Z-scan measurement for the nonlinear absorption of Bi2.55La0.45TiNbO9 thin films

Bi_2.55La_0.45TiNbO₉ (BLTN-0.45) thin films with layered aurivillius structure were fabricated on fused silica substrates by pulsed laser deposition technique. Their structure, fundamental optical constants, and nonlinear absorption characteristics have been studied. The film exhibits a high transmittance (> 60%) in visible-infrared region. The optical band gap energy was found to be 3.44 eV. The optical constant and thickness of the films were characterized using spectroscopic ellipsometric (SE) method. The nonlinear optical absorption properties of the films were investigated by the single-beam Z-scan method at a wavelength of 800 nm laser with a duration of 80 fs. We obtained the nonlinear absorption coefficient β = 4.64 × 10^− 8 m/W. The results show that the BLTN-0.45 thin film is a promising material for applications in absorbing-type optical device.     

Optical properties of TiO2 thin films deposited on polycarbonate by ion beam assisted evaporation

TiO₂ thin films were deposited on polycarbonate (PC) substrate by ion beam assisted evaporation. The grain size increased with the ion anode voltage and film thickness. The TiO₂ thin films had an amorphous structure. Moiré deflectometry was used to measure the nonlinear refractive indices of TiO₂ thin films on PC substrates. The nonlinear refractive index was measured to be of the order of 10^− 8 cm² W^− 1 and a change in refractive index was of the order of 10^− 5. Dense TiO₂ films exhibited high linear refractive indices, red-shift of the optical absorbance, and absorbance in the near-IR region.     

Structural characterization and optical properties of Cd(1−x)MnxSe thin films

Stoichiometric bulk ingot materials of the ternary mixture Cd_(1−x)Mn_xSe (0.05 ≤ x ≤ 0.9) were prepared by direct fusion of the constituent elements in vacuum sealed silica tubes. X-ray diffraction studies indicate that the investigated samples exhibited a hexagonal structure. The lattice parameters varied linearly with Mn content, following Vegard's law. Thin films were deposited by thermal evaporation from the pre-synthesized ingot material, onto glass substrates. X-ray and electron diffraction studies on the as-deposited and annealed films revealed an amorphous-to-crystalline phase transition at T_a ≈ 423 K. EDAX studies on the prepared films show that the as-deposited films are nearly stoichiometric. The transmittance and reflectance of the deposited Cd_(1−x)Mn_xSe films were measured at normal light incident in the wavelength spectral range 500-2500 nm. Analysis of the transmittance spectra in the entire wavelength range allowed the determination of the refractive index. The dispersion parameters have been calculated, from which the static refractive index as well as static dielecric constant were calculated. Analysis of the absorption coefficient of the investigated films revealed the existence of both the allowed direct and forbidden direct optical transition mechanisms. The corresponding energies were estimated.     

Structural,optical and electrical properties of In4Sn3O12 films prepared by pulsed laser deposition

Highly conducting (σ ∼ 2.6 × 10³ Ω⁻¹ cm⁻¹) In₄Sn₃O₁₂ films have been deposited using pulsed laser deposition (PLD) on glass and quartz substrates held at temperatures between 350 and 550 °C under chamber pressures of between 2.5 and 15 mTorr O₂. The crystallinity and the surface roughness of the films were found to increase with increasing substrate temperature. Electron concentrations of the order of 5 × 10²⁰ cm⁻³ and mobilities as high as 30 cm² V⁻¹ s⁻¹ were determined from Hall effect measurements performed on the films. Fitting of the transmission spectral profiles in the ultra-violet–visible spectrum has allowed the determination of the refractive index and extinction coefficient for the films. A red-shift in the frequency of plasmon resonance is observed with both increasing substrate temperature and oxygen pressure. Effective masses have been derived from the plasma frequencies and have been found to increase with carrier concentration indicating a non-parabolic conduction band in the material In₄Sn₃O₁₂. The optical band-gap has been determined as 3.8 eV from the analysis of the absorption edge in the UV. These results highlight the potential of these films as lower In-content functional transparent conducting materials.     

Influence of gamma irradiation on the refractive index of Fe-doped barium titanate thin films

Polycrystalline Fe-doped barium titanate (Fe-doped BaTiO₃) thin films were grown by thermal decomposition of the precursors deposited from a sol-gel system onto quartz substrates. The changes in the transmittance spectra induced by gamma irradiation on the Fe-doped BaTiO₃ thin films were quantified. The values for the optical energy band gap were in the range of 3.42-3.95 eV depending on the annealing time. The refractive index of the film, as measured in the 350-750 nm wavelength range was in the 2.17-1.88 range for the as prepared film, and this increased to 2.34-1.95 after gamma irradiation at 15 kGy. The extinction coefficient of the film was in the order of 10⁻² and increased after gamma irradiation. We obtained tuneable complex refractive index of the films by exposure to various gamma rays doses.     

