A capacitive fingerprint sensor chip using low-temperature poly-Si TFTs on a glass substrate and a novel and unique sensing method

We have developed a capacitive fingerprint sensor chip using low-temperature poly-Si thin film transistors (TFTs). We have obtained good fingerprint images which have sufficient contrast for fingerprint certification. The sensor chip comprises sensor circuits, drive circuits, and a signal processing circuit. The new sensor cell employs only one transistor and one sensor plate within one cell. There is no leakage current to other cells by using a new and unique sensing method. The output of this sensor chip is an analog wave and the designed maximum output level is almost equal to the TFT's threshold voltage, which is 2-3 V for low-temperature poly-Si TFTs. We used a glass substrate and only two metal layers to lower the cost. The size of the trial chip is 30 mm/spl times/20 mm/spl times/1.2 mm and the sensor area is 19.2 mm/spl times/15 mm. The size of the prototype cell is now 60 /spl mu/m/spl times/60 /spl mu/m at 423 dpi, but it will be easy to increase the resolution up to more than 500 dpi. The drive frequency is now 500 kHz and the power consumption is 1.2 mW with a 5-V supply voltage. This new fingerprint sensor is most suitable for mobile use because the sensor chip is low cost and in a thin package with low power consumption.     

A biologically inspired analog IC for visual collision detection

We have designed and tested a single-chip analog VLSI sensor that detects imminent collisions by measuring radially expanding optic flow. The design of the chip is based on a model proposed to explain leg-extension behavior in flies during landing approaches. We evaluated a detailed version of this model in simulation using a library of 50 test movies taken through a fisheye lens. The algorithm was evaluated on its ability to distinguish movies ending in collisions from movies in which no collision occurred. This biologically inspired algorithm is capable of 94% correct performance in this task using an ultra-low-resolution (132-pixel) image as input. A new elementary motion detector (EMD) circuit was developed to measure optic flow on a CMOS focal-plane sensor. This EMD circuit models the bandpass nature of large monopolar cells (LMCs) immediately postsynaptic to photoreceptors in the fly visual system as well as a saturating multiplication operation proposed for Reichart-type motion detectors. A 16/spl times/16 array of two-dimensional motion detectors was fabricated in a standard 0.5-/spl mu/m CMOS process. The chip consumes 140 /spl mu/W of power from a 5 V supply. With the addition of wide-angle optics, the sensor is able to detect collisions 100-400 ms before impact in complex, real-world scenes.     

A signal-processing CMOS image sensor using a simple analog operation

We have developed a high-density CMOS image sensor with a normal mode and three signal-processing function modes: wide dynamic-range mode, motion-detection mode, and edge-extraction mode. Small pixel size and real-time operation are achieved by using a four-transistor and one-capacitor pixel scheme and column-parallel on-chip analog operation. The chip includes 512 (H) /spl times/384 (V) effective pixels. Each pixel has a sufficient fill factor of 24% in an area of 9.3/spl times/9.3 /spl mu/m/sup 2/. The dynamic range at the wide dynamic-range mode is a maximum 97 dB against 51 dB at the normal-readout mode. The chip consumes 79 mW, and the gain-control amplifier and 8-b analog-to-digital converter operate at 46 frames/s using a 3.3-V single power supply.     

A new CMOS pixel structure for low-dark-current and large-array-size still imager applications

A pixel structure for still CMOS imager application called the pseudoactive pixel sensor (PAPS) is proposed and analyzed in this paper. It has the advantages of a low dark current, high signal-to-noise ratio, and a high fill factor over the conventional passive pixel sensor imager or active pixel sensor imager. The readout circuit called the zero-bias column buffer-direct-injection structure is also proposed to suppress both the dark current of the photodiode and the leakage current of row switches by keeping both biases of photodiode and the parasitic p-n junction in the column bus at or near zero voltage. The improved double delta sampling circuits are also used to suppress fixed pattern noise, clock feedthrough noise, and channel charge injection. An experimental chip of the proposed PAPS CMOS imager with the format of 352/spl times/288 (CIF) has been fabricated by using a 0.25-/spl mu/m single-poly-five-level-metal (1P5M) n-well CMOS process. The pixel size is 5.8 /spl mu/m/spl times/5.8 /spl mu/m. The pixel readout speed is from 100 kHz to 10 MHz, corresponding to the maximum frame rate above 30 frames/s. The proposed still CMOS imager has a fill factor of 58%, chip size of 3660 /spl mu/m/spl times/3500 /spl mu/m, and power dissipation of 24 mW under the power supply of 3.3 V. The experimental chip has successfully demonstrated the function of the proposed new PAPS structure. It can be applied in the design of large-array-size still CMOS imager systems with a low dark current and high resolution.     

