Studies on the dielectric and relaxor behavior of sol-gel derived barium strontium zirconate titanate thin films

The dielectric behavior of sol-gel derived Ba_0.80Sr_0.20(Zr_xTi_1−x)O₃ (0.0 ≤ x ≤ 0.50) thin films is studied. A relaxor behavior is observed for x ≥ 0.35. The degree of relaxation increases with Zr content. The frequency dependence of the polar regions follows Vogel-Fulcher relation with a characteristic cooperative freezing at freezing temperature (T_f). Below T_f, a long range polarization ordering is likely to take place. The plausible mechanism of the relaxor behavior of BSZT thin films with Zr contents ≥ 0.35 has been proposed based on the measured temperature as well as frequency dependent dielectric data. The solid solution system is visualized as a mixture of Ti^+ 4 rich polar regions and Zr^+ 4 rich regions; with the increase in Zr content the volume fraction of the polar regions is progressively reduced. At and above 35.0 at.% Zr substitution the polar regions exhibit typical relaxor behavior.     

Microstructure and electrical properties of Ba0.7Sr0.3(Ti1 − xZrx)O3 thin films prepared on copper foils with sol-gel method

Ba_0.7Sr_0.3(Ti_1 − xZr_x)O₃ (x = 0, 0.1, 0.2) (BSZT) thin films have been prepared on copper foils using sol-gel method. The films were annealed in an atmosphere with low oxygen pressure so that the substrate oxidation was avoided and the formation of the perovskite phase was allowed. The X-ray diffraction results show a stable polycrystalline perovskite phase, with the diffraction peaks of the BSZT films shifting toward the smaller 2θ with increasing Zr content. Scanning electron microscopy images show that the grain size of the BSZT thin films decreases with increasing Zr content. High resolution transmission electron microscopy shows the clear lattice and domain structure in the film. The dielectric peaks of the BSZT thin films broaden with increasing Zr content. Leakage current density of Ba_0.7Sr_0.3(Ti_1 − xZr_x)O₃ (x = 0.1) thin film is the lowest over the whole applied voltage.     

Effects of Mn doping on structural and dielectric properties of sol-gel-derived (Ba0.835Ca0.165)(Zr0.09Ti0.91)O3 thin films

We reported the effects of Mn doping on the structure and dielectric properties of (Ba_0.835Ca_0.165)(Zr_0.09Ti_0.91)O₃ (BCZT) thin films prepared by sol-gel method. The (Ba_0.835Ca_0.165)Mn_x(Zr_0.09Ti_0.91)_1 − xO₃ (x = 0, 0.002, 0.005, and 0.01) thin films exhibited a pure pseudo-cubic perovskite structure with random orientation. Scanning electron microscopy and atomic force microscopy observation showed that increasing Mn-doping amount caused a decrease in particle size and a cluster of the particles, while the film surface remained smooth and crack-free. Compared with the undoped film, Mn doped BCZT thin films exhibited smaller dielectric constant and lower dielectric loss. The figure of merit reached the maximum value of 16.7 with a tunability of 53.6% for the film with 0.5 mol % Mn doping, when a bias electric field of 400 kV/cm was applied at 100 kHz. The results indicated that the Mn doped BCZT thin films are suitable for tunable microwave device applications.     

Leakage current characteristics of Bi3.15Nd0.85Ti3 − xZrxO12 thin films

Thin films of Bi_3.15Nd_0.85Ti₃O₁₂ (BNT) and Bi_3.15Nd_0.85Ti_3 − xZr_xO₁₂ (BNTZ_x, x = 0.1 and 0.2) were fabricated on Pt/TiO₂/SiO₂/Si(100) substrates by a chemical solution deposition (CSD) technique at 700 °C. Structures, surface morphologies, leakage current characteristics and Curie temperature of the films were studied as a function of Zr ion content by X-ray diffraction, atomic force microscopy, ferroelectric test system and thermal analysis, respectively. Experimental results indicate that Zr ion substitution in the BNT film markedly decreases the leakage current of the film, while almost not changing the Curie temperature of the film, which is at about 420-460 °C. The decrease of the leakage current in BNTZ_x films is that the conduction by the electron hopping between Ti⁴⁺ and Ti³⁺ ions is depressed because Zr⁴⁺ ions can block the path between two adjacent Ti ions and enlarge hopping distance.     

