Interfacial reaction and failure mode analysis of the solder joints for flip-chip LED on ENIG and Cu-OSP surface finishes

The interfacial reactions and failure modes of the solder joints for flip-chip light emitting diode (LED) on electroless nickel/immersion gold (ENIG) and Cu with organic solderability preservatives (Cu-OSP) surface finishes were investigated in this study. The experimental results demonstrate that the interfacial reactions in the Au/Sn–Ag–Cu(SAC)/ENIG and Au/SAC/Cu systems are different but the failure mechanisms of the two types of solder joints are similar during the shear test. For the Au/SAC/ENIG system, the Au layer on the surface finish of the diodes dissolved into the molten solder and transformed into a continuous (Au, Ni)Sn₄ IMC layer at the diode/solder interface during reflow and the interfacial IMC at the solder/ENIG interface is dendritic Ni₃Sn₄ IMC grains which are surrounded by (Au, Ni)Sn₄. For the Au/SAC/Cu system, however, no IMC layers can be observed at the diode/solder interface. The interfacial IMC at the solder/Cu interface is (Cu, Au)₆Sn₅ and a Cu₃Sn IMC layer at the (Cu, Au)₆Sn₅/Cu interface. Tiny (Au, Cu)Sn₄ IMC grains distribute in the solder layer and surround the (Cu, Au)₆Sn₅ grains. For the two types of systems, the primary failure mode for the cathode is due to the broken of the Si-based insulation layer which led to a high residue stress and poor connection between the Si-based layer and the solder layer. Meanwhile, the failure of the solder joint for the anode is mainly because of the failure of the solder layer under the conductive via. The crack generally forms at this area and then propagated along the diode or the diode/solder interface.     

Impact of Thermal Cycling on Sn-Ag-Cu Solder Joints and Board-Level Drop Reliability

The electronic packaging industry uses electroless nickel immersion gold (ENIG) or Cu-organic solderability preservative (Cu-OSP) as a bonding pad surface finish for solder joints. In portable electronic products, drop impact tests induce solder joint failures via the interfacial intermetallic, which is a serious reliability concern. The intermetallic compound (IMC) is subjected to thermal cycling, which negatively affects the drop impact reliability. In this work, the reliability of lead-free Sn-3.0Ag-0.5Cu (SAC) soldered fine-pitch ball grid array assemblies were investigated after being subjected to a combination of thermal cycling followed by board level drop tests. Drop impact tests conducted before and after thermal aging cycles (500, 1000, and 1500 thermal cycles) show a transition of failure modes and a significant reduction in drop durability for both SAC/ENIG and SAC/Cu-OSP soldered assemblies. Without thermal cycling aging, the boards with the Cu-OSP surface finish exhibit better drop impact reliability than those with ENIG. However, the reverse is true if thermal cycle (TC) aging is performed. For SAC/Cu-OSP soldered assemblies, a large number of Kirkendall voids were observed at the interface between the intermetallic and Cu pad after thermal cycling aging. The void formation resulted in weak bonding between the solder and Cu, leading to brittle interface fracture in the drop impact test, which resulted in significantly lower drop test lifetimes. For SAC/ENIG soldered assemblies, the consumption of Ni in the formation of NiCuSn intermetallics induced vertical voids in the Ni(P) layer.     

Mechanisms and solutions to the brittle solder joint in electroless Ni plating

Brittle solder joints in Electroless Ni electroless Pd immersion Au (ENEPIG) surface finishes are one of the key reliability issues in electronics assembly. Previous characterization of the reflow process has indicated that interfacial voids formed after solder reflow are responsible for the decreases in solder joint strength. However, the mechanisms behind the formation of these voids in the ENEPIG process remain unclear. In this paper, the interaction between various aspects of the ENEPIG process and solder joint strength were investigated. Surface roughness, morphology, and nano-pitting at the interface between electroless Pd and Ni-P were characterized. The size and density of nano voids inside Ni₂SnP were measured after the specimens were reflowed with Sn4Ag0·5Cu solder ball. Additionally, high speed shear solder joint strength measurements were made. The results indicated that anion adhesion induced nano-pitting at the interface between the Ni₂SnP intermetallic and Pd, resulting in the formation of a nano void layer during reflow. These interfacial voids lead to lower solder joint strength. Based on the results, a solution to prevent the brittle solder joint failures is suggested.     

