Preparation and magnetic properties of Bim + 1Fem − 3Ti3O3m + 3 thin films with magnetic order above room temperature

Thin films of Bi_m + 1Fe_m − 3Ti₃O_3m + 3 (BFTO) with m ≦ 9 have been successfully grown on (100) SrTiO₃ by chemical solution deposition. These films had the c axis normal to the film plane. The conversion electron Mössbauer spectoroscopy (CEMS) showed that the spectra of BFTO thin films exhibit an asymmetric quadrupole doublet for m = 8 at 300 K, indicative of being paramagnetic, while, for m = 9, clearly show six hyperfine lines indicating presence of magnetic order at 300 K. From the intensity ratio of asymmetric peaks, the polarization axis of BFTO films with m ≥ 8 was deduced to be likely along <101> of the perovskite-like unit. On the other hand, it was found from the spectral fitting that the BFTO thin film with m = 9 has the Néel temperature around 310 K and the spin axis making an angle of about 60° to the c-axis. These indicate that the BFTO (m = 9) thin film is a promising candidate for room-temperature multiferroics.     

Effect of lattice matching on microstructure and electrical conductivity of epitaxial ARuO3 (A = Sr, Ca and Ba) thin films prepared on (001) LaAlO3 substrates by laser ablation

(001) SrRuO₃ (SRO), (001) CaRuO₃ (CRO) and (205) BaRuO₃ (BRO) thin films were epitaxially grown on (001) LaAlO₃ substrates by laser ablation, and the effect of lattice matching on the microstructure and electrical conductivity was investigated. (001) SRO and (001) CRO thin films had a terrace with orthogonal step structure, whereas (205) BRO thin film had an orthogonal structure with tetragonal grains. Epitaxial thin films showed metallic conduction, and the (001) CRO thin films exhibited the highest electrical conductivity, i.e. 1.5 × 10⁵ S m^− 1, among the (001) SRO, (001) CRO and (205) BRO thin films. The smaller misfit between thin film and substrate could be associated with the higher electrical conductivity.     

Growth and magnetic properties of ultrathin Ni1 + xFe2 − xO4 films for spin filter junctions

We investigated the spin filter effect in tunnel junctions with a Ni_1 + xFe_2 − xO₄ ferrimagnetic tunnel barrier. For higher T_c above room temperature, Ni_1 + xFe_2 − xO₄ film should be thicker than 4.0 nm and grown above 400 °C. The spin filter junctions (SFJs) of Fe₃O₄(001)/Ni_1 + xFe_2 − xO₄(001)/Al₂O₃/Fe/Au grown on MgO(001) substrates exhibited an inverse magnetoresistance effect at room temperature, which is consistent with the band calculation of NiFe₂O₄.     

A comparative study of the properties of thermally evaporated CuIn2n + 1S3n + 2 (n = 0, 1, 2 and 3) thin films

CuInS₂, CuIn₃S₅, CuIn₅S₈ and CuIn₇S₁₁ compounds were synthesized by the horizontal Bridgman method using high-purity copper, indium and sulphur elements. Crushed powders of these ingots were used as raw materials for the vacuum thermal evaporation. So, CuIn_2n + 1S_3n + 2 (n = 0, 1, 2, and 3) thin films were deposited by single source vacuum thermal evaporation onto glass substrates heated at 150 °C. The structural, compositional, morphological, electrical and optical properties of the deposited films were studied using X-ray diffraction (XRD), energy dispersive X-ray, atomic force microscopy and optical measurement techniques. XRD results revealed that all the films are polycrystalline. However, CuInS₂ and CuIn₃S₅ films had a chalcopyrite structure with preferred orientation along 112 while CuIn₅S₈ and CuIn₇S₁₁ films exhibit a spinel structure with preferred orientation along 311. The absorption coefficients of the all CuIn_2n + 1S_3n + 2 films are in the range of 10⁻⁴ and 10⁻⁵ cm⁻¹. The direct optical band gaps of CuIn_2n + 1S_3n + 2 layers are found to be 1.56, 1.78, 1.75 and 1.30 eV for n = 0, 1, 2, and 3, respectively. CuIn₃S₅ and CuIn₅S₈ films are p type with electrical resistivities of 4 and 12 Ω cm whereas CuInS₂ and CuIn₇S₁₁ are highly compensated with resistivities of 1470 and 1176 Ω cm, respectively.     

