Optical characterization of thin chalcogenide films by multiple-angle-of-incidence ellipsometry

Optical properties of thin chalcogenide films from the systems As-S(Se) and As-S-Se were investigated as a function of the film composition, film thickness and conditions of illumination by light using multiple-angle-of-incidence ellipsometry. Thin films were deposited by thermal evaporation and exposed to white light (halogen lamp) and to monochromatic light from Ar⁺ — (λ = 488, 514 nm) and He-Ne- (λ = 632.8 nm) lasers. The ellipsometric measurements were carried out at three different angles of light incidence in the interval 45-55°, at λ = 632.8 nm. An isotropic absorbing layer model was applied for calculation of the optical constants (refractive index, n and extinction coefficient, k) and film thickness, d. The homogeneity of the films was checked and verified by applying single-angle calculations at different angles. It was shown that the refractive index, n of As-S-Se films is independent of film thickness in the range of 50 to 1000 nm and its values varied from 2.45 to 3.05 for thin layers with composition As₂S₃ and As₂Se₃, respectively. The effect of increasing in the refractive index was observed after exposure to light which is related to the process of photodarkening in arsenic containing layers. The viability of the method for determining the optical constants of very thin chalcogenide films with a high accuracy was confirmed.     

Limiting of photo induced changes in amorphous chalcogenide/alumino-silicate nanomultilayers

Photo induced changes in amorphous As₂₀Se₈₀/alumino-silicate nanomultilayers (NML) produced by pulsed laser deposition (PLD) method have been studied in this work. The aim was to investigate the photo induced optical and surface relief changes due to the band gap illumination under the size- and hard cover limited conditions. It was observed that the hard cover layer on the surface of the uniform film or alumino-silicate sub-layers in the NML structure influences the photo darkening and restricts surface relief formations in As₂₀Se₈₀ film or in the related NML compared with this effect in a pure chalcogenide layer. The influence of hard layers is supposed to be connected with limiting the free volume formation at the initial stage of the transformation process, which in turn limits the atomic movement and so the surface relief formation.     

The third-order optical nonlinearities of Ge-Ga-Sb(In)-S chalcogenide glasses

The third-order optical nonlinearities of 80GeS₂·(20 − x)Ga₂S₃·xY₂S₃ (x = 0, 5, 10, 15, 20 and Y = Sb or In) chalcogenide glasses were investigated utilizing the Z-scan method at the wavelength of 800 nm and their linear optical properties and structure were also studied. By analyzing the compositional dependences and possible influencing factors including the linear refractive index, the concentration of lone electron pairs, the optical bandgap and the amount of weak covalent/homopolar bonds, it indicates that the electronic contribution in weak heteropolar covalent and homopolar metallic bonds is responsible for large nonlinear refractive index n₂ in the chalcogenide glasses. These chalcogenide glasses have characteristics of environmentally friendship, wide transparency in the visible region, high nonlinear refractive index n₂ and low nonlinear absorption coefficient β, and would be expected to be used in the all-optical switches working at 1330 nm and 1550 nm telecommunication wavelengths.     

Silicon nitride layers of various n-content: Technology, properties and structure

Two series of amorphous silicon nitride layers (a-SiN_x:H) were formed with Radio Frequency Chemical Vapor Deposition method (13.56 MHz) from a NH₃/SiH₄ gas mixture: the first one on Si (001) and the second on glass. The deposition process was repeated at various [NH₃]/[SiH₄] ratios, while the other parameters (pressure, plasma generator power, substrate temperature, total gas flow, and time) were kept constant. It has been confirmed in optical measurements that the refractive indexes decrease for the layers obtained at increasing [NH₃]/[SiH₄] ratios. Simultaneously, the position of the band assigned to Si-H stretching vibrations (at about 2100 cm^− 1) shifts towards higher frequencies. The observed dependencies were applied in evaluation of nitrogen and hydrogen contents in the respective layers. It has been shown that when [NH₃]/[SiH₄] increases from 0 (no silane flow) to 0.2 then the a-SiN_x:H layers of x = [N]/[Si] increasing between 0 and nearly 1.4 may be obtained. The obtained layers have the refractive indexes higher than 2.1 and lower than 2.7 which make them good materials for antireflective coatings on crystalline and multicrystalline silicon solar cells.     

