Influence of the film thickness on structural and optical properties of CdTe thin films electrodeposited on stainless steel substrates

CdTe thin films of different thicknesses were deposited by electrodeposition on stainless steel substrates (SS). The dependence of structural and optical properties on film thickness was evaluated for thicknesses in the range 0.17–1.5 μm. When the film is very thin the crystallites lack preferred orientation, however, thicker films showed preference for (111) plane. The results show that structural parameters such as crystallite size, lattice constant, dislocation density and strain show a noticeable dependence on film thickness, however, the variation is significant only when the film thickness is below 0.8 μm. The films were successfully transferred on to glass substrates for optical studies. Optical parameter such as absorption coefficient (α), band gap (E_g), refractive index (n), extinction coefficient (k_e), real (?_r) and imaginary (?_i) parts of the dielectric constant were studied. The results indicate that all the optical parameters strongly depend on film thickness.     

Effects of laser irradiation on the structure and optical properties of ZnO thin films

The effects of laser irradiation on the surface microstructure and optical properties of ZnO films deposited on glass substrates were investigated experimentally and compared with those of thermal annealing. X-ray diffraction (XRD) and atomic force microscopy (AFM) measurements showed that the irradiation treatment with an Ar⁺ laser of 514 nm for 5 min improves the crystalline quality of ZnO thin films through increasing the grain size and enhancing the c-axis orientation, with the effects similar to those of the thermal annealing at 500 °C for 1 h. Laser irradiation was found to be more effective both for the relaxation of the residual compressive stress in the as-grown films and for the modification of the surface morphology. A significant increase in the UV absorption and a widening in the optical band-gap of the films were also observed after laser irradiation.     

Effect of thermal annealing time on optical and structural properties of TeO2 thin films

TeO₂ thin films were deposited on quartz substrates by rf reactive sputtering technique from a Te metal target. The obtained samples were annealed in an argon atmosphere at 450 °C for different annealing times up to 90 min. X-ray diffraction studies revealed that the as-grown samples were amorphous and there was no appreciable change in structure for a short annealing time. Thin films became polycrystalline with the tetragonal (α-phase) structure of tellurium dioxide crystal with the increase of the thermal annealing time. The refractive index and optical energy gap of the films were calculated by modelling transmittance spectra. The optical energy gap decreased continuously from 3.83 eV to 3.71 eV with increasing thermal annealing time.     

Stress and structural studies of ZnO thin films on polymer substrate under different RF powered conditions

The ZnO films are deposited on flexible substrate Teflon by radio frequency (RF) magnetron sputtering. The structure and residual stress of the films are revealed by XRD analysis. We find that the increase of RF power results in the change in the nature of stress and the difference of the grain size in the ZnO films on Teflon substrate. This indicates the possibility of the stress relaxation by increasing the RF power. Considering the (002) orientation and the mechanical stress, we suggest that the ZnO film deposited at RF power of 200 W for 1 h is optimal.     

Effect of Zr (IV) doping on the optical properties of sol–gel based nanostructured indium oxide films on glass

Zr (IV) doped indium oxide thin films (55 nm) were deposited onto pure silica glass by the sol–gel dip coating technique utilizing the precursors of 6 wt% equivalent oxide content. Three different Zr (IV) oxide (ZrO₂) dopant concentrations (5.0, 10.0 and 15.0 wt% w.r.t. total oxides) were chosen. XRD patterns suggested the films were of distinct cubic symmetry of In₂O₃. Nanostructured surface feature was revealed by FESEM images. Average cluster size decreased with increasing dopant concentration as evidenced from TEM study. Blue shift of band gap and UV cut off wavelength (lambda-50) occurred with increase in dopant concentration. The refractive index gradually increased with doping. Baking atmosphere plays an important role in tailoring the refractive index (RI) of the films and relatively high RI was obtained in the case of baking in pure oxygen. Presence of both free and bound excitons was detected by the photoluminescence (PL) study. The 5 wt% doped film exhibited relatively high PL intensity at 380 nm responsible for free exciton. The PL emissions gradually quenched with increase in dopant concentration. Similar behaviour was also observed when the film was baked in pure oxygen atmosphere.     

