Light‐trapping properties of patch textures created using laser assisted texturing

For crystalline silicon solar cells, the efficient collection of light at wavelengths in the infrared is a challenge because of long absorption lengths. Especially for thinner wafers, an efficient light‐trapping scheme, such as the patch texture, is required for high short‐circuit current densities. We have measured the light‐trapping properties of patch textures produced by laser assisted texturing (LAST) on polished ⟨100⟩silicon wafers, and compared them with ray‐tracing simulations. Single‐sided random pyramid textures are created for comparison. Excellent agreement between simulations and measurements is achieved by employing diffuse scattering with a narrow angular distribution in the simulations, confirming the successful implementation of the process. We use our optical measurements of the textures for simulations of textures with rear reflectors, where we also investigate the influence on light‐trapping properties when varying geometry and reflectance properties. The results from the optical simulations are imported into the solar cell simulation program PC1D. For a 50 μm‐thick solar cell, we simulate an improvement in J_sc of up to 0.4 mA/cm² when going from single‐sided random pyramid textures to patch textures, even when the performance of the texture is limited by process inaccuracies. Removing the physical inaccuracies of the laser system, the potential gain in J_sc on a 50 μm‐thick cell with a patch texture covering the complete wafer surface is 0.8 mA/cm². We therefore conclude that the LAST method for creating patch textures is suitable to achieve an improved J_sc in thin monocrystalline silicon solar cells. Copyright © 2013 John Wiley & Sons, Ltd.     

18.45%‐Efficient Multi‐Crystalline Silicon Solar Cells with Novel Nanoscale Pseudo‐Pyramid Texture

Silicon‐based cells could convert more solar energy to electrical energy if the cells could absorb more light. However, the nanostructured cells have demonstrated relatively low power conversion efficiency even when its reflection is very low; thus, they are still far from becoming real products of the photovoltaic industry. Here, nanoscale pseudo‐pyramid textured multi‐crystalline silicon (Pmc‐Si) solar cells, with the best efficiency of ≈18.45%, are fabricated by using a metal‐catalyzed chemical etching plus a post alkaline etching on an industrial production line. Such Pmc‐Si solar cells have showed similar light trapping ability as single crystalline silicon solar cells of micrometer pyramid texture, and the improved efficiency is mainly ascribed to its enhanced light absorption while the nanostructured surface still keeps acceptable passivation quality, that is, the short‐circuit current density has an increase of ≈300 mA cell^–1, while the open‐circuit voltage has only a slight decrease of ≈1 mV. Further elevations of the efficiency are expected by optimizing both micrometer‐ and nanotextures, and exploring more effective passivation technique. More excitingly, the technique presented here has been verified in the production line for several batches as a real technique of low cost and high efficiency.     

Silicon solar cells based on all‐laser‐transferred contacts

Crystalline silicon solar cells based on all‐laser‐transferred contacts (ALTC) have been fabricated with both front and rear metallization achieved through laser induced forward transferring. Both the front and rear contacts were laser‐transferred from a glass slide coated with a metal layer to the silicon substrate already processed with emitter formation, surface passivation, and antireflection coating. Ohmic contacts were achieved after this laser transferring. The ALTC solar cells were fabricated on chemically textured p‐type Cz silicon wafers. An initial conversion efficiency of over 15% was achieved on a simple cell structure with full‐area emitter. Further improvements are expected with optimized laser transferring conditions, front grid pattern design, and surface passivation. The ALTC process demonstrates the advantage of laser processing in simplifying the solar cell fabrication by a one‐step metal transferring and firing process. Copyright © 2013 John Wiley & Sons, Ltd.     