Enhancement of photoinduced transformations in amorphous chalcogenide film via surface plasmon resonances

Laser-matter coupling results specific structural changes in amorphous chalcogenide semiconductor layers which originate from electron-hole excitations, defect creation or modification and subsequent atomic motions. These changes can be influenced by plasmon fields. Plasmon enhanced photo-darkening and bleaching, optical recording in thin As_xSe_1 − x films have been demonstrated in this paper, specifically in As₂₀Se₈₀ and As₂Se₃ compositions which revealed the best effects of stimulated expansion or optical darkening respectively due to the He-Ne laser (λ = 633 nm) illumination. Gold nanoparticles deposited on the silica glass substrate and covered by an amorphous chalcogenide film satisfy the conditions of efficient surface plasmon resonance in this spectral region. These experimental results support the importance of localized electric fields in photo-structural transformations of chalcogenide glasses as well as suggest better approaches for improving the performance of these optical recording media.     

Dual-band windows (DBW) transparent for fundamental and second harmonic generation frequencies

Using the known “looking glass” transformation property (z → 2π − z, y → 2π − y) of the optical phase thickness z and y of matching layers of two-layer anti-reflection coating, together with the fact that optical characteristics of any film do not change after addition of a half-wavelength layer, we designed dual-band anti-reflection coatings transparent at any preset wavelengths λ₁ and λ₂. On the basis of this result common fractional anti-reflection coatings for second and higher harmonics generation using dispersionless coating materials are developed. Explicit analytical relationships between refractive indices of the layers and substrate are deduced. Since for second harmonic generation the dispersion of materials may be a factor we show how to compensate the known dispersion of the coating materials by special choice of dispersion of a suitable substrate.     

Effect of substrate temperature on the optical parameters of thermally evaporated Ge-Se-Te thin films

Thin films of Ge₁₀Se_90 − xTe_x (x = 0, 10, 20, 30, 40, 50) glassy alloys were deposited at three substrate temperatures (303 K, 363 K and 423 K) using conventional thermal evaporation technique at base pressure of ~ 10^− 4 Pa. X-ray diffraction results show that films deposited at 303 K are of amorphous nature while films deposited at 363 K and 423 K are of polycrystalline nature. The optical parameters, refractive index and optical gap have been derived from the transmission spectra (using UV-Vis-NIR spectrophotometer) of the thin films in the spectral region 400-1500 nm. This has been observed that refractive index values remain almost constant while the optical gap is found to decrease considerably with the increase of substrate temperature. The decrease in optical gap is explained on the basis of change in nature of films, from amorphous to polycrystalline state, with the increase of substrate temperature. The optical gap has also been observed to decrease with the increase of Te content.     

Mg-composition induced effects on the physical behavior of sprayed Zn1−xMgxO films

Thin films of Zn_1 − xMg_xO, with Mg compositions in the range, 0 < x < 0.4, have been deposited onto soda-lime glass substrates using chemical spray pyrolysis. The effects of altering the alloy composition on the chemical and physical properties of the layers were investigated using X-ray photoelectron spectroscopy, atomic force microscopy, Raman, optical and electrical measurements. The data shows systematic shifts in the properties of the layers with Mg-content. In particular, the optical absorption data showed that the influence of Mg-content on the energy gap of Zn_1 − xMg_xO films is significant. Layers with x = 0.24 had an optical energy band gap, E_g = 3.87 eV. The best layers produced had properties appropriate for application as Cd-free buffer layers in copper indium gallium selenide (CIGS) solar cells.     

Laser-induced amorphization and crystallization on Se80Te20−xPbx thin films

Thin films of glassy alloys of a-Se₈₀Te_20−xPb_x (x=2, 6 and 10) was crystallized in a specially designed sample holder under a vacuum of 10⁻² Pa. The amorphous and crystallized films were induced by pulse laser (wavelength: 337.1 nm, frequency: 10 Hz, pulse duration: 4 ns and pulse energy: 0.963 mJ). After laser irradiation on amorphous and crystalline films: optical band gaps were measured. Crystallization and amorphization of chalcogenide films is accompanied by the change in the optical band gap. The change in optical energy gap could be determined by identification of the transformed phase. This change in the optical band gap may be due to the increase in the grain size and the reduction in the disorder of the system.     