Studies on the relaxor behavior of sol-gel derived Ba(Zr x Ti1− x )O3 (0.30≤x≤0.70) thin films

We have studied the relaxor behavior of sol-gel derived Ba(Zr _x Ti_{1− x} )O₃ (0.30≤ x≤0.70) thin films. The plausible mechanism of the relaxor behavior has been analyzed from the dielectric data and micro-Raman spectra. Substitution of Zr⁺⁴ for Ti⁺⁴ in BaTiO₃ lattice reduces its long-range polarization order yielding a diffused paraelectric to ferroelectric phase transition. The solid solution system is visualized as a mixture of Ti⁺⁴ rich polar region and Zr⁺⁴ rich regions and with the increase in Zr contents the volume fraction of the polar regions are progressively reduced. At about 25.0 at% Zr contents the polar regions exhibit typical relaxor behavior. The degree of relaxation increases with Zr content and maximizes at 40.0 at% Zr doped film. The frequency dependence of the polar regions follows Vogel-Fulcher relation with a characteristic cooperative freezing at freezing temperature (T _f). Below T_f, a long range polarization ordering was ascertained from the polarization hysteresis measurement.     

Enhanced dielectric and tunable properties of barium strontium titanate thin films through introducing Nd(Zn1/2Ti1/2)O3 and adjusting Ba/Sr

Ba_0.6Sr_0.4TiO₃ (BST) and 0.06Nd(Zn_1/2Ti_1/2)O₃–0.94Ba _x Sr_1?x TiO₃ (NZT–BST) thin films with x = 0.6, 0.7, 0.75, and 0.8 were fabricated on Pt/Ti/SiO₂/Si substrates by sol–gel method. The structures, surface morphology, dielectric, and ferroelectric properties, and thermal stability of BST and NZT–BST thin films were investigated as a function of NZT and Ba content. It was found that introducing NZT into BST decreased significantly dielectric loss, however, along with the tunability. On this basis, increasing Ba/Sr in NZT–BST thin films led to the simultaneous increase of dielectric constant and tunability of thin films. As a result, optimized dielectric and tunable properties were obtained for 0.06Nd(Zn_1/2Ti_1/2)O₃–0.94Ba_0.7Sr_0.3TiO₃ thin film with the highest FOM value of 43.22. It awakens us that, for reducing dielectric loss, introducing a certain amount of low permittivity oxides or non-ferroelectrics like NZT into weak ferroelectric perovskite tunable materials, not into paraelectric perovskite tunable materials, may obtain more excellent dielectric and tunable performances.     

Dielectric and tunable properties of Pb0.25BaxSr0.75−xTiO3 thin films fabricated by a modified sol-gel method

A modified sol-gel method was used to fabricate (Pb_0.25Ba_x Sr_0.75−x)TiO₃ (PBST) thin films with x = 0.05,0.1,0.15 and 0.2 on Pt/TiO₂/SiO₂/Si substrate. The structure, surface morphology, dielectric and tunable properties of PBST thin films were investigated as a function of barium content (x). X-ray diffraction and scanning electron microscopy analysis showed that we could get pure PBST perovskite phase and relative fine density thin films with smooth surface. It was found that the crystal lattice constant, grain size, room temperature dielectric constant, dielectric loss and tunability of Ba solutionizing PST thin films increased with the increase in Ba content. For (Pb_0.25Ba_0.2Sr_0.55)TiO₃ thin film, it had the highest dielectric constant of 1390 and the largest tunability of 80.6%. The figure of merit parameter reached a maximal value of 28.9 corresponding to the (Pb_0.25Ba_0.05 Sr_0.7)TiO₃ thin film, whose dielectric constant, dielectric loss and tunability measured at 1 MHz were 627, 0.024 and 69.4%, respectively.     

Electrical and optical investigations on Pb1 − 3x/2LaxZr0.2Ti0.8O3 thin films obtained by radiofrequency assisted pulsed laser deposition

Thin films of ferroelectric relaxor Pb_1 − 3x/2La_xZr_0.2Ti_0.8O₃, x = 0.22 have been integrated in an oxidic heterostructure for electro-optical investigations. The quadratic electro-optic behavior and optical properties have been studied by means of variable angle spectroscopic ellipsometry method in reflection mode. Birefringence values up to δΔ = 0.17° have been obtained for quadratic compositions at λ = 540 nm and 65° angle of incidence. Structural, chemical and morphologic properties of Pb_1-3x/2La_xZr_0.2Ti_0.8O₃ (x = 0.22) thin films have been investigated by x-ray diffraction and atomic force microscopy techniques. The dielectric and ferroelectric behavior has been investigated using dielectric spectroscopy and a ferroelectric test system.     

