Lateral, Ge, nanowire growth on SiO2

Vapor-liquid-solid (VLS) nanowires (NWs) typically grow in [111] directions. Previously, the authors have demonstrated guided Si NW growth, engineering the VLS NWs to grow in a [110] direction against a SiO(2) surface. In this work, the authors demonstrate guided high-quality Ge nanowire growth against a SiO(2) surface in the substrate plane to bridge between two Si mesas. The authors explore the interfaces between a Ge NW and the two Si device-layer mesas and report high-quality, epitaxial interfaces between the Ge NW and both Si mesas.     

ZnO nanowire UV photodetectors with high internal gain

ZnO nanowire (NW) visible-blind UV photodetectors with internal photoconductive gain as high as G approximately 108 have been fabricated and characterized. The photoconduction mechanism in these devices has been elucidated by means of time-resolved measurements spanning a wide temporal domain, from 10-9 to 102 s, revealing the coexistence of fast (tau approximately 20 ns) and slow (tau approximately 10 s) components of the carrier relaxation dynamics. The extremely high photoconductive gain is attributed to the presence of oxygen-related hole-trap states at the NW surface, which prevents charge-carrier recombination and prolongs the photocarrier lifetime, as evidenced by the sensitivity of the photocurrrent to ambient conditions. Surprisingly, this mechanism appears to be effective even at the shortest time scale investigated of t < 1 ns. Despite the slow relaxation time, the extremely high internal gain of ZnO NW photodetectors results in gain-bandwidth products (GB) higher than approximately 10 GHz. The high gain and low power consumption of NW photodetectors promise a new generation of phototransistors for applications such as sensing, imaging, and intrachip optical interconnects.     

Recent advances in germanium nanocrystals: Synthesis,optical properties and applications

Germanium nanocrystals (Ge NCs) have recently attracted renewed scientific interest as environmentally friendlier alternatives to classical II–VI and IV–VI QDs containing toxic elements such as Hg, Cd and Pb. Importantly, Ge NCs are nontoxic, biocompatible, and electrochemically stable. An essential requirement is the ability to prepare Ge NCs with narrow size distributions and well characterized surface chemistry, as these define many of their photophysical properties. However, a thorough discussion on these criteria has not been achieved to date. Here, size, surface control, and mechanisms for light emission in Ge NCs are discussed and their exciting recent applications are highlighted. The beneficial properties of Ge NCs suggest that this material can improve the performance of numerous devices like solar cells, photodetectors, and lithium ion batteries.     

Layer-by-layer assembly of nanowires for three-dimensional, multifunctional electronics

We report a general approach for three-dimensional (3D) multifunctional electronics based on the layer-by-layer assembly of nanowire (NW) building blocks. Using germanium/silicon (Ge/Si) core/shell NWs as a representative example, ten vertically stacked layers of multi-NW field-effect transistors (FETs) were fabricated. Transport measurements demonstrate that the Ge/Si NW FETs have reproducible high-performance device characteristics within a given device layer, that the FET characteristics are not affected by sequential stacking, and importantly, that uniform performance is achieved in sequential layers 1 through 10 of the 3D structure. Five-layer single-NW FET structures were also prepared by printing Ge/Si NWs from lower density growth substrates, and transport measurements showed similar high-performance characteristics for the FETs in layers 1 and 5. In addition, 3D multifunctional circuitry was demonstrated on plastic substrates with sequential layers of inverter logical gates and floating gate memory elements. Notably, electrical characterization studies show stable writing and erasing of the NW floating gate memory elements and demonstrate signal inversion with larger than unity gain for frequencies up to at least 50 MHz. The ability to assemble reproducibly sequential layers of distinct types of NW-based devices coupled with the breadth of NW building blocks should enable the assembly of increasing complex multilayer and multifunctional 3D electronics in the future.     

