Characterization of electron irradiated GaN n-p diode

Electron-beam irradiated GaN n⁺-p diodes were characterized by deep level transient spectroscopy (DLTS) and optical responsivity measurements. The GaN n⁺-p diode structures were grown by metal organic chemical vapor deposition technique, and the electron irradiation was done by the energies of 1 MeV and 2 MeV with dose of 1 × 10¹⁶ cm^− 2. In DLTS measurement, the defect states of E_c − 0.36 eV and E_c − 0.44 eV in the electron irradiated diodes appeared newly. The optical responsivity of GaN n⁺-p diode was characterized in ultra-violet region, and then the maximum optical responsivity at 350 nm was decreased after electron-beam irradiation.     

Chemical diffusion coefficient of lithium ion in Li3V2(PO4)3 cathode material

The kinetic properties of monoclinic lithium vanadium phosphate were investigated by potential step chronoamperometry (PSCA) and electrochemical impedance spectroscopy (EIS) method. The PSCA results show that there exists a linear relationship between the current and the square root of the time. The D?_Li values of lithium ion in Li_3-xV₂(PO₄)₃ under various initial potentials of 3.41, 3.67, 3.91 and 4.07 V (vs Li/Li⁺) obtained from PSCA are 1.26 × 10^− 9, 2.38 × 10^− 9, 2.27 × 10^− 9 and 2.22 × 10^− 9 cm²·s^− 1, respectively. Over the measuring temperature range 15-65 °C, the diffusion coefficient increased from 2.67 × 10^− 8 cm²·s^− 1 (at 15 °C) to 1.80 × 10^− 7 cm²·s^− 1 (at 65 °C) as the measuring temperature increased.     

Influence of electron irradiation on characteristics of Si1−xGex p-n-structures

Electrically active defects induced by irradiation with 4 MeV electrons and their influence on dynamic and static parameters of p-n-structures with bases on boron doped Si_1−xGe_x alloys (0<x?0.06) have been investigated. It has been found that after irradiation with the electron fluence Φ=2×10¹⁴ cm⁻² lifetime of minority charge carriers decreases more than 12 times and forward voltage increases twice. Deep level transient spectroscopy (DLTS) studies have shown that interstitial carbon atoms are dominant electrically active defects induced by the irradiation. These defects are transformed into the complexes “interstitial carbon—interstitial oxygen” upon annealing of irradiated samples in the temperature range 50-100 °C.     

Enhanced thermoelectric properties of NaCo2O4 by adding ZnO

The primary phase present in the as-sintered Na(Co_1 − xZn_x)₂O₄ (0 ≤ x ≤ 0.1) bodies was the solid solution of the constituent oxides with a bronze-type layered structure. The electrical conductivity of the Na(Co_1 − xZn_x)₂O₄ samples significantly increased with an increase in ZnO content. The sign of the Seebeck coefficient for all samples was positive over the whole temperature range (723-1073 K), i.e., p-type conduction. The power factor of Na(Co_0.95Zn_0.05)₂O₄ showed an outstanding power factor (1.7 × 10^− 3Wm^− 1 K^− 2) at 1073 K. The power factor was above four times superior to that of ZnO-free NaCo₂O₄ (0.4 × 10^− 3Wm^− 1 K^− 2). This originates from an unusually large Seebeck coefficient (415 μVK^− 1) accompanied with high conductivity (127Ω^− 1 cm^− 1) at 1073 K.     

Transport characteristics of ZrO2 dispersed mixed (BaCl2)1−x-(KCl)x solid electrolytes

Composite solid electrolytes in the system [(BaCl₂)_1−x:(KCl)_x]_1−y:(ZrO₂)_y were prepared following the conventional ceramic powder processing route. In the mixed matrix system prepared by melt quench technique, a nominal increase in conductivity (σ) was found in (BaCl₂)_0.9:(KCl)_0.1. On ZrO₂ particle dispersion in this mixed matrix, the maximum conductivity (∼90 times that of base matrix value) was found to occur with 50 m/o of ZrO₂. Conductivity increases monotonically over the temperature range from 100 to 300 °C studied and attains the value of 10 × 10⁻⁶ S cm⁻¹ at 300 °C. The mobility (μ) of the charge carriers at room temperature was found to be 18.5 × 10⁻² cm² V⁻¹ s⁻¹ and the increase in μ with temperature was not very significant. The transference ionic number determination showed that the electrical conductivity of the electrolyte is predominantly due to ions. This study indicates that the conductivity is governed by mobile ion concentration.     