Effect of sol concentration on the structural, morphological, optical and photoluminescence properties of zirconia thin films

ZrO₂ thin films were deposited on quartz substrates from 10 wt.%, 20 wt.% and 40 wt.% solutions of Zirconium-n-butoxide in isopropanol by sol-gel dip-coating technique. Higher concentrated sols of 20 wt.% and 40 wt.% exhibited faster gelation, where as 10 wt.% sol remained stable for two months and films synthesized from this sol remained transparent and continuous even for 12 coatings. Ellipsometric study revealed that refractive index of the films increased with increase in sol concentration which is ascribed to the decrease in porosity. X-ray diffraction study showed that a tailoring of grain size from 7.9 to 39.2 nm is possible with increase in sol concentration. Atomic force microscopy studies showed a change in growth mode from vertical to lateral mode with increase in sol concentration. The film surface revealed positive skewness and high kurtosis values which make them favorable for tribological applications. The average optical transmittance in the visible region is highest (greater than 90%) for the film deposited from 10 wt.% sol. The optical band gap decreased from 5.74 to 5.62 eV with increase in the sol concentration. Photoluminescence (PL) spectra of the films exhibit an increase in the emission intensity with increase in sol concentration which substantiates better crystalline quality of the film deposited from 40 wt.% sol and increase in oxygen vacancies. The “Red shift” of the PL spectra with increase in sol concentration originates from the increase in the grain size with sol concentration which makes it suitable for generation of solid state lighting in light emitting diode.     

Modeling the optical properties of tin oxide thin films

Searching the many papers reporting on the optical characteristics of tin oxide thin films, an obvious question arises: what is the origin of the very large differences in the reported optical and electrical properties of these films? The objective of the present work is to resolve this question by applying a modeling approach, simulating the refractive index of SnO, SnO₂, SnO + SnO₂, and porous tin oxide films in the visible range of the spectrum under various structure and composition conditions. Using the semi-empirical model of Wemple and DiDomenico for the dielectric function below the interband absorption edge of ionic and covalent solids, and the effective-medium theory of Bruggeman, the refractive indices of SnO, SnO₂, several mixtures of SnO and SnO₂ and various porous tin oxide films were calculated. The resulting data are compared with some published data to suggest the compositional and structural characteristics of the reported oxides. The correlation between the optical properties of the studied thin films and film composition is also indicated. It is proposed that the large spread in reported optical data is possibly a spread in the composition of the samples.     

Effect of cadmium oxide incorporation on the microstructural and optical properties of pulsed laser deposited nanostructured zinc oxide thin films

CdO doped (doping concentration 0, 1, 3 and 16 wt%) ZnO nanostructured thin films are grown on quartz substrate by pulsed laser deposition and the films are annealed at temperature 500 °C. The structural, morphological and optical properties of the annealed films are systematically studied using grazing incidence X-ray diffraction (GIXRD), energy dispersive X-ray analysis (EDX), scanning electron microscopy (SEM), atomic force microscopy (AFM), Micro-Raman spectra, UV–vis spectroscopy, photoluminescence spectra and open aperture z-scan. 1 wt% CdO doped ZnO films are annealed at different temperatures viz., 300, 400, 500, 600, 700 and 800 °C and the structural and optical properties of these films are also investigated. The XRD patterns suggest a hexagonal wurtzite structure for the films. The crystallite size, lattice constants, stress and lattice strain in the films are calculated. The presence of high-frequency E₂ mode and the longitudinal optical A₁ (LO) modes in the Raman spectra confirms the hexagonal wurtzite structure for the films. The presence of CdO in the doped films is confirmed from the EDX spectrum. SEM and AFM micrographs show that the films are uniform and the crystallites are in the nano-dimension. AFM picture suggests a porous network structure for 3% CdO doped film. The porosity and refractive indices of the films are calculated from the transmittance and reflectance spectra. Optical band gap energy is found to decrease in the CdO doped films as the CdO doping concentration increases. The PL spectra show emissions corresponding to the near band edge (NBE) ultra violet emission and deep level emission in the visible region. The 16CdZnO film shows an intense deep green PL emission. Non-linear optical measurements using the z-scan technique indicate that the saturable absorption (SA) behavior exhibited by undoped ZnO under green light excitation (532 nm) can be changed to reverse saturable absorption (RSA) with CdO doping. From numerical simulations the saturation intensity (I_s) and the effective two-photon absorption coefficient (β) are calculated for the undoped and CdO doped ZnO films.     

