Optical characterization of vacuum evaporated a-Se80Te20−xCux thin films

Thin films of a-Se₈₀Te_20−xCu_x (where x=2, 6, 8 and 10) were deposited on glass substrates by vacuum evaporation technique. The absorbance, reflectance and transmittance of as-deposited thin films were measured in the wavelength region 400-1000 nm. The optical band gap and optical constants of amorphous thin films have been studied as a function of photon energy. The optical band gap increases on incorporation of copper in Se₈₀Te_20−xCu_x system. The value of refractive index (n) decreases while the value of the extinction coefficient (k) increases with increasing photon energy. The results are interpreted in terms of concentration of localized states.     

Optical band gap and optical constants in a-Se100–xSbx thin films

Abstract

The optical properties of a-Se_100-xSb_x thin films (where x = 0, 0.5, 2.5, 5 and 10) have been studied in the wavelength range 540–900 nm. It was found that the optical band gap increases with increasing Sb concentration in the a-Se_100-x Sb _x system. The refractive index n decreases, while the extinction coefficient k increases with increasing photon energy. DC conductivity measurements of a-Se_100-x Sb _x thin films have been reported in the temperature range 349–375 K. It has been observed that the conductivity increases while the activation energy decreases with increasing Sb concentration. We correlated the optical band gap with the electronegativity of the sample. The band gap increases with the decrease in electronegativity of each sample of a-Se_100-x Sb _x .     

Optical investigation of a—Ga x Se100–x thin films

Abstract

The optical band gap and optical constants have been studied as a function of photon energy for a-Ga _x Se_100–x thin films (where x × 0, 2.5, 5.0, 7.5 and 10.0) in the wavelength region 450–1000 nm. The optical band gap decreases with the increase of Ga concentration in the a-Ga _x Se_100–x system. The refractive index (n) decreases while the extinction coefficient (k) increases with increasing photon energy. The results are interpreted in terms of concentration of localized states.     

Influence of laser-irradiation on the optical constants Se75S25 − xCdx thin films

Amorphous thin films of glassy alloys of Se₇₅S_25 − xCd_x (x = 2, 4 and 6) were prepared by thermal evaporation onto chemically cleaned glass substrates. Optical absorption and reflection measurements were carried out on as-deposited and laser-irradiated thin films in the wavelength region of 500-1000 nm. Analysis of the optical absorption data shows that the rule of no-direct transitions predominates. The laser-irradiated Se₇₅S_25 − xCd_x films showed an increase in the optical band gap and absorption coefficient with increasing the time of laser-irradiation. The results are interpreted in terms of the change in concentration of localized states due to the shift in Fermi level. The value of refractive index increases decreases with increasing photon energy and also by increasing the time of laser-irradiation. With the large absorption coefficient and change in the optical band gap and refractive index by the influence of laser-irradiation, these materials may be suitable for optical disc application.     

Composition dependence of optical constants in ferroelectric Ba(Ti1 − x,Nix)O3 thin films by optical transmittance technique

Ba(Ti_1 − x,Ni_x)O₃ ferroelectric thin films with perovskite structure are prepared on fused quartz substrates by a sol-gel process. Optical transmittance measurements indicate that Ni-doping has an obvious effect on the energy band structure of BaTiO₃. It has been found that the refractive index n, extinction coefficient k, and band gap energy E_g of the films are functions of the film composition. The E_g of Ba(Ti_1 − x,Ni_x)O₃ decreases approximately linearly as the Ni content increases, which is attributed to the decline of conduction band energy level with increasing the Ni content. On the other hand, n and k both increase linearly with increasing the Ni content because of the increase of packing density. These results indicate that thin films might have potential applications in BaTiO₃-based thin-film optical devices.     