Passivation of photonic nanostructures for crystalline silicon solar cells

We report on the optical and electrical performances of periodic photonic nanostructures, prepared by nanoimprint lithography (NIL) and two different etching routes, plasma, and wet chemical etching. Optically, these periodic nanostructures offer a lower integrated reflectance compared with the industrial state‐of‐the‐art random pyramid texturing. However, electrically, they are known to be more challenging for solar cell integration. We propose the use of wet chemical etching for fabricating inverted nanopyramids as a way to minimize the surface recombination velocities and maintain a conventional cell integration flow. In contrast to the broadly used plasma etching for nanopatterning, the wet chemically etched nanopatterning results in low surface recombination velocities, comparable with the state‐of‐the‐art random pyramid texturing. Applied to 40‐µm thick epitaxially grown crystalline silicon foils bonded to a glass carrier superstrate, the periodic‐inverted nanopyramids show carrier lifetimes comparable with the non‐textured reference foils (τ_eff = 250 µs). We estimate a maximum effective surface recombination velocity of ~8 cm/s at the patterned surface, which is comparable with the state‐of‐the‐art values for crystalline silicon solar cells. Copyright © 2014 John Wiley & Sons, Ltd.     

Recent progress in MIS solar cells

Metal–insulator–semiconductor (MIS)-type solar cells have an inherent cost advantage compared to p-n junction solar cells. First-generation MIS–inversion layer (MIS–IL) solar cells, already successfully produced in an industrial pilot line, are restricted to efficiencies of 15–16%. With the second-generation MIS–IL silicon solar cells, based on drastically improved surface passivation by plasma-enhanced chemical vapour-deposited silicon nitride, simple technology can be combined with very high efficiencies. The novel inversion layer emitters have the potential to outperform conventional phosphorus-diffused emitters of Si solar cells. A 17.1% efficiency could already be achieved with the novel point-contacted ‘truncated pyramid’ MIS–IL cell. A new surface-grooved line-contact MIS–IL device presently under development using unconventional processing steps applicable for large-scale fabrication is discussed. By the mechanical grooving technique, contact widths down to 2 μm can be achieved homogeneously over large wafer areas. Bifacial sensitivity is included in most of the MIS-type solar cells. For a bifacial 98 cm² Czochralski (Cz) Si MIS-contacted p-n junction solar cell with a random pyramid surface texture and Al as grid metal, efficiencies of 16.5% for front and 13.8% for rear side illumination are reported. A 19.5% efficiency has been obtained with a mechanically grooved MIS n⁺p solar cell. The MIS-type silicon solar cells are able to significantly lower the costs for solar electricity due to the simple technology and the potential for efficiencies well above 20%.©1997 John Wiley & Sons, Ltd.     

Interdigitated back‐contact heterojunction solar cell concept for liquid phase crystallized thin‐film silicon on glass

We present an interdigitated back‐contact silicon heterojunction system designed for liquid‐phase crystallized thin‐film (~10 µm) silicon on glass. The preparation of the interdigitated emitter (a‐Si:H(p)) and absorber (a‐Si:H(n)) contact layers relies on the etch selectivity of doped amorphous silicon layers in alkaline solutions. The etch rates of a‐Si:H(n) and a‐Si:H(p) in 0.6% NaOH were determined and interdigitated back‐contact silicon heterojunction solar cells with two different metallizations, namely Al and ITO/Ag electrodes, were evaluated regarding electrical and optical properties. An additional random pyramid texture on the back side provides short‐circuit current density (j_SC) of up to 30.3 mA/cm² using the ITO/Ag metallization. The maximum efficiency of 10.5% is mainly limited by a low of fill factor of 57%. However, the high j_SC, as well as V_OC values of 633 mV and pseudo‐fill factors of 77%, underline the high potential of this approach. Copyright © 2015 John Wiley & Sons, Ltd.     

Investigation of laser ablation on boron emitters for n‐type rear‐junction PERT type silicon wafer solar cells

n‐type silicon wafer solar cells are receiving increasing attention for industrial application in recent years, such as the n‐type rear‐junction Passivated Emitter Rear Totally‐diffused (PERT) solar cells. One of the main challenges in fabricating the n‐PERT solar cells is the opening of the rear dielectric for localized contacts. In this work laser ablation is applied to locally ablate the rear dielectric. We investigate the laser damage to the emitter at the laser‐ablated regions using the emitter saturation current density, J_0e,laser, extracted by two approaches. J_0e,laser is observed to be injection dependent due to high J₀₂ recombination caused by laser damage to the space charge region. By using the optimized laser ablation parameters, n‐PERT solar cells with an efficiency of up to 21.0% are realized. Copyright © 2015 John Wiley & Sons, Ltd.     