Study of flash evaporated CuIn1 − xGaxTe2 (x = 0, 0.5 and 1) thin films

CuIn_1 − xGa_xTe₂ thin films with x = 0, 0.5 and 1, have been prepared by flash evaporation technique. These semiconducting layers present a chalcopyrite structure. The optical measurements have been carried out in the wavelength range 200-3000 nm. The linear dependence of the lattice parameters as a function of Ga content obeying Vegard's law was observed. The films have high absorption coefficients (4 · 10⁴ cm^− 1) and optical band gaps ranging from 1.06 eV for CuInTe₂ to 1.21 eV for CuGaTe₂. The fundamental transition energies of the CuIn_1 − xGa_xTe₂ thin films can be fitted by a parabolic equation namely E_g1(x) = 1.06 + 0.237x − 0.082x². The second transition energies of the CuInTe₂ and CuGaTe₂ films were estimated to be: E_g2 = 1.21 eV and E_g2 = 1.39 eV respectively. This variation of the energy gap with x has allowed the achievement of absorber layers with large gaps.     

Tl2Ba2CaCu2O8 thin films on 2 in. LaAlO3(0 0 1) substrates

High quality Tl₂Ba₂CaCu₂O₈ (Tl-2212) superconducting thin films are prepared on both sides of 2 in. LaAlO₃(0 0 1) substrates by off-axis magnetron sputtering and post-annealing process. XRD measurements show that these films possess pure Tl-2212 phase with C-axis perpendicular to the substrate surface. The thickness unhomogeneity of the whole film on the 2 in. wafer is less than 5%. The superconducting transition temperatures T_cs of the films are around 105 K. At zero applied magnetic field, the critical current densities J_cs of the films on both sides of the wafer were measured to be above 2 × 10⁶ A/cm² at 77 K. The microwave surface resistance R_s of film was as low as 350 μΩ at 10 GHz and 77 K. In order to test the suitability of Tl-2212 thin films for passive microwave devices, 3-pole bandpass filters have been fabricated from double-sided Tl-2212 films on LaAlO₃ substrates.     

Homoepitaxial MgxZn1 − xO (0 ≤ x ≤ 0.22) thin films grown by pulsed laser deposition

Homoepitaxial MgZnO thin films were grown from PLD targets with 1, 2, 4, and 10 wt.% MgO content on ZnO-buffered ZnO(001) substrates. The resulting Mg content of the films was determined from the blue-shift of the excitonic peak in low-temperature photoluminescence spectra. With increasing Mg content a considerable increase of film mosaicity was observed from HR-XRD (002) rocking curves. Triple-axis reciprocal space maps of symmetric (002) and asymmetric (104) reflections show the structural development in terms of tilt and perpendicular and parallel strain. For more than 1% Mg the films exhibit increasing tensile out-of-plane strain. Very high electron mobilities of 200 cm²/Vs at 300 K and 900 cm²/Vs at 65 K were measured in the homoepitaxial MgZnO/ZnO thin films with free electron concentrations around 10¹⁸ and 10¹⁷ cm^− 3, respectively. The homoepitaxial ZnO template film deposited from a melt-grown ZnO single crystal as PLD target shows two orders of magnitude lower carrier concentration due to high compensation.     

Microstructure tuning of epitaxial BaTiO3 − x thin films grown using laser molecular-beam epitaxy by varying the oxygen pressure

Microstructural properties are found to be variant in the BaTiO_3 − x films grown on SrTiO₃(001) substrate under various oxygen pressures from 2 × 10^− 2 Pa to 2 × 10^− 5 Pa by laser molecular-beam epitaxy. Transmission electron microscopic studies reveal that the predominant defects in the films change from threading dislocations into (111) planar defects (i.e. stacking faults and nanotwins) by lowering the oxygen pressure. High density of these defects was observed in the BaTiO_3 − x film prepared at the oxygen pressure of 2 × 10^− 5 Pa, which shows metallic behavior. The relationships between oxygen pressure, microstructure, and electrical properties are established on the basis of oxygen deficiency. The formation of nanotwins in highly oxygen-deficient BaTiO_3 − x epitaxial thin films results from accommodating excess oxygen vacancies induced by lowering oxygen pressure.     