Nanostructure transition in Cr-C-N coatings deposited by pulsed closed field unbalanced magnetron sputtering

Cr-C-N coatings with different compositions, i.e. (C + N)/Cr atomic ratios (x) of 0.81-2.77, were deposited using pulsed closed field unbalanced magnetron sputtering by varying the chromium and graphite target powers, the pulse configuration and the ratio of the nitrogen flow rate to the total gas flow rate. Three kinds of nanostructures were identified in the Cr-C-N coatings dependent on the x values: a nano-columnar structure of hexagonal closed-packed (hcp) Cr₂(C,N) and face-centered cubic (fcc) Cr(C,N) at x = 0.81 and 1.03 respectively, a nanocomposite structure consisting of nanocrystalline Cr(C,N) embedded in an amorphous C(N) matrix at x = 1.26 and 1.78, and a Cr-containing amorphous C(N) structure at x = 2.77. A maximum hardness of 31.0 GPa and a high H/E ratio of 1.0 have been achieved in the nc-Cr(C,N)/a-C(N) nanocomposite structure at x = 1.26, whereas the coating with a Cr-containing amorphous C(N) structure had a minimum hardness of 10.9 GPa and a low H/E ratio of 0.08 at x = 2.77. The incorporation of carbon into the Cr-N coatings led to a phase transition from hcp-Cr₂(C,N) to fcc-Cr(C,N) by the dissolution into the nanocrystallites, and promoted the amorphization of Cr-C-N coatings with the precipitation of amorphous C(N). It was found that a high x value over 1.0 in the Cr-C-N coatings is the composition threshold to the nanostructure transition.     

Structure and mechanical properties of W-Se-C/diamond-like carbon and W-Se/diamond-like carbon bi-layer coatings prepared by pulsed laser deposition

Bi-layer W-Se-C/diamond-like carbon (DLC) and WSe_x/DLC coatings were obtained by standard and shadow-masked pulsed laser co-deposition from WSe₂ and graphite targets. W-Se-C coatings appeared as nanocomposites containing quasi-amorphous WSe₂, WC, spherical β-W nanocrystalline particles encapsulated in WSe₂ amorphous shell, and amorphous carbon phases. In WSe_x/DLC coatings, the formation of chemical bonds between W and C atoms was noticed at the interface. An increase of the C concentration over 40 at.% increases hardness and elasticity (up to 2 times at ~ 60 at.%C), and the Se/W ratio was always close to 1.4. The use of shadow-masked configuration avoids the deposition of micro- and nanoparticles. However, this method leads to a substantial increase of the Se content (Se/W ≥ 4), and the coatings became softer.     

Phase determination of filtered vacuum arc deposited TiO2 thin films by optical modeling

Thin films of TiO₂ were produced using filtered vacuum arc deposition. Arc currents were 275, 300, 325 A, and the oxygen pressure during deposition was 0.93 Pa. The substrates were glass microscope slides, at temperatures of 25 °C (RT), 200 °C, and 400 °C. Film thickness was in the range 100 to 250 nm, depending on the deposition conditions. Film structure and chemical composition were determined using XRD and XPS analyses, respectively. As-deposited films were amorphous, except to two samples that were found to be crystalline (deposited with 300 A, 325 A at 400 °C), and the crystalline phase was close to that of anatase. All of the films were partially crystallized by annealing in air at 450 °C for 1 h. The O:Ti atomic concentration ratio was in the range 1.6:1-2:1, independent of deposition conditions. The optical parameters, refractive index and the extinction coefficient of the films were determined using variable angle spectroscopic ellipsometry. In addition, the optical transmission of the films were determined in the UV-VIS and IR regions. The average optical transmission in the VIS spectrum was 70-85%, affected by the interference in the film with 90% maxima and 60% minima. The refractive index at λ = 550 nm was in the range 2.4 to 2.7, depending on the deposition conditions and annealing. Using the semi-empirical model of Wemple and DiDomenico for the dielectric function below the interband absorption edge of ionic and covalent solids, the dispersion energy parameters of TiO₂ (E_o, E_d) were calculated. The underlying structural order of the amorphous films was inferred by comparing the dispersion energy parameters of the amorphous films with those of crystalline TiO₂. As expected, the refractive index of the amorphous films depended on the underlying phase of the film. The optical analyses indicated that the underlying phase of the amorphous films deposited on RT substrates was close to anatase, whereas the underlying phase of the amorphous films deposited on 400 °C substrates and annealed at 450 °C for 1 h consisted of both anatase and rutile. Thus, although the XRD analyses could not indicate the underlying phase of the amorphous films, it could be determined by the optical analyses.     

