Optical and structural properties of chemically deposited CdS thin films on polyethylene naphthalate substrates

CdS thin films were deposited on polyethylene naphthalate substrates by means of the chemical bath deposition technique in an ammonia-free cadmium-sodium citrate system. Three sets of CdS films were grown in precursor solutions with different contents of Cd and thiourea maintaining constant the concentration ratios [Cd]/[thiourea] and [Cd]/[sodium citrate] at 0.2 and 0.1 M/M, respectively. The concentrations of cadmium in the reaction solutions were 0.01, 7.5 × 10⁻³ and 6.8 × 10⁻³ M, respectively. The three sets of CdS films were homogeneous, hard, specularly reflecting, yellowish and adhered very well to the plastic substrates, quite similar to those deposited on glass substrates. The structural and optical properties of the CdS films were determined from X-ray diffraction, optical transmission and reflection spectroscopy and atomic force microscopy measurements. We found that the properties of the films depend on both the amount of Cd in the growth solutions and on the deposition time. The increasing of Cd concentration in the reaction solution yield to thicker CdS films with smaller grain size, shorter lattice constant, and higher energy band gap. The energy band gap of the CdS films varied in the range 2.42-2.54 eV depending on the precursor solution. The properties of the films were analyzed in terms of the growth mechanisms during the chemical deposition of CdS layers.     

An in-situ chemical reaction deposition of nanosized wurtzite CdS thin films

Nanocrystalline CdS thin films were deposited on glass substrates by an ammonia-free in-situ chemical reaction synthesis technique using cadmium cationic precursor solid films as reaction source and sodium sulfide based solutions as anionic reaction medium. Effects of ethanolamine addition to the cadmium cationic precursor solid films, deposition cycle numbers and annealing treatments in Ar atmosphere on structure, morphology, chemical composition and optical properties of the resultant films were investigated by X-ray diffraction, field emission scanning electron microscope, energy dispersive X-ray analysis and UV-Vis spectra measurements. The results show that CdS thin films deposited by the in-situ chemical reaction synthesis have wurtzite structure with (002) plane preferential orientation and crystallite size is in the range of 16 nm-19 nm. The growth of film thickness is almost constant with deposition cycle numbers and about 96 nm per cycle.     

Deposition of CdS thin films onto Si(111) substrate by PLD with femtosecond pulse

The effect of laser fluence (laser incident energy in the range of 0.5-1.5 mJ/pulse with the same laser spot size of 0.5 mm × 0.7 mm) on the structural quality and optical properties synthesized by femtosecond pulsed-laser deposition has been studied. The structural quality and optical properties of the deposited CdS thin films were investigated by X-ray diffraction, atomic force microscopy and photoluminescence measurement. The studies revealed an improvement in the structural quality and optical properties of the CdS thin films with increasing the laser fluence in some range. However, too high laser fluence could lead to the structural quality and optical properties of the CdS thin films to degrade. We defined the optimum laser incident energy was around 1.2 mJ/pulse. And the kinetic energy of the plasma produced by femtosecond laser strongly affects the structure and properties of the deposited CdS thin films.     

CdS thin films growth by ammonia free chemical bath deposition technique

Cadmium Sulfide CdS thin films were deposited by chemical bath deposition technique using ethanolamine as complexing agent instead of commonly used ammonia to avoid its toxicity and volatility during film preparation. In order to investigate the film growth mechanism samples were prepared with different deposition times. A set of substrates were dropped in the same bath and each 30 minutes a sample is withdrawn from the bath, by this way all the obtained films were grown in the same condition. The films structure was analyzed by X rays diffraction. In early stage of growth the obtained films are amorphous, with increasing the deposition time, the films exhibits a pure hexagonal structure with (101) preferential orientation. The film surface morphology was studied by atomic force microscopy. From these observations we concluded that the early growth stage starts in the 3D Volmer-Weber mode, followed by a transition to the Stransky-Krastanov mode with increasing deposition time. The critical thickness of this transition is 120 nm. CdS quantum dots were formed at end of the film growth. The optical transmittance characterization in the UV-Visible range shows that the prepared films have a high transparency ranging from 60 to 80% for photons having wavelength greater than 600 nm.     

