短沟道MOSFET散粒噪声测试方法研究

针对MOSFET散粒噪声难以测量的特点,提出了一种低温散粒噪声测试方法。在屏蔽环境下,将被测器件置于低温装置内,有效抑制了外界电磁波和热噪声的干扰,采用背景噪声足够低的放大器以及偏置器、适配器等,建立低温散粒噪声测试系统。应用本系统对短沟道MOSFET器件进行噪声测试,分析该器件散粒噪声的特性。     

散粒噪声时间序列测试方案研究

散粒噪声携带纳米结构与器件载流子输运丰富的信息,为了提取这些信息,需要完整地测量散粒噪声时间序列.文中从全计数统计(FCS)学对噪声信号分析需求出发,通过分析散粒噪声特点和影响因素,提出了一种实现纳米结构与器件散粒噪声时间序列的测试方案,并论证了方案实现的方法.     

纳米MOSFET器件电流噪声测试方法研究

针对常规纳米尺度电子元器件的噪声特性,研究其噪声的基本测试条件,并建立测试系统。在屏蔽条件下采用低温装置和超低噪声前置放大器,能有效抑制外界干扰。应用该系统对实际纳米MOSFET器件进行噪声测试得到其电流噪声,在测试基础上通过计算分别得到热噪声和散粒噪声,同时分析器件工作在亚阈区和反型区下的电流噪声随源漏电压和电流的变化关系。结果表明测试结果与理论分析吻合,验证了测试系统的准确性。     

20 nm金属氧化物半导体场效应晶体管的噪声特性分析北大核心CSCD

传统短沟道的纳米MOSFET噪声主要为受抑制的散粒噪声,其次为热噪声;在建立器件的噪声模型时,并没有考虑栅极噪声源与源极噪声源二者之间的电荷耦合,其耦合效应会形成互相关噪声。实验测试了20 nm MOSFET的噪声,结果分析得到短沟道MOSFET的噪声主要为散粒噪声、热噪声和互相关噪声。其次,根据MOSFET的器件物理结构及特性推导了纳米MOSFET的互相关噪声公式。在此基础上,比较受抑制的散粒噪声、热噪声和互相关噪声随沟道长度、温度、源漏电压和栅极电压的变化关系,所得结论有助于提高MOSFET器件的工作效率、可靠性及寿命。     

散粒噪声用于纳米电子器件与结构的量子效应表征

论述了纳米电子器件与结构中散粒噪声的产生机理和影响因素,表明散粒噪声与输运过程密切相关,按照噪声功率谱的幅值大小将散粒噪声分为泊松散粒噪声、亚泊松散粒噪声和超泊松散粒噪声四类。将散粒噪声的这些规律应用于纳米电子器件和结构,可表征不同器件与结构中的量子效应。利用散粒噪声已经成功检测到无序导线中的开放通道与量子点混沌腔中的波动性,测量出超导体与分数量子霍尔效应中的准粒子电荷。将散粒噪声用于检测纠缠态对量子计算具有重要的意义,自旋相干输运的检测是自旋电子学的重要研究课题。     

物联传感网噪声过滤的自适应线性权值算法

针对物联传感网络由于数据类型不一致造成散粒噪声.提出一种物联传感网络散粒噪声过滤的自适应线性权值算法.提取物联传感网络散粒噪声特征参数,对上述参数进行线性变换,获取噪声关联特征参数自适应线性权值,完成物联传感网络散粒噪声过滤.实验表明,该算法能够有效过滤物联传感网络中的散粒噪声,取得了令人满意的结果.     

