Property variations of direct-current reactive magnetron sputtered copper oxide thin films deposited at different oxygen partial pressures

Cuprous oxide (Cu₂O) and cupric oxide (CuO) thin films were deposited on glass substrates at different oxygen partial pressures by direct-current reactive magnetron sputtering of pure copper target in a mixture of argon and oxygen gases. Oxygen partial pressure was found to be a crucial parameter in controlling the phases and, thus, the physical properties of the deposited copper oxide thin films. Single-phase Cu₂O thin films with cubic structure were obtained at low oxygen partial pressure between 0.147 Pa and 0.200 Pa while higher oxygen partial pressure promoted the formation of CuO thin films with base-centered monoclinic structure. Polycrystalline Cu₂O thin films deposited with oxygen partial pressure at 0.147 Pa possessed the lowest p-type resistivity of 1.76 Ω cm as well as an optical band gap of 2.01 eV. On the other hand, polycrystalline CuO thin films deposited with oxygen partial pressure at 0.320 Pa were also single phase but showed a n-type resistivity of 0.19 Ω cm along with an optical band gap of 1.58 eV.     

Structural,optical, and electrical properties of flash-evaporated copper indium diselenide thin films

Copper indium diselenide (CuInSe₂) compound was synthesized by reacting its elemental components, i.e., copper, indium, and selenium, in stoichiometric proportions (i.e., 1:1:2 with 5% excess selenium) in an evacuated quartz ampoule. Structural and compositional characterization of synthesized pulverized material confirms the polycrystalline nature of tetragonal phase and stoichiometry. CuInSe₂ thin films were deposited on soda lime glass substrates kept at different temperatures (300–573 K) using flash evaporation technique. The effect of substrate temperature on structural, morphological, optical, and electrical properties of CuInSe₂ thin films were investigated using X-ray diffraction analysis (XRD), atomic force microscopy (AFM), optical measurements (transmission and reflection), and Hall effect characterization techniques. XRD analysis revealed that CuInSe₂ thin films deposited above 473 K exhibit (112) preferred orientation of grains. Transmission and reflectance measurements analysis suggests that CuInSe₂ thin films deposited at different substrate temperatures have high absorption coefficient (~10⁴ cm⁻¹) and optical energy band gap in the range 0.93–1.02 eV. Results of electrical characterization showed that CuInSe₂ thin films deposited at different substrate temperatures have p-type conductivity and hole mobility value in the range 19–136 cm²/Vs. Variation of energy band gap and resistivity of CuInSe₂ thin films deposited at 523 K with thickness was also studied. The temperature dependence of electrical conductivity measurements showed that CuInSe₂ film deposited at 523 K has an activation energy of ~30 meV.     

Spray pyrolysed bismuth oxide thin films and their characterization

Uniform, adherent and reproducible bismuth oxide thin films have been deposited on glass substrates from aqueous Bi(NO₃)₃ solution, using the solution spray technique. Their structural, surface morphological, optical, and electrical properties were investigated by XRD, AFM, optical absorption, electrical resistivity and thermo-emf measurements. The structural analysis from XRD pattern showed the formation of mixed phases of monoclinic Bi₂O₃ (predominant), tetragonal β-Bi₂O₃ and nonstiochiometric Bi₂O_2.33. The surface morphological studies on atomic force micrographs revealed round grain morphology of bismuth oxide crystallites. The optical studies showed a direct band gap of 2.90 eV for as-prepared bismuth oxide films. The electrical resistivity measurements of bismuth oxide films indicated a semiconducting behavior with the room temperature electrical resistivity of the order of 10⁷ Ω cm. From thermo-emf measurements, the electrical conductivity was found to be of n-type.     

The optical properties of Bi3.25La0.75Ti3O12 thin films with different thickness prepared by chemical solution deposition

Bi_3.25La_0.75Ti₃O₁₂(BiLT) thin films with different thickness were successfully deposited onto fused quartz by chemical solution deposition. X-ray diffraction analysis shows that BiLT thin films are polycrystalline with (0 0 2)-preferred orientation. The dispersion of refractive indices of the BiLT thin films was investigated by the optical transmittance spectrum. The optical band gap energy was estimated from the graph of (hνα)² versus hν. The results show that the refractive index and band-gap energy of the BiLT thin films decrease with the films thickness.     

