基板预热温度对激光金属沉积成形零件微观组织的影响

基板预热可以显著降低激光金属沉积成形（laser metal deposition shaping, LMDS）过程的热应力,从而抑制成形过程裂缝的产生,但基板预热温度的高低对成形零件的微观组织有着重要的影响,因此研究不同基板预热温度下激光金属沉积成形零件的微观组织变化规律对基板预热温度的选择具有非常重要的意义.利用中国科学院沈阳自动化研究所自行研制的激光金属沉积成形系统和基板预热系统,采用Ni60A金属粉末在基板未预热和预热到200,300,400,500和600 ℃时分别进行成形试验.然后利用扫描电子显微镜和能量散射谱仪对成形试件的微观组织进行深入的研究,得到不同基板预热温度对激光金属沉积成形零件微观组织的影响规律,为基板预热温度的优化选择提供了重要参考.     

金属激光熔化沉积过程双时间步长法多尺度物理耦合场的数值模拟

使用激光金属熔化沉积成形方法制备金属零件时,如果能够提出一种方法来明确宏观工艺参数与成形件内部组织的关系,控制成形件内部组织演变,会提升成形件的力学性能。针对此类问题,本文通过数值模拟与工艺试验相结合的方法,使用双时间步长方法建立多尺度耦合多物理场模型,研究宏观工艺参数对微观组织演变的影响因素。并使用相同的工艺参数对数值模拟模型进行比对验证,得到了相对准确的结果,对激光金属熔化沉积成形过程的控形控性具有指导意义。     

板材激光弯曲成形数值模拟的研究现状及展望

板材的激光弯曲成形是一种利用高能激光束扫描金属板材表面产生非均匀分布的热应力,从而使板材发生塑性变形的金属板材柔性成形新工艺.数值模拟已逐渐成为板材激光弯曲成形研究中的热点内容.综述了近年来国内外对激光弯曲成形过程的温度场及变形场进行数值模拟的研究现状,并对其应用范围和发展前景作了展望.     

激光金属沉积成形过程热应力的数值模拟

根据有限元分析中的"单元生死"技术,利用APDL编程实现了对多道多层激光金属沉积成形过程热应力的三维数值模拟.模拟采用了Gauss热源模型,并引入了沿长边的平行往复扫描方式.计算结果表明,熔池区域以及试样与基板相邻区域是高热应力区,试样内部的热应力较小;试样沿厚度增加方向的热应力在沉积过程中幅值很大并且以拉伸应力为主,是导致试样产生裂缝的主要原因;沉积过程中沉积开始的位置对热应力的分布和强度影响很大,同一沉积层首道各节点热应力值几乎是末道各节点热应力值的一倍.在与模拟过程相同的条件下,实际成形试样裂缝的产生和发展规律与模拟结果相符.     

金属激光3D打印过程数值模拟应用及研究现状

数值模拟可以高效、有针对性地对金属激光选区熔化成型过程中的温度场、熔池形状、残余应力和变形、凝固过程微观组织演变等过程建立相应的模型并对成形件的相关性能做出准确预测,为工艺优化提供科学的依据,显著降低工艺开发成本和缩短工艺开发周期,有力推动金属增材制造向工业级应用的转变。本文综述了金属激光增材制造过程中温度场、熔池动力学、成形件内部残余应力和变形、显微组织变化4个方面数值模拟的最新研究进展,概述了金属SLM过程数值模拟所取得的最新进展,分析了金属SLM数值模拟领域的研究热点和所存在的计算时间长、成本高等问题,最后提出金属SLM过程数值模拟应将3D打印过程中快速凝固、微熔池等特征与大数据、人工智能、深度学习等技术相结合,进一步提高数值模拟精度,拓宽金属激光增材制造加工窗口,为个性化产品开发提供指导。     

基于分区扫描策略的激光金属沉积短梁件残余变形有限元模拟

目的 研究分区扫描策略对激光金属沉积TC4钛合金短梁件残余变形的影响,探寻较优的分区扫描策略,以改善成形短梁件残余变形.方法 通过建立激光金属沉积TC4钛合金三维顺序耦合有限元模型,来模拟不同分区尺寸和分区间跳转顺序下短梁件的成形过程,研究成形过程温度场的演变和不同分区扫描策略下成形件短梁件的总变形和z向变形.结果 不同分区扫描策略下成形短梁件和基板的变形趋势相同,均为面向热源的翘曲变形;与分6个子区域和8个子区域相比,每层分16个子区域扫描成形的短梁件残余变形最小,且较6分区减小了约12％;顺序扫描、对角扫描和向外扫描3种分区间跳转顺序下成形的短梁件残余变形相差不大.结论 随着分区尺寸的减小,激光金属沉积短梁件的残余变形逐渐减小,每层分16个子区域,从中间往两侧向外成形的分区扫描策略成形得到的短梁件残余变形最小.     

