掺氟氧化锡(SnO2:F)纳米粉末的制备

以SnCl4.5H2O、氨水和HF酸为主要原料,用化学方法制取了掺氟氧化锡(FTO)纳米粉末。用XRD、SEM分别研究了FTO粉末的相结构和形貌,用比表面仪测定了粉末比表面积,同时测试了FTO粉末的电阻率。结果表明:FTO粉末是四方晶系金红石结构;在500℃下焙烧制取的粉末电阻率最低,为50?.m,比表面积为61.00m2/g。采用无水酒精球磨分散等步骤,可有效防止粉末团聚。     

Properties of fluorine-doped tin oxide films prepared by an improved sol-gel process

Fluorine-doped tin oxide (FTO) films were prepared by an improved sol-gel process, in which FTO films were deposited on glass substrates using evaporation method, with the precursors prepared by the conventional sol-gel method. The coating and sintering processes were combined in the evaporation method, with the advantage of reduced probability of films cracking and simplified preparation process. The effects of F-doping contents and structure of films on properties of films were analyzed. The results showed the performance index (Φ_TC=3.535×10⁻³ Ω⁻¹ cm) of the film was maximum with surface resistance (R_sh) of 14.7 Ω cm⁻¹, average transmittance (T) of 74.4% when F/Sn=14 mol%, the reaction temperature of the sol was 50 °C, and the evaporation temperature was 600 °C in muffle furnace, and the film has densification pyramid morphology and SnO_2−xF_x polycrystalline structure with tetragonal rutile phase. Compared with the commercial FTO films (Φ_TC=3.9×10⁻³ Ω⁻¹ cm, R_sh=27.4 Ω cm⁻¹, T=80%) produced by chemical vapor deposition (CVD) method, the Φ_TC value of FTO films prepared by an improved sol-gel process is close to them, the electrical properties are higher, and the optical properties are lower.     

掺氟二氧化锡纳米粉的制备及电性能研究

以SnCl2·2H2O、HF为原料,采用共沉淀法合成了掺氟二氧化锡FTO(SnO2∶F)纳米粉。在氧化的过程中进行掺杂,使F原子更容易取代O原子,在400℃低温下蒸发得到了低电阻率的FTO纳米粉。应用SEM、XRD、EDS和压片测电阻等方法,对所获粉体进行了表征。结果表明,F的掺杂明显降低了SnO2的电阻率。当r(Sn∶F)为10∶3时,FTO纳米粉的电阻率最低,为57.2Ω/cm。     

The influence of indium tin oxide deposition on the transport properties at InP junctions

The influence of the deposition of indium tin oxide (ITO) on the electrical properties at n- and p-InP junctions have been investigated by current-voltage-temperature and capacitance-voltage measurements. It was found that the formation of the ITO layer on n-type InP substrates causes the reduction of the barrier height and subsequently forms an ohmic contact. The ITO layer on p-type substrates increases the barrier height by 200–300 meV, and causes a defect-assisted tunneling at low forward bias. The results, therefore, can be explained by the introduction of process induced donor-like defects, with the formation of a thin n⁺-layer in the near-surface, decreasing the barrier height for n-substrates and increasing the barrier height for p-substrates. These results support the buried n⁺/p-junction model for ITO/p-InP solar cell structures.     

The influence of indium tin oxide deposition on the transport properties at InP junctions

The influence of the deposition of indium tin oxide (ITO) on the electrical properties at n- and p-InP junctions have been investigated by current-voltage-temperature and capacitance-voltage measurements. It was found that the formation of the ITO layer on n-type InP substrates causes the reduction of the barrier height and subsequently forms an ohmic contact. The ITO layer on p-type substrates increases the barrier height by 200–300 meV, and causes a defect-assisted tunneling at low forward bias. The results, therefore, can be explained by the introduction of process induced donor-like defects, with the formation of a thin n⁺-layer in the near-surface, decreasing the barrier height for n-substrates and increasing the barrier height for p-substrates. These results support the buried n⁺/p-junction model for ITO/p-InP solar cell structures.     