Structural, optical and electrical properties of undoped polycrystalline hematite thin films produced using filtered arc deposition

Thin films of α-Fe₂O₃ (hematite) were deposited using filtered arc deposition. The structural, optical and electrical properties of the films have been characterized. High-purity hematite films were produced, free from other iron oxide phases and impurities. The films exhibit preferred orientation, with the c-axis of the hexagonal structure aligned perpendicular to the substrate. The films have an upper uncertainty bound of the porosity of 15%, with a microindentation hardness of 17.5 ± 1 GPa and elastic modulus of 1235 ± 5 GPa. The indirect and direct band gap energies were found to be approximately 1.9 eV and 2.7 eV, respectively. The refractive index, and the extinction and absorption coefficients were determined from total reflectance and direct transmittance measurements. The thin films exhibit a high resistivity (≥ 10⁵ Ω cm) which indicates pure α-Fe₂O₃. An activation energy of 0.7 eV was calculated from an Arrhenius plot of the conductivity.     

Synthesis and properties of epitaxial SnO2 films deposited on MgO (100) by MOCVD

Epitaxial tin oxide (SnO₂) thin films have been prepared on MgO (100) substrates at 500-600 °C by metalorganic chemical vapor deposition method. Structural and optical properties of the films have been investigated in detail. The obtained films were pure SnO₂ with the tetragonal rutile structure. An in-plane orientation relationship of SnO₂ (110) [010]//MgO (200) [110] between the film and substrate was determined. Two variant structure of SnO₂ were analyzed. The structure of the film deposited at 600 °C was investigated by high-resolution transmission electron microscopy, and an epitaxial structure was observed. The absolute average transmittance of the SnO₂ film at 600 °C in the visible range exceeded 90%. The optical band gap of the film was about 3.93 eV.     

Electrodeposition of SmS optical thin films on ITO glass substrate

SmS optical thin films were deposited on the surface of ITO glass with an electrodeposition method using aqueous solution containing SmCl₃·6H₂O and Na₂S₂O₃·5H₂O. The phase composition was analyzed by X-ray diffraction (XRD) and microstructure of the film was characterized by atomic force microscope (AFM). It is showed that SmS thin film could be obtained in the solution with n(Sm)/n(S) = 1:4, pH = 4.0 and annealing in Ar atmosphere at 200 °C for 0.5 h. The as-prepared thin films on the ITO glass exhibit a dense microstructure. The band gap of the thin film has been found to be 3.6 eV.     

Effect of chopping on the properties of bismuth oxide thin films

Nanocrystalline bismuth oxide thin films have been deposited by thermal oxidation, in air, of vacuum evaporated chopped bismuth thin films. The optical properties and adhesion have been studied. The oxidation temperature and duration were varied. As revealed by structural investigations, polycrystalline and multiphase bismuth oxide thin films were obtained. At all oxidation temperatures, monoclinic Bi₂O₃ is predominant. The films showed high transmittance in the visible range of spectrum. The direct band gap of the films obtained was between 2.78 eV and 3.04 eV. The refractive index observed is in the range 1.934 to 2.096. The adhesion of films was in the range 215 × 10² to 470 × 10² kgF/cm². The values are strongly influenced by the heat treatment characteristics. It was observed that chopping helps in improving the adhesion and increasing refractive index, packing density and band gap of bismuth oxide thin films. These bismuth oxide films can have potential use in optical waveguides.     

Synthesis and characterization of Sn1Mg1−xO2 thin films fabricated by aero-sole assisted chemical vapor deposition

In order to achieve high conductivity and transmittance of transparent conducting oxide, Mg doped SnO₂ (Mg_xSn_1?xO₂) thin films have been fabricated and characterized to investigate their structural and optical properties. The Mg_xSn_1?xO₂ thin films have been deposited on glass substrate using aero-sole assisted chemical vapor deposition. The molar concentration of Mg contents was changed from 0 to 8 %. The confirmation of tetragonal structure and particle size (32–87 nm) of thin films was analyzed by X-ray diffraction. The surface roughness has been found to decrease with the increase of the dopant concentration as investigated by atomic force microscopy. The optical transmission increased from 54 to 78 % and the band gap of pure SnO₂ has been found to be 3.75 eV while it rises up to 3.88 eV with increasing Mg doping. The sheet resistance (R_s) of undoped SnO₂ is maximum which become lowest at 4 % Mg doped SnO₂.     