激光熔化沉积成形过程数值模拟研究现状

激光熔化沉积(Laser melting deposition,LMD)技术具有效率高、成本低、成形件性能优异等优点,成为零件修复和大尺寸构件制造的有效方法.然而,金属LMD成形是金属粉末、激光束和基体三者相互作用的一个多因素耦合过程,涉及流动熔池、快速非平衡凝固、固态相变以及复杂的温度和热应力演变.预测熔池流动情况、凝固规律以及温度应力的演变规律,对于成形试样的气孔、裂纹等缺陷控制,微观组织、力学性能和应力变形调控具有重要意义.数值模拟是一种经济、快捷的工具,对于LMD成形过程的粉末流动预测、熔池变化预测、组织预测、温度观测以及冷却后的残余应力和变形预测具有重要意义.近几年,LMD数值模拟研究已经涉及以上几个方面,但研究深度各不相同.针对温度场的研究,主要集中于建立不同的热源模型,探讨沉积过程的温度演变及工艺方案的影响规律.针对应力场的研究,以探索工艺方案的影响规律和应力消除方法为主.研究流场则以熔池流动和粉末流动为主.微观组织模拟考虑熔池流动对宏观温度场及熔池形状的影响,采用定向凝固的生长条件,可以确定枝晶一次间距等凝固信息.本文主要从温度场、应力场、流场、微观组织等几个方面总结了金属激光熔化沉积数值模拟的研究现状,并提出了其存在的问题和预发展的方向.     

激光熔化沉积成形缺陷及其控制方法综述

激光增材制造技术作为一种新型的快速成形技术,在快速精准成形的同时,还能够满足个性需求,这种成形方式完全颠覆了传统减材制造的成形理念,因而很快成为最能代表当今信息化时代的一种制造技术。常见的激光增材制造技术主要有以送粉为特征的激光熔化沉积技术(Laser melting deposition,LMD)和以粉末铺床为特征的选区激光熔化技术(Selective laser melting,SLM)。激光熔化沉积技术是采用同步送粉的方式通过大功率激光将同种或不同种的粉末熔化,然后逐行逐层地进行扫描堆积成形。利用这种方法所制备的零件不仅形状复杂,而且各项力学性能均优于铸件。相对于选区激光熔化技术,激光熔化沉积技术具有三大优势:(1)成形尺寸不受限制,可进行大尺寸的零件制造;(2)可以实现不同成分和比例的梯度材料成形;(3)可以进行零件修复与再制造。激光熔化沉积成形过程是一个涉及温度场、应力场等多物理场的耦合过程,由于材料急热、急冷的特点使得利用激光熔化沉积法制备的零件组织为非平衡态组织,过程复杂,不稳定性因素多,因此制件容易出现翘曲变形、熔合不良、尺寸精度不高、开裂等宏观缺陷,内部也容易产生气孔、夹杂、裂纹等微观缺陷,其中激光熔化沉积制备的零件中较大残余应力的存在使得裂纹对其性能的影响更为显著。当前,研究者们主要通过工艺实验及数值模拟研究了产生缺陷的原因,在一定程度上找出了产生气孔、熔合不良、裂纹等缺陷的主要影响因素,并针对这些因素进行逐步分析,在控制粉末特性,调节激光功率、扫描速度、送粉速度、搭接率等工艺参数,引入基板预热,热处理等缺陷控制方法方面取得了一定的进展。同时还利用外界先进检测、传感技术对缺陷进行了实时监测及闭环控制,为激光熔化沉积成形缺陷的控制提供了良好的辅助手段,大大提高了激光熔化沉积成形零件的性能。本文总结了近年来国内外有关激光熔化沉积成形缺陷及其控制方法的研究进展,按照缺陷的种类进行了分类归纳,分析了缺陷形成原因及影响因素,汇总了目前研究的缺陷控制方法,并探讨了当前存在的问题和未来发展前景。     

单曲率多面壳体高温胀形制造球形容器工艺

提出单曲率多面壳体高温胀形制造球形容器工艺的基本思想。对内切球面直径为μ420mm,壁厚为1．2mm的低碳钢单曲率多面壳体加热到胀形温度时的温度场进行了测量,对壳体的高温胀形成形过程进行了数值模拟。壳体加热结果表明,其温度场的最大温差值为80℃,数值模拟结果表明,在壳体壁的最高温度与最低温度相差达80℃时,单曲率多面壳体可以成形为球形容器。     

