共查询到18条相似文献,搜索用时 93 毫秒
1.
衬底温度对ZnO:N薄膜结构和光学性能的影响 总被引:1,自引:1,他引:0
利用超声喷雾热解方法,以不同的沉积温度(450~510℃)在石英衬底上制备出具备较高光学质量的氮掺氧化锌(ZnO:N)薄膜。通过X射线衍射(XRD)谱研究了薄膜的结构,用扫描电子显微镜(SEM)研究了薄膜的表面形貌,用紫外可见(UV)分光光度计、光致发光(PL)谱对薄膜的光学特性进行了测试分析。结果表明,所制备薄膜在可见波段具有较高透过率,并且沉积温度对ZnO:N薄膜的透过性能有很大影响。在衬底温度为500℃时得到的ZnO:N薄膜为六角纤锌矿结构,结晶质量最好、光透过率最高。PL谱的测试结果显示,在该条件制备的ZnO:N薄膜只在389.4nm处有一个较强的近带边紫外发光峰。 相似文献
2.
衬底退火温度对ZnO纳米结构形貌和发光特性的影响 总被引:1,自引:1,他引:0
利用热蒸发Zn粉的方法,在Au/掺铝氧化锌(AZO) /石英衬底上生长ZnO纳米结构。为了研究不同 温度退火后的衬底对生长的ZnO纳米结构的影响,Au/AZO/石英衬底在生长纳米结构前分别在 300、500和700℃真空下退火。Au/AZO/石英衬底的表面形貌用原子力显微镜(AFM)观测 。ZnO纳米结构的微结构、形貌和 光学性能分别用X射线衍射(XRD)、扫描电子显微镜(SEM)、透射电子显微镜(TEM)和荧光光 谱仪进行测量。结果表明,在未退火和300 ℃ 退火衬底上生长了大量的ZnO纳米棒,而在500℃退火衬底上沉积了大量ZnO纳米颗粒。单晶结构 的纳米棒的平均直径分别约50nm,其 生长机制为蒸气-液体-固体(VLS)生长机制。荧光光谱显示所有的样品 都存在紫外发光峰和深能级发射带,随着退火温度的升高,生长的纳米结构的紫外发光峰相 对强度增强,而深能级发射强度减弱。 相似文献
3.
衬底温度对ZnO薄膜氧缺陷的影响 总被引:3,自引:1,他引:2
采用射频磁控溅射在石英玻璃和单晶硅Si(100)衬底上制备了ZnO薄膜,研究了衬底温度对ZnO薄膜中氧缺陷的影响。实验发现,ZnO薄膜c轴取向性随温度的升高而增强;当衬底温度达到550。C时,XRD谱上仅出现一个强的(002)衍射峰和一个弱的(004)衍射峰,显示ZnO具有优异c轴取向性。同时,随着温度的升高,ZnO薄膜的紫外透射截止边带向高波长方向漂移,其电导率也随衬底温度的升高逐渐增大,表明薄膜中的氧缺陷逐渐增多。这种氧缺陷是由于ZnO的氧平衡分压高于Zn所致,可通过提高溅射气体中氧含量来改善。 相似文献
4.
5.
6.
7.
8.
9.
10.
11.
采用超声喷雾热解法,以石英玻璃为衬底,以乙酸 锌(Zn(CH3COO)2·2H2O)、硝酸镁(Mg(NO3)2·6H2O) 和醋酸钠(CH3COONa·3H2O)为前驱体溶液,在不同衬底温 度(480~560℃)下制备Na-Mg共掺杂ZnO薄膜。通过X-射线衍射(X RD)、扫描电子显微镜(SEM)、 光致发光(PL)谱和紫外-可见(UV-Vis)分光光度计等表征手段对样品的晶格结构 、表面形貌、PL性能 和透过率进行了研究。结果表明,衬底温度对薄膜结构和光学特性影响显著,当衬底温度为 500 ℃时制备的 Na-Mg共掺杂ZnO薄膜的c轴择优最明显,表面形貌更加致密,结 晶质量最好,PL性能最佳。 相似文献
12.