Growth of Al2O3 thin film by oxidation of resistively evaporated Al on top of SnO2, and electrical properties of the heterojunction SnO2/Al2O3

Aiming for the investigation of insulating properties of aluminum oxide (Al₂O₃) layers, as well as the combination of this oxide with tin dioxide (SnO₂) for application in transparent field effect transistors, Al thin films are deposited by resistive evaporation on top of SnO₂ thin films deposited by sol–gel dip-coating process. The oxidation of Al films to Al₂O₃ are carried out by thermal annealing at 500 °C in room conditions or oxygen atmosphere. X-ray diffraction data indicate that tetragonal Al₂O₃ is indeed obtained. A simple device and electric circuit is proposed to measure the insulating properties of aluminum oxide and the transport properties of SnO₂ as well. Results indicate a fair insulation when four layers or Al₂O₃ are grown on the tin dioxide film, concomitant with thermal annealing between each layer. The current magnitude through the insulating layer is only 0.2% of the current through the semiconductor film, even though the conductivity of the SnO₂ alone is not very high (the average resistivity is 2 Ω cm), because no doping is used. The presented results are a good indication that this combination may be useful for transparent devices.     

Nanocrystalline TiO2 thin films for NH3 monitoring: microstructural and physical characterization

Nanocrystalline titanium oxide thin films have been deposited by spin coating technique and then have been analyzed to test their application in NH₃ gas-sensing technology. In particular, spectrophotometric and conductivity measurements have been performed in order to determine the optical and electrical properties of titanium oxide thin films. The structure and the morphology of such material have been investigated by X ray diffraction, Scanning microscopy, high resolution electron microscopy and selected area electron diffraction. The X-ray diffraction measurements confirmed that the films grown by this technique have good crystalline tetragonal mixed anatase and rutile phase structure. The HRTEM image of TiO₂ thin film showed grains of about 50–60 nm in size with aggregation of 10–15 nm crystallites. Selected area electron diffraction pattern shows that the TiO₂ films exhibited tetragonal structure. The surface morphology (SEM) of the TiO₂ film showed that the nanoparticles are fine with an average grain size of about 50–60 nm. The optical band gap of TiO₂ film is 3.26 eV. Gas sensing properties showed that TiO₂ films were sensitive as well as fast in responding to NH₃. A high sensitivity for ammonia indicates that the TiO₂ films are selective for this gas.     

Synthesis and characterization of HfO2 and ZrO2 thin films deposited by plasma assisted reactive pulsed laser deposition at low temperature

A plasma assisted reactive pulsed laser deposition process was demonstrated for low-temperature deposition of thin hafnia (HfO₂) and zirconia (ZrO₂) films from metallic hafnium or zirconium with assistance of an oxygen plasma generated by electron cyclotron resonance microwave discharge. The structure and the interface of the deposited films on silicon were characterized by means of Fourier transform infrared spectroscopy, which reveals the monoclinic phases of HfO₂ and ZrO₂ in the films with no interfacial SiO_x layer between the oxide film and the Si substrate. The optical properties of the deposited films were investigated by measuring the refractive indexes and extinction coefficients with the aid of spectroscopic ellipsometry technique. The films deposited on fused silica plates show excellent transparency from the ultraviolet to near infrared with sharp ultraviolet absorption edges corresponding to direct band gap.     