Effect of sputtering power on the electrical and optical properties of Ca-doped ZnO thin films sputtered from nanopowders compacted target

In the present work, we have deposited calcium doped zinc oxide thin films by magnetron sputtering technique using nanocrystalline particles elaborated by sol–gel method as a target material. In the first step, the nanoparticles were synthesized by sol–gel method using supercritical drying in ethyl alcohol. The structural properties studied by X-ray diffractometry indicates that Ca doped ZnO has a polycrystalline hexagonal wurzite structure with a grain size of about 30 nm. Transmission electron microscopy (TEM) measurements have shown that the synthesized CZO is a nanosized powder. Then, thin films were deposited onto glass substrates by rf-magnetron sputtering at ambient temperature. The influence of RF sputtering power on structural, morphological, electrical, and optical properties were investigated. It has been found that all the films deposited were polycrystalline with a hexagonal wurtzite structure and preferentially oriented in the (0 0 2) crystallographic direction. They have a typical columnar structure and a very smooth surface. The as-deposited films show a high transmittance in the visible range over 85% and low electrical resistivity at room temperature.     

Effect of substrate-induced strain on the morphological, electrical, optical and photoconductive properties of RF magnetron sputtered ZnO thin films

ZnO thin films have been grown by radio frequency (RF) magnetron sputtering on different substrates such as glass, quartz (z-cut), sapphire (0 0 1) and Si (1 0 0) in order to study the effect of substrate-induced strain along c-axis on the structural, electrical, optical and photoconducting properties of the films. The full width at half maximum for (0 0 0 2) peak increases while the crystallite size decreases with decrease in the compressive strain. The change in resistivity and carrier concentration has been related to the variation of strain. The resistivity of the films increases and the carrier concentration decreases exponentially with increasing the strain. The film on the quartz substrate shows higher UV emission intensity. The ultraviolet photosensitivity decreases with increase in the strain.     

The use of I-V characteristics for the investigation of selected contacts for spray-deposited CdS:In thin films

An investigation of selected contacts for indium doped cadmium sulphide (CdS:In) thin films was performed through the analysis of the I-V characteristics in the dark and room light at room temperature. Indium, aluminum and silver were selected as contacts where two strips of each metal were vacuum- evaporated on the surface of the film. All of these metals could form ohmic contacts, but indium had shown the best characteristics then aluminum. Films with indium contacts gave the best electrical properties and they are slightly affected by light. Doping and annealing were found to improve the contacts as seen in the I-V plots because they are expected to reduce the contact potential and annealing helps in the formation of an alloy with the semiconductor which forms an ohmic contact.     