Effect of solder resist dissolution on the joint reliability of ENIG surface and Sn–Ag–Cu solder

The electroless nickel immersion gold (ENIG) process results in surface defects, such as pinholes and black pads, which weaken the solder joint and eventually degrade the reliability of the PCB. Contamination of the plating solutions, including dissolution of the solder resist (SR), can be a cause of the pinholes and black pads. This study examined the effects of SR dissolution on the solder joint reliability and electroless Ni plating properties. Electroless Ni plating was performed by adding 1 to 10 ppm hardener (melamine) to the fresh Ni solution. Many black pads were observed in the 7 and 10 ppm hardener-added surfaces. In addition, the content of P was highest when 7 and 10 ppm hardener was added. The ball shear tests were carried out to confirm the joint reliability between the ENIG surface with hardener-added and the Sn-3.0Ag-0.5Cu solder (SAC 305). The ball shear strength decreased with increasing dissolution of the hardener. In particular, the shear strength was the lowest at 7 and 10 ppm hardener addition. In addition, the failure mode of the solder joint was changed from ductile to brittle mode with increasing hardener addition. That is, as the hardener additive increases, intermetallic compound (IMC) phases were changed from (Cu,Ni)₆Sn₅ to (Cu,Ni)₃Sn₄ and Cu₆Sn₅ (brittle structure).     

The effect of modifications to the nickel/gold surface finish on assembly quality and attachment reliability of a plastic ball grid array (peer review version)

Electrolytic and electroless Ni/Au are common pad surface finishes on area array (BGA or CSP) packages and printed wiring boards (PWB). The electroless nickel/immersion gold (ENIG) process often is implemented when there is insufficient space to allow bussing for the more common electrolytic Ni/Au plating. The ENIG process continues to be used despite evidence that it may cause catastrophic, brittle, interfacial solder joint fractures. In this investigation a plastic ball grid array (PBGA) test vehicle is used to compare quality and reliability of standard and experimentally modified ENIG surface finishes. The standard electrolytic Ni/Au surface finish is used as the control cell for the experiment. Ball shear tests and optical and scanning electron microscopy are performed on as-received and thermally preconditioned packages to evaluate package quality prior to assembly. Accelerated temperature cycling (0/+100/spl deg/C and -40/+125/spl deg/C) is used to evaluate solder joint attachment reliability. Detailed failure mode analysis is used to compare the fracture modes in the ball shear and thermal cycled samples in the electroless and electrolytic packages. The results are discussed in terms of the failure modes and the characteristics of the different Ni/Au surface finishes.     

Effects of Microstructure and Loading on Fracture of Sn-3.8Ag-0.7Cu Joints on Cu Substrates with ENIG Surface Finish

When dropped, electronic packages often undergo failure by propagation of an interfacial crack in solder joints under a combination of tensile and shear loading. Hence, it is crucial to understand and predict the fracture behavior of solder joints under mixed-mode high-rate loading conditions. In this work, the effects of the loading conditions (strain rate and loading angle) and microstructure [interfacial intermetallic compound (IMC) morphology and solder yield strength] on the mixed-mode fracture toughness of Sn-3.8 wt.%Ag-0.7 wt.%Cu solder joints sandwiched between two Cu substrates with electroless nickel immersion gold (ENIG) metallization have been studied, and compared with the fracture behavior of joints attached to bare Cu. Irrespective of the surface finish, the fracture toughness of the solder joints decreased monotonically with strain rate and mode-mixity, both resulting in increased fracture proportion through the interfacial IMC layer. Furthermore, the proportion of crack propagation through the interfacial IMC layer increased with increase in the thickness and the roughness of the interfacial IMC layer and the yield strength of the solder, resulting in a decrease in the fracture toughness of the joint. However, under most conditions, solder joints with ENIG finish showed higher resistance to fracture than joints attached directly to Cu substrates without ENIG metallization. Based on the experimental observations, a fracture mechanism map is constructed correlating the yield strength of the solder, the morphology and thickness of the interfacial IMC, and the fracture mechanisms as well as the fracture toughness values for different solder joints under mode I loading.     