改进权值算法在物联网噪声过滤中应用

提出了一种自适应线性权值算法过滤传感网散粒噪声,算法首先提取散粒噪声的特征参数,然后对参数进行线性迭代变换,计算获得自适应权值参数,从而有效实现对散粒噪声的过滤。实验结果表明,该算法能过滤传感网中的散粒噪声,且效果良好。     

电流调制激光引入的非稳散粒噪声的测量

利用锁相放大器,结合对Labview 软件编程,研究了电流调制激光引入的非稳散粒噪 声。通过对噪声功率谱的多次平均和快速傅立叶变换,有效地测量了非稳散粒噪声的频谱特性,研究结果表明非稳散粒噪声具有确定的相位依赖特性。     

外加磁场对含双δ势垒的铁磁/半导体/铁磁异质结中自旋输运和散粒噪声的影响

研究了外磁场存在时,含双δ势垒的铁磁/半导体/铁磁异质结中自旋相关的透射概率和散粒噪声,讨论了量子尺寸效应和Rashba自旋轨道耦合效应.研究结果表明:不同自旋取向的电子隧穿异质结时,透射概率和散粒噪声随半导体长度的变化特性是作等幅振荡;外加磁场和Rashba自旋轨道耦合强度的增强都会加大透射概率和散粒噪声的振荡频率;外加磁场角度的改变会改变散粒噪声的振荡频率;双δ势垒的存在增大了自旋电子透射概率的振幅.     

散粒噪声分布探讨

本文对数字光纤通信系统中的散粒噪声进行了分析、研究。在考虑了接收机传输特性的基础上,给出了散粒噪声分布向高斯分布转化的条件。同时指出改善高斯近似精度的方法。     

Low-frequency excess noise in metal—Silicon Schottky barrier diodes

Theoretical models for the generation-recombination noise and trapping noise in metal-semiconductor Schottky barrier diodes are developed. Low-frequency excess noise in Schottky barrier diodes is found to be dominated by the modulation of the barrier height φB caused by fluctuation in the charge state of traps or generation-recombination centers. This noise mechanism does not occur in p-n junctions. The bias and the temperature dependence of the generation-recombination noise is critically compared with the experimental data for forward diode current ranges from 3 to 300 µA and operating temperatures from -25° to 100°C. Trapping noise in Schottky barrier diodes is observed at low temperatures in diodes not intentionally doped with deep level impurities. The experimental results on trapping noise can be described by assuming that the trap states have a constant capture cross section and are uniformly distributed in space, as well as in energy. The surface potential at the diode periphery also has an important effect on the Schottky barrier diode noise. The best low-frequency noise behavior is found when the surface is at the flat-band condition. An accumulated surface is always associated with a large amount of low-frequency excess noise.     

太赫兹肖特基二极管噪声电压的理论研究

在太赫兹焦平面成像等系统中,GaAs肖特基二极管作为太赫兹检测的核心器件,其噪声特性直接影响太赫兹探测系统的灵敏度。讨论了GaAs肖特基二极管在不同直流偏压下加载给负载的热噪声电压、散粒噪声电压、总噪声电压,并给出了相应的解析解。同时,建模模拟了太赫兹混频前端,并利用谐波平衡法对理论公式进行了对比验证。对太赫兹像元与阵列芯片的噪声机理以及提高芯片的噪声性能研究,改善芯片噪声特性,从而提高太赫兹焦平面成像系统灵敏度具有重要意义和作用。     

Monte Carlo simulation of noise in GaAs semiconductor devices

The Monte Carlo method has been used to calculate the noise in GaAs resistors where finite-size effects are important, being from 0.5 to 1.5 μm in length. The results agree qualitatively with experimental noise measurements performed on similar devices. Monte Carlo noise calculations have also been conducted for Schottky barrier diodes. A method for conducting full-device Monte Carlo simulations of these diodes has been employed. Schottky barrier diodes with both 0.12 and 1.0 μm epitaxial layers were modeled, and the calculated noise is in agreement with experiment throughout a wide range of bias voltages, both when shot noise and when excess noise predominate. Two different methods of calculating the noise current have been compared     

High Doping Density Schottky Diodes in the 3MM Wavelength Cryogenic Heterodyne Receiver

The paper describes a 3mm cryogenic mixer receiver using high doping density (“room-temperature”) Schottky diodes. The measured equivalent noise temperature T_eq of the diodes is 109 K at 20 K, which is much higher than the T_eq of the low doping density (“cryogenic”) diodes. In spite of this, the double-sideband (DSB) noise temperature of the cryogenic receiver developed is 55 K at 110 GHz, owing to the low conversion loss of the mixer and ultra-low noise of the PHEMT IF amplifier. This is the lowest noise temperature ever reported for a Schottky diode mixer receiver. The results obtained are useful for the development of submm receivers in which high doping density Schottky diodes are used.     

