar a-plane ZnO films by pulsed laser deposition. The ZnO film growth temperature was varied in the range of 400°C to 600°C, and the effect of growth temperature on the properties of the ZnO thin films was investigated using x-ray diffraction, atomic force microscopy, photoluminescence (PL) spectroscopy, and Raman measurements. The results show that the crystal quality, surface morphology, strain states, and optical properties of a-plane ZnO films are strongly correlated with the deposition temperature. It is found that the crystallinity of the ZnO films gets better and the surface roughness decreases with increasing growth temperature. At a growth temperature of 600°C, the a-ZnO films display the best crystal quality with x-ray (11[`2]0) (11\bar{2}0) omega scan full-width at half-maximum values of 0.28° and 0.41° on axis (11[`2]0) (11\bar{2}0) at azimuth 0° and 90°, respectively. Furthermore, the PL spectrum measured at 83 K is dominated by neutral donor-bound excitons and free-electron-to-bound (e-A ₀) emission, and relatively intense LO-phonon replicas of (e-A ₀) have also been observed in the a-plane ZnO. The dominance of the free exciton and the appearance of its replicas strongly indicate the high quality of the film.     

Power Factor Anisotropy of <Emphasis Type="Italic">p</Emphasis>-Type and <Emphasis Type="Italic">n</Emphasis>-Type Conductive Thermoelectric Bi-Sb-Te Thin Films

The best films for thermoelectric applications near room temperature are based on the compounds Bi₂Te₃, Sb₂Te₃, and Bi₂Se₃, which as single crystals have distinct anisotropy in their electrical conductivity σ regarding the trigonal c-axis, whereas the Seebeck coefficient S is nearly isotropic. For p- and n-type alloys, P _⊥c > P _||c, and the power factors P _⊥c of single crystals are always higher compared with polycrystalline films, where the power factor is defined as P = S ² σ, ⊥c and ||c are the direction perpendicular and parallel to the c-axis, respectively. For the first time in sputter-deposited p-type (Bi_0.15Sb_0.85)₂Te₃ and n-type Bi₂(Te_0.9Se_0.1)₃ thin films, the anisotropy of the electrical conductivity has been measured directly as it depends on the angle φ between the electrical current and the preferential orientation of the polycrystals (texture) using a standard four-probe method. The graphs of σ(φ) show the expected behavior, which can be described by a weighted mixture of σ _⊥c and σ _||c contributions. Because (σ _⊥c/σ _||c) _p  < (σ _⊥c/σ _||c) _n , the n-type films have stronger anisotropy than the p-type films. For this reason, the angular weighted contributions of P _||c lead to a larger drop in the power factor of polycrystalline n-type films compared with p-type films.     

<Emphasis Type="Italic">p</Emphasis><Superscript>+</Superscript>-Si-<Emphasis Type="Italic">n</Emphasis>-CdF<Subscript>2</Subscript> heterojunctions

Boron diffusion and the vapor-phase deposition of silicon layers are used to prepare ultrashallow p⁺-n junctions and p⁺-Si-n-CdF₂ heterostructures on an n-CdF₂ crystal surface. Forward portions of the I–V characteristics of the p⁺-n junctions and p⁺-Si-n-CdF₂ heterojunctions reveal the CdF₂ band gap (7.8 eV), as well as allow the identification of the valence-band structure of cadmium fluoride crystals. Under conditions in which forward bias is applied to the p⁺-Si-n-CdF₂ heterojunctions, electroluminescence spectra are measured for the first time in the visible spectral region.     

Electrical properties of <Emphasis Type="Italic">n-</Emphasis>GaN/<Emphasis Type="Italic">p</Emphasis>-SiC heterojunctions

Epitaxial GaN layers were grown by hydride vapor phase epitaxy (HVPE) on commercial (CREE Inc., USA) p⁺-6H-SiC substrates (Na ? Nd ≈ 7.8 × 10¹⁷ cm^s?3) and n⁺-6H-SiC Lely substrates with a predeposited p⁺-6H-SiC layer. A study of the electrical properties of the n-GaN/p-SiC heterostructures obtained confirmed their fairly good quality and demonstrated that the given combination of growth techniques is promising for fabrication of bipolar and FET transistors based on the n-GaN/p-SiC heterojunctions.     

