石英陶瓷复合材料防潮体系涂料制备与性能测试

石英纤维增强石英陶瓷复合材料凭借其优异的性能成为高速导弹天线罩、天线窗的首选材料,但由于气孔的存在,导致材料吸水,影响部分使用性能.本文通过在复合材料表面制备涂层,对其进行封孔与防潮处理,详细研究了涂层的附着力、硬度、介电性能以及吸水率等性能.实验结果表明,涂层的附着力良好,硬度适中,基材吸水率明显下降,常温以及高温对...     

无机复合涂层对多孔氮化硅性能影响的研究

利用溶胶-凝胶法制备在多孔氮化硅的表面制备了无机复相陶瓷涂层,利用扫描电镜、红外光谱等手段研究了涂层的形貌和结构,并采用三点弯曲法研究了材料的力学性能,讨论了涂层前后基体的性能变化,结果表明:涂层对基体的抗弯有明显的提高,最大提高20%;用涂层封孔后后,材料的气孔率和吸水率明显下降,对多孔氮化硅介电性能影响很小。     

多孔石英基体上CVD法沉积氮化硅涂层的工艺、结构与性能研究

以甲硅烷(20％甲硅烷+80％氢气)和氨气作为反应前驱体,选择孔隙率为20％左右的多孔石英陶瓷基体,采用CVD法在多孔石英基体表面制备了氮化硅涂层.研究了沉积反应温度、反应压力、反应气体配比以及沉积时间等工艺参数对附着力的影响,确定了CVD法制备氮化硅涂层的最佳工艺参数,通过对所得涂层及复合材料进行抗弯强度和介电性能的表征,探讨了氮化硅涂层对多孔石英基体力学性能和介电性能的影响.     

改性硅溶胶封孔剂对多孔Al2O3陶瓷绝缘性能和微观结构的影响

采用甲基三甲氧基硅烷和二甲基二甲氧基硅烷对硅溶胶进行改性制得有机硅改性硅溶胶封孔剂,并通过浸渍和加热固化的方法对多孔Al₂O₃陶瓷片进行封孔处理。研究了固化温度和固化时间对封孔Al₂O₃陶瓷片绝缘性能的影响,并对多孔Al₂O₃陶瓷片封孔前后的微观结构进行了表征。结果表明,较佳封孔条件为固化温度120℃、固化时间60 min,此时封孔Al₂O₃陶瓷片的直流和交流击穿电压分别达到最大值10.76 kV和6.01 kV,1 000 V绝缘电阻不低于9 999 MΩ。封孔Al₂O₃陶瓷片表面为改性硅溶胶涂层,呈致密无孔隙状态且与基体结合紧密,涂层厚度约为25μm,表面水接触角提高到86.93°,封孔层深度约为10μm。     

炭／炭硬化保温材料的表面涂层及抗氧化性能研究

研究了炭／炭硬化保温材料的两种表面涂层方法。对封孔后的低密度材料进行SEM分析,对硅粉涂层与炭界面进行EDS和XRD分析,然后,（360±10）℃气中进行氧化烧蚀试验。结果表明：封孔石墨颗粒大小对低密度炭／炭保温材料的封孔效果有很大的关系,TC-200涂层效果致密效果好;硅粉涂层与炭本体界面在1600℃后形成碳化硅致密层,对低密度材料起到很好的防护作用。     

α/β相变对多孔氮化硅陶瓷介电性能的影响

采用反应烧结工艺,通过添加硬脂酸,制备孔径为0.8mm,孔隙率在55%左右的具有宏观球形孔的低密度多孔氯化硅陶瓷,研究了α/β相变对多孔氮化硅陶瓷介电性能的影响.通过调节氮化温度和时间,可得到具有不同β相相对含量(质量分数,下同)的多晶氮化硅陶瓷.结果表明:氮化温度高于1 400℃时发生α/β相变,随着氮化温度的提高和...     

