Lateral ordering of quantum dots and wires in the (In,Ga)As/GaAs(100) multilayer structures

The surface morphology and optical properties of the (In,Ga)As/GaAs(100) multilayer structures with self-organized quantum dots and quantum wires, which were grown by molecular-beam epitaxy, are investigated. It is found that the ordered arrangement of quantum dots in the heterointerface plane starts to form during the growth of the first periods of the multilayer structure. As the number of periods increases, quantum dots line up in series and form wires along the \([0\bar 11]\) direction. An increase in the lateral ordering of the structures under consideration correlates with an increase in the optical emission anisotropy governed by relaxation anisotropy of elastic strains and by the shape of nano-objects. A possible mechanism of lateral ordering of quantum dots and wires in multilayer structures, which includes both anisotropy effects of the strain fields and adatom diffusion, as well as the elastic interaction of neighboring quantum dots, is discussed.     

Molecular beam epitaxy of quantum wires and quantum dots on patterned high-index substrates

Using a novel growth mechanism on patterned high-index GaAs (311)A substrates we have developed a new concept to fabricate quantum wires and quantum dots as well as coupled quantum wire-dot arrays by molecular beam epitaxy. The combination of self-organized growth with lithographic patterning and the assistance of atomic hydrogen produces these quasi-planar lateral nanostructure arrays with unprecedented uniformity in size and composition and with controlled positioning on the wafer. The sought for one- and zero-dimensional nature of these quantum wire and quantum dot arrays manifests itself in the superior optical properties. To functionalize our lateral semiconductor quantum wire and quantum dot arrays with the properties of magnetic thin films, epitaxial Fe layers have been grown on GaAs (311)A. Defect free Fe layers are obtained on As-saturated GaAs surfaces. The large electrical conductivity of thin Fe layers indicates reduced Fe-GaAs interface compound formation. An unusual in-plane spontaneous Hall-effect is observed in these epitaxial Fe layers of reduced symmetry.     

Magnetotransport phenomena in single AlGaAs/GaAs quantum wires grown on laterally patterned substrates

Single, sub-micrometer wide quantum wires have been fabricated using molecular beam epitaxy on mesa-etched GaAs substrates, where the GaAs wire is embedded in AlGaAs. By using a Hall bar pattern, potential probes were directly attached to the wires while grown. To avoid problems associated with anisotropic etching and regrowth, the wire structures were oriented along the 100 crystallographic directions. From this fabrication technique, described in detail by Shitara et al., Appl. Phys. Lett. 66, 2385 (1995), one can expect the formation of high quality “self-aligned” quantum wires with a confinement potential determined by the conduction band discontinuity of AlGaAs and GaAs. Here we study the four-point magnetoresistance of 50 μm long single quantum wires with widths between 250 and 700 nm from 1.3 to 21 K. A distinct weak localization peak and universal conductance fluctuations dominate the low magnetic field regime and are used to estimate the phase-coherence length of the electrons. Pronounced 1/B periodic quantum oscillations at magnetic fields above 1 T are consistent with the picture of wires with a square-well shaped confining potential.     

InP/InAlAs/InGaAs quantum wires

Single InGaAs quantum wires and stacked InGaAs quantum wires with InAIAs barriers have been fabricated on V-grooved InP substrates by low pressure metal-organic chemical vapour deposition (MOCVD). We have found growth conditions where the InAIAs barrier exhibits a resharpening effect, similar to that of AlGaAs utilized for growth on GaAs substrates. The existence of structural and electronic quantum wires in the bottom of the grooves is proven.     

Fabrication of GaAs quantum wire structure using metal organic molecular beam epitaxy

GaAs quantum wires (100*20 nm/sup 2/) buried in AlAs layers have been successfully fabricated using metal organic molecular beam epitaxy (MOMBE) for the first time. The underlying growth mechanism is that, under appropriate As/sub 4/ pressure in MOMBE, GaAs preferentially grows only on the sidewalls of the patterned     

Comparative analysis of long-wavelength (1.3 µm) VCSELs on GaAs substrates

Two designs of vertical-cavity surface-emitting lasers (VCSELs) for the 1.3 μm spectral range on GaAs substrates with active regions based on InAs/InGaAs quantum dots and InGaAsN quantum wells are considered. The relationship between the active region properties and optical microcavity parameters required for lasing has been investigated. A comparative analysis is made of VCSELs with active regions based on InAs/InGaAs quantum dots or on InGaAsN quantum wells, which are fabricated by MBE and demonstrate room-temperature CW operation. Optimization of the vertical microcavity design provides single-pass internal optical losses lower than 0.05%. __________ Translated from Fizika i Tekhnika Poluprovodnikov, Vol. 35, No. 7, 2001, pp. 881–888. Original Russian Text Copyright ? 2001 by Maleev, Egorov, Zhukov, Kovsh, Vasil’ev, Ustinov, Ledentsov, Alferov.     