Photonic crystal microcrystalline silicon solar cells

Enhancing the absorption of thin‐film microcrystalline silicon solar cells over a broadband range in order to improve the energy conversion efficiency is a very important challenge in the development of low cost and stable solar energy harvesting. Here, we demonstrate that a broadband enhancement of the absorption can be achieved by creating a large number of resonant modes associated with two‐dimensional photonic crystal band edges. We utilize higher‐order optical modes perpendicular to the silicon layer, as well as the band‐folding effect by employing photonic crystal superlattice structures. We establish a method to incorporate photonic crystal structures into thin‐film (~500 nm) microcrystalline silicon photovoltaic layers while suppressing undesired defects formed in the microcrystalline silicon. The fabricated solar cells exhibit 1.3 times increase of a short circuit current density (from 15.0 mA/cm² to 19.6 mA/cm²) by introducing the photonic crystal structure, and consequently the conversion efficiency increases from 5.6% to 6.8%. Moreover, we theoretically analyze the absorption characteristics in the fabricated cell structure, and reveal that the energy conversion efficiency can be increased beyond 9.5% in a structure less than 1/400 as thick as conventional crystalline silicon solar cells with an efficiency of 24%. © 2015 The Authors. Progress in Photovoltaics: Research and Applications published by John Wiley & Sons Ltd.     

Analysis of short circuit current gains by an anti‐reflective textured cover on silicon thin film solar cells

The influence of a retro‐reflective texture cover on light in‐coupling and light‐trapping in thin film silicon solar cells is investigated. The texture cover is applied to the front glass of the cell and leads to a reflectance as low as r ≈ 3% by reducing the reflection at the air/glass interface and indirectly also reducing the reflections from the internal interfaces. For weakly absorbed light in the long wavelength range, the texture also enhances the light‐trapping in the solar cell. We demonstrate an increase of the short circuit current density of exemplary investigated thin film silicon tandem solar cells by up to 0.95 mA cm⁻² and of the conversion efficiency by up to 0.74% (absolute). For a planar microcrystalline solar cell, the enhancement of light‐trapping was determined from the reduced reflection in the long wavelength range to be up to 17%, leading to an increase of the external quantum efficiency of up to 12%. Copyright © 2012 John Wiley & Sons, Ltd.     

Wire bonding as a cell interconnection technique for polycrystalline silicon thin‐film solar cells on glass

The interconnection of solar cells is a critical part of photovoltaic module fabrication. In this paper, a high‐yield, low‐cost method for interconnecting polycrystalline silicon thin‐film solar cells on glass is presented. The method consists of forming adjacent, electrically isolated groves across the cells using laser scribing, and then forming wire bonds over each laser scribe, resulting in series interconnection of the individual solar cells. Wire bonds are also used to connect the first and last solar cell in the string to external (tabbing) leads, forming a mini‐module. A layer of white paint is then applied, which acts as both an encapsulation layer and an additional back surface reflector. Using this method, an 8·3% efficient mini‐module has been fabricated. By exploiting recent developments in wire bonding technology, it appears that this process can be automated and will be capable of forming solar cell interconnections on large‐area modules within relatively short processing times (∼10 min for a 1 m² module). Copyright © 2010 John Wiley & Sons, Ltd.     

Theory and experiments on the back side reflectance of silicon wafer solar cells

New passivation layers for the back side of silicon solar cells have to show high performance in terms of electrical passivation as well as high internal reflectivity. This optical performance is often shown as values for the back side reflectance R_b which describes the rear internal reflection. In this paper, we investigate in detail the meaning of this single‐value parameter, its correct determination and the use in one‐dimensional simulations with PC1D. The free‐carrier‐absorption (FCA) as non‐carrier‐generating absorption channel is analyzed for solar cells with varying thickness. We apply the optical analysis to samples with different thickness, silicon oxide layer thickness, rear side topography as well as passivation layers (SiO₂, SiN_x, SiC and stack systems). Additionally, the optical influence of the laser‐fired contacts (LFC) process is experimentally investigated. Finally, we show that with correct parameters, the one‐dimensional simulation of very thin silicon solar cells can successfully be performed. Copyright © 2007 John Wiley & Sons, Ltd.     