氮化硅基复合材料

同其它陶瓷一样,氮化硅材料的破坏往往是灾难性的,因而降低了它的可靠性,使其应用受到了限制。若提高这些材料的强度及断裂韧性,就能大大扩大其使用范围。通过加入纤维、颗粒及晶源,有可能使单相陶瓷的性能得到提高,对这一问题,特别是对氮化硅材料的     

船舶热力管道的腐蚀与防护

对船舶热力管道的腐蚀原因及规律进行了分析,在对喷涂材料、蚀洗封孔涂料等方面进行研究的基础上,得出了“热喷涂稀土铝层 无机富锌蚀洗封孔涂层 耐高温面涂层”的复合涂层保护方案。     

金属涂层封闭剂

金属热喷涂防腐涂层（包括金属粉末喷涂，金属线材料涂）的涂层结构都为多孔结构，为提高涂层的耐腐蚀性能，必须进行封孔，以杜绝腐蚀介质通过涂层孔隙对基体的浸蚀，本文介绍了以酚醛树脂米要成分的金属涂层封闭剂，是一种高效的封孔涂料，可用于各种金属涂层的防腐工艺中，具有强渗透力，高封孔率和广泛的耐腐蚀性能。     

火焰喷涂型表面多孔管的性能研究

对比了火焰喷涂型表面多孔管和烧结型表面多孔管的制造方法,分析了这两种表面多孔管多孔涂层的表面形貌和涂层结合强度的差异,并对火焰喷涂型表面多孔管的沸腾传热性能进行了实验研究。     

High performance porous Si3N4 ceramics prepared by coated pore-forming agent method

Coated pore-forming agent method (CPFAM) was introduced to improve the pore-forming agent method (PFAM) for the preparation of porous silicon nitride ceramics. Using SEM in combination with measurements of porosity and flexural strength, it has been found that the flexural strength of the porous silicon nitride ceramics produced with the CPFAM method is significantly higher than those without the coating process: a 100% increase in flexural strength for samples with a porosity of 50%. The porous silicon nitride ceramics also have a very low dielectric constant, which is ideal for applications in wave-transmitting systems. The enhanced mechanical strength of the silicon nitride made by the CPFAM method is a result of a more uniform distribution of the spherical pores and the formation of a dense layer of rod-like microstructures near the surface of the pores.     

Strain Tolerant Porous Silicon Nitride

An approach to material strain tolerance, which basically makes it possible to lower the elastic modulus while retaining strength, was experimentally confirmed using as an example a porous silicon nitride composed of oriented anisotropic grains and pores. The porous structure consisting of tightly tangled rodlike grains and anisotropic pores was obtained by using β-Si₃N₄ whiskers. This material exhibited a low Youngs modulus while retaining a relatively high fracture stress, even though it contained 14.4% porosity. Consequently, the strain to failure of silicon nitride was appreciably increased.     

Excellent corrosion protection performance of epoxy composite coatings filled with silane functionalized silicon nitride

Silicon nitride was firstly used as anticorrosive pigment in organic coatings. An effective strategy by combining inorganic fillers and organosilanes was used to enhance the dispersibility of silicon nitride in epoxy resin. The formed nanocomposites were applied to protect Q235 carbon steel from corrosion. The anticorrosive performance of modified silicon nitride with silane (KH-570) was investigated by electrochemical impedance spectroscopy (EIS), water absorption and pull-off adhesion methods. With the increase of immersion time, the corrosion resistance as well as adhesion strength of epoxy resin coating and unmodified silicon nitride coating decreased significantly. However, for the modified silicon nitride coating, the corrosion resistance and adhesion strength still maintained 5.7×10¹⁰ Ω cm² and 7.6 MPa after 2400-h and 1200-h immersion, respectively. The excellent corrosion resistance performance could be attributed to the chemical interactions between KH-570 functional groups and silicon nitride powders, which mainly came from the easy formation of Si-O-Si bonds. Furthermore, the modified silicon nitride coating formed a strong barrier to corrosive electrolyte due to the hydrophobic of modified silicon nitride powder and increased bonds.     

