Monolithic InGaP-GaAs HBT receiver front-end with 6 mW DC power consumption for 5 GHz band WLAN applications

A very low power consumption (6 mW) 5 GHz band receiver front-end using InGaP-GaAs HBT technology is reported. The receiver front-end is composed of a cascode low noise amplifier followed by a double-balanced mixer with the RF transconductor stage placed above the Gilbert quad for direct-coupled connection. The RF band of this receiver front-end is set to be 5.2 GHz, being downconverted to 1 GHz IF frequency. Input-return-loss (S/sub 11/) in RF port smaller than -12 dB and excellent power-conversion-gain of 35.4 dB are achieved. Input 1 dB compression point (P/sub 1dB/) and input third-order intercept point (IIP3) of -24 and -3 dBm, respectively, are also achieved.     

High microwave and noise performance of 0.17-/spl mu/m AlGaN-GaN HEMTs on high-resistivity silicon substrates

AlGaN-GaN high-electron mobility transistors (HEMTs) based on high-resistivity silicon substrate with a 0.17-/spl mu/m T-shape gate length are fabricated. The device exhibits a high drain current density of 550 mA/mm at V/sub GS/=1 V and V/sub DS/=10 V with an intrinsic transconductance (g/sub m/) of 215 mS/mm. A unity current gain cutoff frequency (f/sub t/) of 46 GHz and a maximum oscillation frequency (f/sub max/) of 92 GHz are measured at V/sub DS/=10 V and I/sub DS/=171 mA/mm. The radio-frequency microwave noise performance of the device is obtained at 10 GHz for different drain currents. At V/sub DS/=10 V and I/sub DS/=92 mA/mm, the device exhibits a minimum-noise figure (NF/sub min/) of 1.1 dB and an associated gain (G/sub ass/) of 12 dB. To our knowledge, these results are the best f/sub t/, f/sub max/ and microwave noise performance ever reported on GaN HEMT grown on Silicon substrate.     

DC, RF, and microwave noise performances of AlGaN/GaN HEMTs on sapphire substrates

High-performance AlGaN/GaN high electron-mobility transistors with 0.18-/spl mu/m gate length have been fabricated on a sapphire substrate. The devices exhibited an extrinsic transconductance of 212 mS/mm, a unity current gain cutoff frequency (f/sub T/) of 101 GHz, and a maximum oscillation frequency (f/sub MAX/) of 140 GHz. At V/sub ds/=4 V and I/sub ds/=39.4 mA/mm, the devices exhibited a minimum noise figure (NF/sub min/) of 0.48 dB and an associated gain (Ga) of 11.16 dB at 12 GHz. Also, at a fixed drain bias of 4 V with the drain current swept, the lowest NFmin of 0.48 dB at 12 GHz was obtained at I/sub ds/=40 mA/mm, and a peak G/sub a/ of 11.71 dB at 12 GHz was obtained at I/sub ds/=60 mA/mm. With the drain current held at 40 mA/mm and drain bias swept, the NF/sub min/,, increased almost linearly with the increase of drain bias. Meanwhile, the Ga values decreased linearly with the increase of drain bias. At a fixed bias condition (V/sub ds/=4 V and I/sub ds/=40 mA/mm), the NF/sub min/ values at 12 GHz increased from 0.32 dB at -55/spl deg/C to 2.78 dB at 200/spl deg/C. To our knowledge, these data represent the highest f/sub T/ and f/sub MAX/, and the best microwave noise performance of any GaN-based FETs on sapphire substrates ever reported.     

A photonic-link millimeter-wave mixer using cascaded optical modulators and harmonic carrier generation

Efficient frequency conversion into and out of the millimeter wave frequency band has been demonstrated using photonic link signal mixing with cascaded optical modulators. By adjusting the modulator bias point and RF drive power to the modulator introducing the local oscillator signal at f/sub LO/=8.8 GHz, frequency conversions from f/sub s/ to f/sub LO//spl plusmn/f/sub s/, sf/sub LO//spl plusmn/f/sub s/, and 4f/sub LO//spl plusmn/f/sub s/ with respective losses of 4.8, 6.3, and 7.5 dB have been demonstrated. The direct phase noise measurement of the optical RF signal at 2f/sub LO/=17.6 GHz with 1 kHz offset shows -89 dBc/Hz, limited by the RF drive source.     