Structural analysis of Ti-Fe thin films prepared by pulsed laser deposition

Titanium iron oxide (Ti-Fe-O) thin films have been successfully deposited by pulsed laser deposition (PLD). Experiments were carried out by using some targets. One was a Ti-50 at.% Fe-sintered target, while the others were Ti and Fe plates with various surface area ratio [S_R=S_Fe/(S_Fe+S_Ti)] from 30 to 70%. The thin films were analyzed by X-ray diffractometry, Rutherford backscattering spectroscopy (RBS) and transmission electron microscopy (TEM). From XRD analysis, the main phase in the thin films deposited at S_R=30 and 50% was β-Ti (Fe). By increasing S_R to 70%, the main phase of the thin film changed to TiFe. By phase diagram, composition of TiFe must be between Ti-47.5-50.3 at.% Fe at a temperature of 1085 °C. However, the composition of the thin film deposited at S_R=70% was found to be Ti_0.15Fe_0.62O_0.23. Thus, the composition of Fe in the thin film was much greater than the solubility limit. This fact suggests two possibilities. One is that the thin films, which we have deposited, were in a metastable state. The other is that metal oxides of amorphous state could be contained in the thin film.     

Enhancement of nonlinear optical susceptibility of CuPc films by ITO layer

In the present study, the Copper Phthalocyanine (CuPc)/ITO thin film was fabricated using thermal evaporation method. The structural property was analyzed by X-ray diffraction study and confirms that the thin film has been preferentially grown along (200) plane. The atomic force microscope study was carried out on deposited film and quality of thin films is assessed by calculating the roughness of the films. The direct and indirect band gap, linear and nonlinear optical characteristics of grown films were calculated by using UV–Vis–NIR spectrometer studies. The calculated values of the first direct and indirect band gaps (E_g1(d) & E_g1(ind)) are 1.879 and 1.644 eV as a fundamental gap, while the values of second direct and indirect band gap (E_g2(d) & E_g2(ind)) are 1.660 and 1.498 eV as an onset gap for CuPc. The values of nonlinear refractive index (n₂) and third order nonlinear optical susceptibility (χ³) are found to be 5 × 10⁻⁸ and 8 × 10⁻⁹ (theoretical) and 5.2 × 10⁻⁸ and 1.56 × 10⁻⁷ (experimental) respectively. The optical band and third order nonlinear properties suggest that the as-prepared films are may be applied in optoelectronic and nonlinear applications.     

Growth and characterization of transparent conducting nanostructured zinc indium oxide thin films

Transparent conductive oxide (TCO) films have been widely used in various applications, such as for transparent electrodes in flat-panel displays, and in solar cells, optoelectronic devices, touch panels and IR reflectors. Among these, tin doped zinc oxide (ZTO) and indium doped zinc oxide (ZIO) have attracted considerable attention. Particularly, IZO thin film is the best candidate for high-quality transparent conducting electrodes in OLEDs and flexible displays. In this work zinc indium oxide (ZIO) thin films were deposited on glass substrate with varying concentration (ZnO:In₂O₃ — 100:0, 90:10, 70:30 and 50:50 wt.%) at room temperature by flash evaporation technique. These deposited ZIO films were annealed in vacuum to study the thermal stability and to see the effects on the physical properties. The XRF spectra revealed the presence of zinc and indium with varying concentration in ZIO thin films, while the surface composition and oxidation state were analyzed by X-ray photoelectron spectroscopy. The core level spectra were deconvoluted to see the effect of chemical changes, while the valance band spectra manifest the electronic transitions. The surface morphology studies of the films using atomic force microscopy (AFM) revealed the formation of nanostructured ZIO thin films. The optical band gap was also found to be decreased for both types of films with increasing concentration of In₂O₃.     

Microstructure-Property relationships in thin film ITO

Polycrystalline tin-doped indium oxide (ITO) thin films were prepared by pulsed laser deposition (PLD) with an ITO (In₂O₃-10 wt.% SnO₂) target and deposited on borosilicate glass substrates. By changing independently the deposition temperature and the oxygen pressure, a variety of microstructures were deposited. These different microstructures were mainly investigated not only by transmission electron microscopy (TEM) with cross-section and plan-view electron micrographs, but also by scanning electron microscopy (SEM), atomic force microscopy (AFM) and X-ray diffraction. Composition changes in ITO thin films grown under different deposition conditions were characterized by energy dispersive X-ray spectroscopy (EDX). The optical and electrical properties were studied respectively by UV-visible spectrophotometry and a four-point probe. The best compromise in terms of high transmittance (T) in the visible range and low resistivity (ρ) was obtained for films deposited between 0.66 and 2 Pa oxygen pressure (P_O2) at 200 °C substrate temperature (T_s). The influence of P_O2 and T_s on the microstructure and ITO film properties is discussed.     

