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基体负偏压对类金刚石涂层结构和性能的影响 总被引:1,自引:0,他引:1
采用直流等离子体增强化学气相沉积技术(DC-PECVD),通过控制基体负偏压的变化在YG8硬质合金基体上制备一系列类金刚石涂层。选用扫描电子显微镜、原子力显微镜、拉曼光谱、X射线光电子能谱、粗糙度仪对涂层形貌和结构进行表征测试。同时,利用显微硬度计、划痕测试仪系统地分析涂层的显微硬度和界面结合性能。结果表明:随着负偏压增大,涂层表面形貌逐渐平整光滑、致密,颗粒尺寸减小及数量降低。拉曼光谱表明,涂层具有典型的类金刚石结构,涂层中sp3键含量呈先增大后减小趋势,最大值约67.9%出现在负偏压为1000V左右,负偏压过大导致sp3键含量降低。显微硬度随负偏压变化规律与sp3键基本相符,sp3键含量决定显微硬度值大小。负偏压过大对吸附离子产生反溅射作用导致涂层厚度减小。当负偏压为1100V时,涂层与基体间的界面结合性能最优。 相似文献
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在不同的射频负偏压作用下,利用微波电子回旋共振(ECR)等离子体源化学气相沉积技术在单晶硅表面进行制备类金刚石薄膜研究.利用傅立叶变换红外吸收光谱(FTIR)和原子力显微镜(ARM)对薄膜的结构成分和形貌进行了分析表征,同时对所制备的薄膜摩擦系数进行了测试.结果表明:所制备的薄膜具有典型的含H类金刚石结构特征,薄膜结构致密均匀、表面粗糙度小.随着负偏压的增大,红外光谱中2800 cm-1~3000 cm-1波段的C-H伸缩振动吸收峰的强度先升高后降低,在射频功率为50 W时达到最大,所对应的薄膜摩擦系数是先降低再升高,在射频功率为50 W时达到最小. 相似文献
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直流负偏压对类金刚石薄膜结构和性能的影响 总被引:3,自引:1,他引:2
利用直流-射频-等离子体增强化学气相沉积技术在单晶硅表面制备了类金刚石薄膜,采用原子力显微镜、Raman光谱、X射线光电子能谱、红外光谱、表面轮廓仪和纳米压痕仪考察了直流负偏压对类金刚石薄膜表面形貌、微观结构、沉积速率和硬度等性能的影响。结果表明:无直流负偏压条件下,薄膜呈现有机类聚合结构,具有较低的SP3含量和硬度;叠加上直流负偏压后,薄膜具有典型的类金刚石结构特征,SP3含量和硬度得到了显著的提高;但随着直流负偏压的升高,薄膜的沉积速率和H含量逐渐降低,而SP3含量和硬度在直流负偏压为200V时出现最大值,此后逐渐降低。 相似文献
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PECVD法制备类金刚石薄膜的结构和摩擦学性能研究 总被引:4,自引:0,他引:4
采用射频一直流等离子体增强化学气相沉积技术在单晶硅衬底上沉积了类金刚石薄膜。用激光拉曼光谱仪和原子力显微镜对薄膜的结构和表面形貌进行了表征,并用纳米压痕仪测定了薄膜的硬度。用UMT微摩擦磨损试验机考察了薄膜在不同的滑行速度下薄膜的摩擦学性能。结果表明:所沉积的薄膜具有典型类金刚石薄膜的结构特征,薄膜表面光滑致密,硬度较高;薄膜与氧化铝陶瓷球对磨显示出良好的摩擦学性能,随着滑行速度的增加,薄膜的摩擦系数单调降低,但磨损寿命先增加后降低。 相似文献
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CVD生长金刚石薄膜衬底负偏压增强成核效应 总被引:1,自引:0,他引:1
基于已经得到的实验结果的分析,本文较详细地讨论了低压化学气相沉积(CVD)金刚石薄膜过程中,衬底负偏压对金刚石成核的增强效应,明确阐述了负偏压增强成核的作用机理,并且讨论了这种效应作为提高金刚石在非金刚石衬底表面成核密度的一种方法所具有的优点以及存在的不足。 相似文献
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掺氮类金刚石薄膜的制备与性能研究 总被引:2,自引:0,他引:2
利用空心阴极放电在玻璃基底表面沉积掺氮类金刚石(DLc)薄膜.拉曼光谱(Raman)分析表明,所制备的碳膜具有典型的类金刚石结构.扫描电镜(SEM)和原子力显微镜(AFM)分析了薄膜表面形貌和粗糙度;利用摩擦磨损仪测量膜的摩擦磨损性能.结果表明,氮的掺入使得薄膜中颗粒致密平整,改变了薄膜的表面微观形貌,进而改善了薄膜的摩擦磨损性能. 相似文献
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《Vacuum》2012,86(2):171-177
MoSx-CrTiAlN film was deposited on Mg alloy substrates using unbalanced magnetron sputtering. First of all, the CrTiAlN layer was synthesized in a gas mixture of Ar + N2, and then the MoSx layer on CrTiAlN were deposited by a single MoSx target. The composition, structure and tribological property of MoSx-CrTiAlN film were characterized by X-ray photoelectron spectrometry, X-ray diffraction, transmission electron microscopy and ball-on-disc tester. The experimental results show that crystallography structure of CrTiAlN layer is FCC whilst the MoSx layer has a mixed microstructure with hexagonal and amorphous state. The coefficient of friction of MoSx-CrTiAlN film is a function of load and shows a steady decreasing with the increasing in applied load. 相似文献
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Nanocrystalline materials are of high interest, because mechanical and physical properties of such materials are different from those or coarse-grained type. Continuous and smooth nanocrystalline diamond (NCD) thin films were successfully grown on mirror polished silicon substrates, using double bias plasma-enhanced hot filament chemical vapour deposition technique. A gas mixture of Ar:CH4:H2 and CH4:H2 was used as the precursor gas. The effect of the gas composition, flow rate and substrate bias during deposition on diamond crystallite size was investigated. Changing the growth parameters facilitates control of grain size of polycrystalline diamond thin films from microcrystalline to nanocrystalline. The structure of fine-grained NCD films has been studied with scanning electron microscopy and Raman spectroscopy. 相似文献
