Room temperature preparation of high performance AZO films by MF sputtering

Aluminum-doped zinc oxide (AZO) thin films have been deposited by MF magnetron sputtering from a ceramic oxide target without heating the substrates. This study has investigated effects of sputtering power on the structural, electrical and optical properties of the AZO films. The films delivered a hexagonal wurtzite structure with (002) preferential orientation and uniform surface morphology with 27–33 nm grain size. The results indicate that residual stress and grain size of the AZO films are dependent on sputtering power. The minimum resistivity of 7.56×10^?4 Ω cm combined with high transmittance of 83% were obtained at deposited power of 1600 W. The films delivered the advantages of a high deposition rate at low substrate temperature and should be suitable for the fabrication of low-cost transparent conductive oxide layer.     

Effect of annealing and room temperature sputtering power on optoelectronic properties of pure and Al-doped ZnO thin films

Transparent ZnO and Al-doped ZnO (AZO) thin films have been prepared by radio frequency sputtering deposition at room temperature. The optical, electrical, and structural characteristics of the obtained films have been extensively investigated as a function of sputtering and annealing parameters. Spectrophotometry, X-ray diffraction (XRD), atomic force microscopy (AFM), four-point probe and Hall-effect measurements were employed. The ZnO films generally exhibited excellent crystalline properties, while providing a UV cut-off in the absorption spectrum for optical filtration. AZO thin films exhibited an average transparency (larger than 85%) over the visible region of the spectrum, and resistivity of the order of 10^?3 Ω cm was obtained. The carrier concentration and electron mobility values proved to be dependent on the deposition parameters and annealing temperature. The obtained results showed that annealing temperatures higher than 400 °C were not necessary and potentially degraded the electronic properties of the AZO thin films.     

Effect of substrate temperature on the structural,electrical, and optical properties of GZO/ZnO films deposited by radio frequency magnetron sputtering

Ga-doped ZnO (GZO)/ZnO bi-layered films were deposited on glass substrates by radio frequency magnetron sputtering at different substrate temperatures of 100, 200 and 300 °C to investigate the effects of substrate temperature on the structural, electrical, and optical properties of the films. Thicknesses of the GZO and ZnO buffer layer were kept constant at 85 and 15 nm by controlling the deposition times.     

Synthesis of high-quality AZO polycrystalline films via target bias radio frequency magnetron sputtering

The deposition rate, transmittance and resistivity of aluminium-doped zinc oxide (AZO) films deposited via radio frequency (r.f.) sputtering change with target thickness. An effective method to control and maintain AZO film properties was developed. The strategy only involved the regulation of target bias voltage of r.f. magnetron sputtering system. The target bias voltage considerably influenced AZO film resistivity. The resistivity of the as-deposited AZO film was 9.82×10⁻⁴ Ω cm with power density of 2.19 W/cm² at target self-bias of −72 V. However, it decreased to 5.98×10⁻⁴ Ω cm when the target bias voltage was increased to −112 V by applying d.c. voltage. Both growth rate and optical band gap of AZO film increased with the absolute value of target bias voltage – growth rate increased from 10.54 nm/min to 25.14 nm/min, and band gap increased from 3.57eV to 3.71 eV when target bias voltage increased from −72 V to −112 V at r.f. power density of 2.19 W/cm². The morphology of AZO films was slightly affected by the target bias voltage. Regulating target bias voltage is an effective method to obtain high-quality AZO thin films deposited via r.f. magnetron sputtering. It is also a good choice to maintain the quality of AZO film in uptime manufacturing deposition.     

Thermochromic properties of ZnO/VO2/ZnO films on soda lime silicate glass deposited by RF magnetron sputtering

A smart window based on VO₂ is a promising thermochromic (TC) glass that can regulate heat flow through windows by solar modulation near room temperature. TC glasses with high visible-light transmittance and large difference in infrared transmittance between high- and low-temperature VO₂ phases are required to save large amounts of energy in buildings. VO₂-based multilayer films with a buffer layer and/or an anti-reflective (AR) layer are used when the films are deposited by sputtering. In this study, VO₂-based multilayer films were prepared on soda lime glass using ZnO as both the buffer and the AR layers. The structure of the multilayer film was simulated using the optical constants measured from the deposited films. The effect of buffer and AR layers on the TC properties of VO₂-based multilayer films prepared by sputtering was investigated by simulation of the multilayer structure and deposition of the films with the simulated structure. The TC properties were measured and compared with the calculated properties. Improved TC properties (luminous transmittance (T_lum) of ～50%/46% (30 °C/80 °C) and solar modulation ability (ΔT_sol) of ～14%), compared to those without the buffer and AR layer, were obtained from the ZnO/VO₂/ZnO film deposited on glass. The calculated transmittances agree better with the measured ones when the optical constants measured directly from the deposited films are used and the roughnesses of the surface/interface of the multilayer films are considered in the calculation of the optical constants.     