Criteria for improving the properties of ZnGeAs2 solar cells

We explore the potential utility of the II‐IV‐V semiconductor ZnGeAs₂ as the absorber material in solar cells. As‐deposited ZnGeAs₂ films prepared by pulsed laser deposition are amorphous because of the limited substrate temperature that can be used without the rapid loss of volatile Zn and As. Thermal processing above 450 °C results in crystallization and improved electrical properties with hole mobilities as high as 58 cm²/V s. The annealed films were used to fabricate p‐type ZnGeAs₂: n‐type CdS cells on SnO₂‐buffered borosilicate glass substrates in the so‐called superstrate geometry. Light‐induced currents of up to ~2 mA/cm² and open‐circuit voltages of up to 470 mV were observed using backside illumination, indicating that these nascent devices hold potential for realizing high performance solar cells from earth‐abundant elements. The performance of the devices fabricated to‐date is degraded by conduction through shorts resulting from the presence of micron‐sized pinholes in the absorber layer. Copyright © 2012 John Wiley & Sons, Ltd.     

Na‐induced efficiency boost for Se‐deficient Cu(In,Ga)Se2 solar cells

Among different process routes for Cu(In,Ga)Se₂ (CIGS) solar cells, sufficient Se supply is commonly required to obtain high‐quality CIGS films. However, supplying extra Se increases the cost and the complexity. In this work, we demonstrate that extra Na incorporation can substantially increase efficiency of Se‐deficient CIGS solar cells, fabricated by sputtering from a quaternary CIGS target without extra Se supply, from 1.5% to 11.0%. The Se‐deficient CIGS device without extra NaF reveals a roll‐over I–V curve at room temperature as well as significantly reduced J_sc and fill factor at low temperatures. The electrical characteristics of Se‐deficient CIGS films are well explained and modeled by the low p‐type doping due to high density of compensating donors and the presence of deep defects possibly originating from the anti‐bonding levels of Se vacancies. The significant improvement after extra Na incorporation is attributable to the Na‐induced passivation of Se vacancies and the increased p‐type doping. Our result suggests that extra Na addition can effectively compensate the Se deficiency in CIGS films, which provides a valuable tuning knob for compositional tolerance of absorbers, especially for the Se‐deficient CIGS films. We believe that our findings can shine light on the development of novel CIGS processes, distinct from previous ones fabricated in Se‐rich atmosphere. Copyright © 2015 John Wiley & Sons, Ltd.     

Very thin film crystalline silicon solar cells on glass substratefabricated at low temperature

The performances of thin-film poly-Si solar cells with a thickness of less than 5 μm on a glass substrate have been investigated. The cell of glass/back reflector/n-i-p-type Si/ITO is well characterized by the structure of naturally surface texture and enhanced absorption with a back reflector (STAR), where the active i-type poly-Si laser was fabricated by plasma chemical vapor deposition (CVD) at low temperature. The cell with a thickness of 2.0 μm demonstrated an intrinsic efficiency of 10.7% (aperture 10.1%), the open-circuit voltage of 0.539 V and the short current density of 25.8 mA/cm² as independently confirmed by Japan Quality Assurance, which shows the no clear light-induced degradation. The optical and transport properties of poly Si cells are summarized     

Laser ablation of SiO2 for locally contacted Si solar cells with ultra‐short pulses

We apply ultra‐short pulse laser ablation to create local contact openings in thermally grown passivating SiO₂ layers. This technique can be used for locally contacting oxide passivated Si solar cells. We use an industrially feasible laser with a pulse duration of τ_pulse ∼ 10 ps. The specific contact resistance that we reach with evaporated aluminium on a 100 Ω/sq and P‐diffused emitter is in the range of 0·3–1 mΩ cm². Ultra‐short pulse laser ablation is sufficiently damage free to abandon wet chemical etching after ablation. We measure an emitter saturation current density of J_0e = (6·2 ± 1·6) × 10⁻¹³ A/cm² on the laser‐treated areas after a selective emitter diffusion with R_sheet ∼ 20 Ω/sq into the ablated area; a value that is as low as that of reference samples that have the SiO₂ layer removed by HF‐etching. Thus, laser ablation of dielectrics with pulse durations of about 10 ps is well suited to fabricate high‐efficiency Si solar cells. Copyright © 2007 John Wiley & Sons, Ltd.     