解理面预处理方法对二次外延的影响

利用超晶格解理面方法制备定位生长的InAs量子线.首先以分子束外延技术在OaAs衬底上生长GaAs/AlGaAs超晶格,然后将样品取出外延系统进行解理,对解理面进行预处理之后在(110)解理面上进行二次外延.实验结果显示超晶格解理面的预处理方法对二次外延有重大影响,其中择优腐蚀比自然氧化更有利于量子线的定位生长,过高温度的脱氧除气会导致解理面的GaAs部分出现坑状结构,表明(110)面上的Ga原子容易脱附.同时,Ga原子在(110)面上的迁移长度比较大,原子的择优扩散方向为[001]方向.     

AlGaAs/GaAs quantum wire lasers fabricated by flow rate modulationepitaxy

AlGaAs/GaAs quantum wire lasers, with three quantum wires (QWRs) of almost identical physical size, have been fabricated by flow rate modulation epitaxy. Room temperature lasing from the ground state electron and heavy-hole (le-lhh) transition of the QWRs has been observed for the first time. Typical threshold currents of 6 mA and extremely minor wavelength shifts in emission spectra have been obtained     

Photosensitive Ox/GaAs heterojunctions: Creation and properties

A method for the thermal oxidation of GaAs crystals in air is suggested and the first photosensitive Ox/n-GaAs heterojunctions, where Ox is a native oxide, are fabricated. The steady current-voltage characteristics and spectra of relative quantum efficiency of the new structures are studied. The features of the spectra of photoactive absorption of the obtained heterojunctions are discussed. The potential of using vacuumfree thermal oxidation of the GaAs crystals in air to fabricate broadband heterophotoconverters of optical radiation on their basis is established.     

GaAs quantum wire lasers grown on v-grooved substrates isolated byself-aligned ion implantation

Multiple vertically stacked GaAs/Al_xGa_1-xAs quantum wires laser diodes have been fabricated via MOVPE on v-grooved GaAs substrates. The devices are electrically isolated by oxygen ion implantation, utilizing the nonplanarity of the device. The process is self-aligning and requires no masking, yielding significant simplification in the device fabrication. Optimum implant conditions are determined. A quantum internal efficiency of 65.8% is measured for the optimum implanted devices, which exhibit a 5.5 mA threshold current     

解理面预处理方法对二次外延的影响

利用超晶格解理面方法制备定位生长的InAs量子线.首先以分子束外延技术在OaAs衬底上生长GaAs/AlGaAs超晶格,然后将样品取出外延系统进行解理,对解理面进行预处理之后在(110)解理面上进行二次外延.实验结果显示超晶格解理面的预处理方法对二次外延有重大影响,其中择优腐蚀比自然氧化更有利于量子线的定位生长,过高温度的脱氧除气会导致解理面的GaAs部分出现坑状结构,表明(110)面上的Ga原子容易脱附.同时,Ga原子在(110)面上的迁移长度比较大,原子的择优扩散方向为[001]方向.     

GaAs（331）A衬底上分子束外延生长自组织InAs纳米结构形貌演化机制

采用分子束外延方法在GaAs(331)A高指数衬底上制备自对齐InAs量子线(QWR)或者三维(3D)岛状结构。InAs量子线(QWR)选择性生长在GaAs层的台阶边缘。通过原子力显微镜(AFM)仔细研究了InAs纳米微结构的表面形貌,发现不同的生长条件如衬底温度、生长速率和InAs层厚度等,对InAs表面形貌有很大的影响。低温更容易导致线状纳米微结构的形成,而高温更利于3D岛状结构形成。表面形貌的转变归结于表面能同应变能之间的竞争。     

GaAs-based long-wavelength InAs bilayer quantum dots grown by molecular beam epitaxy

Molecular beam epitaxy growth of a bilayer stacked InAs/GaAs quantum dot structure on a pure GaAs matrix has been systemically investigated.The influence of growth temperature and the InAs deposition of both layers on the optical properties and morphologies of the bilayer quantum dot（BQD） structures is discussed.By optimizing the growth parameters,InAs BQD emission at 1.436μm at room temperature with a narrower FWHM of 27 meV was demonstrated.The density of QDs in the second layer is around 9×10⁹ to 1.4×10¹⁰ cm^-2. The BQD structure provides a useful way to extend the emission wavelength of GaAs-based material for quantum functional devices.     