Optical properties and DC electrical conductivity of Ge28−xSe72Sbx thin films

Thin films of Ge_28−xSe₇₂Sb_x (x=0, 8, 16, 24 at%) with thickness of 200 nm are prepared by thermal evaporation onto glass substrates under vacuum of 5.3×10⁻⁵ mbar. Optical reflectance and transmittance of these films are measured at room temperature in the light wavelength region from 200 to 1100 nm. The estimated optical energy gap, E_g, is found to decrease from 2 eV (0 at% Sb) to 1.5 eV (24 at% Sb), whereas the band tail width, E_e, increases from 0.062 to 0.077 eV, respectively. The refractive index, n, and extinction coefficient, κ, are determined as functions of wavelength. The DC electrical conductivity, σ, of films is measured as a function of temperature in the range from 300 to 360 K. The extracted value of activation energy, ΔE, is found to decrease from 0.95 eV (0 at% Sb) to 0.74 eV (24 at% Sb). Optical and electrical behavior of films can be explained in terms of cohesive energy (CE) and Se-Se defect bonds.     

Determination of the optical constants of amorphous AsxS100−x films using effective-medium approximation and OJL model

The transmission spectra were used to obtain an efficient parameterization of the spectral dependences of the optical constants of amorphous As–S thin films by applying a suitable dielectric function model. For studying the compositional dependence of the optical constants, different compositions of As_xS_100−x (x = 10, 15, 20, 25, 30 and 40 at%) thin films were deposited by thermal evaporation technique in a base pressure of 7.5 × 10⁻⁶ Torr at room temperature. The transmission spectra (measured in the wavelength range of 0.2–0.9 μm) were analyzed by applying O’Leary, Johnson, and Lim (OJL) model based on the joint density of states (JDOS) functions. However, the best fit of the optical data was obtained by considering the two-layer configuration film; the top layer was assumed to be consisted of a bulk AsS material embedded in voids (air). Therefore, OJL model along with Bruggeman effective-medium approximation (BEMA) model was used to determine the effective optical constants of the As–S thin films. The photon energy dependence of the dielectric function, ? = ?_r − i?_i of the investigated As–S films was presented. The film thickness, absorption coefficient α, refractive index n, extinction coefficient k, static refractive index n(0) and optical band gap E_g have been deduced. It was found that with the increase in arsenic content up to the stoichiometric As₄₀S₆₀, the indirect optical energy gap decreases, while the refractive index increases.     

Compositional effects on the optical properties of Gex Sb40−x Se60 thin films

Ge_x Sb_40−x Se₆₀ (x = 0, 2.42 and 23.41 at.%) thin chalcogenide films were deposited on glass and quartz substrates by the conventional thermal evaporation technique at 300 K. The chemical composition of the bulk material and as-deposited films were determined by energy dispersive analysis X-ray spectrometry (EDAX). X-ray diffraction pattern (XRD) of Ge_x Sb_40−x Se₆₀ (x = 0, 2.42 and 23.41 at.%) thin films indicates that they have amorphous structure. The optical transmission and reflection spectra were measured in the range of 500 to 2500 nm. The optical absorption coefficient spectra were studied for deposited samples. It is observed that the optical absorption edge shift to higher energy range, as the germanium content, x, increases in the film. The type of electronic transition, responsible for the optical properties, is indirect allowed transition. It is found that the optical band gap increases as the Ge content increases.The average coordination number (N_c) in Ge_x Sb_40−x Se₆₀ films increases, but the number of chalcogenide atoms remains constant. The number of Ge - Se bonds and the average bond energy of the system increase with the increase of the average coordination number. The optical band gap, E_g, increases with the increase of the average coordination number, (N_c). Also the energy gap, E₀₄, is discussed in terms of its relation to the chemical composition. The dispersion of the refractive index (n) is discussed in terms of the Single Oscillator Model (SOM) (Wimple - Didomenico model). The single oscillator energy (E₀), the dispersion energy (E_d) and the optical dielectric constant (?_∞) are also estimated.     