Modified tunable dielectric properties by addition of MgO on BaZr0.25Ti0.75O3 ceramics

Phase composition, microstructure and tunable dielectric properties of (1 − x)BaZr_0.25Ti_0.75O₃-xMgO (BZTM) composite ceramics fabricated by solid-state reaction were investigated. It was found Mg not only existed in the matrix as MgO, there was also trace amount of Mg²⁺ ions dissolved in the BZT grains, which led to Curie temperature of the BZTM composites ceramics shifting to below −100 °C. Dielectric permittivity of the BZTM composite ceramics was reduced from thousands to hundreds by manipulating the content of MgO. Johnson's phenomenological equation based on Devonshire's theory was used to describe the nonlinear dielectric permittivity of the ceramics with increasing applied DC field. With increasing content of MgO, anharmonic constant α_(T) increased monotonously. Dielectric permittivity was 672, while dielectric tunability was as high as 30.0% at 30 kV/cm and dielectric loss was around 0.0016 for the 0.6BaZr_0.25Ti_0.75O₃-0.4MgO sample at 10 kHz and room temperature.     

Influence of Zr on structure, mechanical and thermal properties of Ti-Al-N

Multinary Ti-Al-N thin films are used for various applications where hard, wear and oxidation resistant materials are needed. Here, we study the effect of Zr addition on structure, mechanical and thermal properties of Ti_1-xAl_xN based coatings under the guidance of ab initio calculations. The preparation of Ti_1-x-zAl_xZr_zN by magnetron sputtering verifies the suggested cubic (NaCl-type) structure for x below 0.6-0.7 and z ≤ 0.4. Increasing the Zr content from z = 0 to 0.17, while keeping x at ~ 0.5, results in a hardness increase from ~ 33 to 37 GPa, and a lattice parameter increase from 4.18 to 4.29 Å. The latter are in excellent agreement with ab initio data. Alloying with Zr also promotes the formation of cubic domains but retards the formation of stable wurtzite AlN during thermal annealing. This leads to high hardness values of ~ 40 GPa over a broad temperature range of 700-1100 °C for Ti_0.40Al_0.55Zr_0.05N. Furthermore, Zr assists the formation of a dense oxide scale. After 20 h exposure in air at 950 °C, where Ti_0.48Al_0.52N is already completely oxidized, only a ~ 1 μm thin oxide scale is formed on top of the otherwise still intact ~ 2.5 μm thin film Ti_0.40Al_0.55Zr_0.05N.     

Dielectric properties of sol-gel derived high-k titanium silicate thin films

High-k dielectric titanium silicate (Ti_xSi_1 − xO₂) thin films have been deposited by means of an optimized sol-gel process. At the optimal firing temperature of 600 °C, the Ti_0.5Si_0.5O₂ films are shown to exhibit not only a dielectric constant (k) as high as ∼ 23 but more importantly the lowest leakage current and dielectric losses. Fourier transform infrared spectroscopy shows an absorbance peak at 930 cm^− 1, which is a clear signature of the formation of Ti-O-Si bondings in all the silicate films. The developed sol-gel process offers the required latitude to grow Ti_xSi_1 − xO₂ with any composition (x) in the whole 0 ≤ x ≤ 1 range. Thus, the k value of the Ti_xSi_1 − xO₂ films can be tuned at any value between that of SiO₂ (3.8) to that of TiO₂ (k ∼ 60) by simply controlling the TiO₂ content of the films. The composition dependence of the dielectric constant of the Ti_xSi_1 − xO₂ films is analyzed in the light of existing models for dielectric composites.     