激光增材制造热-力耦合数值模拟研究现状及进展

激光增材制造技术加工过程中温度变化迅速而剧烈,导致成形件内部产生复杂的热应力和残余应力,这是成形件发生应力变形、翘曲、开裂等加工缺陷的根本原因。并且,剧烈的温度变化使得难以直接使用实验观察其温度场和应力场演变规律。因此,通过建立有限元模型进行数值模拟的方法来分析热-力耦合场的分布以及其对成形件质量的影响尤为必要。总结了金属激光增材制造技术温度场和应力场的数值模拟研究进展及现阶段存在的一些问题,进一步探讨了金属激光增材制造技术在数值模拟方面的未来发展方向。     

IN690合金管热挤压温升与挤压力的研究

温升和挤压力是影响钢管挤压过程的重要指标,利用热模拟实验获得了IN690合金的热加工本构关系,建立了IN690合金钢管热挤压过程的有限元模型.采用正交实验设计的仿真实验系统分析了坯料温度（T b=1000～1200℃）、挤压速度（v=20～200 mm/s）和模具预热温度（T d=300～500℃）对管材成形过程中温升...     

高温后CFRP筋及其粘结式锚固系统的力学性能

为明确高温后碳纤维增强树脂复合材料(Carbon fiber reinforced polymer,CFRP)筋材及其粘结型锚固系统的力学性能,以筋材的处理温度为试验参数,完成了12个筋材试件的轴向拉伸试验;以粘结式锚具的处理温度和粘结长度为试验参数,完成了36个试件的锚固性能试验。结果表明:对于筋材轴向拉伸试件,处理温度为100℃时,筋材静力性能与常温试件相比未发生明显变化,筋材经历200℃和300℃温升作用后,其抗拉强度、弹性模量和极限拉应变较常温试件分别下降了6.4%、8.2%、3.8%和16.6%、18.3%、8.3%;对于锚固性能试验,试件的粘结强度随处理温度和粘结长度的增加而降低,粘结长度一定时,处理温度为200℃与300℃试件的粘结强度较常温试件分别下降了31.5%~36.3%和44.2%~47.4%。建立了适于分析高温后CFRP筋轴向拉伸性能、粘结型锚固系统粘结强度及临界锚固长度的实用计算公式,且具较高精度。      

The influence of titanium nitride sputter deposition temperature on surface-hardened 2.5% silicon iron

Surface-hardened silicon iron (SiFe), with 2.5% Si, was sputter deposited with TiN by a reactive d.c. magnetron sputtering process. In this work we have studied the influence of the substrate temperature on the adhesion, hardness and the chemical composition of the TiN film and the substrate hardened structure during sputtering. Glow discharge optical spectrometry (GDOS) and electron microprobe analysis (EPMA), together with a scratch tester and a Vickers' hardness instrument, were used to study the chemical composition depth profiles, hardness and the critical load C_L at the TiN-substrate interface. The substrate surface hardness drops from 820 to 225 HV after TiN deposition as a result of decarburization of the SiFe surfaces. This drop in hardness level was found for all the substrate deposition temperatures, between 200 and 600 °C. The TiN surface hardness reached a maximum of 2700 HV at a substrate temperature of 300 °C and dropped to 1400 HV for a substrate temperature of 600 °C. At 200 °C substrate temperature the TiN surface hardness is 2100 HV which is considered to be a normal hardness for stoichiometric TiN film. GDOS chemical composition depth profiles show changes in the relative intensities at the interface when the substrate deposition temperature was at 400 and 550 °C for the elements carbon, nitrogen, titanium, silicon and iron. The O:Ti ratio increases from 200 to 300 °C and decreases between 300 and 500 °C. Above 500 °C, O:Ti starts to increase again. EPMA shows that the TiN surface hardness and critical load values reach a maximum when the interface C:Ti ratio is 0.1 at a deposition temperature of about 300 °C.     

Effects of temperature on the tribological behavior of Al0.25CoCrFeNi high-entropy alloy

The tribological behavior of Al_0.25CoCrFeNi high-entropy alloy (HEA) sliding against Si₃N₄ ball was investigated from room temperature to 600 ℃. The microstructure of the alloys was characterized by simple FCC phase with 260 HV. Below 300 ℃, with increasing temperature, the wear rate increased due to high temperature softening. The wear rate remained stabilized above 300 ℃ due to the anti-wear effect of the oxidation film on the contact interface. The dominant wear mechanism of HEA changed from abrasive wear at room temperature to delamination wear at 200 ℃, then delamination wear and oxidative wear at 300 ℃ and became oxidative above 300 ℃. Moreover, the adhesive wear existed concomitantly below 300 ℃.     