Ellipsometric study of thermally induced redistribution and crystallization of Ge in Ge:SiO2 mixture layers

Mixture layers of Ge:SiO₂ of 40:60 mol% respectively, have been prepared by co-sputtering. The thermally induced change of optical properties of the layers was studied by variable angle spectroscopic ellipsometry. The mixture was modelled as an unknown material with optical constants described by multiple oscillators. The optical parameters determined from ellipsometric measurements can be well correlated with structural changes in the mixture. The results indicate that Ge in the mixture deposited or annealed up to 600 °C is in an amorphous state and it redistributes with increase of temperature, changing refractive index through the layer. The crystallization starts between 600 and 650 °C, at first next to the substrate. Crystallites size grows with temperature. Results were compared with findings of grazing incidence wide angle X-ray scattering measurements and a good agreement was found. Ellipsometry has been shown to be an appropriate non-invasive technique for characterization of this kind of layers.     

Scratch resistant optical coatings on polymers by magnetron-plasma-enhanced chemical vapor deposition

The magnetron-plasma-enhanced chemical vapor deposition (magPECVD) provides silicon-organic thin films for optical, electrically insulating or diffusion barrier coating applications. With process pressures of ≤ 1 Pa this technology is well adapted to the sputtering process of optical interference coatings and also facilitates an inline-process implementation. This paper describes the deposition process for scratch resistant coatings on polycarbonate (PC) and allyl diglycol carbonate substrates. Based on the optical, chemical and mechanical characterization of single magPECVD thin films of varied chemical composition, several types of layer stacks (e.g. of gradient or alternating hardness distribution) were deposited with varied total thickness on PC substrates. Abrasion test results indicate two main effects: the resistance against scratches of high load abrasion (50 N) mainly depends on the total coating thickness. The durability against scratches of low load abrasion (5 N) shows a clear advantage for the multilayer design in contrast to homogeneous single layers even of higher thickness. Finally a 5-layer antireflective system was reactively sputtered onto the magPECVD coating and successfully passed adhesion and environmental tests.     

Thermal annealing effect on the structure, bandgap, and optical constants of Er-Mn oxide thin films

Thin films of erbium-manganese oxide were grown on glass and p-type Si substrates. The films were thermally pre-annealed at different temperatures ranging from 400 to 1000 °C to produce different crystalline structures and agitate a solid-state reaction. The structural characterisation of the films was carried out by X-ray diffraction (XRD) and energy dispersion X-ray fluorescence (XRF). The XRD investigation shows that the films annealed at 400 °C were amorphous and nanocrystals of ErMnO₃ appear under pre-annealing at about 800 °C or more. Mn oxide and Er oxide prevent each other from crystallising alone. The optical properties of the films pre-annealed at different temperatures were studied in the fundamental absorption region of the spectrum in wavelength range 230-800 nm. The spectral complex refractive index, complex optical dielectric constant, and optical bandgap were determined. A modified single-oscillator Forouhi-Bloomer (FB) technique, Wemple-Didomenico (WD) equation, Urbach's relation, Tauc et al. relation, and pointwise unconditioned minimisation approach (PUMA) were used in the analysing of the obtained spectral data.     

A study of the nanostructure and hardness of electron beam evaporated TiAlBN Coatings

TiAlBN coatings have been deposited by electron beam (EB) evaporation from a single TiAlBN material source onto AISI 316 stainless steel substrates at a temperature of 450 °C and substrate bias of − 100 V. The stoichiometry and nanostructure have been studied by X-ray photoelectron spectroscopy, X-ray diffraction and transmission electron microscopy. The hardness and elastic modulus were determined by nanoindentation. Five coatings have been deposited, three from hot-pressed TiAlBN material and two from hot isostatically pressed (HIPped) material. The coatings deposited from the hot-pressed material exhibited a nanocomposite nc-(Ti,Al)N/a-BN/a-(Ti,Al)B₂ structure, the relative phase fraction being consistent with that predicted by the equilibrium Ti-B-N phase diagram. Nanoindentation hardness values were in the range of 22 to 32 GPa. Using the HIPped material, coating (Ti,Al)B_0.29N_0.46 was found to have a phase composition of 72-79 mol.% nc-(Ti,Al)(N,B)_1 − x+ 21-28 mol.% amorphous titanium boride and a hardness of 32 GPa. The second coating, (Ti,Al)B_0.66N_0.25, was X-ray amorphous with a nitride+boride multiphase composition and a hardness of 26 GPa. The nanostructure and structure-property relationships of all coatings are discussed in detail. Comparisons are made between the single-EB coatings deposited in this work and previously deposited twin-EB coatings. Twin-EB deposition gives rise to lower adatom mobilities, leading to (111) (Ti,Al)N preferential orientation, smaller grain sizes, less dense coatings and lower hardnesses.     