Composition dependent preferential orientation, dielectric and ferroelectric properties of Pb(ZrxTi1 − x)O3 thin films derived by sol-gel process

Pb(Zr_xTi_1 − x)O₃ (x = 0.35, 0.40, 0.60, 0.65) thin films were prepared by sol-gel spin on technique. From the X-ray diffraction analysis, PZT films with Zr-rich compositions (x = 0.60 and 0.65) had (111) preferential orientation and the preferential orientation changed to (100) for Ti-rich compositions (x = 0.35 and 0.40). The dielectric measurements on the above compositions at room temperature showed that the dielectric constant values were higher in Zr-rich compositions compared to Ti-rich compositions. The ferroelectric behavior measured in terms of the remnant polarization (P_r) and coercive field (E_c) up to an applied field of 260 kV/cm depicted that the Zr-rich PZT films with (111) preferential orientation had higher P_r and lower E_c values compared to the Ti-rich PZT films with (100) preferential orientation can be understood from the domain switching mechanism.     

Electrical properties of Pb0.97La0.02(Zr0.95Ti0.05)O3 antiferroelectric thin films on TiO2 buffer layer

Pb_0.97La_0.02(Zr_0.95Ti_0.05)O₃ antiferroelectric thin films with thickness of 500 nm were successfully deposited on TiO₂ buffered Pt(1 1 1)/Ti/SiO₂/Si(1 0 0) and Pt(1 1 1)/Ti/SiO₂/Si(1 0 0) substrates via sol-gel process. Microstructure of Pb_0.97La_0.02(Zr_0.95Ti_0.05)O₃ thin films was studied by X-ray diffraction analyses. The antiferroelectric nature of the Pb_0.97La_0.02(Zr_0.95Ti_0.05)O₃ thin films was confirmed by the double hysteresis behaviors of polarization and double buffer fly response of dielectric constant versus applied voltage at room temperature. The capacitance-voltage behaviors of the Pb_0.97La_0.02(Zr_0.95Ti_0.05)O₃ films with and without TiO₂ buffer layer were studied, as a function of temperature. The temperature dependence of dielectric constant displayed a similar behavior and the Curie temperature (T_c) was 193 °C for films on both substrates. The current caused by the polarization and depolarization of polar in the Pb_0.97La_0.02(Zr_0.95Ti_0.05)O₃ films was detected by current density-electric field measurement.     

Structure, dielectric, ferroelectric, and optical properties of (1 − x)Ba(Zr0.2Ti0.8)O3 − x(Ba0.7Ca0.3)TiO3 thin films prepared by sol-gel method

We report high dielectric tunabilities of (1 − x)Ba(Zr_0.2Ti_0.8)O₃ − x(Ba_0.7Ca_0.3)TiO₃ (BZT-xBCT) (x = 0.15, 0.30, 0.40, 0.45, 0.50, and 0.55) thin films prepared by a sol-gel method. The films show a pure perovskite structure with random orientation. They have moderate dielectric constant ranging from 350 to 500 and low dielectric loss near 3.0% at 1 kHz with 0 V bias at room temperature. The dielectric tunability of the BZT-0.55BCT thin films is up to 65% at 400 kV/cm and 100 kHz. The films exhibit a high optical transmission in the range of 420 nm-1500 nm. Their optical band gap energies are about 3.90 eV.     

Dielectric properties of Ba(Ti1 − xZrx)O3 solid solutions

This paper reports the structural and dielectric properties of Ba(Ti_1 − xZr_x)O₃ (x = 0-0.3) ceramics. Single-phase solid solutions of the samples were determined by X-ray diffraction. Microscopic observation by scanning electron microscope revealed dense, single-phase microstructure with large grains (20-60 μm). The evolution of dielectric behavior from a sharp ferroelectric peak (for x ≤ 0.08) to a round dielectric peak (for 0.15 ≤ x ≤ 0.25) with pinched phase transitions and successively to a ferroelectric relaxor (for x = 0.3) was observed with increasing Zr concentration. Compared with pure BaTiO₃, broaden dielectric peaks with high dielectric constant of 25,000-40,000 and reasonably low loss (tanδ: 0.01-0.06) in the Ba(Ti_1 − xZr_x)O₃ ceramics have been observed, indicating great application potential as a dielectric material.     

Dependence of Zr content on electrical properties of Bi3.15Nd0.85Ti3-xZrxO12 thin films synthesized by chemical solution deposition (CSD)

The Bi_3.15Nd_0.85Ti_3-xZr_xO₁₂ (BNTZ) thin films with Zr content (x = 0, 0.05, 0. 1, 0.15, and 0.2) were prepared on Pt/Ti/SiO₂/Si (100) substrates by chemical solution deposition (CSD) technique. The crystal structures of BNTZ films were analyzed by X-ray diffraction (XRD). The effects of Zr contents on the ferroelectric, dielectric properties, and leakage current of BNTZ films were thoroughly investigated. The XRD results demonstrated that all the films possessed a single phase bismuth-layered structure and exhibited the highly preferred (117) orientation. Among these films, the film with Zr content x = 0.1 held the maximum remanent polarization (2P_r) of 50.21 μC/cm² and a low coercive field (2E_c) of 210 kV/cm.     