Spectral photosensitivity of <Emphasis Type="Italic">a</Emphasis>-SiGe:H/<Emphasis Type="Italic">c</Emphasis>-Si heterostructures

Characteristics of a-SiGe:H/c-Si heterostructures produced by rapid plasma-chemical low-frequency (55 kHz) deposition are studied. High photosensitivity of a-SiGe:H films is established. The spectral position of the maximum of photosensitivity of a a-SiGe:H/c-Si heterostructure can be varied from 830 to 920 nm by increasing the content of germanium in an a-SiGe:H alloy and decreasing its band gap.     

Thin-film polycrystalline <Emphasis Type="Italic">n</Emphasis>-ZnO/<Emphasis Type="Italic">p</Emphasis>-CuO heterojunction

Results of X-ray diffraction and spectral-optical studies of n-ZnO and p-CuO films deposited by gas-discharge sputtering with subsequent annealing are presented. It is shown that, despite the difference in the crystal systems, the polycrystallinity of n-ZnO and p-CuO films enables fabrication of a heterojunction from this pair of materials.     

Parameters of ZnO films with <Emphasis Type="Italic">p</Emphasis>-type conductivity deposited by high-frequency magnetron sputtering

It is demonstrated that a reduction in the defect concentration in ZnO films formed by high-frequency magnetron sputtering allows effective doping with acceptor impurities both in the cation (Li) and anion (N⁺) sublattices and p-type conductivity with reproducible charge-carrier parameters (concentration and mobility) to be obtained. ZnO films are doped with nitrogen by annealing in a high-frequency gas discharge atmosphere. Hall measurements by the Van der Pauw technique show that the deposition of thin Eu layers on the ZnO film surface increases the concentration and mobility of majority charge carriers. The embedding of metal impurities with different ionic radii (Ag and Au) in the cation sublattice of the ZnO films to compensate misfit stresses makes it possible to enhance the concentration of radiative-recombination centers.     

Fabrication and photoelectric properties of <Emphasis Type="Italic">n</Emphasis>-ZnO:Al/Pd<Emphasis Type="Italic">Pc/p</Emphasis>-Si structures

Photosensitive n-ZnO:Al/PdPc/p-Si structures were fabricated by vacuum sublimation of palladium phthalocyanine with subsequent magnetron sputtering of ZnO:Al films on p-Si substrates. The current transport mechanisms and the photosensitivity of the structures obtained were investigated. It is shown that structures based on PdPc films are promising for photosensitive devices based on contacts between organic and inorganic semiconductors.     

Photoelectric phenomena in ZnO:Al-<Emphasis Type="Italic">p</Emphasis>-Si heterostructures

Al-doped zinc-oxide (ZnO:Al) films are obtained by magnetron sputtering. Based on an investigation of electrical properties of the films, it is shown that the electron density in these films is as high as 5×10²⁰ cm⁻³ and is practically constant in the temperature range 77–300 K, which indicates high efficiency of doping ZnO with an Al impurity. It is found that the deposition of thin films (d≈1 μm) on the p-Si(111) surface leads to the formation of heterostructures with the highest photosensitivity of ∼400 V/W at T=300 K, which oscillates in the spectral range 1.3–3.5 eV. With the oblique incidence of linearly polarized radiation, induced pleochroism emerges in such heterostructures. The magnitude of pleochroism oscillates in the range 5–40% (θ≈75°), which is associated with the interference phenomena in the ZnO films. The prospects of using the heterostructures obtained as highly selective photosensors of natural and linearly polarized radiation are considered. __________ Translated from Fizika i Tekhnika Poluprovodnikov, Vol. 37, No. 11, 2003, pp. 1329–1333. Original Russian Text Copyright ? 2003 by Nikitin, Nikolaev, Polushina, V. Rud’, Yu. Rud’, Terukov.     