Cover Picture: Photolithographic Route to the Fabrication of Micro/Nanowires of III–V Semiconductors (Adv. Funct. Mater. 1/2005)

The cover shows a patterned assembly of GaAs nanowires with their ends tethered to a bulk single‐crystal wafer as described on p. 30 by Rogers and co‐workers. These wires, which have triangular cross‐sections, were fabricated via a top–down process that combines photolithography and anisotropic chemical etching. Nano/microwires of semiconducting materials (e.g., GaAs and InP) with triangular cross‐sections can be fabricated by “top–down” approaches that combine lithography of high‐quality bulk wafers (using either traditional photolithography or phase‐shift optical lithography) with anisotropic chemical etching. This method gives good control over the lateral dimensions, lengths, and morphologies of free‐standing wires. The behaviors of many different resist layers and etching chemistries are presented. It is shown how wire arrays with highly ordered alignments can be transfer printed onto plastic substrates. This “top–down” approach provides a simple, effective, and versatile way of generating high‐quality single‐crystalline wires of various compound semiconductors. The resultant wires and wire arrays have potential applications in electronics, optics, optoelectronics, and sensing.     

GaInNAs/GaAs量子阱结构基态光跃迁的能量

从理论和实验两个方面对GaInNAs/GaAs量子阱结构基态的光跃迁能量进行研究.在理论计算过程中,分别采用电子有效质量近似法和双能级推斥模型计算了GaInNAs合金的电子空穴分立能级的能量及其带隙能,讨论了由应变引起的带隙变化量.将理论计算结果与光致发光的实验结果进行比较,两者符合得很好.并简单分析了N的加入对GaInNAs合金带隙能产生的影响.     

GaInNAs/GaAs量子阱结构基态光跃迁的能量

从理论和实验两个方面对GaInNAs/GaAs量子阱结构基态的光跃迁能量进行研究.在理论计算过程中,分别采用电子有效质量近似法和双能级推斥模型计算了GaInNAs合金的电子空穴分立能级的能量及其带隙能,讨论了由应变引起的带隙变化量.将理论计算结果与光致发光的实验结果进行比较,两者符合得很好.并简单分析了N的加入对GaInNAs合金带隙能产生的影响.     

多量子阱RCE光探测器的响应及调谐特性的实验研究

报道了在国内首次研制成功的 Ga As/ A1Ga As材料系的多量子阱结构的谐振腔增强型(RCE)光探测器。实验测得器件的响应具有明显的波长选择特性 ,其峰值响应波长位于 84 3nm附近 ,半峰值宽度 6 .96 nm,并初步观察到了器件的电调谐特性。经进一步优化改进 ,该器件有望成为窄线宽、可调谐的新型解复用型光探测器。     

Cascaded quantum wires and integrated designs for complex logic functions: nanoelectronic full adder

Complex logic functions based on cascading quantum wires (QWs) defined in a GaAs/AlGaAs-based two-dimensional electron gas by electron-beam lithography and wet chemical etching are demonstrated. The concept of connected QWs leads to a nanoelectronic full adder with independent carry- and sum-bit structures. Monolithic designs were fabricated and were found to also demonstrate simultaneous switching with common thresholds between high and low logic levels.     

MBE自组织方法生长InGaAs/AlGaAs量子线FET材料

利用分子束外延 (MBE)技术在高指数面 Ga As衬底上自组织生长了应变 In Ga As/Ga As量子线材料。原子力显微镜 (AFM)观测结果表明量子线的密度高达 4× 1 0 5/cm。低温偏振光致发光谱 (PPL)研究发现其发光峰半高宽 (FWHM)最小为 9.2 me V,最大偏振度可达 0 .2 2。以 Al Ga As为垫垒 ,In Ga As/Ga As量子线为沟道 ,成功制备了量子线场效应管 (QWR-FET)结构材料 ,并试制了器件 ,获得了较好的器件结果     

Bandgap engineering and quantum wells in optoelectronic devices

Integrated optoelectronic devices are becoming more important as the demand for low-cost devices for sophisticated applications increases. The paper reviews the techniques of bandgap engineering which can be used to control the characteristics of integrated optoelectronic devices fabricated with III-V semiconductors. In particular, the use of quantum wells as active and passive elements in devices such as waveguides, modulators, lasers and photodiodes is addressed. The flexibility of the performance obtained through the use of quantum wells is emphasised. Linear and nonlinear optical properties as well as the quantum confined Stark effect are discussed. The potential applications and fabrication techniques of lower dimensional semiconductor structures, such as quantum wires, are also described