Influence of radial stress on the performance of gate-all-around Ge(110) NW FETs with HfO2 dielectric

In this work, a simulation method from strained valence band structures to strained mobility calculation to consider a radial stress at the boundary of HfO2 gate dielectric surrounding Ge(110) nanowire is developed. The simulation implements the radial stress to strain distribution calculation via finite element method and then to valence band calculation. The radial stress at the boundary of gate dielectric pushes the valence subbands downwards in contrast with lattice mismatch strain effects between Ge NW and gate dielectric. The impact of the radial stress on the hole effective masses and density of states of HfO2 gate dielectric surrounding Ge(110) nanowire are also investigated. The potential distribution and holes density distribution are calculated by solving the 2D Poisson equation and Schr?dinger equation self-consistently in NW cross section. Hole mobility is obtained by modified Kubo-Greenwood formula. Based on strained valence band structures, the hole density distribution in cross-sectional Ge(110) NW reduces with larger radial stress value. The phonon scattering-limited hole mobility in NW significantly increases as the radial stress increases.     

Electrical transport of bottom-up grown single-crystal Si(1-x)Ge(x) nanowire

In this work, we fabricated an Si(1-x)Ge(x) nanowire (NW) metal-oxide-semiconductor field-effect transistor (MOSFET) by using bottom-up grown single-crystal Si(1-x)Ge(x) NWs integrated with HfO(2) gate dielectric, TaN/Ta gate electrode and Pd Schottky source/drain electrodes, and investigated the electrical transport properties of Si(1-x)Ge(x) NWs. It is found that both undoped and phosphorus-doped Si(1-x)Ge(x) NW MOSFETs exhibit p-MOS operation while enhanced performance of higher I(on)～100?nA and I(on)/I(off)～10(5) are achieved from phosphorus-doped Si(1-x)Ge(x) NWs, which can be attributed to the reduction of the effective Schottky barrier height (SBH). Further improvement in gate control with a subthreshold slope of 142?mV?dec(-1) was obtained by reducing HfO(2) gate dielectric thickness. A comprehensive study on SBH between the Si(1-x)Ge(x) NW channel and Pd source/drain shows that a doped Si(1-x)Ge(x) NW has a lower effective SBH due to a thinner depletion width at the junction and the gate oxide thickness has negligible effect on effective SBH.     

A Triode Device with a Gate Controllable Schottky Barrier: Germanium Nanowire Transistors and Their Applications

Electrical contacts often dominate charge transport properties at the nanoscale because of considerable differences in nanoelectronic device interfaces arising from unique geometric and electrostatic features. Transistors with a tunable Schottky barrier between the metal and semiconductor interface might simplify circuit design. Here, germanium nanowire (Ge NW) transistors with Cu₃Ge as source/drain contacts formed by both buffered oxide etching treatments and rapid thermal annealing are reported. The transistors based on this Cu₃Ge/Ge/Cu₃Ge heterostructure show ambipolar transistor behavior with a large on/off current ratio of more than 10⁵ and 10³ for the hole and electron regimes at room temperature, respectively. Investigations of temperature‐dependent transport properties and low‐frequency current fluctuations reveal that the tunable effective Schottky barriers of the Ge NW transistors accounted for the ambipolar behaviors. It is further shown that this ambipolarity can be used to realize binary‐signal and data‐storage functions, which greatly simplify circuit design compared with conventional technologies.     

Germanium nanowires with 3-nm-diameter prepared by low temperature vapour-liquid-solid chemical vapour deposition