A 1.5-V 550-/spl mu/W 176/spl times/144 autonomous CMOS active pixel image sensor

This paper addresses the development of a micropower 176/spl times/144 CMOS active pixel image sensor that dissipates one to two orders of magnitude less power than current state-of-the-art CMOS image sensors. The chip operates from a 1.5-V voltage source and the power consumption measured for the chip running from an internal 25.2-MHz clock yielding 30 frames per second is about 550 /spl mu/W. This amount enables the sensor to run from a watch battery. In order to achieve design goals, a low-power sensor design methodology is applied throughout the design process from system-level to process-level, while realizing the performance to satisfy the design specification. As an autonomous sensor, it can be operated with only three pads [GND, VDD (1.2-1.7 V), DATAOUT]. The die occupies 4 mm/sup 2/ of silicon.     

A DPS array with programmable resolution and reconfigurable conversion time

A CMOS digital pixel sensor (DPS) with programmable resolution and reconfigurable conversion time is described. The chip features a unique architecture based on the pulse width modulation (PWM) technique and operates with either an 8-b or 4-b accuracy. The 8-b conversion mode is used for high-precision imaging while the 4-b conversion mode provides a shorter conversion time and a two times increase in spatial resolution. Two quantization schemes are studied, namely, the uniform and the nonuniform time-domain quantizers, which are referred to as UQ and NUQ, respectively. It is shown that the latter scheme not only permits to linearize the nonlinear response of the PWM sensor, but also allows to significantly speed up the conversion time, particularly for wide dynamic range and low coding resolutions. A prototype of 32/spl times/32/64/spl times/32 pixels has been fabricated using 1-poly, 5-metal CMOS 0.35-/spl mu/m n-well standard process. Power dissipation is 10 mW at V/sub DD/=3.3 V, dynamic range is 90 dB, while dark current was measured at 1 pA. The reconfiguration features of the chip have been verified experimentally.     

A simplified normal optical flow measurement CMOS camera

Various motion properties of an image can be computed by using normal flow measurements. Notable among these are focus of expansion, time to contact. Many VLSI systems that combine focal plane processing with imaging have been proposed. However, these systems mostly suffer due to lower spatial resolution. This paper presents a two-dimensional dense simplified normal optical flow measurement chip implemented in 0.5-/spl mu/m CMOS process that combines imaging and processing on the same chip efficiently. The algorithm outputs the image, computes partial derivatives with respect to time and space, and uses their ratio to compute a simplified version of the normal flow velocity. The chip is composed of an array of 92/spl times/52 of APS pixels, occupies an area of 4.5 mm/sup 2/ and consumes 2.6 mW power. This paper illustrates the operation of the chip by first presenting results from individual blocks and then from system-level testing. Furthermore, we demonstrate the feasibility of scaling the chip to higher resolutions without affecting the processing.     

In-pixel autoexposure CMOS APS

A CMOS active pixel sensor (APS) with in-pixel autoexposure and a wide dynamic-range linear output is described. The chip features a unique architecture enabling a customized number of additional bits per pixel per readout, with minimal effect on the sensor spatial or temporal resolution. By utilizing multiple readouts via real-time feedback, each pixel in the field of view can automatically set an independent exposure time, according to its illumination. A customized, large increase in the dynamic range can be achieved and a scene containing both bright and dark regions can be captured. A prototype of 64 /spl times/ 64 pixels has been fabricated using 1-poly 3-metal CMOS 0.5 /spl mu/m n-well process available through MOSIS. Power dissipation is 3.7 mW at V/sub DD/ = 5 V. The special functions have been verified experimentally, and an increase of 2 bits over the inherent dynamic range captured is shown.     

A 9-V/Lux-s 5000-frames/s 512/spl times/512 CMOS sensor

A high-responsivity 9-V/Lux-s high-speed 5000-frames/s (at full 512/spl times/512 resolution) CMOS active pixel sensor (APS) is presented in this paper. The sensor was designed for a 0.35-/spl mu/m 2P3M CMOS sensor process and utilizes a five-transistor pixel to provide a true parallel shutter. Column-parallel analog-to-digital converter (ADC) architecture yields fast readout from pixels and digitization of the data simultaneously with acquiring a new frame. The chip has a two-row SRAM to store data from the ADC and read previous rows of data out of the chip. There are a total of 16 parallel ports operating up to 90 MHz delivering /spl sim/1.3 Gpixel/s or 13 Gb/s of data at the maximum rate. In conclusion, a comparison between two high-speed digital CMOS sensor architectures, which are a column-parallel APS and a digital pixel sensor (DPS), is conducted.     