Effect of substrate temperature on the stability of transparent conducting cobalt doped ZnO thin films 总被引:7,自引:7,他引:0
Transparent conducting Co doped ZnO thin films have been fabricated by Ultrasonic spray. The thin films were deposited at three different substrate temperatures of 300, 350 and 400 ℃. The obtained films had a hexagonal wurtzite structure with a strong (002) preferred orientation. The maximum crystallite size value of the film deposited at 350 ℃ is 55.46 nm. Spectrophotometer (UV-vis) of a Co doped ZnO film deposited at 350 ℃ shows an average transmittance of about 90%. The band gap energy increased from 3.351 to 3.362 eV when the substrate temperature increased from 300 to 350 ℃. The electrical conductivity of the films deposited at 300, 350 and 400 ℃ were 7.424, 7.547 and 6.743 (Ω·cm)-1 respectively. The maximum activation energy value of the films at 350 ℃ was 1.28 eV, indicating that the films exhibit a n-type semiconducting nature. 相似文献
13.
超声雾化气相沉积法制备ZnO薄膜 总被引:1,自引:0,他引:1
采用超声雾化气相沉积工艺,以醋酸锌水溶液为前驱体溶液,在SiO2/Si衬底上成功的制备出ZnO薄膜。通过X-射线衍射(XRD)、扫描电镜(SEM)、原子力显微镜(AFM)对所得ZnO薄膜的晶体结构和微观形貌进行分析,发现随着衬底温度升高,ZnO薄膜c轴取向趋势增强,表面趋于光滑平整。研究表明,在前驱体溶液浓度为0.1 mol/L,衬底温度为320℃,载气流量为0.1 L/min,喷口到衬底的距离为60 cm、沉积30 min的实验条件下,生长出的ZnO薄膜为六方纤锌矿结构,且具有的高度c轴取向。 相似文献
14.
15.
16.
以醋酸锌水溶液为前驱体,分别以醋酸铵和硝酸铟为氮(N)源和铟(In)源,采用超声喷雾热解法在石英玻璃衬底上沉积了氮铟(NIn)共掺杂ZnO薄膜。采用X射线衍射、场发射扫描电镜、霍尔效应、塞贝克效应、光致发光谱等分析方法,研究了NIn共掺杂对所得ZnO薄膜的晶体结构、电学和光学性能的影响规律。结果表明:通过氮铟共掺杂,ZnO薄膜的电学和光学性能发生明显改变。优化工艺条件下,所得ZnO基薄膜结构均匀致密,电阻率为6.75×103Ω·cm,并且在室温光致发光谱中检测到很强的近带边紫外发光峰,表明薄膜具有较理想的化学计量比和较高的光学质量。 相似文献
17.
Ravindra Waykar Amit Pawbake Rupali Kulkarni Ashok Jadhavar Adinath Funde Vaishali Waman Rupesh Dewan Habib Pathan Sandesh Jadkar 《半导体学报》2016,37(4):043001-8
Transparent and conducting Al-doped ZnO(ZnO:Al) films were prepared on glass substrate using the RF sputtering method at different substrate temperatures from room temperature(RT) to 200 ℃. The structural,morphological, electrical and optical properties of these films were investigated using a variety of characterization techniques such as low angle XRD, Raman spectroscopy, X-ray photoelectron spectroscopy(XPS), field-emission scanning electron microscopy(FE-SEM), Hall measurement and UV–visible spectroscopy. The electrical properties showed that films deposited at RT have the lowest resistivity and it increases with an increase in the substrate temperature whereas carrier mobility and concentration decrease with an increase in substrate temperature. Low angle XRD and Raman spectroscopy analysis reavealed that films are highly crystalline with a hexagonal wurtzite structure and a preferred orientation along the c-axis. The FE-SEM analysis showed that the surface morphology of films is strongly dependent on the substrate temperature. The band gap decreases from 3.36 to 3.29 e V as the substrate temperature is increased from RT to 200 ℃. The fundamental absorption edge in the UV region shifts towards a longer wavelength with an increase in substrate temperature and be attributed to the Burstein-Moss shift. The synthesized films showed an average transmission(> 85%) in the visible region, which signifies that synthesized ZnO:Al films can be suitable for display devices and solar cells as transparent electrodes. 相似文献