Major factors to the solder joint strength of ENIG layer in FC BGA package

Since electroless nickel and immersion gold (ENIG) process was implemented as the surface finish of printed circuit board (PCB) substrate, there have been lots of reports on the brittle fracture between the Ni–P (phosphorous) layer and solder which results in the poor solder joint strength performance. Galvanic corrosion during immersion Au plating process and P-content in Ni–P layer were considered as major factors in the solder joint strength of ENIG layer in this investigation. The attempt to reduce the galvanic corrosion attack in Ni–P layer was made by changing immersion Au plating process to partial electroless Au plating process. Reducing the galvanic corrosion attack was proved to be effective to improve the solder joint strength of ENIG layer. Evaluation of the solder joint performances in variation with the thickness of the Ni layer leads to the conclusion that the thicker Ni layer has the better solder joint strength performances. The result also showed that higher P-content in Ni layer is more favorable to the solder joint strength.     

Intermetallics Characterization of Lead-Free Solder Joints under Isothermal Aging

Solder interconnect reliability is influenced by environmentally imposed loads, solder material properties, and the intermetallics formed within the solder and the metal surfaces to which the solder is bonded. Several lead-free metallurgies are being used for component terminal plating, board pad plating, and solder materials. These metallurgies react together and form intermetallic compounds (IMCs) that affect the metallurgical bond strength and the reliability of solder joint connections. This study evaluates the composition and extent of intermetallic growth in solder joints of ball grid array components for several printed circuit board pad finishes and solder materials. Intermetallic growth during solid state aging at 100°C and 125°C up to 1000 h for two solder alloys, Sn-3.5Ag and Sn-3.0Ag-0.5Cu, was investigated. For Sn-3.5Ag solder, the electroless nickel immersion gold (ENIG) pad finish was found to result in the lowest IMC thickness compared to immersion tin (ImSn), immersion silver (ImAg), and organic solderability preservative (OSP). Due to the brittle nature of the IMC, a lower IMC thickness is generally preferred for optimal solder joint reliability. A lower IMC thickness may make ENIG a desirable finish for long-life applications. Activation energies of IMC growth in solid-state aging were found to be 0.54 ± 0.1 eV for ENIG, 0.91 ± 0.12 eV for ImSn, and 1.03 ± 0.1 eV for ImAg. Cu₃Sn and Cu₆Sn₅ IMCs were found between the solder and the copper pad on boards with the ImSn and ImAg pad finishes. Ternary (Cu,Ni)₆Sn₅ intermetallics were found for the ENIG pad finish on the board side. On the component side, a ternary IMC layer composed of Ni-Cu-Sn was found. Along with intermetallics, microvoids were observed at the interface between the copper pad and solder, which presents some concern if devices are subject to shock and vibration loading.     

Effect of Stress State on Growth of Interfacial Intermetallic Compounds Between Sn-Ag-Cu Solder and Cu Substrates Coated with Electroless Ni Immersion Au

Excessive intermetallic compound (IMC) growth in solder joints will significantly decrease the reliability of the joints. IMC growth is known to be influenced by numerous factors during the component fabrication process and in service. It is reported that, other than temperature and holding time, stress can also influence the IMC growth behavior. However, no existing method can be used to study the effect of stress state on IMC growth in a controlled manner. This paper presents a novel method to study the effect of stress on interfacial IMC growth between Sn-Ag-Cu solder and a Cu substrate coated with electroless Ni immersion Au (ENIG). A C-ring was used and in-plane bending induced tensile and compressive stresses were applied by tightening the C-ring. Results revealed that in-plane compressive stress led to faster IMC growth as compared with in-plane tensile stress.     