二氧化锡溅射工艺研究

SnO2 是最早使用也是目前使用最广泛的一种气敏材料 ,使用该材料设计制作的气敏传感器具有许多优点。在简要介绍溅射镀膜的成膜过程和特点的基础上 ,着重介绍了SnO2 膜的制备流程 ,分析了功率和温度变化对成膜质量的影响     

Influence of thermal annealing on electrical and optical properties of indium tin oxide thin films

Transparent conducting indium tin oxide (ITO) thin films with the thickness of 300 nm were deposited on quartz substrates via electron beam evaporation, and five of them post-annealed in air atmosphere for 10 min at five selected temperature points from 200 °C to 600 °C, respectively. An UV–vis spectrophotometer and Hall measurement system were adopted to characterize the ITO thin films. Influence of thermal annealing in air atmosphere on electrical and optical properties was investigated in detail. The sheet resistance reached the minimum of 6.67 Ω/sq after annealed at 300 °C. It increased dramatically at even higher annealing temperature. The mean transmittance over the range from 400 nm to 800 nm reached the maximum of 89.03% after annealed at 400 °C, and the figure of merit reached the maximum of 17.79 (Unit: 10⁻³ Ω⁻¹) under the same annealing condition. With the annealing temperature increased from 400 °C to 600 °C, the variations of transmittance were negligible, but the figure of merit decreased significantly due to the deterioration of electrical conductivity. With increasing the annealing temperature, the absorption edge shifted towards longer wavelength. It could be explained on the basis of Burstein–Moss shift. The values of optical band gap varied in the range of 3.866–4.392 eV.     

锑掺杂二氧化锡薄膜的导电机理及其理论电导率

归纳总结了锑掺杂二氧化锡(ATO)的导电机理。晶格的氧缺位、5价Sb杂质在SnO2禁带形成施主能级并向导带提供n型载流子是ATO导电的两种主要机理。从材料的电导率公式出发,定性分析了二氧化锡中掺杂锑的含量存在理论最佳值,根据已有模型计算证明了锑掺杂二氧化锡电导率存在理论上限。掺杂二氧化锡中锑的最佳理论含量为1.49%(质量百分数),锑掺杂二氧化锡理论电导率最高为0.217×104(Ω·cm)-1,氧空位对ATO电导率的贡献为0.1506×104(Ω·cm)-1。     

Indium and tin oxide nanowires by vapor-liquid-solid growth technique

Regular three-dimensional (3-D) arrays of crystalline SnO₂-In₂O₃ nanowires were produced on m-sapphire using a gold catalyst-assisted vapor-liquid-solid growth process. The growth characteristics at multiple growth conditions were analyzed using scanning electron microscopy (SEM), transmission electron microscopy (TEM), selected area electron diffraction (SAED), x-ray photoemission spectroscopy (XPS), and Rutherford backscattering spectroscopy (RBS) to evaluate the functional dependence of nanowire structure and composition on growth parameters such as temperature and source composition. The results indicate that nanowires of mixed composition are not possible from the catalytic clusters; rather, a mixture of indium and tin oxide wires are formed in the range of conditions investigated here.     

锡后处理对锡镀层性能的影响

分别测试了纯锡镀层经钝化及金属保护剂处理后的孔隙率、防变色能力、可焊、回流焊性能及抑制锡须生长情况。试验结果表明:对纯锡层采用钝化和金属保护剂处理均能有效降低镀层的孔隙率,提高镀层的防变色能力。金属保护剂处理能有效防止锡层的氧化,延长产品的储存寿命,对焊接性能无影响,同时能有效抑制锡须生长;钝化处理降低了锡镀层的焊接性能,对抑制锡须生长作用不明显。     