2 V-operated InGaP-AlGaAs-InGaAs enhancement-mode pseudomorphic HEMT

A low-voltage single power supply enhancement-mode InGaP-AlGaAs-InGaAs pseudomorphic high-electron mobility transistor (PHEMT) is reported for the first time. The fabricated 0.5/spl times/160 /spl mu/m/sup 2/ device shows low knee voltage of 0.3 V, drain-source current (I/sub DS/) of 375 mA/mm and maximum transconductance of 550 mS/mm when drain-source voltage (V/sub DS/) was 2.5 V. High-frequency performance was also achieved; the cut-off frequency(F/sub t/) is 60 GHz and maximum oscillation frequency(F/sub max/) is 128 GHz. The noise figure of the 160-/spl mu/m gate width device at 17 GHz was measured to be 1.02 dB with 10.12 dB associated gain. The E-mode InGaP-AlGaAs-InGaAs PHEMT exhibits a high output power density of 453 mW/mm with a high linear gain of 30.5 dB at 2.4 GHz. The E-mode PHEMT can also achieve a high maximum power added efficiency (PAE) of 70%, when tuned for maximum PAE.     

An ultralow-loss and broadband micromachined RF inductor for RFIC input-matching applications

In this brief, we demonstrate that ultralow-loss and broadband inductors can be obtained by using the CMOS process compatible backside inductively coupled-plasma (ICP) deep-trench technology to selectively remove the silicon underneath the inductors. The results show that a 378.5% increase in maximum Q-factor (Q/sub max/) (from 10.7 at 4.7 GHz to 51.2 at 14.9 GHz), a 22.1% increase in self-resonant frequency (f/sub SR/) (from 16.5 to 20.15 GHz), a 16.3% increase (from 0.86 to 0.9999) in maximum available power gain (G/sub Amax/) at 5 GHz, and a 0.654-dB reduction (from 0.654 dB to 4.08/spl times/10/sup -4/ dB) in minimum noise figure (NF/sub min/) at 5 GHz were achieved for a 2-nH inductor after the backside ICP dry etching. In addition, state-of-the-art ultralow-loss G/sub Amax//spl les/0.99 (i.e., NF/sub min//spl les/0.045 dB) for frequencies lower than 12.5 GHz was achieved for this 2-nH inductor after the backside inductively coupled-plasma dry etching. This means this on-chip inductor-on-air can be used to realize an ultralow-noise 3.1-10.6 GHz ultrawide-band RFIC. These results show that the CMOS process compatible backside ICP etching technique is very promising for system-on-a-chip applications.     

Temperature and substrate-impedance dependence of noise figure of monolithic RF inductors on silicon

In this letter, we analyze the effects of temperature (from -50/spl deg/C to 200/spl deg/C) and substrate impedance on the noise figure (NF) and quality factor (Q-factor) performances of monolithic RF inductors on silicon. The results show a 0.75 dB (from 0.98 to 0.23 dB) reduction in minimum NF (NF/sub min/) at 8 GHz, an 86.1% (from 15.1 to 28.1) increase in maximum Q-factor (Q/sub max/), and a 4.8% (from 16.5 to 17.3 GHz) improvement in self-resonant frequency (f/sub SR/) were obtained if post-process of proton implantation had been done. This means the post-process of proton implantation is effective in improving the NF and Q-factor performances of inductors on silicon mainly due to the reduction of eddy current loss in the silicon substrate. In addition, it was found that NF increases with increasing temperature but show a reverse behavior within a higher frequency range. This phenomenon can be explained by the positive temperature coefficients of the series metal resistance (R/sub s/), the parallel substrate resistances (R/sub sub1/ and R/sub sub2/), and the resistance R/sub s1/ of the substrate transformer loop. The present analyzes are helpful for RF designers to design less temperature-sensitive high-performance fully on-chip low-noise-amplifiers (LNAs) and voltage-controlled-oscillators (VCOs) for single-chip receiver front-end applications.     