Wide dynamic range snapshot APS for ultra low-power applications

A novel wide dynamic range (WDR) snapshot active pixel sensor for ultra-low power applications is presented. The proposed imager allows capturing of fast moving objects in the field of view and provides WDR by applying adaptive exposure time to each pixel, according to the local illumination intensity level. Driven by low-power dissipation requirements, the proposed pixel is operated by dual low voltage supplies (1.2 and 1.8 V) and utilizes an advanced low-power sensor design methodology. A test chip of a 32*32 array has been implemented in a standard 0.35-/spl mu/m CMOS technology. A single pixel occupies 18*32 /spl mu/m area and is expected to dissipate 18.5 nW at video rate. System architecture and operation are discussed and simulation results are presented.     

Micro-temperature sensor array with thin-film thermocouples

A micro-temperature sensor array with thin-film thermocouples (TFTCs) is developed. The TFTCs are made with T-type (copper-constantan) thermocouples to measure chip temperature distribution of electronic packaging. The sensor array of 150 nm thickness has 10/spl times/10 junctions within a 9/spl times/9 mm area.     

Pulse frequency modulation based CMOS image sensor for subretinal stimulation

We have developed a CMOS image sensor based on pulse frequency modulation for subretinal implantation. The sensor chip forms part of the proposed intraocular retinal prosthesis system where data and power transmission are provided wirelessly from an extraocular unit. Image sensing and electrical stimulus are integrated onto the same chip. Image of sufficient resolution has been demonstrated using 16/spl times/16 pixels. Biphasic current stimulus pulses at above threshold levels of the human retina (500 /spl mu/A) at varying frame rates (4 Hz to 8 kHz) have been achieved. The implant chip was fabricated using standard CMOS technology.     

A fault-tolerant 256K RAM fabricated with molybdenum-polysilicon technology

Describes a 256K molybdenum-polysilicon (Mo-poly) gate dynamic MOS RAM using a single transistor cell. Circuit technologies, including a capacitive-coupled sense-refresh amplifier and a redundant circuitry, enable the achievement of high performance in combination with Mo-poly technology. Electron-beam direct writing and dry etching technologies are fully utilized to make 1 /spl mu/m accurate patterns. The 256K word/spl times/1 bit device is fabricated on a 5.83 mm/spl times/5.90 mm chip. Cell size is 8.05 /spl mu/m/spl times/8.60 /spl mu/m. The additional 4K spare cells and the associated circuits, in which newly developed electrically programmable elements are used, occupy less than 10 percent of the whole chip area. The measured access time is 160 ns under V/SUB DD/=5 V condition.     

A high-speed, 240-frames/s, 4.1-Mpixel CMOS sensor

This paper describes a large-format 4-Mpixel (2352/spl times/1728) sensor with on-chip parallel 10-b analog-to-digital converters (ADCs). The chip size is 20/spl times/20 mm with a 7-/spl mu/m pixel pitch. At a 66-MHz master clock rate and 3.3-V operating voltage, it achieves a high frame rate of 240 frames/s delivering 9.75 Gb/s of data with power dissipation of less than 700 mW. The principal architectural features of the sensor are discussed along with the results of sensor characterization.     

A 4-Mbit CMOS EPROM

A high-density (512K-word/spl times/8-b) erasable programmable read-only memory (EPROM) has been designed and fabricated by using 0.8-/spl mu/m n-well CMOS technology. A novel chip layout and a sense-amplifier circuit produce a 120-ns access time and a 4-mA operational supply current. The interpoly dielectric, composed of a triple-layer structure, realizes a 10-/spl mu/s/byte fast programming time, in spite of scaling the programming voltage V/SUB PP/ from 12.5 V for a 1-Mb EPROM to 10.5 V for this 4-Mb EPROM. To meet the increasing demand for a one-time programmable (OTP) ROM, a circuit is implemented to monitor the access time after the assembly. A novel redundancy scheme is incorporated to reduce additional tests after the laser fuse programming. Cell size and chip size are 3.1/spl times/2.9 /spl mu/m/SUP 2/ and 5.86/spl times/14.92 mm/SUP 2/, respectively.     