We report the growth of germanium nanowires (Ge NWs) with single-step temperature method via vapour-liquid-solid (VLS) mechanism in the low pressure chemical vapour deposition (CVD) reactor at 300 degrees C, 280 degrees C, and 260 degrees C. The catalyst used in our experiment was Au nanoparticles with equivalent thicknesses of 0.1 nm (average diameter approximately 3 nm), 0.3 nm (average diameter approximately 4 nm), 1 nm (average diameter approximately 6 nm), and 3 nm (average diameter approximately 14 nm). The Gibbs-Thomson effect was used to explain our experimental results. The Ge NWs grown at 300 degrees C tend to have tapered structure while the Ge NWs grown at 280 degrees C and 260 degrees C tend to have straight structure. Tapering was caused by the uncatalysed deposition of Ge atoms via CVD mechanism on the sidewalls of nanowire and significantly minimised at lower temperature. We observed that the growth at lower temperature yielded Ge NWs with smaller diameter and also observed that the diameter and length of Ge NWs increases with the size of Au nanoparticles for all growth temperatures. For the same size of Au nanoparticles, Ge NWs tend to be longer with a decrease in temperature. The Ge NWs grown at 260 degrees C from 0.1-nm-thick Au had diameter as small as approximately 3 nm, offering an opportunity to fabricate high-performance p-type ballistic Ge NW transistor, to realise nanowire solar cell with higher efficiency, and also to observe the quantum confinement effect.     

Sb(2)O(3) nanobelt networks for excellent visible-light-range photodetectors

Excellent photoconductive properties have been found in Sb(2)O(3) nanobelts synthesized by a surfactant-assisted solvothermal method. Visible-light photodetectors have been designed from Sb(2)O(3) nanobelt networks using micrometer-wide gold wires as masks. Photodetectors show high sensitivity to visible light, high stability, and reproducibility. Fast response and decay times (<0.3 s) are comparable or even better than these parameters in many other metal oxide nanoscale photodetectors. The dominant mechanism of excellent photoconductivity is attributed to the barrier height modulations in the nanobelt-to-nanobelt contact regions. These results demonstrate that Sb(2)O(3) nanobelt networks can indeed serve as high-performance photodetectors in the visible light range.     

Polarization-sensitive nanowire photodetectors based on solution-synthesized CdSe quantum-wire solids

Polarization-sensitive photodetectors are demonstrated using solution-synthesized CdSe nanowire (NW) solids. Photocurrent action spectra taken with a tunable white light source match the solution linear absorption spectra of the NWs, showing that the NW network is responsible for the device photoconductivity. Temperature-dependent transport measurements reveal that carriers responsible for the dark current through the nanowire solids are thermally excited across CdSe band gap. The NWs are aligned using dielectrophoresis between prepatterned electrodes using conventional optical photolithography. The photocurrent through the NW solid is found to be polarization-sensitive, consistent with complementary absorption (emission) measurements of both single wires and their ensembles. The range of solution-processed semiconducting NW materials, their facile synthesis, ease of device fabrication, and compatibility with a variety of substrates make them attractive for potential nanoscale polarization-sensitive photodetectors.     

Composition and local strain mapping in Au-catalyzed axial Si/Ge nanowires

For most applications, heterostructures in nanowires (NWs) with lattice mismatched materials are required and promise certain advantages thanks to lateral strain relaxation. The formation of Si/Ge axial heterojunctions is a challenging task to obtain straight, defect free and extended NWs. And the control of the interface will determine the future device properties. This paper reports the growth and analysis of NWs consisting of an axial Si/Ge heterostructure grown by a vapor-liquid-solid process. The composition gradient and the strain distribution at the heterointerface were measured by advanced quantitative electron microscopy methods with a resolution at the nanometer scale. The transition from pure Ge to pure Si shows an exponential slope with a transition width of 21?nm for a NW diameter of 31?nm. Although diffuse, the heterointerface makes possible strain engineering along the axis of the NW. The interface is dislocation-free and a tensile out-of-plane strain is noticeable in the Ge section of the NW, indicating a lattice accommodation. Experimental results were compared to finite element calculations.     

Growth of Ge-Si nanowire heterostructures via chemical vapor deposition

The growth of Ge-Si and Ge-Si nanowire (NW) heterostructures was demonstrated via chemical vapor deposition. Due to the influence of interface energy, differing topographies of the heterostructures were observed. On initially grown Ge NWs, numerous Si NW branches were grown near the tip due to Au migration. However, on initially grown Si NWs, high-density Ge nanodots were observed.     

