用于浸没式工艺的光刻胶研究进展

浸没式光刻技术是在原干法光刻的基础上采用高折射率浸没液体取代原来空气的空间,从而提高光刻分辨率的一种先进技术.此项技术的实际应用,为当前IC产业的飞速发展起到了关键的作用.本文概述了浸没式光刻技术的发展历程和浸没式光刻胶遇到的挑战及要求;对浸没式光刻胶主体树脂、光致产酸剂及添加剂的研究进展进行了综述;最后对浸没式光刻胶的研究发展方向作了进一步的探讨及初步预测.     

Preparation of Substituted N-Methacryloxy Phthalimides for E-Beam Lithography

Poly (methyl methacrylate) (PMMA) is a very good option for electron-beam resists, but suffers from poor radiation sensitivity and poor plasma etch resistance. These problems can be offset, at least in part, by functionalizing the PMMA with photo-labile, plasma etch-resistance groups. Toward this end, a series of N-methacryloxy phthalimides with different substitutuents (methyl, nitro, tetrahydrogen and dichloro) were synthesized as possible useful radiation-sensitive resists. The work discussed here focuses on the cycloimido group, which can be easily attached to methacrylic acid to form a radiation-sensitive resist material for use in electron beam lithography. The labile N–O bond of the cycloimido group, upon exposure to radiation, cleaves and forms a radical on the main chain of the polymer, which leads to polymer degradation. Cursory evaluations showed that these new materials are deserving of further study.     

紫外纳米压印抗蚀剂的研究进展

本文介绍了纳米压印技术的基本原理。总结了紫外纳米压印抗蚀剂的种类以及组分。具体包括丙烯酸酯体系、环氧树脂体系和乙烯基醚体系的配方组成及单体合成方法。比较了各个体系的优缺点。本文还分析了目前国内纳米压印抗蚀剂的研究现状并对其研究方向进行了分析与展望。     

Photopolymerized Thiol-Ene Systems as Shape Memory Polymers

In this study we introduce the use of thiol-ene photopolymers as shape memory polymer systems. The thiol-ene polymer networks are compared to a commonly utilized acrylic shape memory polymer and shown to have significantly improved properties for two different thiol-ene based polymer formulations. Using thermomechanical and mechanical analysis, we demonstrate that thiol-ene based shape memory polymer systems have comparable thermomechanical properties while also exhibiting a number of advantageous properties due to the thiol-ene polymerization mechanism which results in the formation of a homogeneous polymer network with low shrinkage stress and negligible oxygen inhibition. The resulting thiol-ene shape memory polymer systems are tough and flexible as compared to the acrylic counterparts. The polymers evaluated in this study were engineered to have a glass transition temperature between 30 and 40 °C, exhibited free strain recovery of greater than 96% and constrained stress recovery of 100%. The thiol-ene polymers exhibited excellent shape fixity and a rapid and distinct shape memory actuation response.     

Synthesis and lithographic characterization of poly[(dihydrocarveol)-co-(1,1-dimethylethyl bicyclo[2.2.1]hept-5-ene-2-carboxylate)-co-(maleic anhydride)]

A new ArF single-layer resist polymer, poly(dihydrocarveol-co-1,1-dimethylethyl bicyclo[2.2.1]hept-5-ene-2-carboxylate-co-maleic anhydride) has been synthesized by radical polymerization. The molar composition of synthesized resist polymer was confirmed by elemental analysis. The obtained molar composition was 0.25:0.35:0.40. This resist polymer was found to be stable up to 230 °C, but above 250 °C it underwent rapid thermal deprotection of the tert-butyl groups by releasing carbon dioxide and 2-methylpropene. The deprotection temperature was established by DSC and TGA. Using the resist, 0.14 µm L/S pattern was obtained at 26 mJ/cm⁻² doses, using an ArF stepper and the developer of 2.38 wt% tetramethyl ammonium hydroxide aqueous solution. © 1999 Society of Chemical Industry     

Silicon-containing polymer nanosheets for oxygen plasma resist application

In this paper, we prepared a silicon-containing polymer nanosheet, poly(neo-pentylmethacrylamide-co-4-(trimethylsilyl)phenyl)methacrylamide (p(nPMA/SiPhMA)), for positive-tone photoresist application. p(nPMA/SiPhMA) forms a stable monolayer at the air-water interface and the polymer monolayer can be transferred onto a solid substrate using the Langmuir-Blodgett technique, when the SiPhMA molar contents are below 38%. Sixty layers of p(nPMA/SiPhMA) nanosheet were deposited onto a silicon substrate and deep UV was irradiated through a photomask to the deposited film. After development of the irradiated film with alkaline solution, a positive-tone fine pattern with a 0.75 μm resolution, which is the highest resolution of the photomask, was clearly drawn. UV-vis and FT-IR spectroscopy indicates the formation of alkaline soluble groups, such as CO and Si-O-Si after photodecomposition. Moreover, p(nPMA/PhSiMA) polymer nanosheet shows three times higher oxygen etching resistance compared to poly(methylmethacrylate) (PMMA). The high plasma resistance of the polymer nanosheet film is caused by not only the presence of Si atom in the film but also a closely packed and high molecular orientated structure of the polymer nanosheets.     