General-purpose 128/spl times/128 SIMD processor array with integrated image sensor

A CMOS image sensor/processor chip fabricated in a 0.35 /spl mu/m CMOS technology is presented. The chip contains a general purpose software-programmable SIMD array of 128/spl times/128 processing elements. It executes over 20 GOPS while dissipating 240 mW of power and achieves pixel-processor density of 410 cells/mm/sup 2/. Performance and accuracy measurement results are given.     

Thermal management of BioMEMS: temperature control for ceramic-based PCR and DNA detection devices

Integrated microfluidic devices for amplification and detection of biological samples that employ closed-loop temperature monitoring and control have been demonstrated within a multilayer low temperature co-fired ceramics (LTCC) platform. Devices designed within this platform demonstrate a high level of integration including integrated microfluidic channels, thick-film screen-printed Ag-Pd heaters, surface mounted temperature sensors, and air-gaps for thermal isolation. In addition, thermal-fluidic finite element models have been developed using CFDRC ACE+ software which allows for optimization of such parameters as heater input power, fluid flow rate, sensor placement, and air-gap size and placement. Two examples of devices that make use of these concepts are provided. The first is a continuous flow polymerase chain reaction (PCR) device that requires three thermally isolated zones of 94/spl deg/C, 65/spl deg/C, and 72/spl deg/C, and the second is an electronic DNA detection chip which requires hybridization at 35/spl deg/C. Both devices contain integrated heaters and surface mount silicon transistors which function as temperature sensors. Closed loop feedback control is provided by an external PI controller that monitors the temperature dependant I-V relationship of the sensor and adjusts heater power accordingly. Experimental data confirms that better than /spl plusmn/0.5/spl deg/C can be maintained for these devices irrespective of changing ambient conditions. In addition, good matching with model predictions has been achieved, thus providing a powerful design tool for thermal-fluidic microsystems.     

Low-voltage temperature sensor for micro-power harvesters in silicon-on-sapphire CMOS

A low-voltage temperature sensor designed for MEMS power harvesting systems is fabricated. The core of the sensor is a bandgap voltage reference circuit operating with a supply voltage in the range 1-1.5 V. The prototype was fabricated on a conventional 0.5 /spl mu/m silicon-on-sapphire (SOS) process. The sensor design consumes 15 /spl mu/A of current at 1 V. The internal reference voltage is 550 mV. The temperature sensor has a digital square wave output the frequency of which is proportional to temperature. A linear model of the dependency of output frequency with temperature has a conversion factor of 1.6 kHz//spl deg/C. The output is also independent of supply voltage in the range 1-1.5 V. Measured results and targeted applications for the proposed circuit are reported.     

An experimental 80-ns 1-Mbit DRAM with fast page operation

An experimental general purpose 5-V 1-Mb dynamic RAM has been designed for increased performance, high density, and enhanced reliability. The array consists of a one-device overlapped I/O cell with a metal bitline architecture. The cell measures 4.1 /spl mu/m by 8.8 /spl mu/m, which yields a chip size of 5.5 mm by 10.5 mm with an array to chip area ratio of 65.5%. The chip was designed in a double-poly single-metal NMOS technology with selected 1-/spl mu/m levels and an average feature size of 1.5 /spl mu/m. Key design features include a fast page mode cycle with minimum column precharge delay and improved protection for short error rate using a boosted word-line after sense amplifier set scheme. The CAS access time is 40 ns and the cycle is 65 ns at 4.5 V and 85/spl deg/C. The RAS access time is 80 ns and the cycle is 160 ns at 4.5 V and 85/spl deg/C with a typical active power of 625 mW. The chip is usable as a X1, X2, or X4 with the use of block select inputs and the selected package option. The package options include a 500-mil/SUP 2/ pin grid array module with 23 pins, and a 22 pin or 26 pin 300-mil surface solder plastic package.     

Low-voltage high-speed travelling wave InGaAsP-InP phase modulator

A high-speed low-drive-voltage travelling wave electrodes InGaAsP-InP phase modulator operated at 1.55 /spl mu/m is demonstrated. The modulator is fabricated using a multiple quantum-well optical waveguide with an on chip integrated termination resistor. A small signal bandwidth of 35 GHz and a V/spl pi/ of 1.8 V has been demonstrated.