High gain-bandwidth differential distributed InP D-HBT driver amplifiers with large (11.3 V/sub pp/) output swing at 40 Gb/s

High-performance and compact 40-Gb/s driver amplifiers were realized in 1.2-/spl mu/m emitter double-heterojunction InGaAs-InP HBT (D-HBT) technology with a maximum cut-off frequency (f/sub T/) of 150 GHz and a maximum oscillation frequency (f/sub max/) of 200 GHz. Two-stage differential drivers feature a lumped input and fully distributed output stage and deliver a maximum differential output swing of 11.3 V peak-to-peak (V/sub pp/) at 40 Gb/s with less then 350 fs of added rms jitter and rise and fall times of about 7 ps while consuming a total power of 3 W. When biased at a lower output swing of 6.3 V/sub pp/, excellent 40-Gb/s eyes with a 7-ps fall time, 6-ps rise time, and no observable jitter deterioration compared with the input source are obtained at a reduced power consumption of 1.7 W. On-wafer measured differential S-parameters show a differential gain of 25 dB, 50 GHz bandwidth, and input and output reflection below -20 dB from 2 to 45 GHz. The amplifiers' small die size (1.0/spl times/1.7 mm), relatively low power consumption, large output swing, and ability to have dc coupled inputs and outputs enable compact 40-Gb/s optical transmitters with good eye opening for both conventional transmission formats such as nonreturn-to-zero and return-to-zero and alternative formats such as duobinary and differential phase shift keying.     

High-performance 94-GHz single balanced mixer using 70-nm MHEMTs and surface micromachined technology

We reported 94-GHz, low conversion loss, and high isolation single balanced active gate mixer based on 70-nm gate length InGaAs/InAlAs metamorphic high-electron mobility transistors (MHEMTs). This mixer showed that the conversion loss and isolation characteristics were 2.5/spl sim/3.5 dB and under -29 dB in the range of 92.95/spl sim/94.5 GHz, respectively. The low conversion loss of the mixer is mainly attributed to the high-performance of the MHEMTs exhibiting a maximum drain current density of 607 mA/mm, an extrinsic transconductance of 1015 mS/mm, a current gain cutoff frequency (f/sub t/) of 330 GHz, and a maximum oscillation frequency (f/sub max/) of 425 GHz. High isolation characteristics are due to hybrid ring coupler which adopted dielectric-supported air-gapped microstrip line structure using surface micromachined technology. To our knowledge, these results are the best performance demonstrated from 94 GHz single balanced mixer utilizing GaAs-based HEMTs in terms of conversion loss as well as isolation characteristics.     

基于混合集成的高增益光接收模块北大核心

针对光载无线通信(RoF)系统对高增益、小型化光接收模块(ROSA)的需求,基于混合集成技术,设计并制作了一种高增益的四通道ROSA器件,尺寸为20.0 mm×14.0 mm×5.9 mm。模块内集成了低噪声放大器(LNA)芯片以提高射频信号增益,建立了射频信号传输电路,并对器件特性进行了仿真分析。经测试,器件的射频信号增益达14 dB,-3 dB带宽为23 GHz,在1550 nm波长的入射光下,器件的响应度为0.81 A/W,相邻信道之间的射频信号串扰小于-40 dB。该模块对于减小RoF系统的体积和功耗具有重要意义。     

Very low noise RF nMOSFETs on plastic by substrate thinning and wafer transfer

A very low minimum noise figure (NF/sub min/) of 1.2 dB and a high associated gain of 12.8 dB at 10 GHz were measured for six-finger, 0.18-/spl mu/m radio frequency (RF) metal-oxide semiconductor field-effect transistors mounted on insulating plastic following substrate-thinning (/spl sim/30 /spl mu/m) and wafer transfer. Before this process, the devices had a slightly better RF performance of 1.1-dB NF/sub min/ and a 13.7-dB associated gain. The small RF performance degradation of the active transistors transferred to plastic shows the potential of integrating electronics onto plastic.     