Thickness dependence of microcrack formation in YBa2Cu3O6 + x thin films on NdGaO3 (001) substrates

Thickness dependence of parallel microcrack formation in YBa₂Cu₃O_6 + x thin films prepared by pulsed laser deposition from nano- (n) and microcrystalline (μ) targets on NdGaO₃ (001) is systematically investigated. Atomic force microscope and x-ray diffraction measurements show parallel microcracks normal to uniaxial twin boundaries. The amount of microcracks increases with film thickness. Superconducting properties of the films decrease very strongly with film thickness as a result of microcrack formation. The n-films have more rigid lattice and thus show more extensive cracking than μ-films. It is found that the μ-films have a thickness threshold (∼ 70 nm) where the first signs of cracking appear.     

High-frequency magneto-electrical properties of Zn1 − x − yAlxCoyO thin films

The Al doping effects on high-frequency magneto-electric properties of Zn_{1 − x − y}Al_xCo_yO (x = 0-10.65 at.%) thin films were systematically studied. In the current work, the Zn_{1 − x − y}Al_xCo_yO thin films were deposited by magnetron co-sputtering onto quartz substrates. The magneto-impedance spectra of the thin films were measured by an impedance analyzer. Among all the doped films studied, the thin film with 6.03 at.% Al-doping showed the highest ac conductivity and relaxation frequency. To characterize the relaxation mechanism underlying the magneto-electric properties, a Cole-Cole impedance model was applied to analyze the impedance spectra. The analyzed result showed that the magneto-impedance of the Zn_{1 − x − y}Al_xCo_yO is contributed by multiple processes of magnetization dynamics and dielectric relaxation. The results imply that Zn_{1 − x − y}Al_xCo_yO may be applicable for high-frequency magneto-electric devices.     

Ohmic contacts and n-type doping on TixCr2 − xO3 films and the temperature dependence of their transport properties

A procedure to dope n-type Cr_2 − xTi_xO₃ thin films is proposed. Besides doping the material, at the same time the method forms ohmic contacts on Ti_xCr_2 − xO₃ films. It consists on the deposition of 10 nm Ti and 50 nm Au, followed by thermal annealing at 1000 °C for 20 min in N₂ atmosphere. Ohmic contacts were formed on three samples with different composition: x = 0.17, 0.41 and 1.07 in a van der Pauw geometry for Hall effect measurements. These measurements are done between 35 K and 373 K. All samples showed n-type nature, with a charge carrier density (n) on the order of 10²⁰ cm^− 3, decreasing as x increased. As a function of temperature, n shows a minimum around 150 K, while the mobilities have an almost constant value of 11, 28 and 7 cm²V^− 1 s^− 1 for x = 0.17, 0.41 and 1.07, respectively.     

Excitons in organic-inorganic hybrid compounds (CnH2n + 1NH3)2PbBr4 (n = 4, 5, 7 and 12)

Thin films of microcrystalline (C_nH_2n + 1NH₃)₂PbBr₄ (n = 4, 5, 7 and 12) have been prepared by a modified spin-coating method, and the effect of the number of carbon atoms of the alkyl chain length (n) on optical properties has been investigated. Absorption spectra reveal that (C_nH_2n + 1NH₃)₂PbBr₄ films show stable excitons with a binding energy of a few hundred meV. The excitonic structure of (C_nH_2n + 1NH₃)₂PbBr₄ varies with the number of carbon atoms. The lowest-energy exciton splits into a few fine-structure levels at low temperature. (C_nH_2n + 1NH₃)₂PbBr₄ films (n = 5, 7 and 12) show not only singlet excitons but also triplet excitons at low temperature, while (C₄H₉NH₃)₂PbBr₄ films show only singlet excitons. The intersystem crossing from excited singlet state to triplet state plays an important role in the relaxation process of excitons.     

Characteristics of NixFe100−x films deposited on SiO2/Si(1 0 0) by DC magnetron co-sputtering

Ni_xFe_100−x films with a thickness of about 200 nm were deposited on SiO₂/Si(1 0 0) substrates at room temperature by DC magnetron co-sputtering using both Fe and Ni₈₀Fe₂₀ targets. Compositional, structural, electrical and magnetic properties of the films were investigated. Ni₇₆Fe₂₄, Ni₆₅Fe₃₅, Ni₆₀Fe₄₀, Ni₅₅Fe₄₅, Ni₄₉Fe₅₁ films are obtained by increasing the sputtering power of the Fe target. All the films have a fcc structure. Ni₇₆Fe₂₄, Ni₆₅Fe₃₅, Ni₆₀Fe₄₀ and Ni₅₅Fe₄₅ films grow with crystalline orientations of [1 1 1] and [2 2 0] in the direction of the film growth while the Ni₄₉Fe₅₁ film has the [1 1 1] texture structure in the direction of the film growth. The lattice constant of the film increases linearly with increasing Fe content. All of the films grow with thin columnar grains and have void networks in the grain boundaries. The grain size does not change markedly with the composition of the film. The resistivity of the film increases with increasing Fe content and is one order of magnitude larger than that of the bulk. For all the films the magnetic hysteresis loop shows a hard magnetization. The Ni₇₆Fe₂₄ film has the lowest saturation magnetization of 6.75×10⁻² T and the lowest saturation field of 8.36×10⁴ A/m while the Ni₄₉Fe₅₁ film has a largest saturation magnetization of 9.25×10⁻² T and the largest saturation field of 1.43×10⁵ A/m.     