Composition dependence of optical constants in ferroelectric Ba(Ti1 − x,Nix)O3 thin films by optical transmittance technique

Ba(Ti_1 − x,Ni_x)O₃ ferroelectric thin films with perovskite structure are prepared on fused quartz substrates by a sol-gel process. Optical transmittance measurements indicate that Ni-doping has an obvious effect on the energy band structure of BaTiO₃. It has been found that the refractive index n, extinction coefficient k, and band gap energy E_g of the films are functions of the film composition. The E_g of Ba(Ti_1 − x,Ni_x)O₃ decreases approximately linearly as the Ni content increases, which is attributed to the decline of conduction band energy level with increasing the Ni content. On the other hand, n and k both increase linearly with increasing the Ni content because of the increase of packing density. These results indicate that thin films might have potential applications in BaTiO₃-based thin-film optical devices.     

Overview about the optical properties and mechanical stress of different dielectric thin films produced by reactive-low-voltage-ion-plating

Thin films of Ta₂O₅, Nb₂O₅, and HfO₂ were deposited by reactive-low-voltage-ion-plating (RLVIP) on unheated glass and silicon substrates. The film thickness was about 200 nm. Optical properties as well as mechanical film stress of these layers were investigated in dependence of various deposition parameters, i.e. arc current and oxygen partial pressure. For an arc current in the range between 40 and 50 A and an oxygen partial pressure of at least 11 · 10^− 4 mbar good results were obtained. The refractive index and film thickness were calculated from spectrophotometric transmission data using the Swanepoel theory. For example at 550 nm wavelength the refractive index for thin RLVIP-Nb₂O₅-films was found to be n₅₅₀ = 2.40. The optical absorption was obtained by photo-thermal deflection spectrometry. For the investigated materials absorption coefficients in the range of k = 5 · 10^− 4 at 515 nm wavelength were measured. The mechanical film stress was determined by measuring the difference in bending of silicon substrates before and after the deposition process. For dense films, i.e. no water vapour sorption on atmosphere, the mechanical film stress was always compressive with values of some hundred MPa. In case of films deposited with higher arc currents (I_arc > 60A) and lower oxygen pressure (< 15 · 10^− 4 mbar) the influence of a post deposition heat treatment at 350 °C for 4 h on air was also investigated. For these films the properties could clearly be improved by such treatment. However, by using lower arc currents and higher oxygen partial pressure during the ion plating process, immediately dense and environmental stable films with good optical as well as mechanical properties could be achieved without post deposition heat treatment. All the results obtained will be presented in graphs and diagrams.     

Influence of ultraviolet irradiation on the optical properties of amorphous Sb10Se90 thin films

Amorphous Sb₁₀Se₉₀ thin films were prepared by thermal evaporation of the bulk glass. The changes in the optical properties (transmittance, optical gap, absorption coefficient, refractive index and extinction coefficient) have been measured in the wavelength range 500-900 nm of virgin and ultraviolet (UV) illuminated films. Analysis of the optical absorption data shows that the rule of non-direct transitions predominates. It is found that the optical energy gap decreases (photo-darkening) and the refractive index increases with the increase of UV exposure time. The dispersion of the refractive index (n) has been discussed in terms of Wemple-Didomenico single oscillator model. The oscillator energy E₀ and the dispersion energy E_d have been determined and discussed in terms of UV exposure time. The photo-darkening was discussed in terms of some of the current literature models.     

The third-order optical nonlinearity of Bi3.25La0.75Ti3O12 ferroelectric thin film on quartz

Bi_3.25La_0.75Ti₃O₁₂ (BLT) thin film was prepared on quartz substrates using chemical solution deposition. The sign and magnitude of both real and imaginary parts of third-order nonlinear susceptibility χ⁽³⁾ of the BLT thin film have been determined by the Z-scan technique performed at 800 nm with a femtosecond laser. The nonlinear refractive index coefficient γ and the nonlinear absorption coefficient β of the BLT thin film are − 1.915 × 10^− 12 cm² / W and − 6.764 × 10^− 8 m/W, respectively, the real part and imaginary part of the third-order nonlinear susceptibility χ⁽³⁾ of the BLT thin film are − 5.81 × 10^− 18 m² / V² and − 1.31 × 10^− 18 m² / V², respectively. Both the real and the imaginary parts of the third-order nonlinear susceptibility χ⁽³⁾ contribute to the nonlinearity of the film. These experimental results show that BLT thin film is a promising material for applications in nonlinear optical devices.     