An ultra-low-power CMOS symmetrical OTA for low-frequency <Emphasis Type="Italic">G</Emphasis><Subscript><Emphasis Type="Italic">m</Emphasis></Subscript>-<Emphasis Type="Italic">C</Emphasis> applications

In this paper an ultra-low-power CMOS symmetrical operational transconductance amplifier (OTA) for low-frequency G _m -C applications in weak inversion is presented. Its common mode input range and its linear input range can be made large using DC shifting and bulk-driven differential pair configuration (without using complex approaches). The symmetrical OTA was successfully verified in a standard CMOS 0.35-μm process. The measurements show an open loop gain of 61 dB and a unit gain frequency of 195 Hz with only 800 mV of power supply voltage and just 40 nW of power consumption. The transconductance is 66 nS, which is suitable for low-frequency G _m -C applications.     

Low-Power FPGA-Implementation of <Emphasis Type="Italic">atan</Emphasis>(<Emphasis Type="Italic">Y</Emphasis>/<Emphasis Type="Italic">X</Emphasis>) Using Look-Up Table Methods for Communication Applications

This paper presents an architecture for the computation of the atan(Y/X) operation suitable for broadband communication applications where a throughput of 20 MHz is required. The architecture takes advantage of embedded hard-cores of the FPGA device to achieve lower power consumption with respect to an atan(Y/X) operator based on CORDIC algorithm or conventional LUT-based methods. The proposed architecture can compute the atan(Y/X) with a latency of two clock cycles and its power consumption is 49% lower than a CORDIC or 46% lower than multipartite approach.

Characterization of an <Emphasis Type="Italic">a</Emphasis>-Si:H/<Emphasis Type="Italic">c</Emphasis>-Si interface by admittance spectroscopy

The capabilities of admittance spectroscopy for the investigation of a-Si:H/c-Si heterojunctions are presented. The simulation and experimental results, which compare very well, show that the admittance technique is sensitive to the parameters of both the a-Si:H layer and the a-Si:H/c-Si interface quality. In particular, the curves showing capacitance versus temperature have two steps, accompanied by two bumps in the temperature dependence of the conductance. The first step, occurring in the low temperature range (100–200 K), is related to the transport and response of gap states in the a-Si:H layer. The second step, occurring at higher temperatures (>200 K), is caused by a carrier exchange with interface states and appears when the interface defect density exceeds 5 × 10¹² cm^?2. Then, the interface defects affect band bending, and, thus, the activation energy of de-trapping, which favors exchange with electrons from a-Si:H and holes from c-Si, respectively, for an increasing defect density.     

Recombination of charge carriers in the GaAs-based <Emphasis Type="Italic">p</Emphasis>-<Emphasis Type="Italic">i</Emphasis>-<Emphasis Type="Italic">n</Emphasis> diode

It is established that the radiative recombination of charge carriers plays a substantial role in the GaAs-based p-i-n diodes at high densities of the forward current. It is shown experimentally that the diodes operating in microwave integrated circuits intensely emit light in the IR range with wavelengths from 890 to 910 nm. The obtained results indicate the necessity of taking into account the features of recombination processes in the GaAs-based microwave p-i-n diodes.     

Practical Surface Treatments and Surface Chemistry of <Emphasis Type="Italic">n</Emphasis>-Type and <Emphasis Type="Italic">p</Emphasis>-Type GaN

X-ray and ultraviolet photoelectron spectroscopies (XPS and UPS) were used to study the electronic structure of n-GaN and p-GaN(0001) surfaces after three ex situ surface treatments: aq-HCl, annealing in NH₃, and annealing in HCl vapor. The combination of in situ vacuum annealing and re-exposure of samples to air revealed that the adsorption of ambient contaminants can reduce the surface state density and subsequent band bending on both n-GaN and p-GaN surfaces. Insights derived from first-principles calculations of the adsorption of relevant species on the Ga-terminated GaN(0001) surface are used to explain these experimental observations qualitatively.