磁控溅射中溅射电流对Ti薄膜膜基结合性能的影响

研究在磁控溅射工艺中工作压强和溅射时间恒定的情况下,溅射电流的变化对钛膜与基底Gd结合能力的影响.通过拉伸法测量薄膜与基体间的附着强度,利用扫描电镜观察Ti膜表面形貌.结果表明:溅射电流达到3 A时,Ti膜表面平整,与基体的结合力最强.由此说明,溅射电流的变化对钛膜与基底Gd结合能力的影响较大.     

不同基体材料金刚石薄膜涂层刀具附着强度的研究

研究了基体材料对金刚石薄膜涂层刀具附着强度的影响。应用燃焰法制备了基体材料不同的金刚石薄膜涂层刀具,并进行断续车削实验,根据金刚石薄膜剥落时的耐冲击次数和薄膜剥落面积大小对附着强度进行了评价。     

Gd掺杂PZT铁电薄膜的微观结构和铁电性研究

采用溶胶-凝胶技术制备稀土Gd掺杂的PZT(PGZT)前驱体溶胶.以(111)Pt/Ti/SiO2/Si(100)为衬底,采用旋涂法和快速热处理技术制备PGZT薄膜.X射线衍射(XRD)分析结果表明,450℃预烧,650℃快速热处理得到(100)择优取向的薄膜.用扫描电镜(SEM)对稀土Gd不同掺入量薄膜的表面形貌进行分析,薄膜的表面平整,无裂纹;用原子力显微镜(AFM)对薄膜表面的粗糙度进行分析.PGZT薄膜铁电性能测试结果表明,1%(摩尔分数,下同)Gd-PZT薄膜的剩余极化强度(2Pr)为46.373μC/cm2,经1010次极化循环后,剩余极化值减小45%;当Gd掺入量大于1%时,薄膜的剩余极化强度减小.对稀土Gd3+掺杂改性机理进行初步分析,可能是由于稀土掺入量小于1%时,稀土起施主掺杂剂作用,而施主掺杂可以明显改善PZT的疲劳特性;当稀土掺入量大于1%时,稀土起受主掺杂剂作用.     

SiC衬底金刚石薄膜的制备与性能表征

用热丝CVD法,以丙酮和氢气为碳源,在SiC衬底上沉积金刚石薄膜,提出了分步变参数沉积法制备超细晶粒金刚石复合薄膜的新工艺.结果表明,合理控制工艺条件的新工艺,对金刚石薄膜质量、形貌和粗糙度、薄膜与衬底间的附着力以及薄膜的摩擦系数有显著影响,金刚石薄膜的平均晶粒尺寸从3 μm减小到0.3 μm,拉曼特征峰显示超细晶粒金刚石薄膜特征,涂层附着力好,超细晶粒金刚石薄膜的表面粗糙度和摩擦系数值显著下降,对获取实用化的SiC在基体上沉积高附着强度、低粗糙度金刚石薄膜的新技术具有重要的意义.     

铜基体上类石墨膜结合强度评价及其与干摩擦性能关系

用非平衡磁控溅射离子镀技术在铜合金上制备了不同Ti含量的类石墨碳膜,用维氏压入、洛氏压入、划痕等方法测试薄膜的附着性能,用高速线性往复磨损实验机检测薄膜的干磨性能,并用光学显微镜、白光干涉仪观察磨痕。结果表明:压痕法更适合评价软基体上硬膜的结合强度,且维氏压入法因加载载荷较小,基体塑性变形小,评定的结合强度与干摩擦磨损时膜基体系的耐磨性具有对应关系。当靶电流为0.2 A时,铜合金上的类石墨膜与对磨球的摩擦系数和磨损率达最小值,分别为0.14和2.89×10~(-16)m~3/(N·m)。划痕法不适合用来快速评定和预测软基硬膜体系的结合强度。载荷较小的维氏压入法具有更好的结合强度鉴别区分度。     