Effect of alumina doping on structural, electrical, and optical properties of sputtered ZnO thin films

A systematic study of the influence of alumina (Al₂O₃) doping on the optical, electrical, and structural characteristics of sputtered ZnO thin films is reported in this study. The ZnO thin films were prepared on 1737F Corning glass substrates by R.F. magnetron sputtering from a ZnO target mixed with Al₂O₃ of 0-4 wt.%. X-ray diffraction (XRD) analysis demonstrates that the ZnO thin films with Al₂O₃ of 0-4 wt.% have a highly (002) preferred orientation with only one intense diffraction peak with a full width at half maximum (FWHM) less than 0.5°. The electrical properties of the Al₂O₃-doped ZnO thin films appear to be strongly dependent on the Al₂O₃ concentration. The resistivity of the films decreases from 74 Ω·cm to 2.2 × 10^− 3 Ω·cm as the Al₂O₃ content increases from 0 to 4 wt.%. The optical transmittance of the Al₂O₃-doped ZnO thin films is studied as a function of wavelength in the range 200-800 nm. It exhibits high transparency in the visible-NIR wavelength region with some interference fringes and sharp ultraviolet absorption edges. The optical bandgap of the Al₂O₃-doped ZnO thin films show a short-wavelength shift with increasing of Al₂O₃ content.     

Effect of annealing treatment on structural, electrical, and optical properties of Ga-doped ZnO thin films deposited by RF magnetron sputtering

The effect of annealing on structural, electrical, and optical properties of Ga-doped ZnO (GZO) films prepared by RF magnetron sputtering was investigated in air and nitrogen. GZO films are polycrystalline with a preferred 002 orientation. The resistivities of annealed films are larger than the as-deposited. The transmittance in the near IR region increases greatly and the optical band gap decreases after annealing. The photoluminescence spectra is composed of a near band edge emission and several deep level emissions (DLE) which are dominated by a blue emission. After annealing, these DLEs are enhanced evidently.     

Electrical and optical properties of copper-complexes thin films grown by the vacuum thermal evaporation technique

In this work, the synthesis and characterization of molecular materials formed from K₂[Cu(C₂O₄)₂], 1,8-dihydroxyanthraquinone and its potassium salt are reported. These complexes have been used to prepare thin films by vacuum thermal evaporation. The synthesized materials were characterized by scanning electron microscopy (SEM), atomic force microscopy (AFM), fast atomic bombardment (FAB+) mass and ultraviolet–visible (UV–vis) spectroscopy. Electrical transport properties were studied by dc conductivity measurements. The electrical activation energies of the complexes, which were in the range of 0.36–0.65 eV, were calculated from their Arrhenius plots. Optical absorption studies in the 100–1100 nm wavelength range at room temperature showed thin films' optical band gaps in the 2.3–3.9 eV range for direct transitions. On the other hand, strong visible photoluminescence (PL) at room temperature was noticed from the thermally-evaporated thin solid films. The PL of all investigated samples were observed with the naked eye in a bright background. The PL and absorption spectra of the investigated compounds are strongly influenced by the molecular structure and nature of the organic ligand.     

Structural, optical and electrical characterization of spray-deposited TiO2 thin films

Titanium oxide (TiO₂) thin films were deposited onto glass substrates by means of spray pyrolysis method using methanolic titanyl acetyl acetonate as precursor solution. The thin films were deposited at three different temperatures namely 350, 400 and 450 °C. As-deposited thin films were amorphous having 100–300 nm thickness. The thin films were subsequently annealed at 500 °C in air for 2 h. Structural, optical and electrical properties of TiO₂ thin films have been studied. Polycrystalline thin films with rutile crystal structure, as evidenced from X-ray diffraction pattern, were obtained with major reflexion along (1 1 0). Surface morphology and growth stages based on atomic force microscopy measurements are discussed. Electrical properties have been studied by means of electrical resistivity and thermoelectric power measurements. Optical study shows that TiO₂ possesses direct optical transition with band gap of 3.4 eV.     