Spectroscopic ellipsometry studies of amorphous PZT thin films with various Zr/Ti stoichiometries

Amorphous stoichiometric Pb(Zr _x Ti_{1 – x)}O₃) (PZT) thin films with various values of x were deposited on Si(100) substrates by the sol-gel technique. The influence of Ti content on the optical properties was studied by spectroscopic ellipsometry (SE) in the UV-visible region. Using a four-phase fitting model, the refractive index n and extinction coefficient k was obtained by analyzing the SE spectra. The optical band gap energies E _g for these films were reported under the assumption of a direct band-to-band transition. It has been found that the refractive index, extinction coefficient and band gap energy of the films were functions of the film compositions. The refractive index of the PZT films increases linearly with increasing Ti content. On the other hand, the optical band gap energy of the PZT films decreases with increasing Ti content.     

Study of structural and optical properties of Cd1-xZnxSe thin films

Cd_1-xZn_xSe (x = 0, 0.5 and 1) thin films have been deposited onto glass substrates using thermal evaporation technique. The lattice constants, grain size, microstrain and dislocation density were studied by using X-ray diffraction. In addition the optical constants were calculated in the wavelength range 400-2500 nm. Transmittance and reflectance were used to calculate the absorption coefficient α and the optical band gap E_g. The linear relation of (αhυ)² as a function of photon energy hυ for the thin films illustrated that the films exhibit a direct band gap, which increases with increasing Zn content. This increasing of optical band gap was interpreted in accordance to the increasing in the cohesive energy. Optical constants, such as refractive index n, optical conductivity σ_opt, complex dielectric constant, relaxation time τ and dissipation factor tanδ were determined. The optical dispersion parameters E₀, E_d were determined according to Wemple and Di Domenico method.     

Optical constants of silicone-like (Si:Ox:Cy:Hz) thin films deposited on quartz using hexamethyldisiloxane in a remote RF hollow cathode discharge plasma

Deposition of amorphous silicone-like (Si:O_x:C_y:H_z) thin films in a remote RF hollow cathode discharge plasma using hexamethyldisoloxane as monomer and Ar as feed gas has been investigated for films optical constants and plasma diagnostic as a function of RF power (100-300 W) and precursor flow rate (1-10 sccm). Plasma diagnostic has been performed using Optical Emission Spectroscopy (OES). The optical constants (refractive index, extinction coefficient and dielectric constant) have been obtained by reflection/transmission measurements in the range 300-700 nm. It is found that the refractive index increases from 1.92 to 1.97 with increasing power from 100 to 300 W, and from 1.70 to 1.92 with increasing precursor flow rate from 1 to 10 sccm. The optical energy band gap E_g and the optical-absorption tail ΔE have been estimated from optical absorption spectra, it is found that E_g decreases from 3.28 to 3.14 eV with power increase from 100 to 300 W, and from 3.54 to 3.28 eV with precursor flow rate increase from 1 to 10 sccm. ΔE is found to increase with applied RF power and precursor flow rate increase. The dependence of optical constants on deposition parameters has been correlated to plasma OES.     

Magnetron sputtering of TiOxNy films

This article reports on the characterization and preparation of N-doped titanium dioxide (TiO₂) films by reactive magnetron sputtering from Ti(99.5) targets in a mixture of Ar/O₂/N₂ atmosphere on unheated glass substrates. A dual magnetron system supplied by a dc bipolar pulsed power source was used to sputter the TiO_xN_y films. The amount of N in the TiO_xN_y film ranges from 5 to 40 at%. Its structure was measured using X-ray diffraction (XRD), the optical band gap was calculated from Tauc plots and the decrease of the water contact angle α_ir after the film activation by UV irradiation was investigated as a function of at% of N in the TiO_xN_y film. The yellow-coloured TiO_xN_y films with high (≈8 at%) amount of N exhibited a strong decrease of the band gap E_g down to 2.7 eV. A significant decrease of the water contact angle α_ir after UV irradiation has been observed for 2 μm thick transparent nanocrystalline (anatase+rutile) N-doped TiO₂ films containing less than 6 at% of N.     

