CH_4离子束增强沉积对TiC薄膜显微硬度的影响机制SCIEI

研究了双离子束沉积ＴｉＣ薄膜的形成．离子束反应溅射膜的显微硬度比ＣＨ_４高子束增强沉积膜的显微硬度高．ＸＰＳ，ＴＥＭ和ＡＥＳ分析表明后者硬度低的一个重要原因是ＣＨ_４离子束轰击引入过量的自由碳原子．     

单源低能离子束辅助沉积类金刚石薄膜结构及性能研究

用单源低能氩离子束辅助沉积（ＩＢＡＤ）法制备了非晶碳薄膜．氩离子能量为４００－１５００ｅＶ．膜面光滑致密，与衬底的结合力较高。用Ｒａｍａｎ，ＦＴＩＲ，ＨＲＴＥＭ，ＴＥＤ，ＳＥＭ，ＥＲＤ及ＲＢＳ研究了薄膜的形貌、结构和组分，测量了膜的电阻率、显微硬度及摩擦系数．薄膜为无定形的类金刚石（ＤＬＣ）．其中含氢约为２０５ａｔ．－％，碳原子与氢原子几乎没有形成Ｃ－Ｈ键．随着离子束能量及束流的增加，显微硬度、摩擦系数增加，电阻率减小．硬度增加是由于薄膜致密度的增加，而电阻率降低是由于膜中金刚石键（ｓｐ~３键）含量减少的缘故．     

CH4与N2流量比对Ti（C,N）涂层性能的影响

采用物理化学气相沉积（ＰＣＶＤ）技术，在硬质合金上涂复Ｔｉ（ＣＮ１－ｘ）膜（０＜Ｘ＜１），测定了涂层厚度、显微硬度、粘结强度与反应气体中ＣＨ４／Ｎ２比值的关系。在本实验条件下，当ＣＨ４／Ｎ＝１：１时，涂层具有最佳综合性能和最大沉积速率。采用ｘ射线衍射（ＸＲＤ）、扫描电子显微镜（ＳＥＭ）及ｘ射线光电子谱（ＸＰＳ）技术，分析了涂层微观组织、表面形貌、化学成分及涂层／基体界面区微观形貌。在此基础上，就ＣＨ４／Ｎ２值、微观结构及性能间的关系进行了讨论。     

离子束轰击对多层膜摩擦学性能的影响

用Ｎｅ离子束混合法制务了Ｎｉ／Ｃｒ多层膜，用Ａｕｇｅｒ光电子能谱（ＡＥＳ），Ｘ射线衍射（ＸＲＤ）分析离子束混合多层膜的元素组成，分布和相结构，将其结果与简单蒸发沉积的Ｎｉ／Ｃｒ多层膜结构进行比较，同时，对多层膜（轰击与未轰击）的硬度及摩擦学性能进行测定分析比较，结果表明，离子束混合多层膜的硬度和抗磨性能与简单蒸发沉积多层膜相比都相有提高，这主要是因为Ｎｅ离子的轰击使用使多层膜更加致密及膜内的碳化铬     

SEPARATION OF Ta AND Nb BY EXTRACTION WITH SEC-OCTANOL-HF-H_2SO_4 SYSTEM

ＳＥＰＡＲＡＴＩＯＮＯＦＴａＡＮＤＮｂＢＹＥＸＴＲＡＣＴＩＯＮＷＩＴＨＳＥＣ－ＯＣＴＡＮＯＬ－ＨＦ－Ｈ_２ＳＯ_４ＳＹＳＴＥＭ￥ＣｈｅｎＨｕｉｆａｎｇ；ＨｅＷａｎｎｉａｎ；ＺｈａｎｇＹｕｑｉ（ＢｅｉｊｉｎｇＧｅｎｅｒａｌＲｅｓｅａｒｃｈＩｎｓｔｉｌｕｔ...     

离子束辅助沉积TiN膜的摩擦学特性

用ＸＰＳ，ＡＥＳ和ＸＲＤ分析厚约２μｍ离子束辅助沉积ＴｉＮ膜的成分和结构．实验表明：膜的表面成分主要是ＴｉＯ_２，膜内是轻微择优取向晶粒较细的ＴｉＮ．膜与衬底的界面存在混合区，用阶梯加载法测定润滑条件下ＧＣｒ１５钢与ＴｉＮ膜对磨时的临界载荷－速度关系．试验发现ＴｉＮ膜可显著扩大边界润滑区，承受较大载荷而不致发生擦伤．     

RELATIONSHIP OF THE PROPERTIES OF HOT－PRESSING C－BC_4－SiC COMPOSITE WITH THE CONTENT OF ADDITIVE Al

ＲＥＬＡＴＩＯＮＳＨＩＰＯＦＴＨＥＰＲＯＰＥＲＴＩＥＳＯＦＨＯＴ－ＰＲＥＳＳＩＮＧＣ－ＢＣ_４－ＳｉＣＣＯＭＰＯＳＩＴＥＷＩＴＨＴＨＥＣＯＮＴＥＮＴＯＦＡＤＤＩＴＩＶＥＡｌ￥Ｈｕａｎｇ，Ｑｉｚｈｏｎｇ；Ｔａｎ，Ｐｉｎｇ；Ｙａｎｇ，Ｑｉａｏｑｉｎ＋；Ｈ?..     