Transparent and high infrared reflection film having sandwich structure of SiO2/Al:ZnO/SiO2

New transparent and high infrared reflection films having the sandwich structure of SiO₂/Al:ZnO(AZO)/SiO₂ were deposited on the soda-lime silicate glass at room temperature by radio frequency (R.F.) magnetron sputtering. The optical and electrical properties of SiO₂ (110 nm)/AZO (860 nm)/SiO₂ (110 nm) sandwich films were compared with those of single layer AZO (860 nm) films and double layer SiO₂ (110 nm)/AZO (860 nm) films. The results show that these sandwich films exhibit high transmittance of over 85% in the visible light range (380–760 nm), and low reflection rate of below 4.5% in the wavelength range of 350–525 nm, which is not shown in the conventional single layer AZO (860 nm) films and double layer SiO₂ (110 nm)/AZO (860 nm) films. Further these sandwich films display a low sheet resistance of 20 Ω/sq by sheet resistance formula and high infrared reflection rate of above 80% in the wavelength range of 15–25 μm. In addition, the infrared reflection property of these sandwich films is determined mainly by the AZO film. The outer SiO₂ film can diminish the interference coloring and increase transparency; the inner SiO₂ film improves the adhesion of the coating to the glass substrate and prevents Ca²⁺ and Na⁺ in the glass substrate from entering the AZO film.     

Effects of NIR annealing on the characteristics of al-doped ZnO thin films prepared by RF sputtering

Aluminum-doped zinc oxide (AZO) thin films have been deposited on glass substrates by employing radio frequency (RF) sputtering method for transparent conducting oxide applications. For the RF sputtering process, a ZnO:Al₂O₃ (2 wt.%) target was employed. In this paper, the effects of near infrared ray (NIR) annealing technique on the structural, optical, and electrical properties of the AZO thin films have been researched. Experimental results showed that NIR annealing affected the microstructure, electrical resistance, and optical transmittance of the AZO thin films. X-ray diffraction analysis revealed that all films have a hexagonal wurtzite crystal structure with the preferentially c-axis oriented normal to the substrate surface. Optical transmittance spectra of the AZO thin films exhibited transmittance higher than about 80% within the visible wavelength region, and the optical direct bandgap (E_g) of the AZO films was increased with increasing the NIR energy efficiency.     

Preparation and properties of AZO/PS/AZO tri-layer transparent conductive film with a light-trapping structure

The light-trapping structure is an effective method to increase solar light capture efficiency in the solar cells. In this study, Al-doped ZnO (AZO)/polystyrene (PS)/AZO tri-layer transparent conductive film with light-trapping structure was fabricated by magnetron sputtering and liquid phase methods. The structural, optical and electrical properties of the AZO films could be controlled by different growth conditions. When the sputtering pressure of the under-layer AZO film was 0.2 Pa, the discharge voltage was around 80 V, which was within the optimal process window for obtaining AZO film with high crystallinity. The optimal under-layer AZO film had a large surface roughness and a very low static water contact angle of 75.71°, promoting the relatively uniform distribution of PS spheres. Under this sputtering condition, the prepared AZO/PS/AZO tri-layer film had the highest crystallinity and least point defects. The highest carrier concentration and Hall mobility are 3.0 × 10²¹ cm^-3and 5.39 cm² V^-1 s^-1, respectively. Additionally, a transparent conductive film with the lowest resistivity value (3.88 × 10^-4 Ω cm) and the highest average haze value (26.5%) was obtained by optimizing the process parameters. These properties were comparable to or exceed the reported values of surface-textured SnO₂-based as well as ZnO-based TCOs films, making our films suitable for transparent electrode applications, especially in thin-film solar cells.     