Structural,optical and electrical properties of In4Sn3O12 films prepared by pulsed laser deposition

Highly conducting (σ ∼ 2.6 × 10³ Ω⁻¹ cm⁻¹) In₄Sn₃O₁₂ films have been deposited using pulsed laser deposition (PLD) on glass and quartz substrates held at temperatures between 350 and 550 °C under chamber pressures of between 2.5 and 15 mTorr O₂. The crystallinity and the surface roughness of the films were found to increase with increasing substrate temperature. Electron concentrations of the order of 5 × 10²⁰ cm⁻³ and mobilities as high as 30 cm² V⁻¹ s⁻¹ were determined from Hall effect measurements performed on the films. Fitting of the transmission spectral profiles in the ultra-violet–visible spectrum has allowed the determination of the refractive index and extinction coefficient for the films. A red-shift in the frequency of plasmon resonance is observed with both increasing substrate temperature and oxygen pressure. Effective masses have been derived from the plasma frequencies and have been found to increase with carrier concentration indicating a non-parabolic conduction band in the material In₄Sn₃O₁₂. The optical band-gap has been determined as 3.8 eV from the analysis of the absorption edge in the UV. These results highlight the potential of these films as lower In-content functional transparent conducting materials.     

The effect of sodium doping to CuInSe2 monograin powder properties

The effect of sodium doping to the electrical and photoluminescence properties of CuInSe₂ monograin powders was studied. Sodium was added in controlled amounts from 5 × 10¹⁶ cm^− 3 to 1 × 10²⁰ cm^− 3. The photoluminescence spectra of Na-doped stoichiometric CuInSe₂ powders had two bands with peak positions at 0.97 and 0.99 eV. The photoluminescence bands showed the shift of peak positions depending on the Na doping level. Peak positions with maximum energy were observed if added sodium concentration was 1 × 10¹⁹ cm^− 3. This material had the highest carrier concentration 2 × 10¹⁷ cm^− 3. In the case of stoichiometric CuInSe₂ (Cu:In:Se = 25.7:25.3:49.0), Na doping at concentrations of 3 × 10¹⁷ cm^− 3 and higher avoided the precipitation of Cu-Se phase. Solar cells output parameters were dependent on the Na doping level. Sodium concentration 3 × 10¹⁸ cm^− 3 resulted in the best open-circuit voltage.     

Single-step sputtered Cu2SnSe3 films using the targets composed of Cu2Se and SnSe2

Cu₂SnSe₃ thin films were prepared by single-step D.C. sputtering at 100-400 °C for 3 h using targets composed of Cu₂Se and SnSe₂ in three different ratios of 2/1 (target A), 1.8/1 (target B), and 1.6/1 (target C). The advantages of self-synthesized SnSe₂ instead of commercially available SnSe for depositing Cu₂SnSe₃ thin films were demonstrated. Effects of target composition and substrate temperature on the properties of Cu₂SnSe₃ thin films were investigated. Structure, surface morphology, composition, electrical and optical properties at different process conditions were measured. The 400 °C-sputtered films obtained from target B display with direct band gap of 0.76 eV, electrical resistivity of 0.12 Ω cm, absorption coefficient of 10⁴-10⁵ cm^− 1, carrier concentration of ∼ 1.8 × 10¹⁹ cm^− 3, and electrical mobility of 2.9 cm²/V s.     

Properties of La-substituted Na0.5Bi4.5Ti4O15 ferroelectric thin films

Ferroelectric Na_0.5La_0.5Bi₄Ti₄O₁₅ (NaLaBTi) thin films were prepared by a chemical solution deposition method. The NaLaBTi thin films annealed at 750 °C under oxygen atmosphere were randomly oriented polycrystalline. Electrical properties of the NaLaBTi thin films were compared to Na_0.5Bi_4.5Ti₄O₁₅ thin films and better properties were observed in the NaLaBTi thin films. Remnant polarization (2P_r) and coercive electric field (2E_c) were 43 µC/cm² and 204 kV/cm at an applied electric field of 478 kV/cm, respectively. Leakage current density was 1.95 × 10^− 6 A/cm² at 100 kV/cm. Dielectric constant and dielectric loss were 805 and 0.05 at 1 kHz, respectively. Switchable polarization was suppressed by 15% after 1.44 × 10¹⁰ switching cycles.     

Structural and electrical properties of HfO2/Dy2O3 gate stacks on Ge substrates

In the present work we report on the structural and electrical properties of metal-oxide-semiconductor (MOS) devices with HfO₂/Dy₂O₃ gate stack dielectrics, deposited by molecular beam deposition on p-type germanium (Ge) substrates. Structural characterization by means of high-resolution Transmission Electron Microscopy (TEM) and X-ray diffraction measurements demonstrate the nanocrystalline nature of the films. Moreover, the interpretation of the X-ray reflectivity measurements reveals the spontaneous growth of an ultrathin germanium oxide interfacial layer which was also confirmed by TEM. Subsequent electrical characterization measurements on Pt/HfO₂/Dy₂O₃/p-Ge MOS diodes show that a combination of a thin Dy₂O₃ buffer layer with a thicker HfO₂ on top can give very good results, such as equivalent oxide thickness values as low as 1.9 nm, low density of interfacial defects (2-5 × 10¹² eV^− 1 cm^− 2) and leakage currents with typical current density values around 15 nA/cm² at V_g = V_FB − 1V.     