类金刚石碳膜的纳米划擦行为及其加载—卸载效应

用射频等离子体增强化学气相沉积方法在硅片上制备了类金刚石碳膜,利用纳米压入仪的是痕附件研究了薄膜的纳米划擦行为,结果表明：在划擦过程中,随载荷增加,薄膜先后经历弹性变形、弹塑性变形,加载开裂及卸载剥离三个阶段,在连续加载直至薄膜开裂的过程中薄膜未发生剥落,卸载的薄膜与基体变形恢复不同步,发生薄膜从基体上的脆性剥落,纳米划擦实验不仅能在加载阶段获得表征薄膜内聚强度的临界载荷,而且能检测卸载过程中薄膜附着抗力有关的临界载荷,是评价类金刚石薄膜划擦抗力的有效手段之一。     

稀土元素Gd对NiAl合金显微组织和力学性能的影响

研究了不同Gd含量对二元NiAl合金组织以及室温和1100 ℃压缩性能的影响.结果表明,稀土Gd在NiAl中的固溶度很小,在合金晶内及晶界大量析出一种脆硬的新相--富Gd相.由于Gd的固溶强化和适量富Gd相产生的第二相强化,使得含0.10Gd合金的室温压缩强度高于二元NiAl的,而晶界上析出较多的富Gd相又使得含0.25Gd和0.50Gd合金的室温压缩强度较低;Gd的净化基体作用使得NiAl-Gd合金的室温压缩塑性高于二元NiAl的室温压缩塑性.含Gd合金在1100℃压缩,亦未出现应变软化现象.     

表面处理工艺对PEDT抗静电薄膜强度的影响

采用PEDT为导电物质,聚氨酯为主要成膜物质在包装材料聚丙烯(PP)表面制备电子元件包装用抗静电薄膜.研究了聚丙烯基片的表面温度,以及采用铬酸、甲苯对基片表面极化处理后,对薄膜结合强度的影响.实验结果表明基片温度升高可以改善薄膜的附着性能;基片表面在60℃铬酸中处理3 h可以得到较好的附着强度(98/100);基片表面在90℃甲苯中处理可以使附着强度达到80/100.     

Ca和Gd对压铸Mg-6Gd-3Y-0.5Zr合金组织及性能的影响

在冷室压铸机上制备了Mg-6Gd-3Y-0.5Zr(GW63K)、Mg-8Gd-3Y-0.5Zr(GW83K)和Mg-6Gd-3Y-0.3Ca-0.5Zr(GWC630K)合金.通过光学显微镜、扫描电镜、X射线衍射及力学性能测试等研究了Ca、Gd对GW63K合金组织及力学性能的影响.结果表明:在GW63K合金基础上,添加Ca或Gd均可以使合金组织得到细化,并使得晶界上稀土相的数量明显增加.Ca主要溶于基体中,使合金中Gd、Y稀土元素更多地溶入基体,并使稀土相以短棒状或粒状分布于晶界.Gd主要分布于晶界上的稀土相中.Ca的加入有利于提高合金室温拉伸力学性能,而Gd的加入更有助于提高合金的高温强度.     

过渡层对铜基金刚石薄膜的影响

采用热丝化学气相沉积(HFCVD)在纯铜基体及4种不同的过渡层(Ti、Nb、Ni、W)上制备金刚石薄膜。利用场发射扫描电子显微镜(FE-SEM)、拉曼光谱仪(Raman)以及维氏硬度计对金刚石薄膜进行检测分析,研究了不同过渡层对金刚石薄膜形貌质量和附着性能的影响。结果表明,在纯铜基体以及多种过渡层上都能制备高纯度的金刚石薄膜;在形核率较高的基体上金刚石颗粒的尺寸较小,在Ni过渡层上金刚石颗粒的尺寸较大;金刚石薄膜在Ti过渡层上结合性能最好,但是非金刚石相最多。在Nb、W过渡层上的结合性能最差。     