Simulation and fabrication of heterojunction silicon solar cells from numerical computer and hot‐wire CVD

In this paper, we will present a Pc1D numerical simulation for heterojunction (HJ) silicon solar cells, and discuss their possibilities and limitations. By means of modeling and numerical computer simulation, the influence of emitter‐layer/intrinsic‐layer/crystalline‐Si heterostructures with different thickness and crystallinity on the solar cell performance is investigated and compared with hot wire chemical vapor deposition (HWCVD) experimental results. A new technique for characterization of n‐type microcrystalline silicon (n‐µc‐Si)/intrinsic amorphous silicon (i‐a‐Si)/crystalline silicon (c‐Si) heterojunction solar cells from Pc1D is developed. Results of numerical modeling as well as experimental data obtained using HWCVD on µc‐Si (n)/a‐Si (i)/c‐Si (p) heterojunction are presented. This work improves the understanding of HJ solar cells to derive arguments for design optimization. Some simulated parameters of solar cells were obtained: the best results for J_sc = 39·4 mA/cm², V_oc = 0·64 V, FF = 83%, and η = 21% have been achieved. After optimizing the deposition parameters of the n‐layer and the H₂ pretreatment of solar cell, the single‐side HJ solar cells with J_sc = 34·6 mA/cm², V_oc = 0·615 V, FF = 71%, and an efficiency of 15·2% have been achieved. The double‐side HJ solar cell with J_sc = 34·8 mA/cm², V_oc = 0·645 V, FF = 73%, and an efficiency of 16·4% has been fabricated. Copyright © 2009 John Wiley & Sons, Ltd.     

Fabrication and Spatially Resolved Functionalization of 3D Microstructures via Multiphoton‐Induced Diels–Alder Chemistry

Three‐dimensional microstructures are fabricated utilizing direct laser writing combined with a non‐radical step polymerization based on multiphoton‐induced Diels–Alder chemistry of o‐quinodimethanes and maleimides. Woodpile photonic crystals with a total of five axial periods and a rod spacing of down to 500 nm are fabricated. The structures are characterized via scanning electron microscopy and focused ion beam milling. In addition, corresponding photonic stop bands are investigated via light microscopy as well as transmission and reflection spectroscopy. The Diels–Alder based network formation during direct laser writing is verified via infrared spectroscopy. Spatially resolved surface patterning of covalently bonded functional molecules on fabricated structures is demonstrated by employing the direct laser writing setup and a bromine containing maleimide. The successful surface modification is verified via time‐of‐flight secondary ion mass spectrometry.     

UV nanoimprint for the replication of etched ZnO:Al textures applied in thin‐film silicon solar cells

In this work, we present a technology for a high precision nanostructure replication process based on ultraviolet nanoimprint lithography for the application in the field of thin‐film photovoltaics. The potential of the technology is demonstrated by the fabrication of microcrystalline silicon thin‐film prototype solar cells. The high accuracy replication of random microstructures made from sputtered and etched ZnO:Al, used to scatter the incident light in thin solar cells, is shown by local topography investigations of the same 7.5 × 7.5 µm² area on the master and the replica. Different types of imprint resists and imprint moulds were investigated to find the optimal, high precision replication technology. Two types of thin‐film silicon solar cells, in p‐i‐n and n‐i‐p configuration, were fabricated to study the potential of the imprint technology for different applications. It is shown that solar cells deposited on an imprinted glass hold similar performances compared with reference solar cells fabricated with a standard process on textured ZnO:Al. Thus, it is demonstrated that the replication of light scattering structures by using an imprint process is an attractive method to decouple the scattering properties from the layer forming the electrical front contact. Because a simple and cheap high throughput process is used, this study additionally proves the relevance for the industrial mass production in the field of photovoltaics. Copyright © 2013 John Wiley & Sons, Ltd.     

光陷阱在晶硅太阳电池中的应用

为了提高太阳能电池的转换效率和降低成本，采用光陷阱是一种很有效的方法，如多孔硅可使入射光的反射率减小到5％左右。对实验室和国外几种实用性很强的光陷阱结构，如金字塔绒面、多孔硅、压花法、溶胶-凝胶等及其制作方法进行了综述。