离子束溅射制备Co／Pt多层膜的结构

采用高角Ｘ射线衍射（ＨＸＲＤ）和ＴＥＭ研究用离子束溅射（ＩＢＳＤ）技术制备的Ｃｏ／Ｐｔ多层膜的晶体结构和显微组织形貌，结果表明：Ｃｏ／Ｐｔ多层膜的晶体结构与Ｃｏ、Ｐｔ层厚度ｔＣｏ、ｔＰｔ密切相关。当ｔＣｏ＜ｔＰｔ＜２１０时，Ｃｏ、Ｐｔ层为共格ｆｃｃ结构，随ｔＣｏ、ｔＰｔ增加，逐渐向非共格关系转变，同时，Ｐｔ、Ｃｏ层晶格发生了严重畸变。ＴＥＭ发现Ｃｏ／Ｐｔ多层膜的组织形貌明显受基底影响，与沉积在Ｓｉ基底表面上的Ｃｏ／Ｐｔ多层膜相比，沉积在ＮａＣｌ上的Ｃｏ／Ｐｔ多层膜的晶粒出现择优取向且呈条纹状分布，晶粒明显粗化     

BSTUDY ON Ni_(25)Ti_(50)Cu_(25) SHAPE MEMORY PARTICLE/Al MATRIX COMPOSITE

ＳＴＵＤＹＯＮＮｉ_（２５）Ｔｉ_（５０）Ｃｕ_（２５）ＳＨＡＰＥＭＥＭＯＲＹＰＡＲＴＩＣＬＥ／ＡｌＭＡＴＲＩＸＣＯＭＰＯＳＩＴＥＬ．Ｓ．Ｃｕｉ；Ｍ．Ｑｉ；Ｐ．Ｓｈｉ；Ｆ．Ｘ．ＣｈｅｎａｎｄＤ．Ｚ．Ｙａｎｇ（ＤｅｐａｒｔｍｅｎｔｏｆＭａｔｅｒｉａｌｓＥ?..     

MICROSTRUCTURES AND OPTICAL PROPERTIES OF Te_（81）Ge_（15）Sb_4 THIN FILMS USED FOR PHASE CHANGE RECORDING MATERIALS

ＭＩＣＲＯＳＴＲＵＣＴＵＲＥＳＡＮＤＯＰＴＩＣＡＬＰＲＯＰＥＲＴＩＥＳＯＦＴｅ_（８１）Ｇｅ_（１５）Ｓｂ_４ＴＨＩＮＦＩＬＭＳＵＳＥＤＦＯＲＰＨＡＳＥＣＨＡＮＧＥＲＥＣＯＲＤＩＮＧＭＡＴＥＲＩＡＬＳ￥Ｓｏｎｇ，Ｌｉａｎｐｅｎｇ；Ｈｕａｎｇ，Ｓｈｕｗａ?..     

辅助气体CH4和Ar对IBED制备碳膜性能的影响

采用离子束辅助沉积技术(IBED)制备了一系列碳膜,重点分析辅助气体CH4、Ar对碳膜组成相、电阻率、厚度和硬度的影响.结果表明:采用CH4辅助轰击制得的薄膜厚度高于采用Ar辅助轰击的薄膜厚度;采用Ar辅助轰击的薄膜在硬度、结合强度方面要优于CH4辅助轰击的薄膜;相对于类金钢石薄膜,所制备的碳膜更接近于类石墨膜.     

钢表面化学气相沉积TiC晶体的择优取向

本文用化学气相沉积(CVD)法,以TiCl_4-CH_4-H_2为原料气体,在不锈钢表面获得了致密的TiC膜.研究了TiC的成膜速度、表面形貌和晶体择优取向与沉积条什的关系.结果表明,沉积温度T_(dep),碳钛比CH_4/TiCl_4强烈地影响了TiC的成膜速度、表面形貌和晶体择优取向.CH_4/TiCl_4低时,TiC晶体的择优取向为(220):而CH_4/TiCl_4高时,TiC晶体的择优取向为(200).TiC晶体的择优取向主要取决于气氛中活性碳的平衡浓度。     

COMPARISON OF SURFACE PROPERTIES OF Ti-6Al-4V COATED WITH TITANIUM NITRIDE, TiN+TiC+Ti(C,N)/DLC, TiN/DLC AND TiC/DLC FILMS BY PLASMA-BASED ION IMPLANTATION