Comparative study of physical properties of vapor chopped and nonchopped Al2O3 thin films

Aluminium oxide being environmentally stable and having high transmittance is an interesting material for optoelectronics devices. Aluminium oxide thin films have been successfully deposited by hot water oxidation of vacuum evaporated aluminium thin films. The surface morphology, surface roughness, optical transmission, band gap, refractive index and intrinsic stress of Al₂O₃ thin films were studied. The cost effective vapor chopping technique was used. It was observed that, optical transmittance of vapor chopped Al₂O₃ thin film showed higher transmittance than the nonchopped film. The optical band gap of vapor chopped thin film was higher than the nonchopped Al₂O₃, whereas surface roughness and refractive index were lower due to vapor chopping.     

Physical properties of transparent conducting Cd-Te-In-O thin films: Outlining a thermodynamic system for transparent conducting oxides

Cd-Te-In-O thin films are grown by pulsed laser deposition using a composite target of CdTe powder embedded in an indium matrix. Oxygen pressures range from 2.00 to 6.67 Pa at a substrate temperature of 420 °C. The structure, optical transmission and sheet resistance of the films are measured. Substitutional compounds with In_2 − 2x(Cd,Te)_2xO₃ stoichiometry are found at high oxygen pressures. A ternary phase diagram of the CdO-In₂O₃-TeO₂ system shows the relationship between the structure and the stoichiometry of the films. To evaluate film performance, a figure of merit is proposed based on the relationship between the integral photonic flux and the sheet resistance. The best figure of merit values corresponds to a sample prepared at 3.8 Pa O₂ that consists of (In₂O₃)_0.3(CdTe₂O₅)_0.7 and exhibits an optical band gap of 3.0 eV. This sample is a suitable substrate for electrodeposition due to its good electrochemical stability.     

Effects of post-deposition annealing temperature and ambient on RF magnetron sputtered Sm<Subscript>2</Subscript>O<Subscript>3</Subscript> gate on n-type silicon substrate

Samarium oxide (Sm₂O₃) thin films with thicknesses in the range of 15–30 nm are deposited on n-type silicon (100) substrate via radio frequency magnetron sputtering. Effects of post-deposition annealing ambient [argon and forming gas (FG) (90% N₂ + 10% H₂)] and temperatures (500, 600, 700, and 800 °C) on the structural and electrical properties of deposited films are investigated and reported. X-ray diffraction revealed that all of the annealed samples possessed polycrystalline structure with C-type cubic phase. Atomic force microscope results indicated root-mean-square surface roughness of the oxide film being annealed in argon ambient are lower than that of FG annealed samples, but they are comparable at the annealing temperature of 700 °C (Argon—0.378 nm, FG—0.395 nm). High frequency capacitance–voltage measurements are carried out to determine effective oxide charge, dielectric constant and semiconductor-oxide interface trap density of the annealed oxide films. Sm₂O₃ thin films annealed in FG have smaller amount of effective oxide charge and semiconductor-oxide interface trap density than those oxide films annealed in argon. Current–voltage measurements are conducted to obtain barrier heights of the annealed oxide films during Fowler–Nordheim tunneling.     

Influence of thermal annealing on optical properties and surface morphology of NiOx thin films

NiO_x thin films were deposited by reactive DC-magnetron sputtering from a nickel metal target in Ar + O₂ with the relative O₂ content of 5%. Thermal annealing effects on optical properties and surface morphology of NiO_x films were investigated by X-ray photoelectron spectroscopy, thermogravimetric analysis, scanning electron microscope and optical measurement. The results showed that the changes in optical properties and surface morphology depended on the temperature. The surface morphology of the films changed obviously as the annealing temperature increased due to the reaction NiO_x → NiO + O₂ releasing O₂. The surface morphology change was responsible for the variation of the optical properties of the films. The optical contrast between the as-deposited films and 400 °C annealed films was about 52%. In addition, the relationship of the optical energy band gap with the variation of annealing temperature was studied.