Properties of fluorinated silica glass deposited at low temperature by atmospheric plasma-enhanced chemical vapor deposition

The atmospheric pressure plasma-enhanced chemical vapor deposition of fluorinated silica glass was demonstrated at a temperature of 120 °C. The process was carried out by simultaneously feeding tetramethylcyclotetrasiloxane (TMCTS) and triethoxyfluorosilane (TEOFS) into the afterglow of helium and oxygen plasma. The effect of the flow rate of the fluorinated precursor on the growth rate, composition, and optical properties was examined. The ratio of atomic fluorine to atomic silicon increased up to 10% at a TEOFS/TMCTS atomic Si feed ratio of 1.3 and then leveled off. Coatings made from pure TMCTS and both precursors showed higher surface roughness and porosity, and more hydroxyl content compared to coatings made from pure TEOFS. The refractive indices at 633 nm of films produced using pure TMCTS, a TEOFS/TMCTS atomic Si feed ratio of 1.3 and pure TEOFS were 1.457, 1.449, and 1.411, respectively.     

Sputter-assisted plasma CVD of polymer-like amorphous CNx:H films using supermagnetron plasma

By using a sputter-assisted chemical vapor deposition (CVD) of supermagnetron plasma, amorphous CN_x:H films were deposited on the lower part of two parallel electrodes. By applying rf power to the upper electrode (UPRF) at 5 W to 800 W, polymer-like a-CN_x:H films were deposited on substrates placed on the lower electrode with an rf power (LORF) of 10 W. The deposition rate increased as UPRF increased. The hardness was as low as about 6.5 GPa, which is less than that of glass (13.1 GPa). The refractive index changed only slightly as UPRF changed from 1.6 to 1.75. The FT-IR spectrum showed strong absorption bands of NH and CH bonds at high and low UPRFs, respectively. The optical band gap was as large as 2.1 to 2.5, and it decreased as UPRF increased. These a-CN_x:H films showed white photoluminescence (PL) with broadband. With the increase of UPRF from 5 W to 800 W, the PL peak energy shifted down from 2.3 eV to 1.9 eV.     

Double layer SiNx:H films for passivation and anti-reflection coating of c-Si solar cells

In this report, we present a cost effective simple innovative approach to fabricate double layer anti-reflection (DLAR) coatings using a single material which can provide high qualities of passivation and anti-reflection property. Two layers of SiN_x:H films with different refractive indices were deposited onto p-type c-Si wafer using plasma enhanced chemical vapor deposition reactor by controlling the NH₃ and SiH₄ gas ratio. Refractive indices of top and bottom layers were chosen as 1.9 and 2.3 respectively. The effect of passivation at the interface was investigated by effective carrier lifetime, hydrogen concentration and interface trapped density (D_it) measurements. The optical characteristic was analyzed by reflectance and transmittance measurements. A superior efficiency of 17.61% was obtained for solar cells fabricated with DLAR coating when compared to an efficiency of 17.24% for cells with SLAR coating. Further, J_sc and V_oc of solar cell with DLAR coating is increased by a value of ~ 1 mA/cm² and 4 mV respectively than cell with SLAR coating.     

1D-photonic crystals prepared from the amorphous chalcogenide films

We describe the preparation and optical properties of the 15-layer chalcogenide dielectric mirrors with the first order stop bands in near infrared range. The high refractive index Sb–Se and low refractive index Ge–S layers were deposited on silicon and glass substrates using thermal evaporation method. To centre the stop bands of the prepared chalcogenide mirrors at 1.55 μm, the layer thicknesses, d(Sb–Se) = 117 and d(Ge–S) = 183 nm, were calculated from the quarter wave stack condition. The optical reflectivity measurements revealed the total reflection from the 15-layer chalcogenide mirrors in the range of 1,400–1,600 nm for the unpolarized light with normal incidence. The effect of annealing on the optical properties of the prepared chalcogenide mirrors was studied as well. Using spectral ellipsometry, we examined the angular dependence of the multilayers reflectivity for the light with s- and p-polarization. The preparation of the dielectric mirrors for near infrared region from chalcogenide films seems to be possible exploiting good optical quality of chalcogenide films and their simple deposition.