Structural, chemical, and optical properties of tin sulfide thin films as controlled by the growth temperature during co-evaporation and subsequent annealing

Tin sulfide thin films on soda-lime glass substrate were prepared by co-evaporation. This technique uses a vapor phase procedure involving chemical reactions between the precursor species evaporated simultaneously. The influence of the substrate temperature in the crystal structure and chemical composition were determined by X-ray diffraction and energy dispersive analysis of X-rays, showing that thin films crystallized in SnS, SnS₂, and Sn₂S₃ phases. Scanning electron microscope shows thin films with homogenous and uniform surface. Some of the samples were annealed to study the variation of structural, chemical, and optical properties. The variation of refractive index (n), extinction coefficient (k), and dielectric constant (ε) with wavelength and photon energy are reported. The energy band gap was calculated from optical transmittance and reflectance measurements in the range 300–1500 nm. The calculated energy band gap values were between 1.75 and 2.3 eV, depending on the phase in which crystallized the different thin films.     

Compositional dependence optical properties study of As40Se60 − xSbx thin films

Thin films were thermally evaporated from the bulk glasses of As₄₀Se_60 − xSb_x (with x = 0, 5, 10, 15 at.%) under high vacuum. We have characterized the deposited films by Fourier Transform Infrared spectroscopy. The relationship between the structural and optical properties and the compositional variation has been investigated. Increasing Sb content was found to affect the thermal and optical properties of these films. Non-direct electronic transition was found to be responsible for the photon absorption inside the investigated films. It was found that, the optical band gap E_o decreases while the width of localized states (Urbach energy) E_e increases.     

Influence of ultraviolet irradiation on the optical properties of amorphous Sb10Se90 thin films

Amorphous Sb₁₀Se₉₀ thin films were prepared by thermal evaporation of the bulk glass. The changes in the optical properties (transmittance, optical gap, absorption coefficient, refractive index and extinction coefficient) have been measured in the wavelength range 500-900 nm of virgin and ultraviolet (UV) illuminated films. Analysis of the optical absorption data shows that the rule of non-direct transitions predominates. It is found that the optical energy gap decreases (photo-darkening) and the refractive index increases with the increase of UV exposure time. The dispersion of the refractive index (n) has been discussed in terms of Wemple-Didomenico single oscillator model. The oscillator energy E₀ and the dispersion energy E_d have been determined and discussed in terms of UV exposure time. The photo-darkening was discussed in terms of some of the current literature models.     

Tl1−xIn1−xSnxSe2 (x = 0, 0.1, 0.2, 0.25) single-crystalline alloys as promising non-linear optical materials

Novel materials for the infrared two-photon absorption—Tl_1?xIn_1?xSn_xSe₂ single crystals (x = 0, 0.1, 0.2, 0.25) were grown. Their optoelectronic properties including two-photon absorption at wavelength equal to 9.4 μm at different temperatures were studied. From the spectral data it was established that band gap energy increases with increasing SnSe₂ content in the solid solutions reaching its maximum for the largest content (x = 0.25). The infrared two photon absorption has achieved its maximal value at x = 0.1. The temperature dependence of the optical band gap at various compositions in the range of 77–300 К is practically linear. The band gap value decreases with the increase of T causing the spectral shift of the absorption edge to the low-energy region. Additionally X-ray photoelectron core-level spectra for pristine and Ar⁺-ion irradiated surfaces of Tl_1?xIn_1?xSn_xSe₂ single crystals have been measured.     