Influence of low-temperature thermotreatment on the characteristics of Cr-GaAs and Au-Cr-GaAs Schottky diodes

The effect of low-temperature heating on the electric and recombination parameters of Schottky diodes are investigated.     

Fabrication and performance of GaAs p+n junction and Schottky barrier millimeter IMPATT's

A recently developed procedure, incorporating both preferential electrochemical etching for wafer thinning and electroplating for heat sink formation has been applied to the fabrication of Kaband (26.5-40 GHz) GaAs IMPATT's. Both epitaxially grown GaAs p⁺n junction and Cr Schottky barrier diodes have been fabricated. This procedure makes possible the batch fabrication of small area diodes (<2 times 10^{-5}cm²) over a large wafer area. The diodes have been operated both in the oscillator and stable-amplifier mode. Power, efficiency, and noise performance of the devices is reported. The p⁺n diodes, which could withstand junction temperature of over 300°C, gave the best power and efficiency. Powers as high as 680 mW with 12.4 percent efficiency at 34.8 GHz and an efficiency as high as 16 percent with 390 mW at 29.5 GHz have been achieved. The Cr Schottky diodes were unable to withstand junction temperatures in excess of 200°C and therefore produced less power despite the potentially better power handling capability. The highest power obtained from a Cr Schottky is 470 mW with 12.5 percent efficiency at 34 GHz. Comparable oscillator noise performance has been obtained with both types of diode. The best AM (DSB) double sideband NSR obtained is -135 dB in a 100 Hz window at 1.5 MHz from the carrier. An rms frequency deviation as low as 13 Hz in a 100 Hz window has been observed with a power output of 164 mW at 35.4 GHz by raising the external Q to 138. A lowest FM noise measure of 23 dB was achieved by reducing output power to 16 mW. The amplifier noise figure measured for both p⁺n and Cr Schottky diodes is 26 dB.     

AN UNCOOLED VERY LOW NOISE SCHOTTKY DIODE RECEIVER FRONT-END FOR MIDDLE ATMOSPHERIC OZONE AND CARBON MONOXIDE MEASUREMENTS

The paper describes an uncooled front-end of the Schottky diode receiver system, which may be applied for observations of middle atmospheric ozone and carbon monoxide thermal emission lines at frequencies 110.8 GHz and 115.3 GHz, respectively. The mixer of the front-end has utilized high-quality Schottky diodes that allowed us to reduce the mixer conversion loss. The combination of the mixer and an ultra-low-noise IF amplifier in the one integrated unit has resulted in double-sideband (DSB) receiver noise temperature of 260 K at a local oscillator (LO) frequency of 113.05 GHz in the instantaneous IF band from 1.7 to 2.7 GHz. This is the lowest noise temperature ever reported for an uncooled ozone receiver system with Schottky diode mixers.     

Low-Temperature Annealing of Lightly Doped n-4H-SiC Layers after Irradiation with Fast Electrons

Semiconductors - The effect of low-temperature (up to 600°C) isothermal and isochronous annealing on the electrical characteristics of irradiated n-4H-SiC JBS Schottky diodes is studied....     

Flicker noise by random walk of electrons at the interface in nonideal Schottky diodes

An explanation of low frequency 1/f noise in nonideal Schottky barrier diodes is presented where the current fluctuation is attributed to the random walk of electrons at the metal-semiconductor interface via modulation of the barrier height. The experimental results on TiN/n-Si Schottky diodes have been successfully analysed to give useful information on the interface states.     

Shot noise in silicon Schottky barrier diodes

Noise measurements have been performed on forward and reverse-biased silicon Schottky barrier diodes. Measurements were performed in the frequency range of 100 Hz to 50 kHz. Apart from excess noise observed for some diodes in a portion of this frequency range, the noise for the diodes was found to be in excellent agreement with shot-noise theory. Some refinements of the shot-noise theory have been considered, but the difference between the refined and the simple theories was not resolvable in our measurements. A useful noise-measurement technique is described.