Tin sulfide thin films and Mo/p-SnS/n-CdS/ZnO heterojunctions for photovoltaic applications

Tin sulfide (SnS) is one of the most promising materials for photovoltaics. Here we report on the preparation as well as chemical, structural and physical characterization of the Mo/p-SnS/n-CdS/ZnO heterojunctions. The SnS thin films were grown by hot wall deposition method on the Mo-coated glass substrates at 270-350 °C. The crystal structure and elemental composition were examined by X-ray diffraction and Auger electron spectroscopy methods. The CdS buffer layers were deposited onto the SnS films by chemical bath deposition. The ZnO window layers were deposited by a two step radio frequency magnetron sputtering, resulting in a ZnO bilayer structure: the first layer consists of undoped i-ZnO and the second of Al-doped n-ZnO. The best junctions have an open circuit voltage of 132 mV, a short circuit current density of 3.6 mA/cm², a fill-factor of 0.29 and efficiency up to 0.5%.     

Aluminum-induced crystallization of amorphous silicon films deposited by hot wire chemical vapor deposition on glass substrates

Aluminum-induced crystallization of amorphous silicon films is discussed. Amorphous Si films were deposited by hot wire chemical vapor deposition onto Al coated glass substrates at 430 °C. Complete crystallization of a-Si films was achieved during a-Si deposition by controlling Al and Si layer thicknesses. The grain structure of the poly-Si films formed on glass substrate was evaluated by optical and electron microscopy. Continuous poly-Si films were obtained using Al layers with a thickness of 500 nm or less. The average grain size was found to be 10-15 μm, corresponding to a grain size/thickness ratio greater than 20.     

Optical and photoconductivity properties of ZnO thin films grown by pulsed filtered cathodic vacuum arc deposition

High quality transparent conductive ZnO thin films with various thicknesses were prepared by pulsed filtered cathodic vacuum arc deposition (PFCVAD) system on glass substrates at room temperature.The high quality of the ZnO thin films was verified by X-ray diffraction and optical measurements. XRD analysis revealed that all films had a strong ZnO (200) peak, indicating c-axis orientation. The ZnO thin films are very transparent (92%) in the near vis regions. For the ZnO thin films deposited at a pressure of 0.086 Pa (6.5 × 10⁻⁴ Torr) optical energy band gap decreased from 3.21 eV to 3.19 eV with increasing the thickness. Urbach tail energy also decreased as the film thickness increased.Spectral dependence of the photoconductivity was obtained from measurements of the samples deposited at various thicknesses. Photoconductivities were observed at energies lower than energy gap which indicates the existence of energy states in the forbidden gap. Photoconductivities of ZnO thin films increase with energy of the light and reach its maximum value at around 2.32 eV. Above this value surface recombination becomes dominant process and reduces the photocurrent. The photoconductivity increases with decreasing the film thickness.     

Carbon incorporation in chemical vapor deposited aluminum oxide films

We report results from an investigation into the nature and extent of carbon incorporation into aluminum oxide thin films deposited from the pyrolysis of dimethylaluminum isopropoxide via high-vacuum chemical vapor deposition. The chemical nature and distribution of carbon in films deposited in the 417-659 °C temperature range were investigated through X-ray photoelectron spectroscopy and Auger electron spectroscopy. Carbon composition increased with increasing deposition temperature, up to approximately 8 at.% at 659 °C. Carbon in films deposited at 477 °C was bonded only to oxygen or carbon, but films deposited above 538 °C also contained metal carbide-like bonding. Carbon content in films deposited on hydrogen-terminated Si (100) substrates increased toward the film-substrate interface, but no silicon-carbon bonding was observed.     

