力电多场鼓包法测定PZT铁电薄膜的横向压电系数

为表征Pb(Zr_(0.52)Ti_(0.48))O_3(PZT)薄膜的横向压电性能,以纯力场鼓包测试模型和铁电薄膜材料压电方程为基础,推导了PZT铁电薄膜的力电耦合鼓包本构模型。采用溶胶-凝胶法制备了PZT铁电薄膜,并通过化学腐蚀法获得PZT薄膜鼓包样品。在外加电压为0~14V的条件下进行鼓包测试。结果表明,在纯力场作用下,PZT薄膜的弹性模量和残余应力分别为91.9GPa和36.2MPa;随着电压从2V变化到14V,PZT薄膜的横向压电系数d31从-28.9pm/V变化到-45.8pm/V。本工作所发展的力电耦合鼓包测试技术及力电耦合鼓包本构模型为评价铁电薄膜材料的横向压电性能提供了一种有效的分析方法。     

退火温度对Bi3.15(Eu0.7Nd0.15)Ti3O12铁电薄膜力学性能的影响

利用金属有机物分解法(MOD)在Pt/Ti/SiO2/Si(111)衬底上制备了Bi3.15(Eu0.7Nd0.15)Ti3O12(BENT)薄膜,并经600℃、650℃、700℃、750℃退火处理。通过纳米压痕法测试了薄膜的硬度和弹性模量,采用X射线衍射(XRD)测量了薄膜的残余应力。BENT薄膜的晶粒尺寸随着退火温度的升高而不断变大。当晶粒尺寸从37 nm增大到46 nm时,薄膜的硬度值从8.4 GPa减少到3.1 GPa,弹性模量从171.5 GPa减小到141.6 GPa。随着退火温度从600℃升高到750℃时,薄膜的残余压应力值从–743 MPa减小到了–530 MPa。退火温度为600℃的BENT薄膜具有最大的硬度和弹性模量。     

Ba0.85Ca0.15Zr0.1Ti0.9O3/CoFe2O4叠层复合陶瓷的制备与磁电耦合效应研究

以CoFe2O4压磁体、掺CuO和CeO2助烧剂的压电体Ba0.85Ca0.15Zr0.1Ti0.9O3为基本叠层材料,采用界面固相熔融渗透法制备了掺助烧剂Ba0.85Ca0.15Zr0.1Ti0.9O3-CoFe2O4叠层复合陶瓷。叠层复合陶瓷的压电压磁相叠层界面结合良好。随着压磁相与压电相厚度比比率的增加,叠层复合陶瓷的饱和磁致伸缩系数–λ从67×10-6增加到134×10-6、压电系数d33从340 pC/N逐渐减小到205 pC/N;磁电耦合系数先增大后减小,在厚度比为2、外磁场为100 mT时得到最大值3200 mV/(cm.mT)。     

放电等离子烧结Gd/Gd5Si2Ge2复合材料磁热效应研究

以高纯钆和Gd5Si2Ge2合金为原料,采用放电等离子烧结技术制备了两组元Gdx(Gd5Si2Ge2)1-x(x=0,0.33,0.5,0.7,1)层状复合磁制冷材料.通过自制的磁热效应测量仪器直接测量了复合材料在外加磁场1.5 T下的磁热效应(ΔTad).随着复合比例的变化,材料的最大绝热温变(ΔTad)从x=0.3时的1.6 K增加到x=0.7时的2.0 K,而最大绝热温变峰的位置从286K变到了293 K.同时,与单组元的Gd5Si2Ge2合金相比,随着钆的含量增加时,复合材料的最大绝热温变峰变宽.当x=0.7时,层状复合磁制冷材料在外加磁场1.5 T下的最大绝热温变(ΔT)在260-310K范围里从1.1 K变到2.0 K,这种材料非常适合作为室温磁制冷材料.     

xFe-Al2O3颗粒薄膜的XRD分析和GMR效应

对rf溅射法制备的xFe-Al2O3颗粒薄膜,应用X射线衍射仪(XRD)进行了测试和分析,推算了不同样品中Fe粒子的大小和元素面积比.并使用4探针外加磁场法对薄膜的巨磁阻效应进行了分析和讨论.当Fe面积比约为25%时,样品的磁电阻率在1.5T磁场下可达-2.3%.     