Damp-heat durability comparison of Al-doped ZnO transparent electrodes deposited at low temperatures on glass and PI-tape/PC substrates

Durability performances are compared for Al-doped ZnO (AZO) transparent electrodes deposited on hard slide-glass and flexible polyimide-tape attached to polycarbonate (PI-tape/PC) substrates. To identify the appropriate sputtering configuration, the AZO thin films are first deposited on the glass substrates via reactive RF-magnetron sputtering under 90 sccm of argon gas and 3 sccm of oxygen gas at room temperature (RT) with 83 to 90 W of RF power for 30 min. When deposited, only the sputtering configuration with 85 W of RF power could produce the AZO films with acceptable optoelectrical properties for transparent electrodes: 80% average visual transparency and 10 Ω/□ at the thickness of 1.1 μm. The temperature at the surface of the substrates rises from RT to 88 °C due to the sputtering with 85W of RF power for 30 min, and this configuration is successfully conducted for AZO film depositions on both the glass and PI-tape/PC substrates. After exposure to a damp-heat (DH) test at 85 °C and 85% relative humidity (RH) for 25 days, the conductivity of the AZO films on the PI-tape/PC substrates is significantly degraded: many cracks are visible on the films, significantly decreasing the Hall mobility. Conversely, the films deposited on the glass substrates exhibit durable high conductivity, no cracks, and excellent stability of the Hall mobility. Despite this significant difference in Hall mobility evolution, the films on both substrates show similar patterns of a slight decrease in carrier concentrations, suggesting that chemical characteristics, extensively reported as the key for the DH degradation of AZO films, are less involved in this durability study featuring AZO films prepared via a low oxygen-to-argon gas ratio of reactive sputtering at low temperatures.     

Study of Cu-based Al-doped ZnO multilayer thin films with different annealing conditions

AZO/Cu/AZO multilayer thin films produced under different annealing conditions are studied in this paper, to examine the effects of atmosphere and annealing temperature on their optical and electrical properties. The multilayer thin films are prepared by simultaneous RF magnetron sputtering (for AZO) and DC magnetron sputtering (for Cu). The thin films were annealed in a vacuum or an atmosphere of oxygen at temperatures ranging from 100 to 400 °C in steps of 100 °C for 3 min. High-quality multilayer films (at Cu layer thickness of 15 nm) with resistivity of 1.99×10⁻⁵ Ω-cm and maximum optical transmittance of 76.23% were obtained at 400 °C annealing temperature in a vacuum. These results show the films to be good candidates for use as high quality electrodes in various displays applications.     

Sputtered AZO Thin Films for TCO and Back Reflector Applications in Improving the Efficiency of Thin Film a-Si:H Solar Cells

We report the properties of Al doped ZnO (AZO) thin films on glass substrates and its effect on the efficiency of amorphous silicon (a-Si:H) solar cells as the back reflector. Oriented AZO thin films were grown using DC magnetron sputtering by varying Ar gas flow rates. The influence of Ar flow rate on the structural, electrical and optical properties of AZO thin films suitable for transparent conducting oxide (TCO) and back reflector applications was investigated. The (a-Si:H) solar cells, with and without AZO back reflector, were fabricated on FTO coated glass substrates using the PECVD technique. The solar cells were tested using a Sun simulator under AM 1.5 condition. Enhancement in current density from 12.46 to 14.24 mA/cm² with the AZO back reflector was observed, thereby increasing the efficiency of the solar cell from 6.38 to 7.82 %, respectively.     

Deposition and characterization of AZO thin films on flexible glass substrates using DC magnetron sputtering technique

Al-doped zinc oxide (AZO) thin films were deposited onto flexible ultra-thin glass substrates by using a direct current (DC) magnetron sputtering process. The effects of sputtering power, working pressure and substrate temperature on the morphology and optoelectronic performances of AZO films were investigated. The optimal sputtering power, working pressure and substrate temperature for AZO film were determined to be 100 W, 0.9 Pa and 150 ℃, respectively. Further increasing or decreasing the sputtering power, working pressure and substrate temperature degrades the quality of AZO films. XRD patterns show all as-sputtered AZO thin films are preferred to grow along <0002> direction. Moreover, the largest grain size, which depicts the best microstructure of AZO films, matches with the smallest stress value. It can be seen from SEM images that the surface is smooth and dense. The smallest value of the resistivity is 1.784×10⁻³ Ω cm and the average transmittance of all AZO films in the visible range is about 80%. The X-ray photoelectron spectroscopy spectra show that the amount of Al element in the AZO film is very small.     