Digital Coherent Receiver for Phase-Modulated Radio-Over-Fiber Optical Links

A novel digital signal processing-based coherent receiver for phase-modulated radio-over-fiber (RoF) optical links is presented and demonstrated experimentally. Error-free demodulation of 50-Mbaud binary phase-shift keying (BPSK) and quadrature phase-shift keying data signal modulated on a 5-GHz radio-frequency (RF) carrier is experimentally demonstrated using the proposed digital coherent receiver. Additionally, a wavelength- division-multiplexing (WDM) phase-modulated RoF optical link is experimentally demonstrated. A 3$, times ,$50 Mb/s WDM transmission of a BPSK modulated 5-GHz RF carrier is achieved over 25 km for the WDM channel spacing of 12.5 and 25 GHz, respectively.      

Low noise RF MOSFETs on flexible plastic substrates

We report a low minimum noise figure (NF/sub min/) of 1.1 dB and high associated gain (12 dB at 10 GHz) for 16 gate-finger 0.18-/spl mu/m RF MOSFETs, after thinning down the Si substrate to 30 /spl mu/m and mounting it on plastic. The device performance was improved by flexing the substrate to create stress, which produced a 25% enhancement of the saturation drain current and lowered NF/sub min/ to 0.92 dB at 10 GHz. These excellent results for mechanically strained RF MOSFETs on plastic compare well with 0.13-/spl mu/m node (L/sub g/=80 nm) devices.     

A 28-GHz SiGe up-conversion mixer using a series-connected triplet for higher dynamic range and improved IF port return loss

This work presents a fully integrated SiGe microwave up-conversion mixer, utilizing a new circuit topology consisting of a common-base, series-connected triplet at the IF port to achieve a significant improvement in dynamic range. This circuit functions with an IF signal of 1.25 GHz, and has an input 1-dB compression point (IP/sub 1dB/) of -6.8 dBm, for an RF output at 28 GHz. The circuit operates over a frequency range from 19 to 31 GHz, with a maximum conversion gain of 1 dB. The mixer can operate over an IF range from 1 to 10 GHz, while maintaining an IF port return loss greater than 10 dB.     

Metal-mask configurable RF front-end circuits

This paper describes metal-mask configurable RF circuits using a base circuit fabric that can be configured for various wireless applications using only upper metal and via layers. This front-end circuit fabric achieves a wide range of configurability (e.g., operating center frequency) and is essentially applicable for any IC technology. The prototype RF front-end circuit fabric was designed to be configurable for GPS at 1.5 GHz, W-CDMA at 2.1 GHz and WLAN at 5 GHz in a 0.25-/spl mu/m 47-GHz f/sub T/ SiGe BiCMOS process. The upper three metal and via layers are the only application-specific layers for the three applications. The front-end circuits draw 10.5, 9.5, and 8.5 mA from a 2.5-V supply, respectively, at 1.5, 2.1, and 5 GHz while providing a noise figure of 2.5, 2.8, and 4.5 dB, conversion gain of 24.6, 24.2, and 12 dB, and IIP3 of -8, -9, and -4 dBm, respectively.     

DC and RF characteristics of E-mode Ga/sub 0.51/In/sub 0.49/P-In/sub 0.15/Ga/sub 0.85/As pseudomorphic HEMTs

The DC and RF characteristics of Ga/sub 0.49/In/sub 0.51/P-In/sub 0.15/Ga/sub 0.85/As enhancement- mode pseudomorphic HEMTs (pHEMTs) are reported for the first time. The transistor has a gate length of 0.8 /spl mu/m and a gate width of 200 /spl mu/m. It is found that the device can be operated with gate voltage up to 1.6 V, which corresponds to a high drain-source current (I/sub DS/) of 340 mA/mm when the drain-source voltage (V/sub DS/) is 4.0 V. The measured maximum transconductance, current gain cut-off frequency, and maximum oscillation frequency are 255.2 mS/mm, 20.6 GHz, and 40 GHz, respectively. When this device is operated at 1.9 GHz under class-AB bias condition, a 14.7-dBm (148.6 mW/mm) saturated power with a power-added efficiency of 50% is achieved when the drain voltage is 3.5 V. The measured F/sub min/ is 0.74 dB under I/sub DS/=15 mA and V/sub DS/=2 V.     