磁场对Ni/硅橡胶复合材料交流电导率及介电性质的影响

采用硅橡胶（110型）与金属（镍粉）按质量比为1∶2.7进行配料, 应用室温二次固化合成Ni/硅橡胶压敏复合材料样品。室温下测量了样品的压阻效应, 比较了外加0.024 T磁场前后样品的介电性质。结果表明, 当压强从3.75kPa到312.5kPa时, 样品直流电阻率下降了8个数量级。与加磁场前相比, 0.024T的磁场使得低频(40~104Hz)交流电导率提高了2.46倍, 介电常数提高了20%, 介电损耗提高了2倍, 这主要是由复合材料中铁磁绝缘体铁磁颗粒膜的隧道磁电阻效应以及磁电耦合引起的。撤去磁场后交流电导率、介电常数和介电损耗均不能回到加磁场前的初始值, 这与Ni粉的铁磁性有关。Ni/硅橡胶压敏复合材料的压阻、 磁电阻效应及磁电耦合等物理性质在磁传感器件、 信息储存等领域有潜在的应用价值。      

Gd2Co2Al合金的磁相变及磁热效应

电弧炉熔炼的Gd2Co2Al合金在铸态条件下即为W2Co2B型单相正交结构。变温磁化曲线表明,当外加磁场为0.01和0.1T时,可以在40、77和215K附近观察到磁相变;而外加磁场增加到1T以上时,40和215K温度处的磁相变消失。在排除第二相相变的前提下,推测215和77K处的相变对应Gd2Co2Al合金中Co和Gd次晶格的磁有序相变,而40K处的相变可能是由于自旋重取向产生。在0～5T磁场变化下,Gd2Co2Al合金在77K附近的最大磁熵变(-ΔSMmax)为10.7J/kgK,相对制冷量的值为5.4×102J/kg,表明该合金适合作为工作在液氮温区附近的磁致冷工质。     

三明治结构FeNi/Cu/FeNi多层膜巨磁阻抗效应研究

采用MEMS技术在玻璃基片上制备了三明治结构FeNi/Cu/FeNi多层膜,在1～40 MHz范围内研究了FeNi/Cu/FeNi多层膜中的巨磁阻抗效应特性.当磁场Ha施加在薄膜的长方向时,巨磁阻抗效应随磁场的增加而增加,在某一磁场下达到最大值,然后随磁场的增加而下降到负的巨磁阻抗效应.在频率为5MHz时,巨磁阻抗效应在磁场Ha=800 A/m时达到最大值26.6%.巨磁阻抗效应的最大值及负的巨磁阻抗效应与多层膜中磁各向异性轴的取向及发散有关.另外,当磁场施加在薄膜的短方向时,薄膜表现出负的巨磁阻抗效应,在频率5 MHz、磁场Ha=9600 A/m时,巨磁阻抗效应可达-15.6%.     

超磁致伸缩材料ΔE效应理论建模与试验研究

为研究超磁致伸缩材料的ΔE效应,采用Jiles-Atherton模型和磁弹性效应相结合的方法,提出了一种考虑动态应力影响及系数变化的磁化模型。分别对磁场和应力作用下超磁致伸缩材料的磁场-磁化关系和应力-磁化关系进行建模,并根据胡克定律以及二次畴转模型计算出材料在应力和磁场综合作用下的总应变,得到不同外加磁场下材料的应变-应力环。通过对应变-应力曲线斜率的计算,得到超磁致伸缩材料在不同外加磁场下,弹性模量随应力变化规律。搭建了应力测试装置,对不同磁场作用下Terfenol-D的磁化-应力响应和应变-应力响应测试,试验结果与模型计算结果基本一致,结果表明,ΔE效应是磁场能量和应力各向异性平衡的结果,Terfenol-D最大弹性模量变化达到513%。研究成果为新型机电系统变刚度设计提供了理论基础和调控手段。     

外加磁场对Q235钢力磁效应影响试验研究

为研究外加磁场对铁磁材料力磁效应的影响,制作通不同大小直流电的螺旋管作为外加磁场,对带有圆孔缺陷的Q235钢试件进行干扰的静载拉伸试验。结果表明:在地磁场环境中,经去应力退火的试件在没有施加载荷时,初始磁感应强度值趋近于0,磁记忆信号曲线近似水平直线;在施加载荷时,法向磁信号和切向磁信号曲线均发生波动,产生非线性变化;在一定外加磁场范围内,在外加磁场方向和地磁场方向存在差异时,外加磁场与磁记忆信号具有不同的相关性,同向外加磁场越大时,应力集中区磁记忆信号愈加明显;外加磁场的大小不改变其法向和切向磁记忆信号曲线变化规律,但影响其磁感应强度B值和斜率K值的大小,并且对在弹性阶段和塑性阶段法向和切向磁记忆信号的影响也存在差异性。     