Potentiostatic electrodeposition of cuprous oxide thin films for photovoltaic applications

Potentiostatic deposition of Cu₂O thin films on glass substrates coated with F-doped SnO₂ from an alkaline electrolyte solution (pH 12.5) containing copper (II) sulfate and lactic acid was studied for fabrication of a Cu₂O/Al-doped ZnO (AZO) heterojunction solar cell. The band gap of the electrodeposited Cu₂O films was determined by photoelectrochemical measurements to be around 1.9 eV irrespective of the applied potentials. The solar cells with a glass/FTO/Cu₂O/AZO structure were fabricated by sputtering an AZO film onto the Cu₂O film followed by deposition of an Al contact by vacuum evaporation. The highest efficiency of 0.603% was obtained with a Cu₂O film deposited at −0.6 V (vs. Ag/AgCl). This was attributed to better compactness and purity of the Cu₂O film than those of the Cu₂O films deposited at other potentials.     

不同衬底上ZnO:Al透明导电薄膜的性能

室温下,采用射频磁控溅射法在玻璃和聚对苯二甲酸乙二醇酯（polyethylene terephthalate,PET）上沉积了掺铝的氧化锌（ZnO：Al,AZO）透明导电薄膜。通过X射线衍射仪分析不同衬底上AZO薄膜的结构,采用四探针测试仪及紫外可见光分光光度计测试薄膜的光电性能。结果表明：沉积在两种衬底上的AZO薄膜都具有六方纤锌矿结构,最佳取向均为[002]方向;玻璃衬底和PET衬底上制备的AZO薄膜的方阻分别为19/sq和45/sq,薄膜透光率均高于90%。实验表明,柔性衬底透明导电氧化物薄膜可以代替硬质衬底透明导电薄膜使电子器件向小型化、轻便化方向发展。     

Preparation and characterization of Al-doped ZnO piezoelectric thin films grown by pulsed laser deposition

Undoped and Al-doped ZnO (AZO) thin films (Al: 3, 5 at%) using a series of high quality ceramic targets have been deposited at 450 ºC onto glass substrates using PLD method. The used source was a KrF excimer laser (248 nm, 25 ns, 2 J/cm²). The study of the obtained thin films has been accomplished using X-ray diffraction (XRD), M-lines spectroscopy and Rutherford backscattering spectroscopy (RBS). XRD patterns have shown that the films crystallize in a hexagonal wurtzite type structure with a highly c-axis preferred (002) orientation, and the grain sizes decrease from 37 to 25 nm with increasing Al doping. The optical waveguiding properties of the films were characterized by means of the prism-coupling method. The distinct M-lines of the guided transverse magnetic (TM) and transverse electric (TE) modes of the ZnO films waveguide have been observed. The M-lines device has allowed determination of the accurate values of refractive index and thickness of the studied ZnO and AZO thin films. An evaluation of experimental uncertainty and calculation of the precision of the refractive index and thickness were developed on ZnO films. The RBS results agree with XRD and m-lines spectroscopy measurements.     

Heterostructure nanoarchitectonics with ZnO/SnO2 for ultrafast and selective detection of CO gas at low ppm levels

Heterojunction-based gas sensors are very attractive as they substantially improve the sensing characteristics due to the effective potential barrier present at the interface. Taking the advantages of two excellent semiconducting gas sensing materials i.e., SnO₂ and ZnO, herein, we have constructed ZnO/SnO₂ heterojunction by the combination of vacuum evaporation and r.f. sputtering or atomic layer deposition techniques. The ZnO/SnO₂ heterostructure with optimized thickness of ZnO (～10 nm) shows a 6-fold enhancement in sensing response compared to bare SnO₂ films against CO gas. The sensing responses of 81 and 85 % have been obtained for ZnO/SnO₂ heterostructures with ZnO deposited by sputtering and atomic layer deposition (ALD) methods, respectively, against 91 ppm of CO gas with an estimated limit of detection of 1.67 and 0.37 ppm. The ALD ZnO/SnO₂ sample displays an extremely fast response time of 5 s. The heterostructure sensors are also highly selective towards CO gas in the presence of other interfering toxic agents. The enhanced sensing characteristics of ZnO/SnO₂ are assigned to the formation of n-n heterojunction as depicted by X-ray photoelectron spectroscopic band alignment study and the strong CO adsorption on ZnO surface as derived from density functional theory calculations.     