The effect of substrate temperature on the spray-deposited TiO2 nanostructured films for dye-sensitized solar cells

The nanostructured TiO2 films have deposited on SnO2:F (FTO) coated glass substrate by spray pyrolysis technique at different substrate temperatures of 200-500 degrees C. The structural, surface morphological and optical properties of TiO2 films significantly vary with the substrate temperature. The surface of the TiO2 films deposited at 400 degrees C shows the nanoflakes and short nanorods (approximately 130 nm) like structures while the TiO2 films prepared at 500 degrees C shows only the nanoflakes like structures. The band gap of the TiO2 films prepared at higher temperatures (300-500 degrees C) becomes narrow due to presence the rutile phases in their crystal structure. Ruthenium (II) complex as a dye, KI/I2 as an electrolyte and carbon on FTO glass as a counter electrode has used to fabricate the dye-sensitized solar cell (DSC). The TiO2 film deposited at 400 degrees C has showed the best photovoltaic performance in DSC with the efficiency of 3.81%, the photovoltage of 773 mV, the photocurrent of 8.34 mA/cm2, and the fill factor of 56.17%. The photovoltage of the DSC increases with the increase of substrate temperature during the deposition of TiO2 films. Moreover, all the DSCs exhibit reasonably high fill factor value.     

The influence of substrate temperature on the morphology of iron overgrowths on (111) gold single crystals

The influence of substrate temperature between 200 and 700 °C on the growth process of iron which was sublimed onto (111) gold platelets was investigated. Between 400 and 500 °C the morphology of the iron overgrowth changed dramatically from a random island growth mode to needle-like rods with well-defined crystallographic boundaries along the 〈110〉 directions on the subtrate. This change in morphology is attributed to a higher surface mobility as revealed by the decreasing angle φ of misorientation with temperature. Anomalous diffraction spots from iron samples prepared at substrate temperatures between 300 and 400 °C were observed.     

Si-B-N透波纤维的耐超高温性能

以聚硼硅氮烷（PBSZ）为先驱体,经熔融纺丝、不熔化以及在氨气气氛中高温裂解制备了Si-B-N 纤维,然后在高纯氮气保护下加热至超高温。利用元素分析、FTIR、XRD、SEM、力学性能分析和波导法等研究了纤维的耐超高温性能。结果表明:Si-B-N 纤维1 500 ℃退火几乎不失重,在惰性气体中非晶状态可以保持至1 700 ℃,加热到1 850 ℃才形成 Si₃N₄和BN等结晶相;Si-B-N 纤维的拉伸强度为1.72 GPa,弹性模量为196 GPa,1 500 ℃ 退火Si-B-N纤维的拉伸强度为1.86 GPa,弹性模量为205 GPa,Si-B-N纤维具有很好的耐超高温性能;此外,采用波导法测量,Si-B-N纤维表现出优良的介电性能,测试频率为 8~12 GHz,1 400 ℃退火的Si-B-N纤维平均介电常数和介电损耗角正切值分别为约3.68和0.001 1。      

Low Temperature Growth of Vertically Aligned Carbon Nanotubes via Floating Catalyst Chemical Vapor Deposition Method

Synthesis of carbon nanotubes (CNTs) below 600℃ using supporting catalyst chemical vapor deposition method was reported by many research groups.However,the floating catalyst chemical vapor deposition received less attention due to imperfect nanotubes produced.In this work,the effects of varying the preheating temperature on the synthesis of CNT were investigated.The reaction temperature was set at 570℃.The preheating set temperature was varied from 150 to 400℃ at 50℃ interval.Three O-ring shape heating mantels were used as heating source for the preheater.In situ monitoring device was used to observe the temperature profile in the reactor.Benzene and ferrocene were used as the carbon source and catalyst precursor,respectively.Vertically aligned CNTs were synthesized when the preheating temperature was set at 400℃.When the preheating temperature was increased up to 400℃,both the length and the alignment of CNTs produced were improved.     

Structural, Morphological and Optical Properties of ZnO Thin Films Grown on γ-LiAlO2 Substrate by Pulsed Laser Deposition

ZnO thin films were deposited on the substrates of (100) γ-LiAlO2 at 400, 550 and 700℃ using pulsed laser deposition (PLD) with the fixed oxygen pressure of 20 Pa, respectively. When the substrate temperature is 400℃, the grain size of the film is less than 1 μm observed by Leitz microscope and measured by X-ray diffraction (XRD). As the substrate temperature increases to 550℃, highly-preferred c-orientation and high-quality ZnO film can be attained.While the substrate temperature rises to 700℃, more defects appears on the surface of film and the ZnO films become polycrystalline again possibly because more Li of the substrate diffused into the ZnO film at high substrate temperature. The photoluminescence (PL) spectra of ZnO films at room temperature show the blue emission peaks centered at 430 nm. We suggest that the blue emission corresponds to the electron transition from the level of interstitial Zn to the valence band. Meanwhile, the films grown on γ-LiAlO2 (LAO) exhibit green emission centered at 540 nm, which seemed to be ascribed to excess zinc and/or oxygen vacancy in the ZnO films caused by diffusion of Li from the substrates into the films during the deposition.