CdTe thin film solar cells with reduced CdS film thickness

A study was performed to reduce the CdS film thickness in CdTe thin film solar cells to minimize losses in quantum efficiency. Using close space sublimation deposition for CdS and CdTe a maximum efficiency of ~ 9.5% was obtained with the standard CdS film thickness of ~ 160 nm. Reduction of the film CdS thickness to less than 100 nm leads to poor cell performance with ~ 5% efficiency, mainly due to a lower open circuit voltage. An alternative approach has been tested to reduce the CdS film thickness (~ 80 nm) by depositing a CdS double layer. The first CdS layer was deposited at high substrate temperature in the range of 520-540 °C and the second CdS layer was deposited at low substrate temperature of ~ 250 °C. The cell prepared using a CdS double layer show better performance with cell efficiency over 10%. Quantum efficiency measurement confirmed that the improvement in the device performance is due to the reduction in CdS film thickness. The effect of double layer structure on cell performance is also observed with chemical bath deposited CdS using fluorine doped SnO₂ as substrate.     

Synthesis of conductive semi-transparent silver films deposited by a Pneumatically-Assisted Ultrasonic Spray Pyrolysis Technique

The synthesis and characterization of nanostructured silver films deposited on corning glass by a deposition technique called Pneumatically-Assisted Ultrasonic Spray Pyrolysis are reported. Silver nitrate and triethanolamine were used as silver precursor and reducer agent, respectively. The substrate temperatures during deposition were in the range of 300–450 °C and the deposition times from 30 to 240 s. The deposited films are polycrystalline with cubic face-centered structure, and crystalline grain size less than 30 nm. Deposition rates up to 600 Å min⁻¹ were obtained at substrate temperature as low as 300 °C. The electrical, optical, and morphological properties of these films are also reported. Semi-transparent conductive silver films were obtained at 350 °C with a deposition time of 45 s.     

Current transport mechanism in CdS thin films prepared by vacuum evaporation method at substrate temperatures below room temperature

CdS thin films were deposited by vacuum deposition method at low substrate temperatures instead of the commonly used vacuum deposition at high substrate temperatures (T_S > 300 K). The effect of low substrate temperature on the current transport mechanisms in polycrystalline CdS thin films has been studied as a function of temperature over the temperature range 100-300 K. Both thermally assisted tunneling of carriers through and thermionic emission over the grain boundary potential have contributions to the conduction in the range 250-300 K for the sample prepared at 300 K substrate temperature. The dominant conduction mechanism of the samples prepared at 200 K and 100 K is determined as thermionic emission over 200 K and Mott's hopping process below 200 K. The Mott's hopping process is not applicable for the sample prepared at 300 K.     

High band gap nanocrystallite embedded amorphous silicon prepared by hotwire chemical vapour deposition

Hydrogenated silicon films ranging from pure amorphous to biphasic silicon i.e., nanocrystallites embedded amorphous silicon are prepared in an indigenously fabricated hot wire chemical vapor deposition chamber by varying the substrate temperature (T_s) and process pressure (PP). The deposition rates are found to be about 2.5-14 Å/s, which is very much appreciated for the fabrication of cost effective devices. While the films deposited at low T_s are amorphous in nature, those deposited at T_s ≥ 200 °C contain nanocrystallites embedded in the amorphous network. These mixed phase films show high crystalline fraction of 50-56%. All the films deposited at 250 °C, by varying PP, are nanocrystallite embedded with crystalline fraction 60-75%. The optical band gaps of the films (2.0-2.37 eV) are high compared to the regular films, whereas the hydrogen content remains in the reported range of 2.5-5 at.%. We attribute the high optical band gap to the improved order as well as the presence of low density amorphous tissues surrounding the grain boundary regions. The ease of depositing films with tunable band gap is useful for fabrication of tandem solar cells.     