Preparation and characterization of La-doped Ba(1 − x)SrxTiO3 powders and thin films

Ba_(1 − x)Sr_xTiO₃ powders with different Ba/Sr ratios (x = 0.10, 0.25, 0.40, 0.55, 0.70) and La-doped Ba_0.9Sr_0.1TiO₃·yLa powders (y = 0.002, 0.004, 0.006, 0.008, 0.010) have been prepared by sol-gel technology using dehydrated barium-acetate, strontium-carbonate, lanthanum-nitrate, and titanium-isopropoxide as raw materials. The experimental results show that the dielectric properties of Ba_(1 − x)Sr_xTiO₃ powders depend on the Ba/Sr ratios. When the Sr fraction is 0.10, the dielectric constant is relatively higher and the dielectric loss is relatively lower, which are more than 2000 and less than 2.0 × 10^− 2 at 1000 Hz, respectively, the most important is that this kind of powder has better frequency stability. La-doping can increase the dielectric constant distinctly, but the dielectric loss can also be increased. Their dielectric properties at 1.0 × 10³ Hz are better than those at 1.0 × 10⁵ Hz. At 1.0 × 10³ Hz the dielectric constant is much higher, while the dielectric loss is much lower. The dielectric constant of different La-doping contents is nearly 3.5 × 10⁴ and the dielectric loss is less than 0.20 when La fraction is 0.008. The La-doped BST sample also has better frequency stability, especially at high frequency. La-doped BST thin films are successfully deposited on mild steel substrates by using plasma spray system with suspension precursors of Ba_0.90Sr_0.10TiO₃·0.8La powders. The XRD patterns of Ba_0.90Sr_0.10TiO₃ and Ba_0.90Sr_0.10TiO₃·0.8La powders are almost the same. No new peaks appear after La-doping, but the peaks move slightly to a larger degree, which indicates that the element La has entered the lattice of the Ba_0.90Sr_0.10TiO₃ and has made the constant of the crystal cell reduce. The XRD pattern of the thin films is just like that of the Ba_0.90Sr_0.10TiO₃·0.8La powders except a peak corresponding to Fe substrate. The SEM results show that the thin films have a uniform and smooth surface. The morphology of cross-section shows a columnar grain structure indicating smooth surface and uniform thickness of the film. The thickness of the film is about 15 um. The thin films obtained are expected to be prospective material for applications in tunable microwave devices.     

One-step synthesis and double emission (Ca1 + x − yEuy)Ga2S4 + x phosphor for white LEDs

(Ca_{1 + x − y}Eu_y)Ga₂S_4 + x phosphors have been synthesized one step by solid state reaction. The photoluminescence excitation and emission spectra of phosphors have been studied; the influence of host composition and Eu²⁺ concentration on emission spectra has also been investigated. The emission spectrum consists of yellow emission at 550 nm and red emission at 650 nm. It also indicates that the excitation spectrum is a broadband and can be well matched with the emission of GaN chip. Combined these phosphors with 460 nm-emitting GaN chips, White LEDs have been fabricated. Their electroluminescence spectra have been measured under 20 mA forward-bias current. Their CIE chromaticity coordinates and color temperature indicate that (Ca_{1 + x − y}Eu_y)Ga₂S_4 + x phosphors are promising phosphors for GaN-based white LEDs.     