Evaluation of an Nd doping effect on characteristic properties of tin oxide

In the present work, transparent and conductive Nd doped SnO₂ thin films were deposited via spray pyrolysis. Crystallographic, morphological, optical and electrical characterizations of SnO₂ were researched as a function of Nd doping. The XRD analysis indicated the films had tetragonal cassiterite tin oxide structure and (211) preferential direction for NdTO-0, NdTO-1, NdTO-2 and NdTO-3 samples changed to (110) plane for NdTO-4 and NdTO-5 samples. The crystalline size and strain analysis were made by using a Williamson–Hall method. The SEM micrographs showed that all films had homogenously scattered pyramidal and small densely nanoparticles. The optical analysis indicated optical band gap value of undoped film increased with 1 at% Nd doping and then it decreased with more Nd content. The Hall measurements indicated that the highest electrical conductivity was obtained for 2 at% Nd doping content.     

Room temperature ferromagnetism in combustion reaction prepared iron-doped zinc oxide nanoparticles

We present a study of the structural and magnetic properties of Zn_1?xFe_xO (0.00≤x≤0.09) nanoparticles prepared by a combustion reaction method. X-ray diffraction patterns of all samples showed sharp and intensive peaks of hexagonal wurtzite structure of ZnO without any evidence of spurious crystalline phases in all samples. The magnetic properties were measured by using a vibrating sample magnetometer. Hysteresis loop indicated that all samples are ferromagnetic at room temperature and the Curie temperature increased with increasing iron content. Room temperature ferromagnetism can be explained in terms of intrinsic properties and the presence of defects in Fe- doped ZnO nanoparticles.     

衬底温度对ZnO薄膜氧缺陷的影响

采用射频磁控溅射在石英玻璃和单晶硅Si(100)衬底上制备了ZnO薄膜，研究了衬底温度对ZnO薄膜中氧缺陷的影响。实验发现，ZnO薄膜c轴取向性随温度的升高而增强；当衬底温度达到550。C时，XRD谱上仅出现一个强的(002)衍射峰和一个弱的(004)衍射峰，显示ZnO具有优异c轴取向性。同时，随着温度的升高，ZnO薄膜的紫外透射截止边带向高波长方向漂移，其电导率也随衬底温度的升高逐渐增大，表明薄膜中的氧缺陷逐渐增多。这种氧缺陷是由于ZnO的氧平衡分压高于Zn所致，可通过提高溅射气体中氧含量来改善。     

Work function changes of plasma treated indium tin oxide

The work function (WF) changes of indium tin oxide (ITO) treated by O₂ or Cl₂ plasma were invested. The WF firstly decreases in an exponential way for 2–6 h and subsequently in a linear way for days in air after plasma treatment. X-ray photoelectron spectroscopy (XPS) shows the dipole layer formed by O–In and O–O bonds in the ITO surface treated by O₂ plasma increases the WF. Exposed in vacuum, the O–O bonds tend to break and the reactive O species reduce in the oxidized ITO surface, accounting for the exponential decrease of WF. The environment preserving the chlorinated or oxidized ITO is important to slow down the decrease of WF. The mechanism for WF changes of plasma treated ITO is significant to investigate the properties of organic optoelectronic devices.     

Influence of annealing temperature on the structural and optical properties of nanocrystalline zirconium oxide

Nanocrystalline zirconium oxide powder was prepared by sol-gel method using zirconyl chloride octahydrate (ZrOCl₂·8H₂O) and ethylenediaminetetraacitic acid (EDTA) in ammonium hydroxide (NH₄OH) solution. The as-synthesized complex product was annealed at 650 °C, 750 °C and 850 °C for 2 h to get fine ZrO₂ powder. These samples were further analyzed by Scanning electron microscopy (SEM), X- ray diffraction (XRD), Energy-dispersive X- ray spectroscopy (EDX), UV-vis analysis, Fourier transform infrared (FT-IR) spectroscopy, Photoluminescence spectroscopy (PL) and Raman Spectroscopy to study their structural and optical properties. The structural studies revealed that nanocrystalline ZrO₂ powder exhibits monoclinic phase with variation in crystallite size with annealing temperature. The UV–vis absorption band edge of ZrO₂ decreases from 514 nm to 451 nm as annealing temperature rises from 650 °C to 750 °C. It seems that the drastic reduction in band gap energy may be one of the novel unexpected characteristics of ZrO₂. The FTIR analyses further confirmed the formation of nanocrystalline monoclinic ZrO₂. PL analysis revealed the novel emission peaks at 305 and 565 nm. The Raman spectroscopy confirmed the transformation of amorphous zirconium hydroxide to m-ZrO₂ with increase in temperature from 650 °C to 850 °C.     

