GaAs太阳电池的质子辐照和退火效应(英文)

对 Al Ga As/Ga As太阳电池进行了质子辐照和热退火实验 .质子辐照的能量为 32 5 ke V,辐照的剂量为 5×10 1 0— 1× 10 1 3cm- 2 .实验结果表明 ,质子辐照造成了 Ga As太阳电池光伏性能的退化 ,其中短路电流的退化比其它参数的退化更为明显 .退火实验结果表明 ,2 0 0℃的低温退火可以使得辐照后的电池的光伏性能得以部分恢复 .此外 ,实验结果还指出 ,在 Ga As太阳电池表面加盖一层 0 .5 mm的硼硅玻璃盖片可以明显地减少质子辐照对 Ga As太阳电池性能的损伤     

GaAs/AlGaAs量子阱微结构的电学性质(英文)

A novel manifestation of super-lattice properties in GaAs/AlGaAs quantum well photodiode structure grown by MOCVD was observed. When a sample was illuminated, the C-V profiles at different temperature showed an oscillation of charge conccntration.It was explained in terms of quantum well behaving as "giant trap". The mechanism of transport at different temperature was discussed. We also gave a comparison of interface of hete-rojuncion GaAs/AlGaAs and the trap-like effect of quantum well. The deep level of "giant trap" of quantum well was measured by DLTS. Detailed balance between emission and capture of free carriers in quantum well was deduced.     

器件模拟对AlGaAs/GaAs RTD的特性分析(英文)

使用SILVACO公司的器件模拟软件ATLAS对AlGaAs/GaAs共振隧穿二极管(RTD)进行了器件模拟,得到了不同结构的RTD的I-V特性曲线。对量子阱宽度、掺杂浓度、势垒宽度和高度对RTD的I-V特性的影响进行了详细的分析。     

GaAs太阳电池辐照效应的研究现状

文章介绍了ＧａＡｓ太阳电池辐照效应的研究状况，和间述了研究中常用的方法及重要的结论。现有的研究结果表明，ＧａＡｓ太阳电池性能的退化与辐照粒子的能量、剂量及入射方式相关，不同种类的粒子引起的损损伤很不一样。通过退火处理辐照损伤后的太阳电池，其性能可得到部分恢复。     

GaAs和GaAs/AlGaAs多层量子阱中载流子的超快动力学(英文)

The ultrafast photoexcited carrier dynamics in bulk GaAs and GaAs/ AlGaAs multiple quantum well(MQW)structure has been studied using femtosecond laser pulse pump-probe techniques on the samples grown by MBE. A hot carrier cooling time of 1.5ps in MQW is measured at room temperature. Also, optical phonon emission at 33meV is observed in this sample. These results are found to be similar to that observed in bulk GaAs. A comparison of the hot carrier cooling rates for the two cases suggests that the infra-sub-band optical phonon scattering in MQW may play a dominant role in the cooling of highly excited hot carriers for the narrow wells. The experimental results agree well with that predicted by a simple infinite depth square-well model.     

GaAs/AlGaAs多量子阱红外探测器的γ辐照研究

本文报道了γ射线辐照对量子阱红外探测器性能的影响。γ射线的辐射剂量分别为１ｍｒａｄ、６ｍｒａｄ、１６ｍｒａｄ。测量了器件在不同γ辐照剂量下的光谱响应、暗电汉、黑体响应率。通过对实验结果的分析,暗电流和黑体响应率随γ辐照剂量增加而递减,表明探测器的性能随γ射线辐照剂量的增加而逐步衰减。     

AlGaAs/GaAs DH激光器的红外透射研究(摘要)

本文介绍了红外透射技术的装置和原理,报导了主要研究结果。实验表明,红外透射技术是研究AlGaAs/GaAs DH激光器的又一有效工具。我们获得的有关AlGaAs/GaAs DH激光器的外延层、条区结构和作用区发光情况的综合照片,是用普通的光学显微镜或扫描电子显微镜所不能得到的。     

AlGaAs/GaAs/AlGaAs渐变异质结光致发光仿真研究

分析了AlGaAs/GaAs/AlGaAs渐变异质结的光致发光特性。根据理论及仿真结果,确定了GaAs发光的最优能带结构为双异质结P-AlGaAs/P-GaAs/P-AlGaAs或者N-AlGaAs/N-GaAs/ N-AlGaAs,并且异质结两边能带渐变。基于所选结构,研究了能带渐变及层宽对发光效率的影响。研究结果表明,外体区吸收层的能带渐变,且外体区激发层的能带不变,发光区域的载流子最多,发光能量值最大。激励光源的波长不同,各层有不同的最优宽度,为器件的整体优化提供了依据。AlGaAs/GaAs/AlGaAs渐变异质结的光致发光研究为高效率器件如太阳电池、发光二极管等的实用化设计、研制提供了有价值的参考。     

AlGaAs/GaAs HBT的设计研究

利用BIPOLE计算机程序,评价了具有不同版图、不同掺杂分布和不同层厚的AlGaAs/GaAs HBT的频率性能,研究了HBT的最佳化设计,并比较了HBT和多晶硅发射极晶体管的大电流性能。研究表明,对发射极条宽S_E<3μm的HBT来说,在电流密度小于1×10~5A/cm~2时,并未发现电流集聚效应,由最高f_T确定的HBT电流处理容量要比多晶硅发射极晶体管的大两倍多。对基区掺杂为1×10~(19)cm~(-3)的典型工艺n-p-n型AlGaAs/GaAs HBT,已获得了一个最佳化的最高振荡频率f_(mos(?))的方程式:f_(mosc)=337(W_(Bop)/S_E)~(1/2)GHz,式中,W_(Bop)是最佳基区宽度,S_E是发射极条宽,二者都以微米为单位。     