Molecular beam epitaxy grown GeSn p-i-n photodetectors integrated on Si

GeSn p-i-n photodetectors with a low Sn mole fraction made by molecular beam epitaxy on Si substrates show higher optical responsivities for wavelength λ > 1400 nm compared with p-i-n photodetectors made from pure Ge. The Sn incorporation in Ge is done by a low temperature growth step in order to minimize Sn segregation. The Sn incorporation and the alloy content are investigated by μ-Raman spectroscopy and calibrated Secondary Ion Mass Spectrometry. The photodetectors are manufactured with sharp doping transitions and are realized as double mesa structures with diameters from 1.5 μm up to 80 μm. The optical measurements are carried out with a broadband super continuum laser from λ = 1200 nm up to λ = 1700 nm. At a wavelength of λ = 1550 nm the optical responsivity of these vertical GeSn diodes is 0.1 A/W. In comparison with a pure Ge detector of the same geometrical dimensions the optical responsivity is increased by factor of three as a result of Sn caused band gap reduction.     

Role of confinement on carrier transport in Ge-Si(x)Ge(1-x) core-shell nanowires

We examine the impact of shell content and the associated hole confinement on carrier transport in Ge-Si(x)Ge(1-x) core-shell nanowires (NWs). Using NWs with different Si(x)Ge(1-x) shell compositions (x = 0.5 and 0.7), we fabricate NW field-effect transistors (FETs) with highly doped source/drain and examine their characteristics dependence on shell content. The results demonstrate a 2-fold higher mobility at room temperature, and a 3-fold higher mobility at 77K in the NW FETs with higher (x = 0.7) Si shell content by comparison to those with lower (x = 0.5) Si shell content. Moreover, the carrier mobility shows a stronger temperature dependence in Ge-Si(x)Ge(1-x) core-shell NWs with high Si content, indicating a reduced charge impurity scattering. The results establish that carrier confinement plays a key role in realizing high mobility core-shell NW FETs.     

High‐Responsivity Graphene/InAs Nanowire Heterojunction Near‐Infrared Photodetectors with Distinct Photocurrent On/Off Ratios

Graphene is a promising candidate material for high‐speed and ultra‐broadband photodetectors. However, graphene‐based photodetectors suffer from low photoreponsivity and I_light/I_dark ratios due to their negligible‐gap nature and small optical absorption. Here, a new type of graphene/InAs nanowire (NW) vertically stacked heterojunction infrared photodetector is reported, with a large photoresponsivity of 0.5 AW^?1 and I_light/I_dark ratio of 5 × 10², while the photoresponsivity and I_light/I_dark ratio of graphene infrared photodetectors are 0.1 mAW^?1 and 1, respectively. The Fermi level (E_F ) of graphene can be widely tuned by the gate voltage owing to its 2D nature. As a result, the back‐gated bias can modulate the Schottky barrier (SB) height at the interface between graphene and InAs NWs. Simulations further demonstrate the rectification behavior of graphene/InAs NW heterojunctions and the tunable SB controls charge transport across the vertically stacked heterostructure. The results address key challenges for graphene‐based infrared detectors, and are promising for the development of graphene electronic and optoelectronic applications.     

Metastable Ge1-xCx alloy nanowires

Carbon-containing alloy materials such as Ge(1-x)C(x) are attractive candidates for replacing silicon (Si) in the semiconductor industry. The addition of carbon to diamond lattice not only allows control over the lattice dimensions, but also enhances the electrical properties by enabling variations in strain and compositions. However, extremely low carbon solubility in bulk germanium (Ge) and thermodynamically unfavorable Ge-C bond have hampered the production of crystalline Ge(1-x)C(x) alloy materials in an equilibrium growth system. Here we successfully synthesized high-quality Ge(1-x)C(x) alloy nanowires (NWs) by a nonequilibrium vapor-liquid-solid (VLS) method. The carbon incorporation was controlled by NW growth conditions and the position of carbon atoms in the Ge matrix (at substitutional or interstitial sites) was determined by the carbon concentration. Furthermore, the shrinking of lattice spacing caused by substitutional carbon offered the promising possibility of band gap engineering for photovoltaic and optoelectronic applications.     