Morphology and Growth of Intermetallics at the Interface of Sn-based Solders and Cu with Different Surface Finishes

Several types of surface finishes have been applied on Cu substrates in an effort to facilitate bonding and improve the reliability of lead-free solder joints. In the current research, the effects of printed circuit board surface finishes on the reliability of the solder joints were investigated by examining the morphology and growth behavior of the intermetallic compounds (IMCs) between Sn-based solders and different surface finishes on Cu. Three types of Cu substrates with different surface finishes were fabricated in this study: organic solderability preservative (OSP)/Cu, Ni/Cu, and electroless nickel immersion gold (ENIG)/Cu. Sn-3.5Ag and Sn-3.0Ag-0.5Cu were used as the solders. In the experiment, the solder joint specimens were aged isothermally at 150°C for up to 1000 h. Experimental results revealed that the OSP surface finish promoted the interdiffusion between Cu and Sn during soldering. The composition and morphology of the IMC layer at the solder/Ni/Cu interface were sensitive to the Cu concentration in the solder. Meanwhile, the solder joints with different morphological features of the IMCs exhibited significant differences in shear strengths. The Au-containing ENIG surface finish affected the shear strength of the solder joint significantly at the initial stage of isothermal aging.     

Effect of additions of ZrO2 nano-particles on the microstructure and shear strength of Sn-Ag-Cu solder on Au/Ni metallized Cu pads

Nano-sized, nonreacting, noncoarsening ZrO₂ particles reinforced Sn-3.0 wt%Ag-0.5 wt%Cu composite solders were prepared by mechanically dispersing ZrO₂ nano-particles into Sn-Ag-Cu solder. The interfacial morphology of unreinforced Sn-Ag-Cu solder and solder joints containing ZrO₂ nano-particles with Au/Ni metallized Cu pads on ball grid array (BGA) substrates and the distribution of reinforcing particles were characterized metallographically. At their interfaces, a Sn-Ni-Cu intermetallic compound (IMC) layer was found in both unreinforced Sn-Ag-Cu and Sn-Ag-Cu solder joints containing ZrO₂ nano-particles and the IMC layer thickness increased with the number of reflow cycles. In the solder ball region, AuSn₄, Ag₃Sn, Cu₆Sn₅ IMC particles and ZrO₂ nano-particles were found to be uniformly distributed in the β-Sn matrix of Sn-Ag-Cu solder joints containing ZrO₂ nano-particles, which resulted in an increase in the shear strength, due to a second phase dispersion strengthening mechanism. The fracture surface of unreinforced Sn-Ag-Cu solder joints exhibited a brittle fracture mode with a smooth surface while Sn-Ag-Cu solder joints containing ZrO₂ nano-particles ductile failure characteristics with rough dimpled surfaces.     

Influence of Cu content on compound formation near the chip side for the flip-chip Sn-3.0Ag-(0.5 or 1.5)Cu solder bump during aging

Sn-Ag-Cu solder is a promising candidate to replace conventional Sn-Pb solder. Interfacial reactions for the flip-chip Sn-3.0Ag-(0.5 or 1.5)Cu solder joints were investigated after aging at 150°C. The under bump metallization (UBM) for the Sn-3.0Ag-(0.5 or 1.5)Cu solders on the chip side was an Al/Ni(V)/Cu thin film, while the bond pad for the Sn-3.0Ag-0.5Cu solder on the plastic substrate side was Cu/electroless Ni/immersion Au. In the Sn-3.0Ag-0.5Cu joint, the Cu layer at the chip side dissolved completely into the solder, and the Ni(V) layer dissolved and reacted with the solder to form a (Cu_1−y,Ni_y)₆Sn₅ intermetallic compound (IMC). For the Sn-3.0Ag-1.5Cu joint, only a portion of the Cu layer dissolved, and the remaining Cu layer reacted with solder to form Cu₆Sn₅ IMC. The Ni in Ni(V) layer was incorporated into the Cu₆Sn₅ IMC through slow solid-state diffusion, with most of the Ni(V) layer preserved. At the plastic substrate side, three interfacial products, (Cu_1−y,Ni_y)₆Sn₅, (Ni_1−x,Cu_x)₃Sn₄, and a P-rich layer, were observed between the solder and the EN layer in both Sn-Ag-Cu joints. The interfacial reaction near the chip side could be related to the Cu concentration in the solder joint. In addition, evolution of the diffusion path near the chip side in Sn-Ag-Cu joints during aging is also discussed herein.     