多孔氮化硅陶瓷透波材料研究进展

多孔氮化硅陶瓷透波材料具有优异的机械性能、耐热性能及介电性能,成为透波材料科学研究领域中的热点之一。本文介绍了多孔氮化硅陶瓷的主要制备技术,并对国内外多孔氮化硅陶瓷透波材料的应用研究进展进行了综述。     

Thermal Oxidation of Sputter-Coated Reaction-Bonded Silicon Nitride

Ceramic coatings prepared by sputtering and reactive sputtering were applied to reaction-bonded silicon nitride surfaces to prevent extensive oxidation of the underlying material. The high-density nitride-based coatings retard the oxidation of the substrate by forming an oxygen diffusion barrier which seals the open porosity while maintaining dimensional and thermal stability. The oxidation kinetics of the coated and uncoated reaction-bonded silicon nitride substrates were compared at T = 1000 ° to 1200°C. Oxidation of the underlying material in this temperature range was substantially reduced when suitable coatings were used and the crystalline oxidation product (cristobalite) was essentially eliminated.     

Chemical stability of silicon nitride coatings used in the crystallization of photovoltaic silicon ingots. Part I: Stability in vacuum

Photovoltaic silicon is currently grown in silica crucibles coated with an oxidized silicon nitride powder, which acts as an interface releasing agent between the silicon and the crucible. A series of experiments was performed to study the reactions between coating components under high vacuum, varying the temperature, the holding time and the oxygen content in the coating. The results are discussed with the help of a simple analytical model taking into account the diffusive transport of reaction species from the inside of the porous coating to its surface and then their evaporation into the vapour phase.     

High performance porous silicon nitrides

In structural materials, pores are generally believed to deteriorate the mechanical reliability. This study, however, demonstrates pores can cause improved or unique performance when the porous microstructure is carefully controlled. The first example is a silicon nitride of 14% porosity fabricated by tape-castng whiskers. This material, where the characteristic fibrous grains were aligned uniaxially, shows a high fracture strength in excess of 1 GPa as well as high damage tolerance. The fracture energy obtained by a chevron-noteched beam technique was about seven times larger than that of dense silicon nitride, which was primarily attributable to grain “pull-out” mechanism enhanced by the pores. The other example was a silicon nitride of 24% porosity, fabricated by sinter forging technique which exhibited excellent strain tolerance.     

Chemical stability of silicon nitride coatings used in the crystallization of photovoltaic silicon ingots. Part II: Stability under argon flow

Processing of photovoltaic silicon by solidification is currently carried out under argon flow in silica crucibles coated with an oxidized silicon nitride powder. A series of experiments was performed to study the reactions between coating components under argon flow by varying the temperature, the holding time and the oxygen content in the coating. The results are discussed with the help of a simple analytical model taking into account the diffusive transport of gaseous reaction species from the inside of the porous coating to the flowing argon. The conclusions drawn are used to discuss different practical aspects of the photovoltaic silicon crystallization process.     

Fabrication and properties of in situ silicon nitride nanowires reinforced porous silicon nitride (SNNWs/SN) composites

The in situ silicon nitride nanowires reinforced porous silicon nitride (SNNWs/SN) composites were fabricated via gelcasting followed by pressureless sintering. SNNWs were well distributed in the porous silicon nitride matrix. The tip-body appearance suggested a VLS growth mechanism. The flexural strength and elastic modulus of the prepared composites can achieve 84.3?±?3.9?MPa and 23.3?±?2.0?GPa respectively (25?°C), while the corresponding porosity was 40.7?vol.%. Remarkably, the strength retention rate of the composites at 1400?°C was up to 66.1%. This is due to the excellent thermal stability of SNNWs and silicon nitride matrix. Also, the fracture toughness of the composites was improved to ～42% larger than pure porous silicon nitride ceramics because of the bridging effect of the NWs and the interlocking effect of β-Si₃N₄ crystals. In addition, a good thermal shock resistance and dielectric properties were indicated. The good overall performance made SNNWs/SN composites promising candidate for advanced high-temperature applications.