1. IlltroductionThe high yield strength and toughness, moderate modules, low density, good corrosionresistance and exceptional biocompatibility of Ti-6Al--4V alloy have made it increasinglypopular in industrial and medical application. But the alloy does not have enough wearresistance, and so is restricted in surface, particularly tribological applications to a certain e.tent[1--2]. It has been demonstrated that plasma-based ion implalltation (PBll), anew cost-effective technique for improvi…     

PREFERRED ORIENTATION OF DEPOSITED TiC COATING ON STEEL BY CVD

Investigation was made of the deposited rate,surface morphology and crystal pre-ferred orientation of the dense TiC coating onto austenitic stainless steel in relationwith CH_4/TiCl_4 mole ratio and temperature adopted in CVD processing. When theCH_4/TiCl_4 ratio is low or high,the preferred orientation may be(220)or(200),respec-tively,which is mainly dependent on the equilibrium concentration of active C in vapourphase.     

CORROSION BEHAVIOR OF Cu-Nb AND Ni-Nb AMORPHOUS FILMSPREPARED BY ION BEAM ASSISTED DEPOSITION

The Cu25 Nb75 and Ni45Nb55 amorphous films with about 500nm thickness were prepared by ion beam assisted deposition (IBAD). Potentiodynamic polarization measurement was adopted to investigate the corrosion resistance of samples and the tests were carried out respectively in 1mol/L H2SO4 and NaOH aquatic solution. The corrosion performance of the amorphous films was compared with that of multilayered and pure Nb films. Experimental results indicated that the corrosion resistance of amorphous films was better than that of the corresponding multilayers and pure Nb films for both Ni-Nb system with negative heat of formation and Cu-Nb system with positive heat of formation.     

加氮对直流电弧等离子体喷射金刚石膜显微组织和断裂强度的影响

利用DcArcP1asmaJetcVD法制备搀杂氮的金刚石厚膜。研究了在反应气体cH。／Ar／H：中加入N!对金刚石膜显微组织和力学性能的影响。在固定H2、Ar、CH4流量的情况下改变N2的流量，即反应气体中氮原子和碳原子的变化比例(N／C比，范围从0．06～0．68)，同时在固定的腔体压力(4kPa)和衬底温度(800℃)下进行金刚石膜生长。用扫描电镜(SEM)观察金刚石膜形貌、用X射线衍射表征晶体取向，用三点弯曲的方法来测量金刚石膜的断裂强度。结果表明，氮气在反应气体中的大量加入，对直流等离子体喷射制备金刚石膜的显微组织和力学性能有显著的影响。     

梯度基体温度法和反应溅射TiC过渡层对钛合金基体沉积金刚石薄膜的影响

以H2和CH4作为反应气体,采用热丝化学气相沉积法(HFCVD)在钛合金(Ti6Al4V)平板基体上制备金刚石薄膜,利用扫描电镜(SEM)、X射线衍射仪(XRD)、激光拉曼光谱(Raman)和洛氏硬度仪分析薄膜的表面形貌、结构、成分和附着性能,研究了高温形核-低温生长的梯度降温法对原始钛合金和反应磁控溅射TiC过渡层的钛合金表面沉积金刚石薄膜的影响。结果表明:原始基体区和TiC过渡层区沉积的金刚石薄膜平均尺寸分别为0.77μm和0.75μm,薄膜内应力分别为-5.85GPa和-4.14GPa,TiC层的引入可以有效提高金刚石的形核密度和晶粒尺寸的均匀性,并减少薄膜残余应力;高温形核-低温生长的梯度降温法可以有效提高金刚石的形核密度和质量,并提高原始基体上沉积金刚石薄膜的附着性能。     

PREPARATION OF B-N FILMS BY ION BEAM ASSISTED DEPOSITION

BN films,synthesized by ion beam assisted deposition,were analysed by RBS,AES,IR spectra and TEM.Formatiom of c-BN phase was shown not only by IR spectra atabsorption peak of 1100 cm~(-1),but also by electron diffraction pattern.The results ofAES demonstrate an effect of N~+ implantation near the film surface.The deposited filmsconsist of three layers,i.e.,ion implantation layer,film layer and mixed intermediatelayer,according to the difference of concentration.The micro-Knoop hardness of the film is25—35 GPa.     

霍尔无栅离子源的研制及应用

基于离子束辅助镀膜技术,自主研制了一款新型霍尔无栅离子源,利用该离子源,采取离子束辅助沉积方法,在玻璃基底上镀制了多种光学薄膜,并对所镀制光学薄膜的性能进行了测试。测试结果表明:所研制的霍尔无栅离子源制备的各种光学薄膜,其膜层强度、附着性、耐腐蚀性以及光学性质都比常规热蒸发工艺所制得的薄膜有明显改善。