Large third-order optical nonlinearity of SrBi2Nb2O9 thin films fabricated by pulsed laser deposition

SrBi₂Nb₂O₉ (SBN) thin films with a single phase of layered perovskite structure have been fabricated on fused quartz substrates at room temperature by pulsed laser deposition. The XRD and AFM analysis indicated that the films had better crystallinity, less rough surface morphology, and larger grain size with increasing oxygen pressure. The nonlinear optical properties of the samples were determined using a single beam Z-scan technique at a laser wavelength of 532 nm with laser duration of 25 ps. The real and imaginary parts of the third-order nonlinear optical susceptibility χ⁽³⁾ of the films were measured to be 3.18 × 10^− 8 esu and 5.94 × 10^− 9 esu, respectively.     

Large nonlinear optical response of a Bi1.5Zn1.0Nb1.5O7 thin film fabricated by pulsed laser deposition

The Bi_1.5Zn_1.0Nb_1.5O₇ (BZN) thin film has been fabricated on MgO (001) substrate by pulsed laser deposition. The nonlinear optical properties of the BZN film were investigated using Z-scan technique at a wavelength of 532 nm with 25 ps pulse duration. The two-photon absorption coefficient and the nonlinear refractive index of the BZN film were obtained to be 4.2 × 10^− 6 cm/W and 1.6 × 10^− 10 cm²/W respectively, which are comparable with those of some representative nonlinear optical materials. The large and fast response optical nonlinearities indicated that the BZN film is a promising candidate for future photonics devices.     

Low temperature stabilized rutile phase TiO2 films grown by sputtering

The deposition of rutile phase TiO₂ films on unheated substrates by radio frequency magnetron sputtering is elaborated. The effect of total pressure and O₂/Ar flow ratio on the growth of rutile film on different substrates has been studied thoroughly. The development of crystalline phase along with film deposition rate, surface morphology, optical transmission and band gap were also investigated for various growth conditions. It was found that the rutile phase crystallinity increased with decrease in total pressure and increase in O₂ flow. In addition, the grown rutile films have interesting optical characteristics such as high transmittance (~ 85%) and high refractive index (~ 2.7) with a band gap about 3.2 eV.     

Structural, optical and electrical properties of thermally evaporated Ag2S thin films

Thin films of Ag₂S are prepared on glass and quartz substrates by a thermal evaporation method. The structural studies show that the films are well crystallized with an acanthite structure. The optical properties of the films are investigated using spectrophotometric measurements of transmittance and reflectance at normal incidence in the wavelength range 500-2200 nm. The refractive index, n, and the absorption index, k, of Ag₂S are determined from the absolute values of the measured transmittance and reflectance. The dispersion of refractive index in Ag₂S is analyzed using the concept of the single oscillator. Within this concept the oscillator energy, E₀, and the dispersion energy, E_d, can be determined as 5 and 32.5 eV, respectively. It is interesting to note that Ag₂S appears to fall into the ionic class. The values of the lattice dielectric constant and the ratio of the carrier concentration to the effective mass are also determined as 7.77 and 1.7×10⁴⁷ kg⁻¹ m⁻³, respectively. The analysis of the spectral behavior of the absorption coefficient in the intrinsic absorption region reveals an indirect allowed transition with a band gap of 0.96 eV and associated phonons of 0.05 eV. Measurements of the dark electrical resistivity is studied as a function of film thickness and temperature. The dark electrical resistivity decreases with increasing film thickness. Graphical representation of log ρ as a function of reciprocal temperature yields two distinct linear parts indicating the existence of two activation energies ΔE₁ and ΔE₂ as 0.18 and 0.28 eV respectively. Discussion on the obtained results and their comparison with the previous published data is also given.     

Structural and magnetic properties of epitaxial SnFe2O4 thin films

Epitaxial thin films of SnFe₂O₄ are deposited on sapphire substrate by ablating the sintered SnFe₂O₄ target with a KrF excimer laser (λ = 248 nm and pulsed duration of 20 ns). X-ray diffraction study reveals that SnFe₂O₄ films are epitaxial along (222) direction. The optical bandgap of SnFe₂O₄ film is estimated using transmittance vs. wavelength data and is observed to be 2.71 eV. The presence of hysteresis loop at room temperature in magnetization vs. field plot indicates the ferromagnetic behavior of the film. It is observed that the coercive field and remnant magnetization decrease with increase in temperature.     