GaAs太阳电池的质子辐照和退火效应

对AlGaAs/GaAs太阳电池进行了质子辐照和热退火实验.质子辐照的能量为325keV,辐照的剂量为5×1010-1×1013cm-2.实验结果表明,质子辐照造成了GaAs太阳电池光伏性能的退化,其中短路电流的退化比其它参数的退化更为明显.退火实验结果表明,200℃的低温退火可以使得辐照后的电池的光伏性能得以部分恢复.此外,实验结果还指出,在GaAs太阳电池表面加盖一层0.5mm的硼硅玻璃盖片可以明显地减少质子辐照对GaAs太阳电池性能的损伤.     

自对准AlGaAs/GaAs微波异质结双极晶体管(HBT)

本文提出了一种制作HBT采用的垂直台面结构自对准工艺.利用该工艺及对A1GaAs/GaAs具有高选择比的化学湿法腐蚀剂,已研制成微波HBT.发射区台面与基极电极间隙为0.1μm,最大直流电流增益为40,截止频率f_T为10GHz.     

1－MeV电子辐照对Al_xGa_（1－x）As／GaAs异质面太阳电池性能的影响

对ＡｌｘＧａｌ－ｘＡｓ／ＧａＡｓ异质面太阳电池经ｌ－ＭｅＶ电子辐照前后的性能变化进行实验研究和数值拟合分析．讨论了电池性能衰退的主要原因，并提出了如何提高ＡｌｘＧａ１－ｘＡｓ／ＧａＡｓ异质面太阳电池的抗电子辐照能力的方法．     

Beryllium Ion Implantation into GaAs and Pseudomorphic AIGaAs/lnGaAs/GaAs Heterostructure

Implantations of Be, Be + P, Be + F, Be + P +F, BeF and Mg + P into GaAs and AlGaAs/InGaAs/GaAs pseudomorphic heterostructure were evaluated by secondary ion mass spectrometry profilings and electrical resistivity measurements. Rapid thermal annealing causes a strong diffusion of Be when implanted alone. Co-implantation with P prevents both diffusion and degradation of the Gaussian-shape implant distribution and thus improves the semiconductor sheet resistivity. Annealing at 850°C for 10 s for a Be + P co-implant results in a 60% activation efficiency, and lower diffusion and resistivity when compared to single Be, Be + F, Be + F + P, BeF, and Mg + P implanted at the same dose.     

GaAs／AlGaAs多量子阱器件均匀性研究

从几个方面研究了ＧａＡｓ／ＡｌＧａＡｓ多量子阱红外探测器的均匀性,找到了影响其均匀性的几个因素,今后的工作奠定了基础。     

MOCVD制备GaAs/AlGaAs异质结和异质结双极晶体管(HBT)的研究

本文应用MOCVD技术制备出高质量的GaAs,AlGaAs外延材料以及GaAs/AlGaAs异质结和多量子阱结构.首次成功地用该技术生长了微波HBT全结构材料,并获得了较高性能的器件结果:300K时直流增益(β)为15～40,77K时为60,截止频率大于10GHz,最高振荡频率为5.5GHz.     

MBE growth and characterization of high purity GaAs/AIGaAs on the (110) surface of GaAs

An improved quality of (110) GaAs has been grown by molecular beam epitaxy using As₂ in lieu of As₄. The most pronounced effect of using As₂ is a higher doping efficiency of Si δ-doped GaAs layers, resulting in a mobility of the (110) layers, comparable to the reference (100) samples.

The high quality of the (110) GaAs was confirmed by low temperature photoluminescence. The spectrum of the GaAs layer shows a single dominant free exciton line with a linewidth of 1.0 meV.     

GaAs／AIGaAs量子阱红外探测器的发展

半导体超晶格量子阱红外探测器的研制近年来取得了引人注目的成果,其中 GaAs/AlGaAs 红外器件的发展最快。本文在简要综述其单元探测器的基础上,着重介绍这种材料用于红外探测器列阵和焦平面的新成果。     

Processing parameters for selective intermixing of GaAs/AIGaAs quantum wells

Some of the parameters which determine the amount of intermixing of GaAs/AIGaAs quantum wells (QWs) using SiO₂ capping and rapid thermal annealing (RTA) have been studied using photoluminescence (PL) techniques. The degree of intermixing of QWs was found to be larger for thicker SiO₂ capping layers and for shorter distances between the QWs and the oxide-wafer interface. A maximum PL energy difference of 90 meV was observed between the region covered by a 1.3 μm thick oxide layer and the non-oxide region in a wafer that was annealed at 1100° C for 15 s.     

Effect of growth temperature on performance of AIGaAs/lnGaAs/GaAs QW laser diodes

Growth and characterization results are presented for high-power laser diodes with AlGaAs cladding and waveguide layers and strained In_1-xGa_xAs quantum wells with 0.09 < x < 0.25 grown by metalorganic vapor phase epitaxy at different temperatures. Photoluminescence at 300 and 10K, Auger spectroscopy, and high-resolution x-ray measurements are discussed. Broad area laser diodes have been fabricated with different cavity length and threshold current densities, absorption coefficients, internal efficiencies, and degradation rates have been measured.