Effect of residual stresses on mechanical properties and interface adhesion strength of SiN thin films

Residual stresses play a significant role in the mechanical reliability of thin films. Thus in this study, the mechanical properties and interface adhesion strengths of SiN thin films containing different residual stresses have been investigated by using nanoindentation and nanoscratch tests. With varied residual stresses from compressive to tensile, the penetration depth of nanoindentation tests shifted to a higher value. The hardness and elastic modulus decreased from 11.0 and 95 GPa, respectively, for the film containing a compressive stress of 235 MPa to 9.6 and 84 GPa for the film with a tensile stress of 86 MPa. With decreasing compressive stress and increasing tensile stress, the interface adhesion energy decreased from 1.8 to 1.5 J/m². Compressive stresses were expected to blunt crack tips and inhibit crack propagation, while tensile stresses enlarged crack opening and facilitated crack propagation, thus changing the mechanical properties of the SiN thin films.     

Magnetic properties of NiFe2O4 thin films grown on La0.7Sr0.3MnO3-buffered Si substrate

Nickel ferrite NiFe₂O₄ (NFO) thin films have been prepared on a Si substrate (NFO/Si) and La_0.7Sr_0.3MnO₃ (LSMO)-coated Si (100) substrate (NFO/LSMO/Si) by RF magnetron sputtering. The microstructures and magnetic properties of the two films were systematically investigated. X-ray diffraction (XRD) and atomic force microscopy (AFM) revealed that highly (331)-oriented NFO films with a smooth surface were grown on the LSMO/Si substrate. The magnetization of the films was measured at room temperature. It showed a clear hysteresis loop in both samples, with the magnetic field applied in the plane. However, no hysteresis loop is seen with the magnetic field applied perpendicular to the film plane. This indicates the presence of an anisotropy favoring the orientation of the magnetization in the direction parallel to the film plane. A study of magnetization hysteresis loop measurements indicates that the LSMO buffer layer may improve the magnetic properties of NFO thin films, and that the saturation magnetization increases from 4.15 × 10⁴ to 3.5 × 10⁵ A/m.     

Structural evolution of La-Cr-O thin film: Part II. Elasto-plastic properties by nanoindentation

The goal of this research is to study the elasto-plastic properties of La-Cr-O thin films deposited by RF-magnetron sputtering on stainless steel interconnect materials after annealing at high temperatures in air. Elastic modulus, hardness and yield pressure derived from nanoindentation data are reported for thin films in different structural states. The amorphous film has an estimated elastic modulus of 174 GPa. The moduli of annealed films are calculated to be 150, 185 and 120 GPa after annealing at 500 °C, 600 °C and 800 °C, respectively. The film annealed at 800 °C has the lowest hardness and is dramatically different from the other structural states due to formation of the nanoporosity. The amorphous film and the films annealed at 500 °C and 600 °C both have hardness of 14 GPa, which is close to the value estimated by modeling.     

Mechanical properties of polymer thin film measured by the bulge test

The bulge test was used to measure the mechanical properties of polymer thin films with thickness in the range of 77 nm to 352 nm. The mechanical properties of polymeric thin films were extracted by comparing differences between curves of load vs. bulge height obtained from composite film configurations with and without the polymer layer. Both square and long rectangular windows were used to obtain the Poisson ratio and Young's Modulus. Composite film with 230 nm silicon nitride layer and 30 nm Al layer has a composite Poisson ratio of 0.29 and a Young's Modulus of 234 ± 0.8 GPa. The Poisson ratio extracted for a 352 nm Poly(methyl methacrylate)-based thermoplastic polymeric thin film was 0.39. The Young's Modulus extracted for the 77 nm thick polymeric film is 4.9 ± 0.8 GPa and for the 352 nm thick film is 5.8 ± 0.2 GPa. In the thickness range investigated, no clear thickness dependence of the Young's modulus was observed using the Bulge test.     