Dielectric and ferroelectric properties of Ba(Sn0.15Ti0.85)O3 thin films grown by a sol-gel process

Ferroelectric Ba(Sn_0.15Ti_0.85)O₃ (BTS) thin films were deposited on LaNiO₃-coated silicon substrates via a sol-gel process. Films showed a strong (1 0 0) preferred orientation depending upon annealing temperature and concentration of the precursor solution. The dependence of dielectric and ferroelectric properties on film orientation has been studied. The leakage current density of thin films at 100 kV/cm was 7 × 10⁻⁷ A/cm² and 5 × 10⁻⁵ A/cm² and their capacitor tunability was 54 and 25% at an applied field of 200 kV/cm (measurement frequency of 1 MHz) for the thin films deposited with 0.1 and 0.4 M spin-on solution, respectively. This work clearly reveals the highly promising potential of BTS compared with BST films for application in tunable microwave devices.     

Improvement of dielectric thermal stability of BST ferroelectric material for tunable applications

100(1 − y)wt%(Ba_0.6Sr_0.4)(Ti_0.8Zr_0.2)O₃-100y wt%MgO (BSTZ20-MgO, y = 0.4, 0.5, 0.6, 0.7) composite ceramics were synthesized via a solid-state reaction route, aiming at improving the dielectric thermal stability of BST for tunable applications. Excellent dielectric thermal stability (low temperature coefficient of permittivity value) was gained in this system. According to our experiment, diffuse phase transition (DPT) induced by Zr ion substitution, ferroelectric-dilution effect of MgO phase and grain size refinement were considered as contributions to this good dielectric thermal stability.     

Structure and properties of (1 − x)Pb(Mg1/2W1/2)O3 − xPb(Zr0.5Ti0.5)O3 solid solution ceramics

The widely used piezoelectric Pb(Zr_1−x Ti _x )O₃ ceramics have been known to have Zr⁴⁺ and Ti⁴⁺ randomly distributed on the B-site lattice in the ABO₃ perovskite structure. In this study, we attempted to develop long range 1:1 B-site cation order by forming the solid solution of (1 − x)Pb(Mg_1/2W_1/2)O₃ − xPb(Zr_0.5Ti_0.5)O₃ (x ≥ 0.60). High temperature X-ray diffraction tests indicate that the cation order is embedded in the structural order. The solid solution ceramics appear to have a non-cubic paraelectric phase above their Curie temperatures. The competition between the antiferroelectric order in Pb(Mg_1/2W_1/2)O₃ and the ferroelectric order in Pb(Zr_0.5Ti_0.5)O₃ leads to the relaxor ferroelectric behavior in the solid solution. Since the temperature at dielectric maximum, T _m, is significantly above room temperature, regular polarization versus electric field hysteresis loops are recorded in these compositions at room temperature. In addition, these ceramics show very good piezoelectric properties.     

Dielectric properties of (Ba,Ca)(Zr,Ti)O3/CaRuO3 heterostructure thin films prepared by pulsed laser deposition

(Ba_0.90Ca_0.10)(Zr_0.25Ti_0.75)O₃ (BCZT) thin films were grown on Pt/Ti/SiO₂/Si substrates without and with a CaRuO₃ (CRO) buffer layer using pulsed laser deposition (PLD). The structure and surface morphology of the films have been characterized by X-ray diffraction (XRD) and scanning electron microscopy (SEM). At room temperature and 1 MHz, the dependence of dielectric constant and tunability of the films with electric field were investigated; the dielectric constant and tunability are 725 and 47.0%, 877 and 50.4%, respectively, for the BCZT film on Pt/Ti/SiO₂/Si substrates without and with the CRO buffer layer at 400 kV/cm. The tunability of the BCZT/CRO heterostructure thin films on Pt/Ti/SiO₂/Si substrates was higher than that of the BCZT thin films on Pt/Ti/SiO₂/Si substrates. The high constant likely results from the oxide electrode (CRO).