Metal-insulator-metal RF bypass capacitor using niobium oxide (Nb/sub 2/O/sub 5/) with HfO/sub 2//Al/sub 2/O/sub 3/ barriers

A high capacitance density (C/sub density/) metal-insulator-metal (MIM) capacitor with niobium pentoxide (Nb/sub 2/O/sub 5/) whose k value is higher than 40, is developed for integrated RF bypass or decoupling capacitor application. Nb/sub 2/O/sub 5/ MIM with HfO/sub 2//Al/sub 2/O/sub 3/ barriers delivers a high C/sub density/ of >17 fF//spl mu/m/sup 2/ with excellent RF properties, while maintaining comparable leakage current and reliability properties with other high-k dielectrics. The capacitance from the dielectric is shown to be stable up to 20 GHz, and resonant frequency of 4.2 GHz and Q of 50 (at 1 GHz) is demonstrated when the capacitor is integrated using Cu-BEOL process.     

Implementation of perfect-magnetic-coupling ultralow-loss transformer in RFCMOS technology

In this letter, we propose a single-turn multiple-layer interlaced stacked transformer structure with nearly perfect magnetic-coupling factor (k/sub IM//spl sim/1) using standard mixed-signal/RF CMOS (or BiCMOS) technology. A single-turn six-layer interlaced stacked transformer was implemented to demonstrate the proposed structure. Temperature dependence (from -25/spl deg/C to 175/spl deg/C) of the quality-factor (Q-factor), k/sub Im/, resistive-coupling factor (k/sub Re/), maximum available power gain (G/sub Amax/), and minimum noise figure (NF/sub min/) performances of the transformer are reported. State-of-the-art G/sub Amax/ of 0.762 and 0.904 (i.e., NF/sub min/ of 1.181 dB and 0.437 dB) have been achieved at 5.2 and 8 GHz, respectively, at room temperature, mainly due to the perfect magnetic-coupling factor and the high resistive-coupling factor. The present analysis is helpful for RF engineers to design ultralow-voltage high-performance transformer-feedback low-noise amplifiers and voltage-controlled oscillators, and other radio frequency integrated circuits which include transformers.     

Precise Design of a Bandpass Filter Using High-Q Dielectric Ring Resonators

A precise design is presented for a bandpass filter constructed by placing TE/sub 01delta/ dielectric ring resonators coaxially in a TE/sub 01/ cutoff circular waveguide. On the basis of a rigorous analysis by the mode- matching technique, the interresonator coupling coefficients are determined accurately from the calculation of two resonant frequencies f/sub sh/ and f/sub op/ when the structurally symmetric plane is short- and open-circuited. For the TE/sub 01delta/ ring resonator,the resonant frequency f/sub 0/, the temperature coefficient tau/sub f/, the unloaded Q(Q/sub u/), and the other resonances are also calculated accurately in a similar way. From the calculations, the optimum dimensions are determined to obtain the maximum Q/sub u/, as F/sub r/ = f/sub r/ /f/sub 0/ is kept constant, where f/sub r/ is the next higher resonant frequency the ring resonator using low-loss ceramics (epsilon/sub r/ = 24.3, tan delta = 5 x 10/sup -5/) has Q/sub u/ = 16800 at 12 GHz and tau/sub f/ = 0.1+-0.5 ppm/° C, while the rod one has Q/sub u/ = 14700. A four-stage Chebyshev filter having ripple of 0.04 dB and equiripple bandwidth of 27.3 MHz at f/sub 0/ =11.958 GHz is fabricated using these resonator; the measured frequency responses agree well with theory. The insertion loss is 0.9 dB, which corresponds to Q/sub u/ = 9800.     

System-on-Packaging with Electroabsorption Modulator for a 60-GHz Band Radio-Over-Fiber Link

A system-on-packaging (SoP) with an electroabsorption modulator (EAM) for a 60 GHz band radio-over-fiber (RoF) link is described. The system consists of an EAM device, a microstrip filter, and a low noise amplifier (LNA). The microstrip filter was used to achieve impedance matching between the EAM device and the LNA and to reject the local oscillator (LO) frequency of the heterodyne system. The frequency response and the effect of the EAM bias voltage were measured for a simple RF/optical link. A 60 GHz band RoF link with 2.5 GHz intermediate frequency (IF) was prepared to measure the transmission characteristics of the 16 QAM data.