Studies of electroless nickel under bump metallurgy—Solder interfacial reactions and their effects on flip chip solder joint reliability

The electroless-deposited Ni-P under bump metallurgy (UBM) layer was fabricated on Al pads for Sn containing solder bumps. The amount of P in the electroless Ni film was optimized by controlling complexing agents and the pH of plating solution. The interfacial reaction at the electroless Ni UBM/solder interface was investigated in this study. The intermetallic compound (IMC) formed at the interface during solder reflowing was mainly Ni₃Sn₄, and a P-rich Ni layer was also formed as a by-product of Ni-Sn reaction between the Ni-Sn IMC and the electroless Ni layer. One to four microns of Ni₃Sn₄ IMC and a 1800–5000 Å of P-rich Ni layer were formed in less than 10 min of solder reflowing depending on solder materials and reflow temperatures. It was found that the P-rich Ni layer contains Ni, P, and a small amount of Sn (～7 at.%). Further cross-sectional transmission electron microscopy (TEM) analysis confirmed that the composition of the P-rich Ni layer was 75 at.% Ni, 20at.%P, and 5at.%Sn by energy-dispersive x-ray spectroscopy (EDS) and the phase transformation occurred in the P-rich Ni layer by observing grain size. Kirkendall voids were also found in the Ni₃Sn₄ IMC, just above the P-rich Ni layer after extensive solder reflow. The Kirkendall voids are considered a primary cause of the brittle fracture; restriction of the growth of of the P-rich Ni layer by optimizing proper processing conditions is recommended. The growth kinetics of Ni-Sn IMC and P-rich Ni layer follows three steps: a rapid initial growth during the first 1 min of solder reflow, followed by a reduced growth step, and finally a diffusion-controlled growth. During the diffusion-controlled growth, there was a linear dependence between the layer thickness and time^1/2. Flip chip bump shear testing was performed to measure the effects of the IMC and the P-rich Ni layers on bump adhesion property. Most failures occurred in the solder and at the Ni₃Sn₄ IMC. The brittle characteristics of the Ni-Sn IMC and the Kirkendall voids at the electroless Ni UBM-Sn containing solder system cause brittle bump failure, which results in a decreased bump adhesion strength.     

A study on interfacial reactions between electroless Ni-P under bump metallization and 95.5Sn-4.0Ag-0.5Cu alloy