Leakage current characteristics of Bi3.15Nd0.85Ti3 − xZrxO12 thin films

Thin films of Bi_3.15Nd_0.85Ti₃O₁₂ (BNT) and Bi_3.15Nd_0.85Ti_3 − xZr_xO₁₂ (BNTZ_x, x = 0.1 and 0.2) were fabricated on Pt/TiO₂/SiO₂/Si(100) substrates by a chemical solution deposition (CSD) technique at 700 °C. Structures, surface morphologies, leakage current characteristics and Curie temperature of the films were studied as a function of Zr ion content by X-ray diffraction, atomic force microscopy, ferroelectric test system and thermal analysis, respectively. Experimental results indicate that Zr ion substitution in the BNT film markedly decreases the leakage current of the film, while almost not changing the Curie temperature of the film, which is at about 420-460 °C. The decrease of the leakage current in BNTZ_x films is that the conduction by the electron hopping between Ti⁴⁺ and Ti³⁺ ions is depressed because Zr⁴⁺ ions can block the path between two adjacent Ti ions and enlarge hopping distance.     

Silver loaded WO3 − x/TiO2 composite multifunctional thin films

Multifunctional WO_3 − x-TiO₂ composite thin films have been prepared by sol-gel synthesis and shown to be good visible light photocatalysts whilst retaining a desirable underlying blue colouration. The WO_3 − x-TiO₂ composite thin films were further enhanced using silver nanoparticles synthesised in-situ on the surface from the photo-degradation of silver nitrate solution. Thin films were characterised using X-ray diffraction, Raman, Scanning electron microscopy and UV-visible spectroscopy and shown to photo degrade stearic acid, using white light λ = 420-800 nm.     

Structure, dielectric, ferroelectric, and optical properties of (1 − x)Ba(Zr0.2Ti0.8)O3 − x(Ba0.7Ca0.3)TiO3 thin films prepared by sol-gel method

We report high dielectric tunabilities of (1 − x)Ba(Zr_0.2Ti_0.8)O₃ − x(Ba_0.7Ca_0.3)TiO₃ (BZT-xBCT) (x = 0.15, 0.30, 0.40, 0.45, 0.50, and 0.55) thin films prepared by a sol-gel method. The films show a pure perovskite structure with random orientation. They have moderate dielectric constant ranging from 350 to 500 and low dielectric loss near 3.0% at 1 kHz with 0 V bias at room temperature. The dielectric tunability of the BZT-0.55BCT thin films is up to 65% at 400 kV/cm and 100 kHz. The films exhibit a high optical transmission in the range of 420 nm-1500 nm. Their optical band gap energies are about 3.90 eV.     

Effect of TiOx seed layer on the texture and electric properties in La and Ca modified PbTiO3 thin films

Lanthanum-and calcium-modified PbTiO₃ (PLCT) ferroelectric thin films were successfully prepared on Pt(111)/Ti/SiO₂/Si substrates by pulsed laser deposition. Influence of TiO_x seed layer on texture and electric properties of PLCT films was investigated. It is found the PLCT films without seed layer exhibited highly (100)-textured, while using about 9 nm TiO_x as seed layer lead to highly (301)-textured. The PLCT film with TiO_x seed layer possess higher remnant polarization (Pr = 26 µC/cm²), better pyroelectric coefficient and figure of merit at room temperature (p = 370 µC/m²k, F_d = 190 × 10^− 5 Pa^− 1/2) than that of film without seed layer. The mechanism of the enhanced electric properties was also discussed.     

Optical and electrical properties of heat-resistant Sb-doped Sn1 − xHfxO2 transparent conducting films

To examine variations in the transparent conducting properties after annealing at high temperatures, 300-nm thick Sb-doped Sn_1 − xHf_xO₂ (x = 0.00-0.10) films were deposited onto silica glass substrates by the RF sputtering method and annealed in air up to 1000 °C at 200 °C increments. After annealing, all the Sb-doped SnO₂ films were transparent and electrically conductive, but large cracks, which decreased the electrical conductivity, were generated in several films due to crystallization or the thermal expansion difference between the film and substrate. Only the film deposited at room temperature in an Ar and O₂ mixed atmosphere did not crack after annealing, and its electrical conductivity exceeded 100 S cm^− 1 even after annealing at 1000 °C in air. Hf-doping blue shifted the fundamental absorption edges in the UV region in the Sb-doped Sn_1 − xHf_xO₂ films. Additionally, the optical transmission at 310 nm, T₃₁₀, increased as the Hf concentration increased, whereas the electrical conductivity was inversely proportional to the Hf concentration. On the other hand, thinner films (150-nm thick) with x = 0.00 showed both a high electrical conductivity over 100 S cm^− 1 and a high transparency T₃₁₀ = 65% after high temperature annealing.