调制周期对TiN/Ti多层膜组织结构和结合力的影响

为了阐明调制周期对薄膜微观组织及薄膜与基体结合力的影响,采用反应磁控溅射在Ti6Al4V基板上交替沉积了Ti层及TiN层制备了TiN/Ti多层膜。利用X射线衍射仪(XRD)、扫描电子显微镜(SEM)、显微硬度仪和划痕仪测量分析了薄膜的晶体结构、微观组织、硬度以及薄膜与基体之间的结合力。研究结果表明:TiN/Ti多层膜中均存在TiN,Ti和Ti2N 3种相。TiN/Ti多层膜均以柱状晶方式生长,在调制周期较大(5层)时,TiN和Ti层的界面清晰;随着调制周期的减小(层数增加),TiN和Ti层的界面逐渐消失。与单层TiN薄膜相比,多层TiN/Ti薄膜的硬度显著提高;但随着薄膜层数的增加,多层TiN/Ti薄膜硬度略微降低。当调制周期为80nm(30层)时,薄膜与基体的结合力明显提高,达到73N。     

氮化钛铝薄膜的制备及其摩擦学性能的研究

用多弧离子镀方法在高速钢的基体上沉积了不同钛铝比例的氮化钛铝薄膜，研究了不同铝含量对薄膜性能的影响，采SEM、XRD、AES、表面形貌仪、显微硬度计、划痕仪对薄膜的微观结构和力学性能进行了全面测试，用球盘试验机测试了薄膜的摩擦因数，在此基础上讨论了铝在薄膜中的作用。结果表明Al的引入使膜层的硬度明显提高。所有的(Ti，Al)N试样皆由面心立方晶格(fcc)的(Ti0．5Al0．5)N相组成。随着Al含量增加，GCr15与(TiAl)N膜层之间的摩擦因数下降，减摩性能提高，耐磨性能增强。(TiA1)N涂层可以显著提高硬质合金刀具的使用寿命。     

Analysis of diamond-like carbon and Ti/MoS2 coatings on Ti–6Al–4V substrates for applicability to turbine engine applications

Ti–6Al–4V substrates have been coated by diamond-like carbon (DLC) films, with no surface pretreatment, and have been coated by Ti/MoS₂ films, with a simple surface pre-cleaning. The DLC films were deposited by planar coil r.f. inductively-coupled plasma-enhanced chemical vapor deposition (r.f. ICPECVD); the Ti/MoS₂ films were deposited by magnetron sputtering. Both the DLC and Ti/MoS₂ films were characterized by pull tests, hardness tests, scanning electron microscopy (SEM), and wear tests (pin-on-disk and block-on-ring) to compare their adhesion, hardness, surface topology, and wear properties to plasma-sprayed Cu–Ni–In coating currently used for turbine engine applications. The DLC films were easily characterized by their optical properties because they were highly transparent. We used variable-angle spectroscopic ellipsometry (VASE) to characterize thickness and to unequivocally extract real and complex index of refraction, providing a rapid assessment of film quality. Thicker coatings yielded the largest hardness values. The DLC coatings did not require abrasive pretreatment or the formation of bond-layers to ensure good adhesion to the substrate. Simple surface pre-cleaning was also adequate to form well-adhered Ti/MoS₂ on Ti–6Al–4V. The results show that the DLC and Ti/MoS₂ coatings are both much better fretting- and wear-resistant coatings than plasma-sprayed Cu–Ni–In. Both show excellent adhesion to the substrates, less surface roughness, harder surfaces, and more wear resistance than the Cu–Ni–In films.     