Control of lateral dimension in metal-catalyzed germanium nanowire growth: usage of carbon sheath

We report on the catalytic growth of thin carbon sheathed single crystal germanium nanowires (GeNWs), which can solve the obstacles that have disturbed a wide range of applications of GeNWs. Single crystal Ge NW core and amorphous carbon sheath are simultaneously grown via vapor-liquid-solid (VLS) process. The carbon sheath completely blocks unintentional vapor deposition on NW surface, thus ensuring highly uniform diameter, dopant distribution, and electrical conductivity along the entire NW length. Furthermore, the sheath not only inhibits metal diffusion but also improves the chemical stability of GeNWs at even high temperatures.     

Facile fabrication of In:Ge/Cu nano-octahedra film for improving photoelectrochemical properties

The novel In:Ge/Cu nano-octahedra photoelectric film, a kind of metal-semiconductor-metal (MSM) like structures, was prepared from by a facile two-step electrodeposition process, which In:Ge and Cu nano-octahedra were successively deposited on the indium tin oxide (ITO) substrates from aqueous solution. With the modification of Cu nano-octahedral, the photoresponse and photoactive current of the In:Ge films has significantly improved 88 flods under illuminations (wavelength range: 365, 532 and 805 nm). Notably, the In:Ge/Cu nano-octahedra films exhibit excellent photoelectrochemical properties in wide wavelength range from the UV to near-infrared. This novel photoelectric film shows great potential applications in optoelectronic devices and photodetectors, and the facilely synthesis route can provide an enlightening insight for the fabrication of photoelectric devices and high-performance energy conversion systems.     

Effects of a a-Si:H layer on reducing the dark current of 1310 nm metal-germanium-metal photodetectors

Two approaches of hydrogenated-amorphous-silicon (a-Si:H), as Schottky-barrier height (SBH) enhancement and passivation layers, were investigated to suppress dark current of 1310 nm metal-germanium-metal photodetectors (MGM-PDs). Observations show that when a-Si:H is inserted between metal and Ge, the dark current is effectively reduced due to SBH enhancement, but similarly lowers photocurrent resulting from the blocking of a-Si:H. In contrast with a-Si:H acting as a passivation layer a very high photo-to-dark current ratio of 6530 is achieved with a high responsivity of 0.72 A/W, attributing to the defect centers on the Ge surface which are passivated. Such a result suggests that the a-Si:H passivation layer is a good candidate in fabricating high-quality 1310 nm MGM-PDs.     

Photoconductive characteristic in individual WO(3-x) nanowire

Tungsten Oxide nanowires, with their natural excellent structure, possess unique physical and chemical properties. In this paper, photoconductivity of single tungsten trioxide nanowire (WO3 NW) and single tungsten suboxide nanowire (WO(3-x) NW) have been studied respectively on a photoconductivity testing system. Under 514 nm wavelength laser illumination, an unsaturated photocurrent and a slow photoconductive responsivity could be expressed in single WO3 NW device. In WO(3-x) NW device, photoconductive responsivity was determined by the illuminating position. About 100 nA photocurrent could be generated and a fast optoelectric responsivity with a recover time about 90 ms from the device was observed. Not only photoconductive effect but also the photovoltaic effect was obtained from individual WO(3-x) NW device. According to the results of X-ray photoelectron spectroscopy, the mechanisms of photoconductive and photovoltaic effects in these two kinds of devices have been discussed and the oxygen vacancy played an important role in the photoconductive phenomenon. All these effects could be of practical use in the design and fabrication of photodetectors based on single tungsten oxide nanowire.