快速成型用光敏树脂固化收缩率的研究

讨论了齐聚物及稀释剂对固化体系收缩率的影响。实验结果表明:改性环氧丙烯酸酯可以明显改善体系收缩率,稀释剂对收缩率有影响。用正交实验法优选后,100克改性环氧丙烯酸中加入40克DEGDA,20克TEG DA,20克TMPTA,30克PDDA后收缩率较小,为3 89%,能够满足光固化快速成型工艺的要求。     

疏水缔合聚合物溶液抗稀释性研究

通过聚合物粘—浓关系研究了疏水缔合聚合物溶液抗地层水的稀释性能,通过研究表明缔合聚合物分子间相互缔合作用使溶液内形成均匀分布于整个溶液体系的三维立体网状结构,是一种热力学稳定体系,其内聚能密度更高,使其较普通聚丙烯酰胺溶液更难被稀释,表现出具有明显抗稀释的能力。     

Fabrication of Nickel Nanostructure Arrays Via a Modified Nanosphere Lithography

In this paper, we present a modified nanosphere lithographic scheme that is based on the self-assembly and electroforming techniques. The scheme was demonstrated to fabricate a nickel template of ordered nanobowl arrays together with a nickel nanostructure array-patterned glass substrate. The hemispherical nanobowls exhibit uniform sizes and smooth interior surfaces, and the shallow nanobowls with a flat bottom on the glass substrate are interconnected as a net structure with uniform thickness. A multiphysics model based on the level set method (LSM) was built up to understand this fabricating process by tracking the interface between the growing nickel and the electrolyte. The fabricated nickel nanobowl template can be used as a mold of long lifetime in soft lithography due to the high strength of nickel. The nanostructure–patterned glass substrate can be used in optical and magnetic devices due to their shape effects. This fabrication scheme can also be extended to a wide range of metals and alloys.     

Ferrocene-containing Liquid Crystalline Polymers

This article is one of a number of reviews in a special issue to honor Prof. Dr. Ian Manners of the University of Bristol, UK, for his outstanding contributions in the field of organometallic polymers. The focus of this review is on the syntheses, properties, and characterization of ferrocene-containing liquid crystalline polymers in which ferrocene moieties are in or pendent to the backbone and also dendrimers and [60]fullerene-ferrocene liquid crystalline materials.     

光致变色聚合物

介绍了用合成、共混等方法提高光致变色材料化学性能与物理性能的途径,比较了不同手段对终端产品质量的影响,阐明了化学合成方法在功能材料发展道路上的巨大潜力。     

智能材料与聚合物

本文阐述了智能材料的概念、设计方法和相关的研究领域。在分子、原子、介观和宏观层次上讨论了聚合物的结构和智能性。     

芳香族电子导电聚合物的研究进展

主链型芳香族聚合物具有热稳定性高、化学稳定性好、质地轻且牢固以及良好的加工成型性等优点,其作为导电聚合物材料的应用正受到人们越来越多的关注。本文综述了芳香族电子导电聚合物的研究进展,并指出存在问题和解决方法。     

智能聚合物研究进展

描述了智能聚合物的研究现状，详细讨论了智能性的形式和构筑策略的最新研究进展。     

An Antireflective Nanostructure Array Fabricated by Nanosilver Colloidal Lithography on a Silicon Substrate

An alternative method is presented for fabricating an antireflective nanostructure array using nanosilver colloidal lithography. Spin coating was used to produce the multilayered silver nanoparticles, which grew by self-assembly and were transformed into randomly distributed nanosilver islands through the thermodynamic action of dewetting and Oswald ripening. The average size and coverage rate of the islands increased with concentration in the range of 50–90 nm and 40–65%, respectively. The nanosilver islands were critically affected by concentration and spin speed. The effects of these two parameters were investigated, after etching and wet removal of nanosilver residues. The reflection nearly disappeared in the ultraviolet wavelength range and was 17% of the reflection of a bare silicon wafer in the visible range.