Preparation and characterization of CuIn1 − xGaxSe2 − ySy thin film solar cells by rapid thermal processing

This paper describes the synthesis and characterization of CuIn_1 − xGa_xSe_2 − yS_y (CIGSeS) thin-film solar cells prepared by rapid thermal processing (RTP). An efficiency of 12.78% has been achieved on ~ 2 µm thick absorber. Materials characterization of these films was done by SEM, EDS, XRD, and AES. J-V curves were obtained at different temperatures. It was found that the open circuit voltage increases as temperature decreases while the short circuit current stays constant. Dependence of the open circuit voltage and fill factor on temperature has been estimated. Bandgap value calculated from the intercept of the linear extrapolation was 1.1-1.2 eV. Capacitance-voltage analysis gave a carrier density of 4.0 × 10¹⁵ cm^− 3.     

Growth and characterization of group-III impurity-doped semiconducting BaSi2 films grown by molecular beam epitaxy

Ga- or In-doped BaSi₂ films were grown on Si(111) by molecular beam epitaxy (MBE). The Ga-doped BaSi₂ showed n-type conductivity. The electron concentration and resistivity of the Ga-doped BaSi₂ depended on the Ga temperature; however, the electron concentration and resistivity could not be controlled properly. In contrast, the In-doped BaSi₂ showed p-type conductivity and its hole concentration was controlled in the range between 10¹⁶ and 10¹⁷ cm^− 3 at RT.     

High frequency characteristics of tin oxide thin films on Si

High frequency characteristics of tin oxide (SnO₂) thin films were studied. SnO₂ thin films have been successfully grown on n-type Si (111) substrates by using a spray deposition technique. The capacitance-voltage (C-V) and conductance-voltage (G/ω-V) characteristics of the metal-oxide-semiconductor (Au/SnO₂/n-Si) Schottky diodes were investigated in the high frequency range from 300 kHz to 5 MHz. It has been shown that the interface state density, D_it, ranges from 2.44 × 10¹³ cm⁻² eV⁻¹ at 300 kHz to 0.57 × 10¹³ cm⁻² eV⁻¹ at 5 MHz and exponentially decreases with increasing frequency. The C-V and G/ω-V characteristics confirm that the interface state density and series resistance of the diode are important parameters that strongly influence the electrical parameters exhibited by the metal-oxide-semiconductor structure.     

The effect of MgO and SiO2 codoping on the properties of Nd:YAG transparent ceramic

Nd:YAG transparent ceramics were fabricated by a reactive sintering method under vacuum using SiO₂, MgO and compound additives (SiO₂ and MgO) as sintering aids. The effects of SiO₂ and MgO on the microstructure and sintering process of Nd:YAG ceramics were studied. High quality Nd:YAG ceramics with compound sintering aids obtained by vacuum sintering at 1780 °C are composed of grains of the size ∼10 μm, and their transmittance is 82% at 400 nm. It was found the absorption coefficient of 1.0 mol% Nd:YAG ceramic was 8.6 cm⁻¹ at 808 nm and its absorption cross section was calculated to be 6.26 × 10⁻²⁰ cm².     

Semi-transparent pentacene thin film transistors with NiOx electrode operating at low voltages

We demonstrate the fabrication of semi-transparent pentacene-based thin-film transistors (TFTs) with thin poly-4-vinylphenol (PVP)/high-k yttrium oxide (YO_x) double gate dielectric layers and also with thermally-evaporated NiO_x source/drain (S/D) electrodes which show a transmittance of ∼ 30-40% and sheet resistance range of 100-200 Ω/□ (controlled by deposition rate). Our pentacene TFTs with PVP (45 nm)/YO_x (100 nm) layers operated at less than − 5 V, exhibiting a decent saturation mobility (maximum 0.83 cm²/Vs) and on/off current ratios of 10⁴. When the sheet resistance of our semi-transparent NiO_x electrode increased from 100 Ω/□ to 200 Ω/□, the field mobility of our TFT decreased but was found to be still effective as 0.32 cm²/Vs.     