Evaluation of electrical and optical properties of indium tin oxide thin film using chemical mechanical polishing technique

In this study, the optimum process parameters and the influences of their process parameters were investigated for indium tin oxide-chemical mechanical polishing (ITO-CMP) with the sufficient removal rate and the good planarity. And then, the optical property such as transmittance and absorption efficiency, and the electrical characteristics such as sheet resistance, carrier density and Hall mobility were discussed in order to evaluate the possibility of CMP application for the organic light emitting display (OLED) device using an ITO film. Light transmission efficiency and current-voltage characteristics of ITO thin film were improved after CMP process using optimized process parameters compared to that of as-deposited thin film before CMP process.     

Low-pressure H2/N2 annealing on indium tin oxide film

Annealing of indium tin oxide (ITO) film in low-pressure H₂/N₂ was investigated. On carefully selecting the annealing process window, apparent electrical property improvement as well as good optical property can be obtained. It was found that ITO annealed with 2 Pa, H₂/N₂:6/6 sccm, at 500 °C for an hour can increase its electrical conductivity 60% more than ITO without annealing, 58% more than ITO annealed with pure H₂. An annealed ITO without specially selected recipe can easily possess worse electrical and optical properties than that without annealing. It can be explained that annealing ITO in a hydrogen-contained environment can lead to hydrogen reduction–oxygen vacancy playing a donor role in ITO; however, annealing also provides the energy to remove ITO material defects including donors.     

营养治疗对门诊血液透析患者的作用

利用中频磁控反应溅射技术在玻璃衬底上制备氮化铝(AlN)薄膜,并经退火处理.利用X-衍射和原子力显微镜分析了AlN薄膜的结构及表面形貌.结果表明,衬底温度和退火工艺对AlN薄膜的结构和表面形貌有重要影响.研究表明,衬底温度为230 ℃时,AlN薄膜的表面粗糙度最小,退火能减小AlN薄膜表面粗糙度.     

高能球磨法制备纳米氧化锡粉体工艺研究

通过调整高能球磨工艺参数,于不同工艺条件下制备了氧化锡粉体,分别测试了对应粉体的比表面积,并利用扫描电镜观察粉体的微观形貌。结果显示:对于80 mL的球磨罐体,球料质量比为20∶1,填充率为40%,直径分别为8,6,4 mm的钢球质量比为1∶5∶3时,制得氧化锡粉体比表面积最大,为28.415 2 m2·g–1;且颗粒分布均匀,粒径为50~100 nm。     

Influence of oxygen flow rate on microstructural,electrical and optical properties of indium tin tantalum oxide films

Indium tin oxide (ITO) and indium tin tantalum oxide (ITTO) films were deposited on glass substrates by magnetron sputtering technology with one or two targets. Properties of ITO and ITTO films deposited at different oxygen flow rates were contrastively studied. Ta-doping strengthens along the orientation of (400) plane and leads to better crystalline structure as well as to a decrease in surface roughness. The increase in oxygen flow rate increases sheet resistance and reduces carrier concentration, and ITTO films show higher carrier concentration. Certain oxygen flow rates can improve the visible light transmittance of films, but excessive oxygen can worsen the optical properties. The carrier concentration has an important influence on near-IR reflection, near-UV absorption and optical band gap. The optical band gap decreases with the increasing of oxygen flow rate, and ITTO films show wider optical band gap than ITO films. ITTO films prepared by co-sputtering reveal better optical–electrical properties and chemical and thermal stability than ITO films.