Laser-induced amorphization and crystallization on Se80Te20−xPbx thin films

Thin films of glassy alloys of a-Se₈₀Te_20−xPb_x (x=2, 6 and 10) was crystallized in a specially designed sample holder under a vacuum of 10⁻² Pa. The amorphous and crystallized films were induced by pulse laser (wavelength: 337.1 nm, frequency: 10 Hz, pulse duration: 4 ns and pulse energy: 0.963 mJ). After laser irradiation on amorphous and crystalline films: optical band gaps were measured. Crystallization and amorphization of chalcogenide films is accompanied by the change in the optical band gap. The change in optical energy gap could be determined by identification of the transformed phase. This change in the optical band gap may be due to the increase in the grain size and the reduction in the disorder of the system.     

Optical properties of 60B2O3-(40-x)PbO-xMCl2 and 50B2O3-(50-x) PbO-xMCl2 (M = Pb, Cd) glasses

Optical absorption and transmittance spectra of 60B₂O₃-(40-x)PbO-xMCl₂ and 50B₂O₃-(50-x) PbO-xMCl₂ (M = Pb, Cd) (10 ≤x ≤ 20) glasses of varying composition were recorded in the UV-visible region. Various optical parameters such as optical energy gap (E _opt), Urbach energy (E _e), refractive index (n ₀), optical dielectric constant (ε∞), and ratio of carrier concentration to the effective mass (N/m*;) were determined. The variation of optical energy gap with increase in the concentration of PbCl₂ or CdCl₂ is discussed.     

Correlation between the composition, structure and properties of dual ion beam deposited SiNx films

Silicon nitride (SiN_x) films were prepared by dual ion beam deposition at room temperature. An assisted N₂⁺ ion beam (current I_b=0-45 mA) was directed to bombard the substrate surface to control the N content x, which saturated at x≈1.36 when I_b?25 mA. The presence of SiN bonds was indicated by the appearance of a Si 2p photoelectron peak at 101.9 eV and an infrared absorption peak at 850 cm⁻¹. As x increases from 0 to 1.36, the hardness, elastic modulus and compressive stress increase from 12.2 to 21.5 GPa, 191 to 256 GPa and 0.52 to 1.4 GPa and the friction coefficient against stainless steel ball decreases from 0.65 to 0.37. The optical band gap increases remarkably with a concomitant drop in electrical conductivity (σ_RT) by more than 10⁷ times. Ion bombardment induces defects and trap states in the mid-gap, such that the transport mechanism is dominated by hopping of charge carriers through the trap states. Consequently, the activation energy of electrical conductivity is much lower than the optical band gap.     

Effects of annealing temperatures on optical and electrical properties of vacuum evaporated Ga15Se77In8 chalcogenide thin films

The optical constants (absorption coefficient, optical band gap, refractive index, extinction coefficient, real and imaginary parts of dielectric constants) of amorphous and thermally annealed thin films of Ga₁₅Se₇₇In₈ chalcogenide glasses with thickness 4000 Å have been investigated from absorption and reflection spectra as a function of photon energy in the wave length region 400-800 nm. Thin films of Ga₁₅Se₇₇In₈ chalcogenide glasses were thermally annealed for 2 h at three different annealing temperatures 333 K, 348 K and 363 K, which are in between the glass transition and crystallization temperature of Ga₁₅Se₇₇In₈ glasses. Analysis of the optical absorption data shows that the rule of non-direct transitions predominates. It was found that the optical band gap decreases with increasing annealing temperature. It has been observed that the value of absorption coefficient and extinction coefficient increases while the values of refractive index decrease with increasing annealing temperature. The decrease in optical band gap is explained on the basis of the change in nature of films, from amorphous to crystalline state. The dc conductivity of amorphous and thermally annealed thin films of Ga₁₅Se₇₇In₈ chalcogenide glasses is also reported for the temperature range 298-393 K. It has been observed that the conduction is due to thermally assisted tunneling of the carriers in the localized states near the band edges. The dc conductivity was observed to increase with the corresponding decrease in activation energy on increasing annealing temperature in the present system. These results were analyzed in terms of the Davis-Mott model.