Composition dependent thermoelectric properties of sintered Mg2Si1−xGex (x = 0 to 1) initiated from a melt-grown polycrystalline source

Fabrication of Mg₂Si_1−xGe_x (x = 0-1.0) was carried out using a spark plasma sintering technique initiated from melt-grown polycrystalline Mg₂Si_1−xGe_x powder. The thermoelectric properties were evaluated from RT to 873 K. The power factor of Mg₂Si_1−xGe_x with higher Ge content (x = 0.6-1.0) tends to decrease at higher temperatures, and the maximum value of about 2.2 × 10^− 5 Wcm^− 1K^− 2 was observed at 420 K for Mg₂Si and Mg₂Si_0.6Ge_0.4. The coexistence of Si and Ge gave rise to a decrease in the thermal conductivity in the Mg₂Si_1−xGe_x. The values close to 0.02 Wcm^− 1K^− 1 were obtained for Mg₂Si_1−xGe_x (x = 0.4-0.6) over the temperature range from 573 to 773 K, with the minimum value being about 0.018 Wcm^− 1K^− 1 at 773 K for Mg₂Si_0.4Ge_0.6. The maximum dimensionless figure of merit was estimated to be 0.67 at 750 K for samples of Mg₂Si_0.6Ge_0.4.     

Synthesis and nano-field-effect transistors of p-type Zn0.3Cd0.7Te nanoribbons

Ternarysemiconductor Zn_0.3Cd_0.7Te nanoribbons are, firstly, synthesized via a two-step process, and the structure characterizations reveal that the as-synthesized nanoribbons are single-crystalline with a zinc blende structure and a crystal growth direction of [1-10]. Nano-field-effect transistors are fabricated based on single nanoribbon, and the electron transport characteristics demonstrate that the Zn_0.3Cd_0.7Te ribbons have p-type conductivity with a mobility (μ_h) of 5.7 cm²V⁻¹S⁻¹ and carrier concentration (n_h) about 1.1 × 10¹⁷ cm⁻³. The prepared nanoribbons with significant p-type conductivity will be a very attractive candidate for nanoelectronic devices.     

Structure and negative thermal expansion of Pb1 −xBixTiO3

Pb_1-xBi_xTiO₃ (x = 0.0-0.1) compounds were prepared to study the unique dopant effect of bismuth in PbTiO₃. Their thermal expansions and structures were investigated by high-temperature X-ray diffraction and X-ray Rietveld method. The results indicated that Bismuth substitution evidently weakened the tetragonality of PbTiO₃ solid solution, but increased the spontaneous polarization. Both the enhanced spontaneous polarization and the decreased tetragonality led to small volume shrinkage with temperature rising, where the average volumetric thermal expansion coefficient changed from − 1.99 × 10^− 5/°C for pure PbTiO₃ to − 0.56 × 10^− 5/°C for Pb_0.90Bi_0.10TiO₃. The Curie point of Pb_1 − xBi_xTiO₃ was slightly raised compared to PbTiO₃ and permitted one to use it in a wide temperature range.     

Electron transport in InGaO3(ZnO)m (m=integer) studied using single-crystalline thin films and transparent MISFETs

We have investigated the characteristics of transparent metal-insulator-semiconductor field-effect transistors (MISFETs) fabricated using InGaO₃(ZnO)_m (m=integer) single-crystalline thin films as n-channel layers and amorphous alumina as gate insulator films. The MISFETs exhibit good characteristics such as insensitivity to visible light illumination, off-current as low as ∼1 nA with a positive threshold voltage of ∼3 V and on/off current ratio of 10⁵. The field-effect mobility increased from ∼1 to ∼10 cm² (V s)⁻¹ as the m-value increased. Room temperature Hall mobility also increased. However, unexpectedly these values were lower than the field-effect mobility. It is explained by existence of shallow localized state in the homologous compounds.     

Electrical properties of p-type β-FeSi2 single crystals grown from Ga and Zn solvents

The electrical properties of β-FeSi₂ single crystals grown from solutions were investigated by the Hall effect measurements. The crystals grown from Ga solvent (Ga-β-FeSi₂) and Zn solvent (Zn-β-FeSi₂) showed p-type conduction. The resistivities at RT of Ga-β-FeSi₂ and Zn-β-FeSi₂ were 0.02-0.03 Ω cm (Ga) and 0.4-2 Ω cm (Zn), respectively. The hole concentration and Hall mobility at RT were (1-2)×10¹⁹ cm⁻³ and 14-16 cm²/V s for Ga-β-FeSi₂ and (2-4)×10¹⁷ cm⁻³ and 19-46 cm²/V s for Zn-β-FeSi₂. The temperature dependence of the hole concentration reveals that ionization energy E_A is approximately 0.02 and 0.12 eV for Ga-β-FeSi₂ and Zn-β-FeSi₂, respectively. We also found the intrinsic conduction of β-FeSi₂ above 500 K.