Mechanical characterization of LiPON films using nanoindentation

Nanoindentation has been used to characterize the elastic modulus and hardness of LiPON films ranging in thickness from 1 to 10 μm. Four fully dense, amorphous films were deposited on glass and sapphire substrates with one film annealed at 200 °C for 20 min. The modulus of LiPON is found to be approximately 77 GPa, and argued to be independent of the substrate type, film thickness, and annealing. Based on the numerical analysis of Monroe and Newman, this value may be sufficiently high to mechanically suppress dendrite formation at the lithium/LiPON interface in thin film batteries [1]. Using Sneddon's stiffness equation and assuming the modulus is 77 GPa, the hardness is found to be approximately 3.9 GPa for all but the annealed film. The hardness of the annealed film is approximately 5% higher, at 4.1 GPa. Atomic force microscopy images of the residual hardness impressions confirm the unexpected increase in hardness of the annealed film. Surprisingly, the indentation data also reveal time-dependent behavior in all four films. This indicates that creep may also play a significant role in determining how LiPON responds to complex loading conditions and could be important in relieving stresses as they develop during service.     

Tribological properties of Ta‐C‐N and Ta‐N thin films

The amorphous Ta‐C‐N and Ta‐N thin films were deposited using magnetron sputtering on silicon wafer under the similar condition. The as‐prepared thin films were characterized using scanning electron microscope (SEM), optical profiling system, nano‐indentation and friction test instruments. The results show that, compared with the Ta‐N thin film, the Ta‐C‐N thin film has higher nano‐hardness (9.45 GPa) and elastic modulus (225.71 GPa). Furthermore, the lower friction coefficient and wear rate of the Ta‐C‐N thin film are 0.238 and 5.94×10^–6 mm^–3· N^–1·m^–1, respectively. The wear surface of Ta‐C‐N thin film is smoother than that of the Ta‐N thin film. Therefore, it shows better anti‐wear properties.     

Magnetic properties of NiFe2O4 thin films grown on La0.7Sr0.3MnO3-buffered Si substrate

Nickel ferrite NiFe₂O₄ (NFO) thin films have been prepared on a Si substrate (NFO/Si) and La_0.7Sr_0.3MnO₃ (LSMO)-coated Si (100) substrate (NFO/LSMO/Si) by RF magnetron sputtering. The microstructures and magnetic properties of the two films were systematically investigated. X-ray diffraction (XRD) and atomic force microscopy (AFM) revealed that highly (331)-oriented NFO films with a smooth surface were grown on the LSMO/Si substrate. The magnetization of the films was measured at room temperature. It showed a clear hysteresis loop in both samples, with the magnetic field applied in the plane. However, no hysteresis loop is seen with the magnetic field applied perpendicular to the film plane. This indicates the presence of an anisotropy favoring the orientation of the magnetization in the direction parallel to the film plane. A study of magnetization hysteresis loop measurements indicates that the LSMO buffer layer may improve the magnetic properties of NFO thin films, and that the saturation magnetization increases from 4.15 × 10⁴ to 3.5 × 10⁵ A/m.     

薄膜高频磁阻抗效应及其应用

本文介绍了Ｆｅ－Ｎｉ软磁薄膜高频磁阻抗效应及在磁传感技术中的应用，分析了讨论了获得高灵敏度磁传感的途径，磁性薄膜厚度的一般控制在４００ｎｍ以上抑制Ｎｅｅｌ壁的出现，为了提高电压输出变化灵敏度，需要沿被测场方向加向Ｏｅ的偏磁场并使高频磁场形成闭合回路，感生各向异性通过在溅射薄膜过程中加几百Ｏｅ平行于膜的直流磁场获得，与各向异性磁阻效应和巨磁阻效应相比，高频磁阻抗效应传感技术灵敏度高，无巴克豪森噪声，     

Structural,mechanical, and electrical properties of carbon nanoparticles synthesized from diesel

We studied the elemental analysis, structural morphology, mechanical, and electrical properties of carbon nanoparticles synthesized from diesel. The spherical carbon particle size in the range of about 10 to 80 nm in diameter was observed in scanning electron microscope (SEM) studies that were identified by Atomic force microscopy (AFM) study as an aggregation of carbon particles of average size 2.5 nm. The surface rms of carbon nanoparticle thin film (CNTF) was measured directly by AFM and found 0.22 nm. The Derjaguin–Muller–Toporov (DMT) elastic modulus of carbon nanoparticles (CNPs) was measured by PeakForce QNM mode of AFM. The minimum and maximum elastic modulus was measured of 0.40 GPa and 43.89 GPa, respectively. The resistivity, conductivity, magneto resistance, mobility, and average Hall co-efficient were measured by “Ecopia Hall-effect measurement system” by four-point Van der Pauw approach at ambient condition. We demonstrated I–V characteristic at the Indium/CNTF thin film interface, which is accompanied by rectifying behavior.