Thermal and optical properties of polycrystalline CdS thin films deposited by the gradient recrystallization and growth (GREG) technique using photoacoustic methods

In this work we report the study of the thermal and optical properties of polycrystalline CdS thin films deposited by the gradient recrystallization and growth technique. CdS films were grown on pyrex glass substrates. These studies were carried out using an open photoacoustic cell made out of an electret microphone. From X-ray diffraction, atomic force microscope and photoluminescence measurements we observed polycrystalline CdS films with good morphology and crystalline quality. We obtained a thermal diffusivity coefficient of our samples with values ranging from 3.15 to 3.89 × 10^− 2 cm²/s. For comparison, we measured a value of 1.0 × 10^− 2 cm²/s for the thermal diffusivity coefficient of a CdS single crystal. We measured an energy gap value of 2.42 eV for our samples by using a photoacoustic spectroscopy system.     

Large-area SnO2: F thin films by offline APCVD

In this paper, we reported the successful preparation of fluorine-doped tin oxide (FTO) thin films on large-area glass substrates (1245 mm × 635 mm × 3 mm) by self-designed offline atmospheric pressure chemical vapor deposition (APCVD) process. The FTO thin films were achieved through a combinatorial chemistry approach using tin tetrachloride, water and oxygen as precursors and Freon (F-152, C2H4F2) as dopant. The deposited films were characterized for crystallinity, morphology (roughness) and sheet resistance to aid optimization of materials suitable for solar cells. We got the FTO thin films with sheet resistance 8-11 Ω/□ and direct transmittance more than 83%. X-ray diffraction (XRD) characterization suggested that the as-prepared FTO films were composed of multicrystal, with the average crystal size 200-300 nm and good crystallinity. Further more, the field emission scanning electron microscope (FESEM) images showed that the films were produced with good surface morphology (haze). Selected samples were used for manufacturing tandem amorphous silicon (a-Si:H) thin film solar cells and modules by plasma enhanced chemical vapor deposition (PECVD). Compared with commercially available FTO thin films coated by online chemical vapor deposition, our FTO coatings show excellent performance resulting in a high quantum efficiency yield for a-Si:H solar cells and ideal open voltage and short circuit current for a-Si:H solar modules.     

The electrical and optical properties of indium zinc tin oxide thin films with different Sn/Zn ratio

Indium zinc tin oxide (IZTO) thin films with two different chemical compositions, i.e. IZTO15 and IZTO25, where In content was fixed at 60 at.% and Sn content was 15 and 25 at.%, respectively, were deposited onto alkaline-free glass substrate at temperature from 37 °C to 600 °C. The deposition process was carried out in argon using an RF magnetron sputter. After deposition, the films were annealed in argon atmosphere at 450 °C for 30 min. The effect of substrate temperature and annealing treatment was investigated, and the minimum resistivity value of 3.44 × 10^− 4Ω.cm was obtained from the film deposited at 400 °C using IZTO25 target followed by rapid thermal annealing at 450 °C for 30 min. The average optical transmittance was kept fairly high over 80%. It was proven that both substrate temperature and thermal annealing were important parameters in lowering the electrical resistivity without deteriorating optical properties.     

Thin gold films on SnO2:In: Temperature-dependent effects on the optical properties

Gold films with thicknesses of 5 ± 0.5 nm were sputter deposited onto SnO₂:In-coated glass kept at different temperatures up to 140 °C, and similar films, deposited onto substrates at 25 °C, were annealing post treated at the same temperatures. Nanostructures and optical properties were recorded by scanning electron microscopy and spectrophotometry in the 0.3 to 2.5 μm wavelength range, respectively. Annealing had a minor influence on the optical transmittance despite significant changes in the scale of the nanostructure, whereas deposition onto substrates heated to 140 °C yielded granular films with strong plasmon absorption of luminous radiation. These results are of considerable interest for optical devices with gold films prepared at elevated temperature or operating at such temperature.     

Brush electrodeposited CdS films on low temperature substrates

Cadmium sulphide films were deposited by the brush plating technique on titanium and conducting glass substrates using a current density of 80 mA cm^− 2. X-ray diffraction studies indicated the polycrystalline nature of the films with hexagonal structure. As the deposition temperature decreased, the peaks were broad indicating the formation of nanocrystallites. Optical absorption measurements yielded band gap values in the range of 2.39-3.10 eV as the deposition temperature decreases. XPS studies confirmed the formation of CdS. Atomic force microscope studies indicated the roughness of the films decreases with the decrease of deposition temperature. The as deposited films were photoactive.     