Ti层对316L不锈钢表面TiB2薄膜结合力的影晌

基于多层膜优异的力学性能,采用磁控溅射法在316L不锈钢基体表面沉淀[Ti／TiB2]。（n=1,2,3）多层膜以增强TiB2薄膜的膜基结合强度。研究周期数对多层膜的结构、硬度及结合力的影响。结果表明：TiB：单层膜表现为（001）方向的织构。随着周期数的增加,多层膜的织构方向由（001）转变为（100）;多层膜的硬度从20GPa增加到26GPa,但略低于TiB2单层膜的硬度（33GPa）;相对于单膜的膜基结合力（9．5N）,多层膜表现出较好膜基结合力,最大结合力可达24N。     

Deposition of wear resistant coatings based on diamond like carbon by unbalanced magnetron sputtering

Amorphous hydrogenerated carbon films containing a small amount of metal (Me:C-H) have been deposited by closed field unbalanced magnetron sputter ion plating. The films have graded film compositions to optimise the adhesion to the substrates, and multilayer TiC/Ti:C-H films have also been deposited. The films have excellent properties: very high measured microhardness (more than 4000 H_v), excellent adhesion (L_c 115–125 N), coefficients of friction against WC of less than 0.2, and volumetric wear rates one fifth that of titanium nitride. The coating procedure is ideally suited to the system used, and many applications for the films are already realised.     

Growth of Free-standing Diamond Films on Graphite Substrates with Ti Interlayers

DIAMOND has many remarkable chemical andphysical properties,such as extreme hardness,highthermal conductivity,high electrical resistively andexcellent optical transparency and so on.For diamond,approximately5.5ev is required to excite an electronfrom the valence band to the conduction band,compared with1.1ev for Si and0.7ev for Ge m.Therefore,Diamond is a wide band gap material.Furthermore,due to the high vibration energy of carbonatoms in diamond,the frequency of infrared absorptionis abn…     

梯度基体温度法和反应溅射TiC过渡层对钛合金基体沉积金刚石薄膜的影响

以H2和CH4作为反应气体,采用热丝化学气相沉积法(HFCVD)在钛合金(Ti6Al4V)平板基体上制备金刚石薄膜,利用扫描电镜(SEM)、X射线衍射仪(XRD)、激光拉曼光谱(Raman)和洛氏硬度仪分析薄膜的表面形貌、结构、成分和附着性能,研究了高温形核-低温生长的梯度降温法对原始钛合金和反应磁控溅射TiC过渡层的钛合金表面沉积金刚石薄膜的影响。结果表明:原始基体区和TiC过渡层区沉积的金刚石薄膜平均尺寸分别为0.77μm和0.75μm,薄膜内应力分别为-5.85GPa和-4.14GPa,TiC层的引入可以有效提高金刚石的形核密度和晶粒尺寸的均匀性,并减少薄膜残余应力;高温形核-低温生长的梯度降温法可以有效提高金刚石的形核密度和质量,并提高原始基体上沉积金刚石薄膜的附着性能。     

Surface and interface analysis of HAP/TiO2 composite films on Ti6Al4V

The composite films constituted of hydroxyapatite (HAP) submicron particles embedded in the gel composed of the titania nanoparticles were prepared on commercial Ti6Al4V plates with titania buffer layer obtained by a spin-coating technique. The films were annealed in air at 450 ℃, 550 ℃ and 650 ℃, respectively. The phase formation, surface morphology, andinterfacial microstructure of the films were investigated by X-ray diffraction(XRD),Fourier transform infrared spectroscopy (FT-IR), field emission-scanning electron microscopy(FE-SEM) and energy dispersive X-ray (EDS) analysis. The results show that the as-prepared films are all well-crystallized, dense,homogeneous, and there was a close interfacial bond between the film and the substrate. The results of adhesion test indicate that there is a good bonding strength between the film and the substrate. The bone-like apatite formation on the surface of the films after immersion in acellular simulatedbody fluid(SBF) validated their bioactivities.     

硼掺杂对钛基金刚石薄膜附着力的影响

采用微波等离子体化学气相沉积(MPCVD)技术在钛基片上沉积了掺硼金刚石薄膜,并对掺杂前后的薄膜形貌及结构进行了检测.结果表明掺杂元素对形貌和结构有很大的影响,同时掺杂后薄膜与基底附着力有所下降.掠角衍射(GIXD)检测表明,中间层的主要成分是TiC和TiH_2.随着硼的加入,两者的含量增加.薄膜与基底的附着力下降的原因主要是受中间过渡层成分和残余应力增加的共同影响.