Even though electroless Ni-P and Sn-Ag-Cu solders are widely used materials in flip-chip bumping technologies, interfacial reactions of the ternary Cu-Ni-Sn system are not well understood. The growth of intermetallic compounds (IMCs) at the under bump metallization (UBM)/solder interface can affect solder-joint reliability, so analysis of IMC phases and understanding their growth kinetics are important. In this study, interfacial reactions between electroless Ni-P UBM and the 95.5Sn-4.0Ag-0.5Cu alloy were investigated, focusing on identification of IMC phases and IMC growth kinetics at various reflowing and aging temperatures and times. The stable ternary IMC initially formed at the interface after reflowing was the (Cu,Ni)₆Sn₅ phase. However, during aging, the (Cu,Ni)₆Sn₅ phase slowly changed into the quaternary IMC composed of Cu, Ni, Sn, and a small amount of Au. The Au atoms in the quaternary IMC originated from immersion Au plated on electroless Ni-P UBM. During further reflowing or aging, the (Ni,Cu)₃Sn₄ IMC started forming because of the limited Cu content in the solder. Morphology, composition, and crystal structure of each IMC were identified using transmission electron microscopy (TEM) and scanning electron microscopy (SEM). Small amounts of Cu in the solder affect the types of IMC phases and the amount of the IMC. The activation energies of (Cu,Ni)₆Sn₅ and (Ni,Cu)₃Sn₄ IMCs were used to estimate the growth kinetics of IMCs. The growth of IMCs formed in aging was very slow and temperature-dependent compared to IMCs formed in reflow because of the higher activation energies of IMCs in aging. Comparing activation energies of each IMC, growth mechanism of IMCs at electroless Ni-P/SnAgCu solder interface will be discussed.     

Interfacial reactions and mechanical strength of Sn-3.0Ag-0.5Cu/Ni/Cu and Au-20Sn/Ni/Cu solder joints for power electronics applications

The mechanical strength of Sn-3.0Ag-0.5Cu (SAC305) and Au-20Sn solder joints and their interfacial reaction with a Ni-plated ceramic substrate were evaluated to assess their suitability for use as die attach materials in power module applications. The compatibility between the two solder alloys and the Ni substrate was assessed during isothermal long-term aging, while the mechanical strength of the two solder joints was measured by die shear testing. A higher intermetallic compound (IMC) growth rate and Ni consumption rate was observed in the SAC305 solder joint, with the formation of a thick IMC layer and weak interface resulting in brittle fracture. The Au-20Sn solder joint, on the other hand was found to exhibit superior high temperature interfacial stability and joint strength.     

Drop impact reliability testing for lead-free and lead-based soldered IC packages

Board-level drop impact testing is a useful way to characterize the drop durability of the different soldered assemblies onto the printed circuit board (PCB). The characterization process is critical to the lead-free (Pb-free) solders that are replacing lead-based (Pb-based) solders. In this study, drop impact solder joint reliability for plastic ball grid array (PBGA), very-thin quad flat no-lead (VQFN) and plastic quad flat pack (PQFP) packages was investigated for Pb-based (62Sn–36Pb–2Ag) and Pb-free (Sn–4Ag–0.5Cu) soldered assemblies onto different PCB surface finishes of OSP (organic solderability preservative) and ENIG (electroless nickel immersion gold). The Pb-free solder joints on ENIG finish revealed weaker drop reliability performance than the OSP finish. The formation of the brittle intermetallic compound (IMC) Cu–Ni–Sn has led to detrimental interfacial fracture of the PBGA solder joints. For both Pb-based and Pb-free solders onto OSP coated copper pad, the formation of Cu₆Sn₅ IMC resulted in different failure sites and modes. The failures migrated to the PCB copper traces and resin layers instead. The VQFN package is the most resistant to drop impact failures due to its small size and weight. The compliant leads of the PQFP are more resistant to drop failures compared to the PBGA solder joints.     

Effect of Aluminum Concentration on the Interfacial Reactions of Sn-3.0Ag-<Emphasis Type="Italic">x</Emphasis>Al Solders with Copper and ENIG Metallizations