The properties of transparent semiconductor Zn1 − xTixO thin films prepared by the sol-gel method

Transparent semiconductor thin films of Zn_1 − xTi_xO (0 ≦ x ≦ 0.12) were deposited on alkali-free glass substrates by the sol-gel method. The effects of Ti addition on the crystallization, microstructure, optical properties and resistivity of ZnO thin films were investigated. The as-coated films were preheated at 300 °C, and then annealed at 500 °C in air ambiance. X-ray diffraction results showed all polycrystalline Zn_1 − xTi_xO thin films with preferred orientation along the (002) plane. Ti incorporated within the ZnO thin films not only decreased surface roughness but also increased optical transmittance and electrical resistivity. In the present study, the Zn_0.88Ti_0.12O film exhibited the best properties, namely an average transmittance of 91.0% (an increase of ~ 12% over the pure ZnO film) and an RMS roughness value of 1.04 nm.     

Effect of composition and deposition parameters on optical properties of Ge25Sb15−xBixS60 thin films

The optical constants of the Ge₂₅Sb_15−xBi_xS₆₀ (0?x?15) chalcogenide films, either as-deposited or after being annealed at various temperatures have been computed in the spectral wavelength range 400-2400 nm from the transmittance and reflectance measurements of normally-incident light. With the increase in bismuth content, the optical energy gap (which is indirect) decreases, while the refractive index increases. The effects of film thickness, substrate type, deposition rate and γ-radiation on optical properties have been studied. The effect of thermal annealing on the growth characteristics and stability of the films has been studied using X-ray diffraction and scanning electron microscopy. The dispersion of the refractive index is discussed in terms of the single-oscillator Wemple-DiDomenico model.     

Fundamental optical constants of Nd-doped Y2O3 ceramic and its scintillation characteristics

Transparent Nd:Y₂O₃ ceramics were produced by vacuum sintering. Their fundamental optical constants including optical transmittance, reflectivity, absorption coefficient, refractive index, extinction coefficient, and dielectric constant were evaluated. Scintillation characteristics including radio-luminescence and light yield under α (²⁴¹Am 5.5 MeV) excitation are reported as well.     

Optical properties of In2O3 films prepared by spray pyrolysis

In₂O₃ thin films have been deposited on glass substrates by spray pyrolysis. InCl₄ was used as the solute to prepare the starting solution with a concentration of 0.1 M. The films were grown at different substrate temperatures ranging from 300 to 400 °C. The as-grown layers were optically characterized in order to evaluate the absorption coefficient, optical band gap, refractive index, extinction coefficient and other optical parameters. The influence of substrate temperature on these parameters was reported and discussed.     

Studies on aluminum-doped ZnO films for transparent electrode and antireflection coating of β-FeSi2 optoelectronic devices

β-FeSi₂ can be used for various optoelectronic devices owing to its superior material features including high optical absorption coefficient and direct band gap of about 0.8 eV. Due to its high refractive index (>5.6), however, suitable antireflection coating (ARC) is necessary for practical device applications. In order to increase the effective areas of optoelectronic devices, transparent electrodes should be also developed. In this work, Al-doped ZnO (AZO) films were fabricated by sputtering on β-FeSi₂ thin films and were found suitable for both transparent electrodes and ARC films. Choosing optimum substrate temperature and sputtering rate, high quality AZO films were formed. The conductivity of AZO films was as high as 3×10³ S/cm and ohmic contact was easily achieved between AZO and β-FeSi₂ films, indicating AZO film as an ideal transparent electrode for β-FeSi₂. The transmittance of 400-nm-thick AZO films was >80% and >70% in the wavelength ranges 400-1400 and 1400-1600 nm, respectively. By changing the thickness of AZO film, the central wavelength of minimum reflectance was adjusted to 1550 nm where the total reflectance of AZO/β-FeSi₂/Si structure was reduced below 2%.     

Single-step sputtered Cu2SnSe3 films using the targets composed of Cu2Se and SnSe2

Cu₂SnSe₃ thin films were prepared by single-step D.C. sputtering at 100-400 °C for 3 h using targets composed of Cu₂Se and SnSe₂ in three different ratios of 2/1 (target A), 1.8/1 (target B), and 1.6/1 (target C). The advantages of self-synthesized SnSe₂ instead of commercially available SnSe for depositing Cu₂SnSe₃ thin films were demonstrated. Effects of target composition and substrate temperature on the properties of Cu₂SnSe₃ thin films were investigated. Structure, surface morphology, composition, electrical and optical properties at different process conditions were measured. The 400 °C-sputtered films obtained from target B display with direct band gap of 0.76 eV, electrical resistivity of 0.12 Ω cm, absorption coefficient of 10⁴-10⁵ cm^− 1, carrier concentration of ∼ 1.8 × 10¹⁹ cm^− 3, and electrical mobility of 2.9 cm²/V s.