The effect of titanium current on structure and hardness of aluminium titanium nitride deposited by reactive unbalanced magnetron co-sputtering

Nanocrystalline aluminium titanium nitride (AlTi₃N) thin films were deposited on Si (100) wafer and grid substrates without external heating and biasing at room temperature by reactive unbalanced magnetron co-sputtering technique using pure individual titanium and aluminium targets. The effects of titanium current (I_Ti) on the structure and hardness of these films have been studied. The films were sputtered with Ar and N₂ gases flow rate of 8 and 4 sccm, respectively. The sputtering current of the aluminium current (I_Al) was kept at 600 mA and the sputtering current of titanium (I_Ti) was varied from 600 to 800 mA. The films were deposited for different deposition times ranging from 15 to 60 min. The deposited films were then characterized and analyzed by X-Ray Diffraction (XRD), Atomic Force Microscopy (AFM), Scanning Electron Microscopy (SEM), Transmission Electron Microscopy (TEM) and nanoindentation measurement. The results indicated that the modification of the crystal structure, surface morphology and microstructure were dependent on the deposition parameters. The XRD patterns show polycrystalline structure with preferred orientations in (112), (004) and (153) planes which agree with the standard structure of aluminium titanium nitride (AlTi₃N) films. In addition, the structure of AlTi₃N was also confirmed by TEM. These results show that the films are composed of high Al content. The root mean square surface roughness and the average thicknesses were strongly influenced by I_ti and deposition times. Cross section analysis by SEM showed dense and compact columnar morphology. The typical hardness of the films was approximately 26.24-30.37 GPa.     

Chemically deposited thin films of PbSe as an absorber component in solar cell structures

PbSe thin films were prepared by chemical deposition using dimethylselenourea as a source of selenide ions. Depending on the duration (30 min to 4 h) and temperature (30-60 °C) of the deposition, and the substrate, the films show a high degree of preferred orientation for the (111) planes. The texture coefficients could be up to 5 for these planes. The crystallite diameters are in the 30-35 nm range, and optical bad gap, 0.4-0.7 eV. The electrical conductivity is p-type, 0.01-10 (Ω cm)^− 1. These films were deposited over CdS/Sb₂S₃ or CdS/Sb₂Se₃ solar cell structures as an additional absorber. In a CdS/Sb₂Se₃/PbSe cell, this addition increases the short circuit current density (J_sc) from 0.2 mA/cm² to 8.9 mA/cm² and conversion efficiency (η) from 0.04% to 0.99%. In a CdS/Sb₂S₃/PbSe cell, J_sc is 5.91 mA/cm²; η, 0.98%; and open circuit voltage, 560 mV.     

CdS thin films doped with metal-organic salts using chemical bath deposition

CdS thin films doped with metal-organic salts were grown on glass substrates at 90 °C by the chemical bath deposition technique. Metal-organic salts such as zinc acetate, chromium acetylacetonate, ammonium fluoride, aluminum nitrate, tin acetate and indium acetate were used. The chemical bath was prepared with cadmium acetate, ammonium acetate, thiourea and ammonium hydroxide. In the case of un-doped films, the S/Cd ratio was varied by changing the thiourea in the range 1-12. The best optical, structural and electrical properties were found for S/Cd = 2. The doped films were prepared by always keeping the ratio S/Cd constant at 2. The band gap (E_g) of doped and un-doped films was evaluated from transmittance spectra, where films with lower sulfur concentration exhibited higher E_g. X-ray analysis showed that both un-doped and doped films were polycrystalline with preferential orientation along the (111) direction and with the zincblende structure in all cases. The dark electrical results showed that CdS doped with Zn (1 at.%) exhibited the lowest resistivity values of 10 Ω cm.