Aluminum was added into Sn-3.0Ag (wt.%) solder to investigate the effect of aluminum concentration on the interfacial reaction of Sn-3.0Ag-xAl solders with copper or electroless nickel immersion gold (ENIG) metallizations. Four different Sn-3.0Ag-xAl solders (x = 0 wt.%, 0.1 wt.%, 0.5 wt.%, and 1.0 wt.%) were used for comparison. It was found that the composition, morphology, and thickness of interfacial reaction products were strongly dependent on aluminum concentration. At low aluminum concentration (0.1 wt.%), the typical Cu₆Sn₅ layer was formed at the interface. When the aluminum concentration was 0.5 wt.%, a continuous CuAl₂ layer spalled off from the interfacial Cu-Sn intermetallic compound (IMC) layer. Only a planar CuAl₂ layer was observed at the interface when the aluminum concentration was increased to 1.0 wt.%. In Sn-Ag-Al/ENIG reactions, Ni₃Sn₄ was formed and spallation occurred near the interface in the Sn-3.0Ag and Sn-3.0Ag-0.1Al solder joints. When the aluminum concentration was higher than 0.1 wt.%, a thin planar AuAl compound formed at the interface. There was no P-rich phase formation that retarded the spalling phenomenon. The aluminum additive in Sn-Ag solder inhibited the growth of IMCs in the reaction with copper or ENIG metallizations, which was favorable for the reliability of solder joints.     

Interfacial reaction between the electroless nickel immersion gold substrate and Sn-based solders

The electroless nickel immersion gold (ENIG) surface finish is widely used in electronic packaging. The ENIG induced Au embrittlement has been investigated in SnPb/ENIG/Cu solder joint since several years ago. However, in Sn-based lead-free solder joint, discrepancies still exist about the influence of Au finish on the reliability of the solder joint. This study investigated the effects of ENIG surface finish on the interfacial reaction and thus the mechanical property of Sn-based solder joints. Experimentally, two types of ENIG with different thickness of Au layer were fabricated. The results indicated that the Au layer dissolved into the solder matrix readily in the soldering stage, and then affected the shear strength of the solder joint significantly. The Au migration occurred in the solder joint during isothermal aging. The Au migration is more apparent when the Cu₆Sn₅ type compound formed at the interface. The embrittlement caused by the weak interface between the (Au_1−xNi_x)Sn₄ and Ni₃Sn₄ layers cannot be observed in this study.     

Influence of current density on mechanical reliability of Sn-3.5Ag BGA solder joint

In this study, we investigated the effect of the current density on the interfacial reaction and mechanical reliability of an electroless Ni/immersion Au (ENIG) substrate with Sn-3.5Ag solder. We first evaluated the interfacial reactions of the solder joint under aging for up to 800 h and current stressing with current densities of 3 × 10² A/cm² and 5 × 10³ A/cm². Also, we successfully revealed the correlation between the interfacial reaction behavior and mechanical reliability under current stressing. With increasing aging time, the thickness of the Ni₃Sn₄ layer increased. At both low and high current densities, the thickness of the Ni₃Sn₄ layer increased up to 400 h and decreased thereafter at the cathode, while that of the IMC increased up to 800 h at the anode. After the die shear test, the ductile fracture was observed in the as-reflowed joint without current stressing. The fracture mode changed from ductile fracture to brittle fracture when thermal aging and current flow were simultaneously applied. The combination of the current stressing and isothermal aging at high temperature significantly deteriorated the mechanical reliability of the solder joint.     

Effects of Surface Finishes and Current Stressing on Interfacial Reaction Characteristics of Sn-3.0Ag-0.5Cu Solder Bumps

The effects of surface finishes on the in situ interfacial reaction characteristics of ball grid array (BGA) Sn-3.0Ag-0.5Cu lead-free solder bumps were investigated under annealing and electromigration (EM) test conditions of 130°C to 175°C with 5.0 × 10³ A/cm². During reflow and annealing, (Cu,Ni)₆Sn₅ intermetallic compound (IMC) formed at the interface of electroless nickel immersion gold (ENIG) finish. In the case of both immersion Sn and organic solderability preservative (OSP) finishes, Cu₆Sn₅ and Cu₃Sn IMCs formed. Overall, the IMC growth velocity of ENIG was much lower than that of the other finishes. The activation energies of total IMCs were found to be 0.52 eV for ENIG, 0.78 eV for immersion Sn, and 0.72 eV for OSP. The ENIG finish appeared to present an effective diffusion barrier between the Cu substrate and the solder, which leads to better EM reliability in comparison with Cu-based pad systems. The failure mechanisms were explored in detail via in situ EM tests.