Influence of Nb dopant on the structural and optical properties of nanocrystalline TiO2 thin films

In this study, preparation of Nb-doped (0-20 mol% Nb) TiO₂ dip-coated thin films on glazed porcelain substrates via sol-gel process has been investigated. The effects of Nb on the structural, optical, and photo-catalytic properties of applied thin films have been studied by X-ray diffraction, Raman spectroscopy, and scanning electron microscopy. Surface topography and surface chemical state of thin films was examined by atomic force microscope and X-ray photoelectron spectroscopy. XRD and Raman study showed that the Nb doping inhibited the grain growth. The photo-catalytic activity of the film was tested on degradation of methylene blue. Best photo-catalytic activity of Nb-doped TiO₂ thin films were measured in the TiO₂-1 mol% Nb sample. The average optical transmittance of about 47% in the visible range and the band gap of films became wider with increasing Nb doping concentration. The Nb⁵⁺ dopant presented substitutional Ti⁴⁺ into TiO₂ lattice.     

Effect of annealing temperature on structural, electrical and optical properties of B-N codoped ZnO thin films

The B-N codoped p-type ZnO thin films have been prepared by radio frequency magnetron sputtering using a mixture of nitrogen and oxygen as sputtering gas. The effect of annealing temperature on the structural, electrical and optical properties of B-N codoped films was investigated by using X-ray diffraction, Hall-effect, photoluminescence and optical transmission measurements. Results indicated that the electrical properties of the films were extremely sensitive to the annealing temperature and the conduction type could be changed dramatically from n-type to p-type, and finally changed to weak p-type in a range from 600 °C to 800 °C. The B-N codoped p-type ZnO film with good structural, electrical and optical properties can be obtained at an intermediate annealing temperature region (e.g., 650 °C). The codoped p-type ZnO had the lowest resistivity of 2.3 Ω cm, Hall mobility of 11 cm²/Vs and carrier concentration of 1.2 × 10¹⁷ cm^− 3.     

Effect of laser repetition frequency on the structural and optical properties of ZnO thin films by PLD

ZnO thin films were grown on Si (1 1 1) substrates by pulsed laser deposition (PLD) at various laser repetition frequency in order to investigate the structural and optical properties of the films. The optical properties of the films were studied by photoluminescence spectra using a 325 nm He-Cd laser. The structural properties of the films were investigated by XRD measurement. The results suggest that films grown at 5 Hz have excellent UV emission and high-quality crystallinity. Laser repetition frequency can affect the structural and optical properties obviously. In addition, the thickness of all samples is about 200 nm and is not as expected that the film thickness was in direct proportion to laser repetition frequency. The authors think that one laser pulse is not corresponding to one growth instantaneousness. There is a growth ambience containing essential components and partial pressure in the work cavity.     

Preparation and characterization of sol-gel Li and Al codoped ZnO thin films

Li and Al codoped ZnO (LAZO) thin films have been prepared by a sol-gel method and their structural and optical properties have been investigated. The prepared LAZO films had an average transmittance of over 85% in the visible range. The UV absorption edge was red-shifted with Li-doping, whereas it was blue-shifted with Al-doping. A broad yellowish-white emission was observed from the LAZO films annealed above 600 °C. The visible emission was enhanced with increasing annealing temperature and dopant concentration.     

Structural and optical properties of CdS thin films grown by chemical bath deposition

Cubic cadmium sulphide (CdS) thin films with (111) preferential orientation were prepared by chemical bath deposition (CBD) technique, using the reaction between NH₄OH, CdSO₄ and CS(NH₂)₂. The films properties have been investigated as a function of bath temperature and deposition time. Structural properties of the obtained films were studied by X-ray diffraction analysis. The structural parameters such as crystallite size have been evaluated. The transmission spectra, recorded in the UV visible range reveal a relatively high transmission coefficient (70%) in the obtained films. The transmittance data analysis indicates that the optical band gap is closely related to the deposition conditions, a direct band gap ranging from 2.0 eV to 2.34 eV was deduced. The electrical characterization shows that CdS films' dark conductivities can be controlled either by the deposition time or the bath temperature.