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Pengfei Wang Takanori Takeno Julien Fontaine Masami Aono Koshi Adachi Hiroyuki Miki Toshiyuki Takagi 《Materials Chemistry and Physics》2014
Effects of substrate bias voltage and target sputtering power on the structural and tribological properties of carbon nitride (CNx) coatings are investigated. CNx coatings are fabricated by a hybrid coating process with the combination of radio frequency plasma enhanced chemical vapor deposition (RF PECVD) and DC magnetron sputtering at various substrate bias voltage and target sputtering power in the order of −400 V 200 W, −400 V 100 W, −800 V 200 W, and −800 V 100 W. The deposition rate, N/C atomic ratio, and hardness of CNx coatings as well as friction coefficient of CNx coating sliding against AISI 52100 pin in N2 gas stream decrease, while the residual stress of CNx coatings increases with the increase of substrate bias voltage and the decrease of target sputtering power. The highest hardness measured under single stiffness mode of 15.0 GPa and lowest residual stress of 3.7 GPa of CNx coatings are obtained at −400 V 200 W, whereas the lowest friction coefficient of 0.12 of CNx coatings is achieved at −800 V 100 W. Raman and XPS analysis suggest that sp3 carbon bonding decreases and sp2 carbon bonding increases with the variations in substrate bias voltage and target sputtering power. Optical images and Raman characterization of worn surfaces confirm that the friction behavior of CNx coatings is controlled by the directly sliding between CNx coating and steel pin. Therefore, the reduction of friction coefficient is attributed to the decrease of sp3 carbon bonding in the CNx coating. It is concluded that substrate bias voltage and target sputtering power are effective parameters for tailoring the structural and tribological properties of CNx coatings. 相似文献
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77K基底制备的银薄膜的微观结构和光学性质 总被引:2,自引:0,他引:2
应用蒸发镀膜方法,分别在室温和液氮温度(77K)玻璃基底上制备了银薄膜样品。对两种样品的微观结构和光学性质进行了对比研究,微观结构应用X射线衍射仪、扫描电子显微镜进行分析,光学性质应用椭圆偏振光谱仪进行研究,测量的光学参数与理论计算的结果基本吻合。比较液氮温度基底上制备的银薄膜与室温基底上制备的银薄膜表面后发现:前种薄膜的表面更均匀、颗粒更小;两种薄膜的光频介电函数实部ε1基本没有差别,前种薄膜的光频介电函数虚部ε2大;前种薄膜的光学吸收增强,吸收峰发生蓝移和宽化。实验结果表明颗粒膜的光学吸收峰的位置依赖于颗粒膜中金属的介电常数和粒子尺寸。 相似文献
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MoSx-CrTiAlN film was deposited on Mg alloy substrates using unbalanced magnetron sputtering. First of all, the CrTiAlN layer was synthesized in a gas mixture of Ar + N2, and then the MoSx layer on CrTiAlN were deposited by a single MoSx target. The composition, structure and tribological property of MoSx-CrTiAlN film were characterized by X-ray photoelectron spectrometry, X-ray diffraction, transmission electron microscopy and ball-on-disc tester. The experimental results show that crystallography structure of CrTiAlN layer is FCC whilst the MoSx layer has a mixed microstructure with hexagonal and amorphous state. The coefficient of friction of MoSx-CrTiAlN film is a function of load and shows a steady decreasing with the increasing in applied load. 相似文献
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《Zeolites》1995,15(8):679-683
The primary stages of zeolite Y and silicalite-1 film formation on both untreated and plastically deformed copper substrates are considered from the viewpoint of the film growth kinetics and morphology. Experimental results indicate a satisfactory agreement between the kinetic and profilometric data. 相似文献