Physical properties of Al-doped ZnO films deposited on nonwoven substrates by radio frequence magnetron sputtering

In this study, the polyethylene terephthalate (PET) spunbonded nonwoven materials were used as substrates for creating electro-optical functional nanostructures on the fiber surfaces. A magnetron sputter coating was used to deposit Al-doped ZnO (AZO) films onto the nonwovens. The influences of the deposition time on the structural, optical, and electrical properties of AZO films were investigated. Atomic force microscopy (AFM) was employed to examine the topography of the fibers. The AFM observation revealed a significant difference in the morphology of the fibers before and after the AZO sputter coating. The examination by UV–visible spectrophotometer analysis showed that the nonwovens deposited with transparent nanostructure AZO films had better UV absorption, and an average transmittance was approximately 50% in the visible light wavelength region. The surface conductivity of the materials was analyzed using a four-probe meter, and it was found that electrical resistance was significantly decreased as the sputtering time increased.     

Improved physical properties of Al-doped ZnO thin films deposited by unbalanced RF magnetron sputtering

Room temperature Al-doped ZnO (AZO) thin films with improved crystalline and optical properties were grown on normal glass substrates using unbalanced RF magnetron sputtering technique. To modify the plasma density towards the substrate and enhance the crystalline nature, an additional magnetic field ranging from 0 to 6.0 mT has been applied to the AZO target by proper tuning of solenoid coil current from 0 to 0.2 A respectively, which plays a significant role for controlling the physical properties of AZO films. The results from XRD studies indicate that all AZO films were composed of hexagonal wurtzite structure with better crystal quality through the applied magnetic field, ZnO (002) plane as a preferred growth. Furthermore, XPS studies suggested that symmetric chemical shifts in the binding energies for the Zn 2p and O1s levels with applied magnetic field. SEM analysis revealed the formation of a smooth, homogeneous and dense morphological surface with applied magnetic field. From AFM analysis, it was observed that the applied magnetic field strongly influenced the grain size and the films showed decreasing tendency in electrical resistivity. Films exhibited superior optical transmittance more than 94% in the visible region essentially due to the formation of better crystalline nature. The results indicate that improved band gap from 3.10 to 3.15 eV with additional magnetic field varied from 0 to 6.0 mT respectively.     

Efficiency improvement of CIGS solar cells using RF sputtered TCO/Ag/TCO thin-film as prospective buffer layer

In this paper, TCO (Transparent Conductive Oxide) incorporating ultrathin Ag intermediate film is proposed as a new buffer layer to enhance the efficiency of CIGS thin-film solar cells (TFSCs). In this regard, versatile multilayer thin-films based on ZnO/Ag/ZnO and ITO/Ag/ITO structures were deposited on glass using RF magnetron sputtering technique to determine the optoelectronic parameters of the multilayer structures. The elaborated samples were then characterized using SEM, EDS, XRD, and UV–Visible absorption spectroscopy techniques to investigate the structure morphological, optical, and electronic properties. The deposited multilayer thin-films showed amorphous-like structure and exhibited a broadband absorbance over the visible and even NIR spectrum ranges, indicating its potential application as alternative buffer layers for thin-film solar cells. In this context, TCO/Ag/TCO/CIGS solar cells have been numerically investigated using the deposited multilayer optoelectronic properties. It was revealed that the estimated efficiency of the ZnO/Ag/ZnO/CIGS-based solar cell could reach 18.5% with an open circuit voltage of 0.7 V and a short-circuit current density of 34.8 mA/cm². The performances exhibited by the investigated solar cell demonstrated that ZnO/Ag/ZnO multilayer can be used as an alternative to the conventional CdS buffer layer for developing high-performance non-toxic CIGS solar cells.     

Deposition of F-doped ZnO transparent thin films using ZnF2-doped ZnO target under different sputtering substrate temperatures

Highly transparent and conducting fluorine-doped ZnO (FZO) thin films were deposited onto glass substrates by radio-frequency (RF) magnetron sputtering, using 1.5 wt% zinc fluoride (ZnF₂)-doped ZnO as sputtering target. Structural, electrical, and optical properties of the FZO thin films were investigated as a function of substrate temperature ranging from room temperature (RT) to 300°C. The cross-sectional scanning electron microscopy (SEM) observation and X-ray diffraction analyses showed that the FZO thin films were of polycrystalline nature with a preferential growth along (002) plane perpendicular to the surface of the glass substrate. Secondary ion mass spectrometry (SIMS) analyses of the FZO thin films showed that there was incorporation of F atoms in the FZO thin films, even if the substrate temperature was 300°C. Finally, the effect of substrate temperature on the transmittance ratio, optical energy gap, Hall mobility, carrier concentration, and resistivity of the FZO thin films was also investigated.